JP1584146S - - Google Patents
Info
- Publication number
- JP1584146S JP1584146S JPD2017-1755F JP2017001755F JP1584146S JP 1584146 S JP1584146 S JP 1584146S JP 2017001755 F JP2017001755 F JP 2017001755F JP 1584146 S JP1584146 S JP 1584146S
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPD2017-1755F JP1584146S (en) | 2017-01-31 | 2017-01-31 | |
| TW106301395F TWD190344S (en) | 2017-01-31 | 2017-03-17 | Shield ring for plasma processing unit |
| US29/610,999 USD840365S1 (en) | 2017-01-31 | 2017-07-18 | Cover ring for a plasma processing apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPD2017-1755F JP1584146S (en) | 2017-01-31 | 2017-01-31 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP1584146S true JP1584146S (en) | 2017-08-21 |
Family
ID=59593506
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JPD2017-1755F Active JP1584146S (en) | 2017-01-31 | 2017-01-31 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | USD840365S1 (en) |
| JP (1) | JP1584146S (en) |
| TW (1) | TWD190344S (en) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD882536S1 (en) * | 2017-04-28 | 2020-04-28 | Applied Materials, Inc. | Plasma source liner |
| USD875055S1 (en) * | 2017-04-28 | 2020-02-11 | Applied Materials, Inc. | Plasma connector liner |
| USD875053S1 (en) * | 2017-04-28 | 2020-02-11 | Applied Materials, Inc. | Plasma connector liner |
| USD875054S1 (en) * | 2017-04-28 | 2020-02-11 | Applied Materials, Inc. | Plasma connector liner |
| JP1640255S (en) * | 2018-10-25 | 2019-09-02 | ||
| JP1638504S (en) | 2018-12-06 | 2019-08-05 | ||
| USD918273S1 (en) * | 2019-05-14 | 2021-05-04 | Dana Gonzalez | Shoe and float collar device |
| USD931241S1 (en) * | 2019-08-28 | 2021-09-21 | Applied Materials, Inc. | Lower shield for a substrate processing chamber |
| USD913979S1 (en) * | 2019-08-28 | 2021-03-23 | Applied Materials, Inc. | Inner shield for a substrate processing chamber |
| US12100577B2 (en) | 2019-08-28 | 2024-09-24 | Applied Materials, Inc. | High conductance inner shield for process chamber |
| JP1678672S (en) * | 2019-11-07 | 2021-02-08 | ||
| JP1682811S (en) * | 2020-08-11 | 2021-04-05 | rectifier | |
| JP1682810S (en) * | 2020-08-11 | 2023-03-28 | rectifier | |
| JP1682813S (en) * | 2020-08-11 | 2021-04-05 | rectifier | |
| JP1682812S (en) * | 2020-08-11 | 2021-04-05 | rectifier | |
| JP1706321S (en) * | 2021-06-28 | 2022-01-31 | ||
| USD1008967S1 (en) * | 2022-05-16 | 2023-12-26 | Japan Aviation Electronics Industry, Limited | Collar for connector |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD404369S (en) * | 1997-08-20 | 1999-01-19 | Tokyo Electron Limited | Manifold cover for use in a semiconductor wafer heat processing apparatus |
| JP2003100713A (en) * | 2001-09-26 | 2003-04-04 | Kawasaki Microelectronics Kk | Cover for plasma electrode |
| USD491963S1 (en) * | 2002-11-20 | 2004-06-22 | Tokyo Electron Limited | Inner wall shield for a process chamber for manufacturing semiconductors |
| USD494551S1 (en) | 2002-12-12 | 2004-08-17 | Tokyo Electron Limited | Exhaust ring for manufacturing semiconductors |
| US20050150452A1 (en) * | 2004-01-14 | 2005-07-14 | Soovo Sen | Process kit design for deposition chamber |
| JP2005340251A (en) * | 2004-05-24 | 2005-12-08 | Shin Etsu Chem Co Ltd | Plasma processing apparatus and shower plate therefor |
| USD559993S1 (en) * | 2005-03-30 | 2008-01-15 | Tokyo Electron Limited | Cover ring |
| TWD121115S1 (en) | 2005-03-30 | 2008-01-21 | 東京威力科創股份有限公司 | Cover ring |
| US7186171B2 (en) * | 2005-04-22 | 2007-03-06 | Applied Materials, Inc. | Composite retaining ring |
| USD557425S1 (en) | 2005-08-25 | 2007-12-11 | Hitachi High-Technologies Corporation | Cover ring for a plasma processing apparatus |
| USD557226S1 (en) | 2005-08-25 | 2007-12-11 | Hitachi High-Technologies Corporation | Electrode cover for a plasma processing apparatus |
| US20080121620A1 (en) * | 2006-11-24 | 2008-05-29 | Guo G X | Processing chamber |
| USD667561S1 (en) * | 2009-11-13 | 2012-09-18 | 3M Innovative Properties Company | Sample processing disk cover |
| USD638550S1 (en) * | 2009-11-13 | 2011-05-24 | 3M Innovative Properties Company | Sample processing disk cover |
| USD638951S1 (en) * | 2009-11-13 | 2011-05-31 | 3M Innovative Properties Company | Sample processing disk cover |
| USD717746S1 (en) * | 2013-11-06 | 2014-11-18 | Applied Materials, Inc. | Lower chamber liner |
| JP1551512S (en) * | 2015-06-12 | 2016-06-13 | ||
| JP1546801S (en) * | 2015-06-12 | 2016-03-28 | ||
| JP1546800S (en) | 2015-06-12 | 2016-03-28 |
-
2017
- 2017-01-31 JP JPD2017-1755F patent/JP1584146S/ja active Active
- 2017-03-17 TW TW106301395F patent/TWD190344S/en unknown
- 2017-07-18 US US29/610,999 patent/USD840365S1/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| USD840365S1 (en) | 2019-02-12 |
| TWD190344S (en) | 2018-05-11 |