SE7605083L - PHOTOGRAPHIC COMPOSITIONS - Google Patents

PHOTOGRAPHIC COMPOSITIONS

Info

Publication number: SE7605083L
Authority: SE; Sweden
Prior art keywords: photographic compositions; photographic; compositions
Prior art date: 1975-06-19

Application number

SE7605083A

Other languages

Swedish (sv)

Other versions

SE422847B (en

Inventor

R W Hallman

Original Assignee

Napp Systems Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1975-06-19

Filing date

1976-05-04

Publication date

1976-12-20

1976-05-04 Application filed by Napp Systems Inc filed Critical Napp Systems Inc

1976-12-20 Publication of SE7605083L publication Critical patent/SE7605083L/en

1982-03-29 Publication of SE422847B publication Critical patent/SE422847B/en

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/04—Chromates
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/06—Silver salts

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Formation Of Insulating Films (AREA)

SE7605083A 1975-06-19 1976-05-04 GRAPHIC FORMAL INCLUDING A SUBSTRATE PROVIDED WITH A PHOTO-SENSITIVE SINGLE MOVIE CONSTRUCTION SE422847B (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US58833475A	1975-06-19	1975-06-19

Publications (2)

Publication Number	Publication Date
SE7605083L true SE7605083L (en)	1976-12-20
SE422847B SE422847B (en)	1982-03-29

Family

ID=24353419

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
SE7605083A SE422847B (en)	1975-06-19	1976-05-04	GRAPHIC FORMAL INCLUDING A SUBSTRATE PROVIDED WITH A PHOTO-SENSITIVE SINGLE MOVIE CONSTRUCTION

Country Status (12)

Country	Link
JP (1)	JPS5936731B2 (en)
BE (1)	BE841797A (en)
CA (1)	CA1091969A (en)
CH (1)	CH633893A5 (en)
DE (1)	DE2626066A1 (en)
DK (1)	DK232276A (en)
FR (1)	FR2315110A1 (en)
GB (1)	GB1548764A (en)
IT (1)	IT1061234B (en)
NL (1)	NL7604774A (en)
NO (1)	NO762006L (en)
SE (1)	SE422847B (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS52154626A (en) *	1976-06-18	1977-12-22	Fuji Photo Film Co Ltd	Silver halide light sensitive material
JPS52154627A (en) *	1976-06-18	1977-12-22	Fuji Photo Film Co Ltd	Silver halide light sensitive material
JPS5518621A (en) *	1978-07-26	1980-02-08	Fuji Photo Film Co Ltd	Photosensitive lithographic printing plate
DE2834059A1 (en) *	1978-08-03	1980-02-14	Hoechst Ag	LIGHT SENSITIVE COPY MATERIAL AND METHOD FOR THE PRODUCTION THEREOF
JPS5823026A (en) *	1981-08-04	1983-02-10	Nippon Paint Co Ltd	Water developable material for lithographic plate
JPS58174939A (en) *	1982-03-18	1983-10-14	Konishiroku Photo Ind Co Ltd	Image forming material
US4551415A (en) *	1982-04-22	1985-11-05	E. I. Du Pont De Nemours And Company	Photosensitive coatings containing crosslinked beads
US4601970A (en) *	1982-04-22	1986-07-22	E. I. Du Pont De Nemours And Company	Dry photosensitive film containing crosslinked beads
US4668604A (en) *	1982-04-22	1987-05-26	E.I. Du Pont De Nemours And Company	Positive-working photosensitive elements containing crosslinked beads and process of use
DE3328019A1 (en) *	1982-09-21	1984-03-22	Polychrome Corp., 10702 Yonkers, N.Y.	PRESSURE PLATE DEVELOPABLE WITH WATER
GB2273366B (en) *	1992-11-18	1996-03-27	Du Pont	Forming images on radiation-sensitive plates
US5688627A (en) *	1996-07-02	1997-11-18	Precision Lithograining Corp.	Light sensitive diazonium compounds having both bisulfate and zincate parts, method of making the compounds and compositions utilizing them

