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IT9021550A0 - METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE - Google Patents

METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE

Info

Publication number
IT9021550A0
IT9021550A0 IT9021550A IT2155090A IT9021550A0 IT 9021550 A0 IT9021550 A0 IT 9021550A0 IT 9021550 A IT9021550 A IT 9021550A IT 2155090 A IT2155090 A IT 2155090A IT 9021550 A0 IT9021550 A0 IT 9021550A0
Authority
IT
Italy
Prior art keywords
manufacturing
semiconductor device
semiconductor
Prior art date
Application number
IT9021550A
Other languages
Italian (it)
Other versions
IT9021550A1 (en
IT1243103B (en
Inventor
Kim Kyung-Hun
Kim Seong-Tae
Lee Hyeong-Kyu
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Publication of IT9021550A0 publication Critical patent/IT9021550A0/en
Publication of IT9021550A1 publication Critical patent/IT9021550A1/en
Application granted granted Critical
Publication of IT1243103B publication Critical patent/IT1243103B/en

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B12/00Dynamic random access memory [DRAM] devices
    • H10B12/30DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells
    • H10B12/31DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells having a storage electrode stacked over the transistor
    • H10B12/318DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells having a storage electrode stacked over the transistor the storage electrode having multiple segments
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B12/00Dynamic random access memory [DRAM] devices
    • H10B12/01Manufacture or treatment
    • H10B12/02Manufacture or treatment for one transistor one-capacitor [1T-1C] memory cells
    • H10B12/03Making the capacitor or connections thereto
    • H10B12/033Making the capacitor or connections thereto the capacitor extending over the transistor
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B12/00Dynamic random access memory [DRAM] devices
    • H10B12/30DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells
    • H10B12/31DRAM devices comprising one-transistor - one-capacitor [1T-1C] memory cells having a storage electrode stacked over the transistor

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Semiconductor Memories (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Light Receiving Elements (AREA)
IT02155090A 1990-05-21 1990-09-24 METHOD FOR THE MANUFACTURE OF A SEMICONDUCTOR DEVICE. IT1243103B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1019900007268A KR930000718B1 (en) 1990-05-21 1990-05-21 Manufacturing Method of Semiconductor Device

Publications (3)

Publication Number Publication Date
IT9021550A0 true IT9021550A0 (en) 1990-09-24
IT9021550A1 IT9021550A1 (en) 1992-03-24
IT1243103B IT1243103B (en) 1994-05-24

Family

ID=19299238

Family Applications (1)

Application Number Title Priority Date Filing Date
IT02155090A IT1243103B (en) 1990-05-21 1990-09-24 METHOD FOR THE MANUFACTURE OF A SEMICONDUCTOR DEVICE.

Country Status (6)

Country Link
JP (1) JPH0724285B2 (en)
KR (1) KR930000718B1 (en)
DE (1) DE4031414A1 (en)
FR (1) FR2662302B1 (en)
GB (1) GB2244375B (en)
IT (1) IT1243103B (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR930006732B1 (en) * 1991-05-08 1993-07-23 재단법인 한국전자통신연구소 Semiconductor substrate with embedded structure having electrical characteristics and manufacturing method thereof

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62120070A (en) * 1985-11-20 1987-06-01 Toshiba Corp Semiconductor memory
JPH0736437B2 (en) * 1985-11-29 1995-04-19 株式会社日立製作所 Method of manufacturing semiconductor memory
JP2569048B2 (en) * 1987-05-27 1997-01-08 株式会社日立製作所 Method for manufacturing semiconductor memory
EP0750347B1 (en) * 1987-06-17 2002-05-08 Fujitsu Limited Dynamic random access memory device and method of producing the same
JPH01154551A (en) * 1987-12-11 1989-06-16 Oki Electric Ind Co Ltd Semiconductor storage integrated circuit device and manufacture thereof
KR910010167B1 (en) * 1988-06-07 1991-12-17 삼성전자 주식회사 Stacked Capacitor DRAM Cells and Manufacturing Method Thereof
US5116776A (en) * 1989-11-30 1992-05-26 Sgs-Thomson Microelectronics, Inc. Method of making a stacked copacitor for dram cell
KR920010204B1 (en) * 1989-12-02 1992-11-21 삼성전자 주식회사 Ultra-Integrated DRAM Cell and Manufacturing Method Thereof

Also Published As

Publication number Publication date
GB9020502D0 (en) 1990-10-31
JPH0424961A (en) 1992-01-28
IT9021550A1 (en) 1992-03-24
KR910020901A (en) 1991-12-20
DE4031414A1 (en) 1991-11-28
GB2244375A (en) 1991-11-27
IT1243103B (en) 1994-05-24
JPH0724285B2 (en) 1995-03-15
KR930000718B1 (en) 1993-01-30
FR2662302A1 (en) 1991-11-22
FR2662302B1 (en) 1992-08-14
GB2244375B (en) 1994-06-15

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Legal Events

Date Code Title Description
0001 Granted
TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19970926