HK1148561A1 - Mould for galvanoplasty and method of fabricating the same - Google Patents
Mould for galvanoplasty and method of fabricating the sameInfo
- Publication number
- HK1148561A1 HK1148561A1 HK11102558A HK11102558A HK1148561A1 HK 1148561 A1 HK1148561 A1 HK 1148561A1 HK 11102558 A HK11102558 A HK 11102558A HK 11102558 A HK11102558 A HK 11102558A HK 1148561 A1 HK1148561 A1 HK 1148561A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- layer
- upper layer
- intermediate layer
- etching
- mold
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title abstract 3
- 239000011248 coating agent Substances 0.000 abstract 4
- 238000000576 coating method Methods 0.000 abstract 4
- 238000005530 etching Methods 0.000 abstract 4
- 239000000758 substrate Substances 0.000 abstract 4
- 238000000034 method Methods 0.000 abstract 3
- 239000002210 silicon-based material Substances 0.000 abstract 2
- 238000000206 photolithography Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D1/00—Electroforming
- C25D1/10—Moulds; Masks; Masterforms
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C99/00—Subject matter not provided for in other groups of this subclass
- B81C99/0075—Manufacture of substrate-free structures
- B81C99/009—Manufacturing the stamps or the moulds
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2201/00—Specific applications of microelectromechanical systems
- B81B2201/03—Microengines and actuators
- B81B2201/035—Microgears
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Micromachines (AREA)
- ing And Chemical Polishing (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP20090155125 EP2230207A1 (fr) | 2009-03-13 | 2009-03-13 | Moule pour galvanoplastie et son procédé de fabrication |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1148561A1 true HK1148561A1 (en) | 2011-09-09 |
Family
ID=41047360
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK11102558A HK1148561A1 (en) | 2009-03-13 | 2011-03-14 | Mould for galvanoplasty and method of fabricating the same |
Country Status (8)
Country | Link |
---|---|
US (2) | US8512539B2 (xx) |
EP (2) | EP2230207A1 (xx) |
JP (1) | JP5443220B2 (xx) |
KR (1) | KR20100103434A (xx) |
CN (1) | CN101831672B (xx) |
HK (1) | HK1148561A1 (xx) |
RU (1) | RU2526108C2 (xx) |
TW (1) | TWI598206B (xx) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2230206B1 (fr) * | 2009-03-13 | 2013-07-17 | Nivarox-FAR S.A. | Moule pour galvanoplastie et son procédé de fabrication |
EP2263971A1 (fr) * | 2009-06-09 | 2010-12-22 | Nivarox-FAR S.A. | Pièce de micromécanique composite et son procédé de fabrication |
JP5773624B2 (ja) | 2010-01-08 | 2015-09-02 | キヤノン株式会社 | 微細構造体の製造方法 |
EP2655700A1 (en) * | 2010-12-23 | 2013-10-30 | Centre de Recherche Public - Gabriel Lippmann | An ecpr master electrode and a method for providing such ecpr master electrode |
CN102167282A (zh) * | 2011-04-07 | 2011-08-31 | 天津海鸥表业集团有限公司 | 一种硅与金属复合材料的微结构加工方法 |
KR101351221B1 (ko) * | 2011-09-21 | 2014-01-14 | 한국전력공사 | 테이프 캐스팅을 이용한 지지체식 코팅막의 제조방법 |
KR20140092914A (ko) * | 2011-11-15 | 2014-07-24 | 가부시키가이샤 리프 | 다단 전사 금형의 제조 방법, 다단 전사 금형, 및 그것에 의한 부품 |
EP2767869A1 (fr) * | 2013-02-13 | 2014-08-20 | Nivarox-FAR S.A. | Procédé de fabrication d'une pièce de micromécanique monobloc comportant au moins deux niveaux distincts |
CH708827A2 (fr) * | 2013-11-08 | 2015-05-15 | Nivarox Sa | Pièce de micromécanique creuse, à plusieurs niveaux fonctionnels et monobloc en un matériau à base d'un allotrope synthétique du carbone. |
CN105402363B (zh) * | 2014-09-09 | 2019-07-23 | 精工电子有限公司 | 机械部件、机芯、钟表以及机械部件的制造方法 |
EP3109199B1 (fr) * | 2015-06-25 | 2022-05-11 | Nivarox-FAR S.A. | Piece a base de silicium avec au moins un chanfrein et son procede de fabrication |
CN105729683B (zh) * | 2016-03-18 | 2017-12-01 | 宁波双林模具有限公司 | 一种注塑模具型腔精密仿真皮纹型面的制作方法 |
