IT7822795A0 - Apparecchiatura perfezionata perl'impiantamento di ioni. - Google Patents
Apparecchiatura perfezionata perl'impiantamento di ioni.Info
- Publication number
- IT7822795A0 IT7822795A0 IT7822795A IT2279578A IT7822795A0 IT 7822795 A0 IT7822795 A0 IT 7822795A0 IT 7822795 A IT7822795 A IT 7822795A IT 2279578 A IT2279578 A IT 2279578A IT 7822795 A0 IT7822795 A0 IT 7822795A0
- Authority
- IT
- Italy
- Prior art keywords
- ion implantation
- improved equipment
- equipment
- improved
- implantation
- Prior art date
Links
- 238000005468 ion implantation Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/026—Means for avoiding or neutralising unwanted electrical charges on tube components
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/24405—Faraday cages
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/245—Detection characterised by the variable being measured
- H01J2237/24507—Intensity, dose or other characteristics of particle beams or electromagnetic radiation
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US05/794,276 US4135097A (en) | 1977-05-05 | 1977-05-05 | Ion implantation apparatus for controlling the surface potential of a target surface |
US05/794,275 US4118630A (en) | 1977-05-05 | 1977-05-05 | Ion implantation apparatus with a cooled structure controlling the surface potential of a target surface |
Publications (2)
Publication Number | Publication Date |
---|---|
IT7822795A0 true IT7822795A0 (it) | 1978-04-28 |
IT1112625B IT1112625B (it) | 1986-01-20 |
Family
ID=27121491
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT22795/78A IT1112625B (it) | 1977-05-05 | 1978-04-28 | Apparecchiatura perfezionata per l'impiantamento di ioni |
Country Status (5)
Country | Link |
---|---|
DE (1) | DE2819114C3 (it) |
FR (1) | FR2389998B1 (it) |
GB (1) | GB1584224A (it) |
IT (1) | IT1112625B (it) |
NL (1) | NL7804691A (it) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2490873A1 (fr) * | 1980-09-24 | 1982-03-26 | Varian Associates | Procede et dispositif destines a produire une neutralisation amelioree d'un faisceau d'ions positifs |
FR2793951B1 (fr) * | 1999-05-21 | 2001-08-17 | Centre Nat Etd Spatiales | Procede et installation de traitement d'un substrat tel qu'un circuit integre par un faisceau focalise de particules electriquement neutres |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2890342A (en) * | 1954-09-29 | 1959-06-09 | Gen Electric | System for charge neutralization |
US3313969A (en) * | 1966-03-25 | 1967-04-11 | Boeing Co | Charged particle deflecting apparatus having hemispherical electrodes |
US3507709A (en) * | 1967-09-15 | 1970-04-21 | Hughes Aircraft Co | Method of irradiating dielectriccoated semiconductor bodies with low energy electrons |
US3997846A (en) * | 1975-06-30 | 1976-12-14 | International Business Machines Corporation | Method and apparatus for electrostatic deflection of high current ion beams in scanning apparatus |
US4011449A (en) * | 1975-11-05 | 1977-03-08 | Ibm Corporation | Apparatus for measuring the beam current of charged particle beam |
US4013891A (en) * | 1975-12-15 | 1977-03-22 | Ibm Corporation | Method for varying the diameter of a beam of charged particles |
-
1978
- 1978-03-23 FR FR7809182A patent/FR2389998B1/fr not_active Expired
- 1978-04-07 GB GB13696/78A patent/GB1584224A/en not_active Expired
- 1978-04-28 IT IT22795/78A patent/IT1112625B/it active
- 1978-04-29 DE DE2819114A patent/DE2819114C3/de not_active Expired
- 1978-05-02 NL NL7804691A patent/NL7804691A/xx not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
DE2819114B2 (de) | 1981-07-16 |
DE2819114C3 (de) | 1982-03-04 |
FR2389998B1 (it) | 1981-11-20 |
NL7804691A (nl) | 1978-11-07 |
IT1112625B (it) | 1986-01-20 |
GB1584224A (en) | 1981-02-11 |
DE2819114A1 (de) | 1978-11-16 |
FR2389998A1 (it) | 1978-12-01 |
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