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GB1548764A - Photosensitive compositions - Google Patents

Photosensitive compositions

Info

Publication number
GB1548764A
GB1548764A GB14886/76A GB1488676A GB1548764A GB 1548764 A GB1548764 A GB 1548764A GB 14886/76 A GB14886/76 A GB 14886/76A GB 1488676 A GB1488676 A GB 1488676A GB 1548764 A GB1548764 A GB 1548764A
Authority
GB
United Kingdom
Prior art keywords
phase
films
solvent
coherent
photosensitive compositions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB14886/76A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Napp Systems Inc
Original Assignee
Napp Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Napp Systems Inc filed Critical Napp Systems Inc
Publication of GB1548764A publication Critical patent/GB1548764A/en
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/04—Chromates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/06—Silver salts

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Formation Of Insulating Films (AREA)

Abstract

The photosensitive film consists of a coherent first phase of photosensitive material and a second, particulate second phase. The first phase changes its behaviour towards a solvent by exposure with electromagnetic radiation, i.e. it becomes insoluble, and only the unexposed areas can be washed out with the solvent. By using a second, non-coherent phase, up to 75% of the proportion of the first phase can be saved. In this way, the cost can be reduced and the film properties can be controlled by the selection of the chemical properties of the second phase. Thus, films can be activated more rapidly after actinic irradiation than hitherto and the durability of the films when used on offset printing plates was considerably increased. <IMAGE>
GB14886/76A 1975-06-19 1976-04-12 Photosensitive compositions Expired GB1548764A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US58833475A 1975-06-19 1975-06-19

Publications (1)

Publication Number Publication Date
GB1548764A true GB1548764A (en) 1979-07-18

Family

ID=24353419

Family Applications (1)

Application Number Title Priority Date Filing Date
GB14886/76A Expired GB1548764A (en) 1975-06-19 1976-04-12 Photosensitive compositions

Country Status (12)

Country Link
JP (1) JPS5936731B2 (en)
BE (1) BE841797A (en)
CA (1) CA1091969A (en)
CH (1) CH633893A5 (en)
DE (1) DE2626066A1 (en)
DK (1) DK232276A (en)
FR (1) FR2315110A1 (en)
GB (1) GB1548764A (en)
IT (1) IT1061234B (en)
NL (1) NL7604774A (en)
NO (1) NO762006L (en)
SE (1) SE422847B (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2533227A1 (en) * 1982-09-21 1984-03-23 Polychrome Corp COATING COMPOSITION IN THE FORM OF A PHOTOSENSITIVE LATEX AND PRINTING PLATE CONTAINING THE SAME
US4551415A (en) * 1982-04-22 1985-11-05 E. I. Du Pont De Nemours And Company Photosensitive coatings containing crosslinked beads
US4601970A (en) * 1982-04-22 1986-07-22 E. I. Du Pont De Nemours And Company Dry photosensitive film containing crosslinked beads
US4668604A (en) * 1982-04-22 1987-05-26 E.I. Du Pont De Nemours And Company Positive-working photosensitive elements containing crosslinked beads and process of use
US5948599A (en) * 1992-11-18 1999-09-07 Agfa Gevaert Nv Method of forming an image in a printing plate

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52154626A (en) * 1976-06-18 1977-12-22 Fuji Photo Film Co Ltd Silver halide light sensitive material
JPS52154627A (en) * 1976-06-18 1977-12-22 Fuji Photo Film Co Ltd Silver halide light sensitive material
JPS5518621A (en) * 1978-07-26 1980-02-08 Fuji Photo Film Co Ltd Photosensitive lithographic printing plate
DE2834059A1 (en) * 1978-08-03 1980-02-14 Hoechst Ag LIGHT SENSITIVE COPY MATERIAL AND METHOD FOR THE PRODUCTION THEREOF
JPS5823026A (en) * 1981-08-04 1983-02-10 Nippon Paint Co Ltd Water developable material for lithographic plate
JPS58174939A (en) * 1982-03-18 1983-10-14 Konishiroku Photo Ind Co Ltd Image forming material
US5688627A (en) * 1996-07-02 1997-11-18 Precision Lithograining Corp. Light sensitive diazonium compounds having both bisulfate and zincate parts, method of making the compounds and compositions utilizing them

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3382069A (en) * 1964-06-18 1968-05-07 Azoplate Corp Planographic printing plate
GB1469941A (en) * 1973-04-10 1977-04-06 Andrews Paper & Chem Co Inc Diazotype reproduction layer

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4551415A (en) * 1982-04-22 1985-11-05 E. I. Du Pont De Nemours And Company Photosensitive coatings containing crosslinked beads
US4601970A (en) * 1982-04-22 1986-07-22 E. I. Du Pont De Nemours And Company Dry photosensitive film containing crosslinked beads
US4668604A (en) * 1982-04-22 1987-05-26 E.I. Du Pont De Nemours And Company Positive-working photosensitive elements containing crosslinked beads and process of use
FR2533227A1 (en) * 1982-09-21 1984-03-23 Polychrome Corp COATING COMPOSITION IN THE FORM OF A PHOTOSENSITIVE LATEX AND PRINTING PLATE CONTAINING THE SAME
US5948599A (en) * 1992-11-18 1999-09-07 Agfa Gevaert Nv Method of forming an image in a printing plate

Also Published As

Publication number Publication date
FR2315110B1 (en) 1981-11-13
FR2315110A1 (en) 1977-01-14
NO762006L (en) 1976-12-21
JPS5936731B2 (en) 1984-09-05
DE2626066A1 (en) 1977-01-20
BE841797A (en) 1976-09-01
SE7605083L (en) 1976-12-20
JPS522520A (en) 1977-01-10
CH633893A5 (en) 1982-12-31
SE422847B (en) 1982-03-29
NL7604774A (en) 1976-12-21
CA1091969A (en) 1980-12-23
IT1061234B (en) 1983-02-28
DK232276A (en) 1976-12-20

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PCNP Patent ceased through non-payment of renewal fee