EP3467151B1 (fr) * | 2017-10-06 | 2020-06-17 | Nivarox-FAR S.A. | Moule pour galvanoplastie et son procédé de fabrication |
JP7317637B2 (ja) * | 2019-08-30 | 2023-07-31 | シチズンファインデバイス株式会社 | 電鋳金型製造方法 |
EP3839624B1 (fr) * | 2019-12-18 | 2023-09-13 | Nivarox-FAR S.A. | Procede de fabrication d'un composant horloger |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4142001A1 (de) * | 1991-12-19 | 1993-06-24 | Microparts Gmbh | Verfahren zum herstellen gestufter formeinsaetze, gestufte formeinsaetze und damit abgeformte mikrostrukturkoerper |
DE4001399C1 (en) * | 1990-01-19 | 1991-07-25 | Kernforschungszentrum Karlsruhe Gmbh, 7500 Karlsruhe, De | Metallic microstructures - formed on substrates, by putting poly:methyl methacrylate] between moulding tool and silicon substrate |
US5529681A (en) * | 1993-03-30 | 1996-06-25 | Microparts Gesellschaft Fur Mikrostrukturtechnik Mbh | Stepped mould inserts, high-precision stepped microstructure bodies, and methods of producing the same |
US5944974A (en) * | 1995-07-01 | 1999-08-31 | Fahrenberg; Jens | Process for manufacturing mold inserts |
US6214245B1 (en) * | 1999-03-02 | 2001-04-10 | Eastman Kodak Company | Forming-ink jet nozzle plate layer on a base |
US7052117B2 (en) * | 2002-07-03 | 2006-05-30 | Dimatix, Inc. | Printhead having a thin pre-fired piezoelectric layer |
JP3990307B2 (ja) * | 2003-03-24 | 2007-10-10 | 株式会社クラレ | 樹脂成形品の製造方法、金属構造体の製造方法、チップ |
CN100548692C (zh) * | 2003-10-10 | 2009-10-14 | 富士胶卷迪马蒂克斯股份有限公司 | 具有薄膜的打印头 |
RU2254403C1 (ru) * | 2004-02-02 | 2005-06-20 | Российская Федерация, от имени которой выступает Министерство Российской Федерации по атомной энергии | Гальванопластический способ изготовления сложнорельефных деталей со щелевой структурой |
JP4469194B2 (ja) | 2004-03-12 | 2010-05-26 | セイコーインスツル株式会社 | 電鋳用型、電鋳方法、及びその電鋳用型の製造方法 |
JP4550569B2 (ja) * | 2004-12-20 | 2010-09-22 | セイコーインスツル株式会社 | 電鋳型とその製造方法 |
JP4840756B2 (ja) * | 2005-01-14 | 2011-12-21 | セイコーインスツル株式会社 | 電鋳型とその製造方法及び電鋳部品の製造方法 |
JP4834426B2 (ja) * | 2006-03-06 | 2011-12-14 | キヤノン株式会社 | インクジェット記録ヘッドの製造方法 |
US7448277B2 (en) * | 2006-08-31 | 2008-11-11 | Evigia Systems, Inc. | Capacitive pressure sensor and method therefor |
JP5144127B2 (ja) * | 2007-05-23 | 2013-02-13 | キヤノン株式会社 | ナノインプリント用のモールドの製造方法 |
EP2060534A1 (fr) * | 2007-11-16 | 2009-05-20 | Nivarox-FAR S.A. | Pièce de micromécanique composite silicium - métal et son procédé de fabrication |
US8197029B2 (en) * | 2008-12-30 | 2012-06-12 | Fujifilm Corporation | Forming nozzles |
EP2230206B1 (fr) * | 2009-03-13 | 2013-07-17 | Nivarox-FAR S.A. | Moule pour galvanoplastie et son procédé de fabrication |
-
2009
- 2009-03-13 EP EP20090155125 patent/EP2230207A1/fr not_active Withdrawn
-
2010
- 2010-02-26 EP EP20100154909 patent/EP2230208B1/fr active Active
- 2010-03-05 TW TW099106471A patent/TWI598206B/zh active
- 2010-03-12 US US12/723,191 patent/US8512539B2/en active Active
- 2010-03-12 RU RU2010109438/02A patent/RU2526108C2/ru active
- 2010-03-12 CN CN2010101339857A patent/CN101831672B/zh active Active
- 2010-03-15 JP JP2010057503A patent/JP5443220B2/ja active Active
- 2010-03-15 KR KR20100022724A patent/KR20100103434A/ko not_active Ceased
-
2011
- 2011-03-14 HK HK11102558A patent/HK1148561A1/xx unknown
-
2012
- 2012-10-03 US US13/644,215 patent/US9139925B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
US20130213800A1 (en) | 2013-08-22 |
EP2230208A1 (fr) | 2010-09-22 |
KR20100103434A (ko) | 2010-09-27 |
RU2526108C2 (ru) | 2014-08-20 |
JP2010216014A (ja) | 2010-09-30 |
EP2230208B1 (fr) | 2014-01-08 |
US20100236934A1 (en) | 2010-09-23 |
RU2010109438A (ru) | 2011-09-20 |
CN101831672A (zh) | 2010-09-15 |
JP5443220B2 (ja) | 2014-03-19 |
US9139925B2 (en) | 2015-09-22 |
US8512539B2 (en) | 2013-08-20 |
CN101831672B (zh) | 2013-01-16 |
TW201100224A (en) | 2011-01-01 |
TWI598206B (zh) | 2017-09-11 |
EP2230207A1 (fr) | 2010-09-22 |
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