[go: up one dir, main page]

HUT64986A - Process for the production of polymers and copolymers with low optical density for use as photoresisting material - Google Patents

Process for the production of polymers and copolymers with low optical density for use as photoresisting material

Info

Publication number
HUT64986A
HUT64986A HU911969A HU196991A HUT64986A HU T64986 A HUT64986 A HU T64986A HU 911969 A HU911969 A HU 911969A HU 196991 A HU196991 A HU 196991A HU T64986 A HUT64986 A HU T64986A
Authority
HU
Hungary
Prior art keywords
transesterification
polymers
optical density
over
low optical
Prior art date
Application number
HU911969A
Other languages
English (en)
Other versions
HU911969D0 (en
Inventor
Michael T Sheehan
James H Rea
Original Assignee
Hoechst Celanese Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=27415527&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=HUT64986(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Priority claimed from US07/706,601 external-priority patent/US5239015A/en
Application filed by Hoechst Celanese Corp filed Critical Hoechst Celanese Corp
Publication of HU911969D0 publication Critical patent/HU911969D0/hu
Publication of HUT64986A publication Critical patent/HUT64986A/hu

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00—Chemical modification by after-treatment
    • C08F8/12—Hydrolysis
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2800/00—Copolymer characterised by the proportions of the comonomers expressed
    • C08F2800/20—Copolymer characterised by the proportions of the comonomers expressed as weight or mass percentages

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerisation Methods In General (AREA)
  • Polymerization Catalysts (AREA)
HU911969A 1990-06-29 1991-06-13 Process for the production of polymers and copolymers with low optical density for use as photoresisting material HUT64986A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US54834490A 1990-06-29 1990-06-29
US60484790A 1990-10-26 1990-10-26
US07/706,601 US5239015A (en) 1990-06-29 1991-05-28 Process for making low optical density polymers and copolymers for photoresists and optical applications

Publications (2)

Publication Number Publication Date
HU911969D0 HU911969D0 (en) 1991-12-30
HUT64986A true HUT64986A (en) 1994-03-28

Family

ID=27415527

Family Applications (1)

Application Number Title Priority Date Filing Date
HU911969A HUT64986A (en) 1990-06-29 1991-06-13 Process for the production of polymers and copolymers with low optical density for use as photoresisting material

Country Status (17)

Country Link
EP (1) EP0466359B2 (hu)
JP (1) JP3022932B2 (hu)
KR (1) KR100201375B1 (hu)
CN (1) CN1057847A (hu)
AT (1) ATE192753T1 (hu)
AU (1) AU7945691A (hu)
CS (1) CS184091A3 (hu)
DE (1) DE69132181T3 (hu)
FI (1) FI913175A (hu)
HU (1) HUT64986A (hu)
IE (1) IE64029B1 (hu)
IL (1) IL98605A (hu)
NO (1) NO178155C (hu)
PH (1) PH30779A (hu)
PL (1) PL290835A1 (hu)
SG (1) SG46518A1 (hu)
TW (1) TW219368B (hu)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4300209A1 (de) * 1993-01-07 1994-07-14 Basf Ag Verfahren zur Herstellung von p-Hydroxystyrolpolymerisaten und deren Verwendung
US5324788A (en) * 1993-04-30 1994-06-28 Eastman Kodak Company Thermosetting coating compositions
KR100332915B1 (ko) * 1997-12-23 2002-10-25 주식회사 포스코 접착력 및 내식성이 개선된 강판 피복용 스티렌 고분자 킬레이트 접착제 제조방법
TWI226339B (en) 1999-03-26 2005-01-11 Shinetsu Chemical Co High molecular weight compound and the method to prepare the same
JP2002302515A (ja) 2001-04-04 2002-10-18 Gun Ei Chem Ind Co Ltd レジスト用高分子化合物の製造方法
TWI267697B (en) * 2001-06-28 2006-12-01 Tokyo Ohka Kogyo Co Ltd Chemical amplified type positive resist component and resist packed-layer material and forming method of resist pattern and manufacturing method of semiconductor device
CN102471491B (zh) * 2009-08-21 2014-04-02 日本曹达株式会社 改性聚硅氧烷化合物的制备方法
KR102245076B1 (ko) * 2020-08-26 2021-04-28 로움하이텍 주식회사 비닐페놀계 중합체의 제조방법
KR102245074B1 (ko) * 2020-09-17 2021-04-28 로움하이텍 주식회사 비닐페놀계 중합체의 제조방법

