GB647799A - Electroplating method employing pulsating current - Google Patents
Electroplating method employing pulsating currentInfo
- Publication number
- GB647799A GB647799A GB35113/47A GB3511347A GB647799A GB 647799 A GB647799 A GB 647799A GB 35113/47 A GB35113/47 A GB 35113/47A GB 3511347 A GB3511347 A GB 3511347A GB 647799 A GB647799 A GB 647799A
- Authority
- GB
- United Kingdom
- Prior art keywords
- transformer
- generator
- direct current
- plating
- current component
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/18—Electroplating using modulated, pulsed or reversing current
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/615—Microstructure of the layers, e.g. mixed structure
- C25D5/617—Crystalline layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S204/00—Chemistry: electrical and wave energy
- Y10S204/08—AC plus DC
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S204/00—Chemistry: electrical and wave energy
- Y10S204/09—Wave forms
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Electroplating Methods And Accessories (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Abstract
647,799. Electro-plating. POOR & CO. Dec. 31, 1947, No. 35113. Convention date, May 4, 1942. [Class 41] A method of electro-plating comprises applying to the cathode a pulsating direct current voltage having a direct current component and an alternating current component, the lowest instantaneous value of the pulsating voltage at the negative alternating peak being between 0.5 volts and 1.5 volts, the direct current component having a voltage not substantially higher than 24 volts and the alternating current component having a frequency within the range of from 25 to 60 cycles. The method may be applied to the electro-plating of various metals especially zinc, copper, cadmium, silver and arsenic-antimony alloy. In the arrangement shown in Fig. 1, electrodes 2 in a plating tank 1 are connected as shown to a D.C. generator 3 in series with a secondary winding 6 of a transformer 7. A storage battery 5 is connected in parallel with the generator. The primary winding 8 of the transformer is connected to a source of A.C. supply and is in series with a variable inductance 9. In a modification, the battery 5 is replaced by a condenser. In other arrangements the inductance 9 is replaced by an adjustable reactor with three legs, two for the transformer windings and the third for a winding connected through a variable resistance to a source of direct current. In a further arrangement, the secondary winding of the transformer and the D.C. generator are connected in parallel to the electrodes. In the arrangement shown in Fig. 6, three pairs of electrodes are connected to a D.C. generator 44, and two pairs to the secondary 47 of a transformer 45. Calcium gluconate may be added to the electrolyte as a control agent, with lauric sulphonate provided to assist in retaining the gluconate in suspension.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US441694A US2443599A (en) | 1942-05-04 | 1942-05-04 | Electroplating method employing pulsating current of adjustable wave form |
Publications (1)
Publication Number | Publication Date |
---|---|
GB647799A true GB647799A (en) | 1950-12-20 |
Family
ID=23753921
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB35113/47A Expired GB647799A (en) | 1942-05-04 | 1947-12-31 | Electroplating method employing pulsating current |
Country Status (3)
Country | Link |
---|---|
US (1) | US2443599A (en) |
FR (1) | FR960114A (en) |
GB (1) | GB647799A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1151604B (en) * | 1951-06-19 | 1963-07-18 | British Dielectric Res Ltd | Anodic-electrolytic etching process to enlarge the surface of electrode starting material for electrolytic capacitors |
DE2555834A1 (en) * | 1974-12-11 | 1976-06-16 | Physikalisch Tech Entwicklungs | PROCESS FOR QUENCHING METAL SURFACES BY GALVANIC DEPOSITION OF QUENCHING METALS WITH HIGH CURRENT DENSITY |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2515192A (en) * | 1944-09-27 | 1950-07-18 | Poor & Co | Method of electroplating |
