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IL130874A - מערכת ושיטה למדידת מבנים תבניתיים - Google Patents

מערכת ושיטה למדידת מבנים תבניתיים

Info

Publication number
IL130874A
IL130874A IL13087499A IL13087499A IL130874A IL 130874 A IL130874 A IL 130874A IL 13087499 A IL13087499 A IL 13087499A IL 13087499 A IL13087499 A IL 13087499A IL 130874 A IL130874 A IL 130874A
Authority
IL
Israel
Prior art keywords
light
measurement
measured data
wafer
collection
Prior art date
Application number
IL13087499A
Other languages
English (en)
Other versions
IL130874A0 (en
Original Assignee
Nova Measuring Instr Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to IL13087499A priority Critical patent/IL130874A/he
Application filed by Nova Measuring Instr Ltd filed Critical Nova Measuring Instr Ltd
Priority to US09/610,889 priority patent/US6657736B1/en
Publication of IL130874A0 publication Critical patent/IL130874A0/xx
Publication of IL130874A publication Critical patent/IL130874A/he
Priority to US10/724,113 priority patent/US7477405B2/en
Priority to US11/931,520 priority patent/US7626711B2/en
Priority to US11/931,598 priority patent/US7495782B2/en
Priority to US11/931,435 priority patent/US7663768B2/en
Priority to US11/931,169 priority patent/US7626710B2/en
Priority to US11/931,342 priority patent/US7760368B2/en
Priority to US11/930,594 priority patent/US20080062406A1/en
Priority to US12/389,890 priority patent/US7791740B2/en
Priority to US12/624,555 priority patent/US7864343B2/en
Priority to US12/838,763 priority patent/US8023122B2/en
Priority to US12/838,739 priority patent/US20100280807A1/en
Priority to US12/853,453 priority patent/US7864344B1/en
Priority to US13/235,986 priority patent/US8531678B2/en
Priority to US14/021,765 priority patent/US20140009760A1/en
Priority to US14/494,981 priority patent/US9184102B2/en
Priority to US14/935,806 priority patent/US20160109225A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N21/4788—Diffraction
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/55—Specular reflectivity
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
IL13087499A 1999-07-09 1999-07-09 מערכת ושיטה למדידת מבנים תבניתיים IL130874A (he)

Priority Applications (18)

Application Number Priority Date Filing Date Title
IL13087499A IL130874A (he) 1999-07-09 1999-07-09 מערכת ושיטה למדידת מבנים תבניתיים
US09/610,889 US6657736B1 (en) 1999-07-09 2000-07-06 Method and system for measuring patterned structures
US10/724,113 US7477405B2 (en) 1999-07-09 2003-12-01 Method and system for measuring patterned structures
US11/931,520 US7626711B2 (en) 1999-07-09 2007-10-31 Method and system for measuring patterned structures
US11/931,598 US7495782B2 (en) 1999-07-09 2007-10-31 Method and system for measuring patterned structures
US11/931,435 US7663768B2 (en) 1999-07-09 2007-10-31 Method and system for measuring patterned structures
US11/931,169 US7626710B2 (en) 1999-07-09 2007-10-31 Method and system for measuring patterned structures
US11/931,342 US7760368B2 (en) 1999-07-09 2007-10-31 Method and system for measuring patterned structures
US11/930,594 US20080062406A1 (en) 1999-07-09 2007-10-31 Method and system for measuring patterned structures
US12/389,890 US7791740B2 (en) 1999-07-09 2009-02-20 Method and system for measuring patterned structures
US12/624,555 US7864343B2 (en) 1999-07-09 2009-11-24 Method and system for measuring patterned structures
US12/838,739 US20100280807A1 (en) 1999-07-09 2010-07-19 Method and system for measuring patterned structures
US12/838,763 US8023122B2 (en) 1999-07-09 2010-07-19 Method and system for measuring patterned structures
US12/853,453 US7864344B1 (en) 1999-07-09 2010-08-10 Method and system for measuring patterned structures
US13/235,986 US8531678B2 (en) 1999-07-09 2011-09-19 Method and system for measuring patterned structures
US14/021,765 US20140009760A1 (en) 1999-07-09 2013-09-09 Method and system for measuring patterned structures
US14/494,981 US9184102B2 (en) 1999-07-09 2014-09-24 Method and system for measuring patterned structures
US14/935,806 US20160109225A1 (en) 1999-07-09 2015-11-09 Method and system for measuring patterned structures

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IL13087499A IL130874A (he) 1999-07-09 1999-07-09 מערכת ושיטה למדידת מבנים תבניתיים

Publications (2)

Publication Number Publication Date
IL130874A0 IL130874A0 (en) 2001-01-28
IL130874A true IL130874A (he) 2002-12-01

Family

ID=11073004

Family Applications (1)

Application Number Title Priority Date Filing Date
IL13087499A IL130874A (he) 1999-07-09 1999-07-09 מערכת ושיטה למדידת מבנים תבניתיים

Country Status (2)

Country Link
US (13) US6657736B1 (he)
IL (1) IL130874A (he)

Families Citing this family (132)

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