[go: up one dir, main page]

JP1546800S - - Google Patents

Info

Publication number
JP1546800S
JP1546800S JPD2015-13037F JP2015013037F JP1546800S JP 1546800 S JP1546800 S JP 1546800S JP 2015013037 F JP2015013037 F JP 2015013037F JP 1546800 S JP1546800 S JP 1546800S
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JPD2015-13037F
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JPD2015-13037F priority Critical patent/JP1546800S/ja
Priority to TW104305550F priority patent/TWD175854S/en
Priority to US29/544,070 priority patent/USD770992S1/en
Application granted granted Critical
Publication of JP1546800S publication Critical patent/JP1546800S/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JPD2015-13037F 2015-06-12 2015-06-12 Active JP1546800S (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JPD2015-13037F JP1546800S (en) 2015-06-12 2015-06-12
TW104305550F TWD175854S (en) 2015-06-12 2015-10-06 Protective rings for plasma processing equipment
US29/544,070 USD770992S1 (en) 2015-06-12 2015-10-30 Electrode cover for a plasma processing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JPD2015-13037F JP1546800S (en) 2015-06-12 2015-06-12

Publications (1)

Publication Number Publication Date
JP1546800S true JP1546800S (en) 2016-03-28

Family

ID=55539624

Family Applications (1)

Application Number Title Priority Date Filing Date
JPD2015-13037F Active JP1546800S (en) 2015-06-12 2015-06-12

Country Status (3)

Country Link
US (1) USD770992S1 (en)
JP (1) JP1546800S (en)
TW (1) TWD175854S (en)