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3382069A (en) *	1964-06-18	1968-05-07	Azoplate Corp	Planographic printing plate
GB1469941A (en) *	1973-04-10	1977-04-06	Andrews Paper & Chem Co Inc	Diazotype reproduction layer

1976
- 1976-04-02 CA CA249,489A patent/CA1091969A/en not_active Expired
- 1976-04-12 GB GB14886/76A patent/GB1548764A/en not_active Expired
- 1976-04-28 CH CH534076A patent/CH633893A5/en not_active IP Right Cessation
- 1976-05-03 FR FR7613143A patent/FR2315110A1/en active Granted
- 1976-05-03 IT IT49301/76A patent/IT1061234B/en active
- 1976-05-04 SE SE7605083A patent/SE422847B/en unknown
- 1976-05-05 NL NL7604774A patent/NL7604774A/en not_active Application Discontinuation
- 1976-05-13 BE BE167002A patent/BE841797A/en not_active IP Right Cessation
- 1976-05-26 DK DK232276A patent/DK232276A/en not_active Application Discontinuation
- 1976-06-08 JP JP51067029A patent/JPS5936731B2/en not_active Expired
- 1976-06-10 DE DE19762626066 patent/DE2626066A1/en not_active Withdrawn
- 1976-06-10 NO NO762006A patent/NO762006L/no unknown

Also Published As

Publication number	Publication date
FR2315110B1 (en)	1981-11-13
FR2315110A1 (en)	1977-01-14
NO762006L (en)	1976-12-21
JPS5936731B2 (en)	1984-09-05
DE2626066A1 (en)	1977-01-20
BE841797A (en)	1976-09-01
JPS522520A (en)	1977-01-10
CH633893A5 (en)	1982-12-31
SE422847B (en)	1982-03-29
GB1548764A (en)	1979-07-18
NL7604774A (en)	1976-12-21
CA1091969A (en)	1980-12-23
IT1061234B (en)	1983-02-28
DK232276A (en)	1976-12-20

Publication	Publication Date	Title
BE831363A (en)	1976-01-15	VITAMINIC COMPOSITIONS
SE7610293L (en)	1977-03-20	DITIONITE COMPOSITION
SE427277B (en)	1983-03-21	PHOTOPOLYMERIZABLE COMPOSITION
IT1068132B (en)	1985-03-21	PHOTOPOLYMERIZABLE COMPOSITIONS
FR2299651A1 (en)	1976-08-27	PHOTORESISTANT COMPOSITION
RO81146A (en)	1983-02-15	HERBICIDA COMPOSITION
BE844180A (en)	1977-01-17	ALKYLTHIOUREUM-KILLIC COMPOUNDS
SE7607620L (en)	1977-01-05	ALDOHEXURONIC ACID-SWEET COMPOSITIONS
SE430372B (en)	1983-11-14	RODENTICID COMPOSITION
SE7605083L (en)	1976-12-20	PHOTOGRAPHIC COMPOSITIONS
AR217406A1 (en)	1980-03-31	ANTI-SWEATING COMPOSITION
BR7608364A (en)	1977-12-06	PHOTOCONDUCTIVE COMPOSITION
FR2315909A1 (en)	1977-01-28	ODORING COMPOSITIONS
SE413137B (en)	1980-04-21	PLASTER COMPOSITION
SE7613364L (en)	1977-05-31	COMPOSITIONS
SE7614252L (en)	1977-06-19	INKLET COMPOSITION
RO70708A (en)	1982-02-01	ERBICIDA COMPOSITION
BR7606138A (en)	1977-06-21	THERMOSTENDING COMPOSITIONS
FR2318441A1 (en)	1977-02-11	COMPOSITION
JPS5196828A (en)	1976-08-25	** SE ******* NO
SE430297B (en)	1983-11-07	RODENTICID COMPOSITION
SE7606190L (en)	1976-12-07	POLYETENE COMPOSITIONS
IT1049540B (en)	1981-02-10	LIPOLIPEMIZING COMPOUNDS
BE841250A (en)	1976-10-28	ANESTHESIC COMPOSITIONS
FR2298317A1 (en)	1976-08-20	COMPOSITIONS INCLUDING