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB948961A (en) * 1960-01-22 1964-02-05 Nat Res Dev Polymers derived from polyvinyl phenol
EP0277721A3 (en) * 1987-01-28 1989-03-15 Hoechst Celanese Corporation Emulsion polymerization of 4-acetoxystyrene and hydrolysis to poly(p-vinylphenol)
US4898916A (en) * 1987-03-05 1990-02-06 Hoechst Celanese Corporation Process for the preparation of poly(vinylphenol) from poly(acetoxystyrene) by acid catalyzed transesterification
EP0353339A3 (en) * 1988-08-02 1990-05-09 Hoechst Aktiengesellschaft A process for the production of poly(3-mono or 3,5-disubstituted-4-acetoxystryrenes), their copolymers and hydrolysis thereof

Also Published As

Publication number Publication date
IL98605A (en) 1995-03-15
ATE192753T1 (de) 2000-05-15
AU7945691A (en) 1992-01-02
IE64029B1 (en) 1995-06-28
JP3022932B2 (ja) 2000-03-21
KR100201375B1 (ko) 1999-06-15
NO178155B (no) 1995-10-23
PL290835A1 (en) 1992-03-23
HU911969D0 (en) 1991-12-30
IL98605A0 (en) 1992-07-15
IE912267A1 (en) 1992-01-01
EP0466359B2 (en) 2003-07-23
CN1057847A (zh) 1992-01-15
NO912557L (no) 1991-12-30
CS184091A3 (en) 1992-03-18
TW219368B (hu) 1994-01-21
DE69132181D1 (de) 2000-06-15
NO178155C (no) 1996-01-31
NO912557D0 (no) 1991-06-28
PH30779A (en) 1997-10-17
SG46518A1 (en) 1998-02-20
FI913175A (fi) 1991-12-30
JPH04279608A (ja) 1992-10-05
FI913175A0 (fi) 1991-06-28
DE69132181T3 (de) 2004-05-06
KR920000807A (ko) 1992-01-29
DE69132181T2 (de) 2000-12-14
EP0466359B1 (en) 2000-05-10
EP0466359A3 (en) 1992-07-01
EP0466359A2 (en) 1992-01-15

Similar Documents

Publication Publication Date Title
Hegazy et al. Radiation grafting of acrylic acid onto fluorine‐containing polymers. I. Kinetic study of preirradiation grafting onto poly (tetrafluoroethylene)
Yagci et al. Block copolymers by combination of radical and promoted cationic polymerization routes
DE3477389D1 (en) Preparation of aromatic polymers
RU92004373A (ru) Способ контроля распределения молекулярного веса в полимерах
HUT64986A (en) Process for the production of polymers and copolymers with low optical density for use as photoresisting material
US5239015A (en) Process for making low optical density polymers and copolymers for photoresists and optical applications
Ayrey et al. Radiochemical studies of free-radical vinyl polymerizations: 7. Polymerization of methyl acrylate
DK0583177T3 (da) Forbedring af fremstillingen af superabsorberende pulvere ved polymerisation i invers suspension af acrylmonomerer
CA2045093A1 (en) A process for making low optical density polymers and copolymers for photoresists and optical applications
Schnarr et al. Polymerization of diethylene glycol bis (allyl carbonate) by means of di‐sec‐butyl peroxydicarbonate
ES523301A0 (es) Un procedimiento para preparar un polimero soluble en agua.
US3450616A (en) Tri-ortho-tolylphosphine as a photo-polymerization initiator
EP0101300A3 (en) Hydrophilic copolymer compositions useful as contact lenses
TH27026A (th) กรรมวิธีสำหรับทำโพลิเมอร์และโคโพลิเมอร์ชนิดความทึปแสงต่ำสำหรับทนต่อแสง และการใช้เชิงแสง
Zhili et al. Grafting of vinylimidazole into air-irradiated polymer films—2. Grafting into polyethylene
Fujii et al. Photoinduced isomerization and photoregulation of the hydrodynamic volume of poly (α, ι-disubstituted 2, 3-azabutadiene)
Onishi et al. Study of Dextran-Methyl Methacrylate Graft Copolymer
Musayev et al. The effect of the medium on the kinetics of radiation polymerization of aminoalkyl monomers
JP2003155311A (ja) 導光材料製造で使用可能な架橋性官能性ポリマー
Chung et al. Homopolymerization and copolymerization behavior of α-chlorostyrene
Huang et al. Polyfunctional initiation system for preparation of block copolymer of ethylene oxide and methyl methacrylate by sequential initiation of anion and charge transfer complex and the effect of polymerization conditions on the copolymerization
Gupta et al. Heat Degradation of PVC Stabilized by Treatment with Alkylaluminum Compounds
JPS63235304A (ja) 軟質コンタクトレンズ素材の製造法
JPH05100041A (ja) 固体飛跡検出器

Legal Events

Date Code Title Description
DFC4 Cancellation of temporary protection due to refusal