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GB647799A - Electroplating method employing pulsating current - Google Patents

Electroplating method employing pulsating current

Info

Publication number
GB647799A
GB647799A GB35113/47A GB3511347A GB647799A GB 647799 A GB647799 A GB 647799A GB 35113/47 A GB35113/47 A GB 35113/47A GB 3511347 A GB3511347 A GB 3511347A GB 647799 A GB647799 A GB 647799A
Authority
GB
United Kingdom
Prior art keywords
transformer
generator
direct current
plating
current component
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB35113/47A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Poor and Co
Original Assignee
Poor and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Poor and Co filed Critical Poor and Co
Publication of GB647799A publication Critical patent/GB647799A/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18Electroplating using modulated, pulsed or reversing current
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60Electroplating characterised by the structure or texture of the layers
    • C25D5/615Microstructure of the layers, e.g. mixed structure
    • C25D5/617Crystalline layers
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S204/00Chemistry: electrical and wave energy
    • Y10S204/08AC plus DC
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S204/00Chemistry: electrical and wave energy
    • Y10S204/09Wave forms

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electroplating And Plating Baths Therefor (AREA)

Abstract

647,799. Electro-plating. POOR & CO. Dec. 31, 1947, No. 35113. Convention date, May 4, 1942. [Class 41] A method of electro-plating comprises applying to the cathode a pulsating direct current voltage having a direct current component and an alternating current component, the lowest instantaneous value of the pulsating voltage at the negative alternating peak being between 0.5 volts and 1.5 volts, the direct current component having a voltage not substantially higher than 24 volts and the alternating current component having a frequency within the range of from 25 to 60 cycles. The method may be applied to the electro-plating of various metals especially zinc, copper, cadmium, silver and arsenic-antimony alloy. In the arrangement shown in Fig. 1, electrodes 2 in a plating tank 1 are connected as shown to a D.C. generator 3 in series with a secondary winding 6 of a transformer 7. A storage battery 5 is connected in parallel with the generator. The primary winding 8 of the transformer is connected to a source of A.C. supply and is in series with a variable inductance 9. In a modification, the battery 5 is replaced by a condenser. In other arrangements the inductance 9 is replaced by an adjustable reactor with three legs, two for the transformer windings and the third for a winding connected through a variable resistance to a source of direct current. In a further arrangement, the secondary winding of the transformer and the D.C. generator are connected in parallel to the electrodes. In the arrangement shown in Fig. 6, three pairs of electrodes are connected to a D.C. generator 44, and two pairs to the secondary 47 of a transformer 45. Calcium gluconate may be added to the electrolyte as a control agent, with lauric sulphonate provided to assist in retaining the gluconate in suspension.
GB35113/47A 1942-05-04 1947-12-31 Electroplating method employing pulsating current Expired GB647799A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US441694A US2443599A (en) 1942-05-04 1942-05-04 Electroplating method employing pulsating current of adjustable wave form

Publications (1)

Publication Number Publication Date
GB647799A true GB647799A (en) 1950-12-20

Family

ID=23753921

Family Applications (1)

Application Number Title Priority Date Filing Date
GB35113/47A Expired GB647799A (en) 1942-05-04 1947-12-31 Electroplating method employing pulsating current

Country Status (3)

Country Link
US (1) US2443599A (en)
FR (1) FR960114A (en)
GB (1) GB647799A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1151604B (en) * 1951-06-19 1963-07-18 British Dielectric Res Ltd Anodic-electrolytic etching process to enlarge the surface of electrode starting material for electrolytic capacitors
DE2555834A1 (en) * 1974-12-11 1976-06-16 Physikalisch Tech Entwicklungs PROCESS FOR QUENCHING METAL SURFACES BY GALVANIC DEPOSITION OF QUENCHING METALS WITH HIGH CURRENT DENSITY

