HK1008887A1 - 可光固化的組合物 - Google Patents
可光固化的組合物 Download PDFInfo
- Publication number
- HK1008887A1 HK1008887A1 HK98109621A HK98109621A HK1008887A1 HK 1008887 A1 HK1008887 A1 HK 1008887A1 HK 98109621 A HK98109621 A HK 98109621A HK 98109621 A HK98109621 A HK 98109621A HK 1008887 A1 HK1008887 A1 HK 1008887A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- ferrocene
- ppm
- bis
- oxo
- acetyl
- Prior art date
Links
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F22/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides or nitriles thereof
- C08F22/30—Nitriles
- C08F22/32—Alpha-cyano-acrylic acid; Esters thereof
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Inorganic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Polymerization Catalysts (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polymerisation Methods In General (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP296281/95 | 1995-10-19 | ||
| JP29628195 | 1995-10-19 | ||
| JP2203796 | 1996-01-12 | ||
| JP22037/96 | 1996-01-12 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| HK1008887A1 true HK1008887A1 (zh) | 1999-05-21 |
| HK1008887B HK1008887B (zh) | 2002-09-13 |
Family
ID=
Also Published As
| Publication number | Publication date |
|---|---|
| EP0769721B1 (en) | 2002-01-02 |
| DE69626707T2 (de) | 2003-08-21 |
| SG52854A1 (en) | 1998-09-28 |
| MY120908A (en) | 2005-12-30 |
| DE69626707D1 (de) | 2003-04-17 |
| KR100407213B1 (ko) | 2004-03-24 |
| US6503959B1 (en) | 2003-01-07 |
| TW369554B (en) | 1999-09-11 |
| BR9605176A (pt) | 1998-08-25 |
| DE69618311D1 (de) | 2002-02-07 |
| EP1124159B1 (en) | 2003-03-12 |
| EP0769721A1 (en) | 1997-04-23 |
| DE69618311T2 (de) | 2002-08-14 |
| CN1153794A (zh) | 1997-07-09 |
| CN1102161C (zh) | 2003-02-26 |
| EP1124159A1 (en) | 2001-08-16 |
| KR970059191A (ko) | 1997-08-12 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PF | Patent in force | ||
| PE | Patent expired |
Effective date: 20161009 |