Families Citing this family (69)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD801942S1 (en) * 2015-04-16 2017-11-07 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD797067S1 (en) 2015-04-21 2017-09-12 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
JP1545222S (en) * 2015-06-10 2016-03-07
JP1551512S (en) * 2015-06-12 2016-06-13
JP1546801S (en) * 2015-06-12 2016-03-28
JP1545406S (en) * 2015-06-16 2016-03-14
JP1545407S (en) * 2015-06-16 2016-03-14
USD798248S1 (en) * 2015-06-18 2017-09-26 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
JP1549880S (en) * 2015-08-06 2016-05-23
JP1550115S (en) * 2015-08-18 2016-05-23
JP1549882S (en) * 2015-08-18 2016-05-23
TWD179095S (en) * 2015-08-25 2016-10-21 荏原製作所股份有限公司 Substrate retaining ring
USD810705S1 (en) * 2016-04-01 2018-02-20 Veeco Instruments Inc. Self-centering wafer carrier for chemical vapor deposition
USD830434S1 (en) * 2015-12-28 2018-10-09 Ntn Corporation Inner ring for tapered roller bearing
USD847982S1 (en) * 2016-02-04 2019-05-07 Atos Medical Ab Heat exchanger base plate
USD828419S1 (en) * 2016-02-23 2018-09-11 Joy Global Underground Mining Llc Idler roller
USD836572S1 (en) 2016-09-30 2018-12-25 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
JP1581911S (en) * 2016-10-25 2017-07-24
USD839224S1 (en) * 2016-12-12 2019-01-29 Ebara Corporation Elastic membrane for semiconductor wafer polishing
JP1611626S (en) * 2017-01-20 2018-08-20
JP1584906S (en) 2017-01-31 2017-08-28
JP1584784S (en) 2017-01-31 2017-08-28
JP1584241S (en) 2017-01-31 2017-08-21
JP1584146S (en) 2017-01-31 2017-08-21
JP1598997S (en) * 2017-08-31 2018-03-05
JP1598998S (en) * 2017-08-31 2018-03-05
USD851613S1 (en) 2017-10-05 2019-06-18 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD891923S1 (en) * 2017-11-12 2020-08-04 Yun Lin Container lid
USD868124S1 (en) 2017-12-11 2019-11-26 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD877101S1 (en) 2018-03-09 2020-03-03 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
JP1643124S (en) 2018-07-25 2019-10-07
JP1643125S (en) 2018-07-25 2019-10-07
JP1642983S (en) 2018-07-25 2019-10-07
JP1643123S (en) 2018-07-25 2019-10-07
JP1642984S (en) 2018-07-25 2019-10-07
JP1646505S (en) * 2018-12-07 2019-11-25
US11961723B2 (en) * 2018-12-17 2024-04-16 Applied Materials, Inc. Process kit having tall deposition ring for PVD chamber
USD891382S1 (en) * 2019-02-08 2020-07-28 Applied Materials, Inc. Process shield for a substrate processing chamber
USD933725S1 (en) * 2019-02-08 2021-10-19 Applied Materials, Inc. Deposition ring for a substrate processing chamber
USD904305S1 (en) * 2019-02-25 2020-12-08 Petram Technologies, Inc. Electrode cage for a plasma blasting probe
JP1646366S (en) * 2019-03-19 2019-11-25
USD920521S1 (en) 2019-05-08 2021-05-25 Reza Jalinous Double coil
USD970020S1 (en) 2019-05-09 2022-11-15 Reza Jalinous Double coil
USD926996S1 (en) 2019-05-14 2021-08-03 Reza Jalinous Coil
USD1010135S1 (en) 2019-05-20 2024-01-02 Reza Jalinous Coil
USD979080S1 (en) 2019-06-27 2023-02-21 Reza Jalinous MRI tower coil stand
USD908645S1 (en) 2019-08-26 2021-01-26 Applied Materials, Inc. Sputtering target for a physical vapor deposition chamber
USD931241S1 (en) * 2019-08-28 2021-09-21 Applied Materials, Inc. Lower shield for a substrate processing chamber
JP1659287S (en) * 2019-10-18 2020-05-11
USD979524S1 (en) 2020-03-19 2023-02-28 Applied Materials, Inc. Confinement liner for a substrate processing chamber
USD943539S1 (en) * 2020-03-19 2022-02-15 Applied Materials, Inc. Confinement plate for a substrate processing chamber
USD934315S1 (en) * 2020-03-20 2021-10-26 Applied Materials, Inc. Deposition ring for a substrate processing chamber
USD937329S1 (en) 2020-03-23 2021-11-30 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber
USD980394S1 (en) * 2020-04-01 2023-03-07 Watermann Polyworks Gmbh Sealing apparatus
USD1034491S1 (en) * 2020-07-27 2024-07-09 Applied Materials, Inc. Edge ring
USD933726S1 (en) * 2020-07-31 2021-10-19 Applied Materials, Inc. Deposition ring for a semiconductor processing chamber
US11581166B2 (en) 2020-07-31 2023-02-14 Applied Materials, Inc. Low profile deposition ring for enhanced life
USD922589S1 (en) 2020-09-08 2021-06-15 Reza Jalinous Coil
USD989012S1 (en) * 2020-09-17 2023-06-13 Ebara Corporation Elastic membrane
USD940765S1 (en) 2020-12-02 2022-01-11 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD1006768S1 (en) * 2021-01-07 2023-12-05 Solaero Technologies Corp. Semiconductor wafer for mosaic solar cell fabrication
USD1007449S1 (en) 2021-05-07 2023-12-12 Applied Materials, Inc. Target profile for a physical vapor deposition chamber target
USD981459S1 (en) * 2021-06-16 2023-03-21 Ebara Corporation Retaining ring for substrate
JP1711120S (en) * 2021-10-22 2022-03-29 Suceptor cover
USD1042373S1 (en) 2022-03-18 2024-09-17 Applied Materials, Inc. Sliding ring for an interlocking process kit for a substrate processing chamber
USD1055006S1 (en) * 2022-03-18 2024-12-24 Applied Materials, Inc. Support ring for an interlocking process kit for a substrate processing chamber
USD1042374S1 (en) 2022-03-18 2024-09-17 Applied Materials, Inc. Support pipe for an interlocking process kit for a substrate processing chamber
USD1049067S1 (en) * 2022-04-04 2024-10-29 Applied Materials, Inc. Ring for an anti-rotation process kit for a substrate processing chamber
USD1053230S1 (en) 2022-05-19 2024-12-03 Applied Materials, Inc. Sputter target for a physical vapor deposition chamber