US2606147A (en) * | 1944-09-27 | 1952-08-05 | Poor & Co | Electrodeposition of arsenic |
US2548867A (en) * | 1945-04-14 | 1951-04-17 | Poor & Co | Electroplating metals |
US2619454A (en) * | 1945-08-30 | 1952-11-25 | Brush Dev Co | Method of manufacturing a magnetic recording medium by electrodeposition |
US2651609A (en) * | 1950-07-17 | 1953-09-08 | Poor & Co | Method of electroplating copper |
US2651610A (en) * | 1950-07-17 | 1953-09-08 | Poor & Co | Method of electroplating zinc |
US2935454A (en) * | 1953-05-01 | 1960-05-03 | Tokumoto Shin-Ichi | Method of the electrodeposition of titanium metal |
NL275905A (en) * | 1961-03-17 | |||
NL288862A (en) * | 1962-02-13 | |||
US3418222A (en) * | 1966-02-28 | 1968-12-24 | Murdock Inc | Aluminum anodizing method |
DE1902983C3 (en) * | 1968-06-21 | 1978-06-22 | Keller, Eberhard, 7121 Freudental | Process for the electrolytic coloring of anodic oxide layers on aluminum or aluminum alloys |
US3716464A (en) * | 1969-12-30 | 1973-02-13 | Ibm | Method for electrodepositing of alloy film of a given composition from a given solution |
US3959088A (en) * | 1975-03-19 | 1976-05-25 | The United States Of America As Represented By The Secretary Of The Army | Method and apparatus for generating high amperage pulses from an A-C power source |
US4038158A (en) * | 1975-10-22 | 1977-07-26 | E. I. Du Pont De Nemours And Company | Electrochemical generation of field desorption emitters |
US4290868A (en) * | 1980-04-07 | 1981-09-22 | Mack Michael H | Iron plumbing corrosion minimizing method |
US4515671A (en) * | 1983-01-24 | 1985-05-07 | Olin Corporation | Electrochemical treatment of copper for improving its bond strength |
US5039381A (en) * | 1989-05-25 | 1991-08-13 | Mullarkey Edward J | Method of electroplating a precious metal on a semiconductor device, integrated circuit or the like |
EP1019954B1 (en) | 1998-02-04 | 2013-05-15 | Applied Materials, Inc. | Method and apparatus for low-temperature annealing of electroplated copper micro-structures in the production of a microelectronic device |
US7244677B2 (en) | 1998-02-04 | 2007-07-17 | Semitool. Inc. | Method for filling recessed micro-structures with metallization in the production of a microelectronic device |
US6632292B1 (en) * | 1998-03-13 | 2003-10-14 | Semitool, Inc. | Selective treatment of microelectronic workpiece surfaces |
EP1125007B1 (en) * | 1998-10-05 | 2010-08-11 | Semitool, Inc. | Submicron metallization using electrochemical deposition |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE464709C (en) * | 1928-08-23 | Tech Beratungsstelle G M B H | Process for the electrolytic pretreatment of objects that are to receive a metallic coating | |
US1388874A (en) * | 1920-02-18 | 1921-08-30 | Ralph D Mershon | Forming dielectric films |
US1755479A (en) * | 1924-04-28 | 1930-04-22 | Jones W Bart Ett | Method of and means for cyclic current control |
US1918605A (en) * | 1928-01-09 | 1933-07-18 | Parker Rust Proof Co | Chromium plating |
US2063760A (en) * | 1931-09-10 | 1936-12-08 | Schulein Joseph | Bath for and process of electrodeposition of metal |
GB414939A (en) * | 1933-11-22 | 1934-08-16 | Max Schlotter | Improved process for electro-deposition of chromium |
-
0
- FR FR960114D patent/FR960114A/fr not_active Expired
-
1942
- 1942-05-04 US US441694A patent/US2443599A/en not_active Expired - Lifetime
-
1947
- 1947-12-31 GB GB35113/47A patent/GB647799A/en not_active Expired
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1151604B (en) * | 1951-06-19 | 1963-07-18 | British Dielectric Res Ltd | Anodic-electrolytic etching process to enlarge the surface of electrode starting material for electrolytic capacitors |
DE2555834A1 (en) * | 1974-12-11 | 1976-06-16 | Physikalisch Tech Entwicklungs | PROCESS FOR QUENCHING METAL SURFACES BY GALVANIC DEPOSITION OF QUENCHING METALS WITH HIGH CURRENT DENSITY |
Also Published As
Publication number | Publication date |
---|---|
US2443599A (en) | 1948-06-22 |
FR960114A (en) | 1950-04-13 |
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