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2515192A (en) * 1944-09-27 1950-07-18 Poor & Co Method of electroplating
US2606147A (en) * 1944-09-27 1952-08-05 Poor & Co Electrodeposition of arsenic
US2548867A (en) * 1945-04-14 1951-04-17 Poor & Co Electroplating metals
US2619454A (en) * 1945-08-30 1952-11-25 Brush Dev Co Method of manufacturing a magnetic recording medium by electrodeposition
US2651609A (en) * 1950-07-17 1953-09-08 Poor & Co Method of electroplating copper
US2651610A (en) * 1950-07-17 1953-09-08 Poor & Co Method of electroplating zinc
US2935454A (en) * 1953-05-01 1960-05-03 Tokumoto Shin-Ichi Method of the electrodeposition of titanium metal
NL275905A (en) * 1961-03-17
NL288862A (en) * 1962-02-13
US3418222A (en) * 1966-02-28 1968-12-24 Murdock Inc Aluminum anodizing method
DE1902983C3 (en) * 1968-06-21 1978-06-22 Keller, Eberhard, 7121 Freudental Process for the electrolytic coloring of anodic oxide layers on aluminum or aluminum alloys
US3716464A (en) * 1969-12-30 1973-02-13 Ibm Method for electrodepositing of alloy film of a given composition from a given solution
US3959088A (en) * 1975-03-19 1976-05-25 The United States Of America As Represented By The Secretary Of The Army Method and apparatus for generating high amperage pulses from an A-C power source
US4038158A (en) * 1975-10-22 1977-07-26 E. I. Du Pont De Nemours And Company Electrochemical generation of field desorption emitters
US4290868A (en) * 1980-04-07 1981-09-22 Mack Michael H Iron plumbing corrosion minimizing method
US4515671A (en) * 1983-01-24 1985-05-07 Olin Corporation Electrochemical treatment of copper for improving its bond strength
US5039381A (en) * 1989-05-25 1991-08-13 Mullarkey Edward J Method of electroplating a precious metal on a semiconductor device, integrated circuit or the like
EP1019954B1 (en) 1998-02-04 2013-05-15 Applied Materials, Inc. Method and apparatus for low-temperature annealing of electroplated copper micro-structures in the production of a microelectronic device
US7244677B2 (en) 1998-02-04 2007-07-17 Semitool. Inc. Method for filling recessed micro-structures with metallization in the production of a microelectronic device
US6632292B1 (en) * 1998-03-13 2003-10-14 Semitool, Inc. Selective treatment of microelectronic workpiece surfaces
EP1125007B1 (en) * 1998-10-05 2010-08-11 Semitool, Inc. Submicron metallization using electrochemical deposition

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE464709C (en) * 1928-08-23 Tech Beratungsstelle G M B H Process for the electrolytic pretreatment of objects that are to receive a metallic coating
US1388874A (en) * 1920-02-18 1921-08-30 Ralph D Mershon Forming dielectric films
US1755479A (en) * 1924-04-28 1930-04-22 Jones W Bart Ett Method of and means for cyclic current control
US1918605A (en) * 1928-01-09 1933-07-18 Parker Rust Proof Co Chromium plating
US2063760A (en) * 1931-09-10 1936-12-08 Schulein Joseph Bath for and process of electrodeposition of metal
GB414939A (en) * 1933-11-22 1934-08-16 Max Schlotter Improved process for electro-deposition of chromium

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1151604B (en) * 1951-06-19 1963-07-18 British Dielectric Res Ltd Anodic-electrolytic etching process to enlarge the surface of electrode starting material for electrolytic capacitors
DE2555834A1 (en) * 1974-12-11 1976-06-16 Physikalisch Tech Entwicklungs PROCESS FOR QUENCHING METAL SURFACES BY GALVANIC DEPOSITION OF QUENCHING METALS WITH HIGH CURRENT DENSITY

Also Published As

Publication number Publication date
US2443599A (en) 1948-06-22
FR960114A (en) 1950-04-13

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