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6358388B1 (en) * 1996-07-15 2002-03-19 Semitool, Inc. Plating system workpiece support having workpiece-engaging electrodes with distal contact-part and dielectric cover
USD427570S (en) * 1997-01-31 2000-07-04 Tokyo Electron Limited Quartz fin heat retaining tube
USD404372S (en) * 1997-08-20 1999-01-19 Tokyo Electron Limited Ring for use in a semiconductor wafer heat processing apparatus
USD404370S (en) * 1997-08-20 1999-01-19 Tokyo Electron Limited Cap for use in a semiconductor wafer heat processing apparatus
US6843894B2 (en) * 1997-12-18 2005-01-18 Semitool, Inc. Cathode current control system for a wafer electroplating apparatus
US6248222B1 (en) * 1998-09-08 2001-06-19 Acm Research, Inc. Methods and apparatus for holding and positioning semiconductor workpieces during electropolishing and/or electroplating of the workpieces
US6908540B2 (en) * 2001-07-13 2005-06-21 Applied Materials, Inc. Method and apparatus for encapsulation of an edge of a substrate during an electro-chemical deposition process
US7025862B2 (en) * 2002-10-22 2006-04-11 Applied Materials Plating uniformity control by contact ring shaping
USD494551S1 (en) * 2002-12-12 2004-08-17 Tokyo Electron Limited Exhaust ring for manufacturing semiconductors
USD494552S1 (en) * 2002-12-12 2004-08-17 Tokyo Electron Limited Exhaust ring for manufacturing semiconductors
US7138039B2 (en) * 2003-01-21 2006-11-21 Applied Materials, Inc. Liquid isolation of contact rings
US7087144B2 (en) * 2003-01-31 2006-08-08 Applied Materials, Inc. Contact ring with embedded flexible contacts
USD559993S1 (en) 2005-03-30 2008-01-15 Tokyo Electron Limited Cover ring
TWD121115S1 (en) 2005-03-30 2008-01-21 東京威力科創股份有限公司 Cover ring
USD557226S1 (en) * 2005-08-25 2007-12-11 Hitachi High-Technologies Corporation Electrode cover for a plasma processing apparatus
USD709539S1 (en) 2011-09-30 2014-07-22 Tokyo Electron Limited Focusing ring
USD709536S1 (en) 2011-09-30 2014-07-22 Tokyo Electron Limited Focusing ring
USD699200S1 (en) 2011-09-30 2014-02-11 Tokyo Electron Limited Electrode member for a plasma processing apparatus
USD709538S1 (en) 2011-09-30 2014-07-22 Tokyo Electron Limited Focusing ring

Also Published As

Publication number Publication date
USD770992S1 (en) 2016-11-08
TWD175854S (en) 2016-05-21

Similar Documents

Publication Publication Date Title
JP1575842S (en)
JP1549882S (en)
JP1550115S (en)
JP1549880S (en)
JP1546800S (en)
JP1545222S (en)
BR112017026609A2 (en)
BR112018004968A2 (en)
JP1545407S (en)
JP1551512S (en)
JP1546801S (en)
JP1545406S (en)
BR112018004058A2 (en)
BR112017026793A2 (en)
BR0009373B1 (en)
BR0008132B1 (en)
CN303069651S (en)
BR0010150B1 (en)
BR0009942B1 (en)
BR0009761B1 (en)
BR0009757B1 (en)
BR0009717B1 (en)
BR0009649B1 (en)
BR0004687B1 (en)
BR0009349B1 (en)