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GB1172106A - Improvements in or relating to Pressure Control in Vacuum Apparatus - Google Patents

Improvements in or relating to Pressure Control in Vacuum Apparatus

Info

Publication number
GB1172106A
GB1172106A GB30011/67A GB3001167A GB1172106A GB 1172106 A GB1172106 A GB 1172106A GB 30011/67 A GB30011/67 A GB 30011/67A GB 3001167 A GB3001167 A GB 3001167A GB 1172106 A GB1172106 A GB 1172106A
Authority
GB
United Kingdom
Prior art keywords
gas
chamber
region
sputtering
evacuated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB30011/67A
Inventor
Colin Richard Dougl Priestland
Geoffrey Norman Jackson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Edwards High Vacuum International Ltd
Original Assignee
Edwards High Vacuum International Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Edwards High Vacuum International Ltd filed Critical Edwards High Vacuum International Ltd
Priority to GB30011/67A priority Critical patent/GB1172106A/en
Priority to US738873A priority patent/US3629095A/en
Priority to DE19681767863 priority patent/DE1767863A1/en
Publication of GB1172106A publication Critical patent/GB1172106A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

1,172,106. Coating by sputtering. EDWARDS HIGH VACUUM INTERNATIONAL Ltd. May 31, 1968 [June 29, 1967], No. 30011/67. Heading C7F. In sputtering apparatus, in which gas is continuously fed and evacuated from a chamber, the inlet and outlet are so arranged in a region that the presence of the incoming gas does not affect the pressure in the chamber other than in this region. In a sputtering apparatus, Fig. 1, gas is introduced at 3 and evacuated through a duct 6, the region being defined by baffles 5. Substrates 7, 8 are mounted on a rotatable holder. Sputtering deposition taking place on substrate, whilst the pressure in the rest of the chamber is low enough to allow vapour deposition on substrate 8. In a modification Figs. 3 and 4 (not shown) a secondary pumping outlet is provided. In other modifications R. F. frequency and a magnetic field may be used and a grid bias may be placed in the evacuating duct to prevent ionized gas from reaching the pump.
GB30011/67A 1967-06-29 1967-06-29 Improvements in or relating to Pressure Control in Vacuum Apparatus Expired GB1172106A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
GB30011/67A GB1172106A (en) 1967-06-29 1967-06-29 Improvements in or relating to Pressure Control in Vacuum Apparatus
US738873A US3629095A (en) 1967-06-29 1968-06-21 In or relating to vacuum apparatus
DE19681767863 DE1767863A1 (en) 1967-06-29 1968-06-25 Vacuum device and method for regulating the pressure in a specific zone of a vacuum chamber

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB30011/67A GB1172106A (en) 1967-06-29 1967-06-29 Improvements in or relating to Pressure Control in Vacuum Apparatus

Publications (1)

Publication Number Publication Date
GB1172106A true GB1172106A (en) 1969-11-26

Family

ID=10300834

Family Applications (1)

Application Number Title Priority Date Filing Date
GB30011/67A Expired GB1172106A (en) 1967-06-29 1967-06-29 Improvements in or relating to Pressure Control in Vacuum Apparatus

Country Status (3)

Country Link
US (1) US3629095A (en)
DE (1) DE1767863A1 (en)
GB (1) GB1172106A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0502242A2 (en) * 1991-03-04 1992-09-09 Leybold Aktiengesellschaft Process and apparatus for reactive coating of a substrate
EP0790326A1 (en) 1996-02-17 1997-08-20 Leybold Systems GmbH Process for depositing an optical transparent and electrical conductive layer on a substrate of transparent material

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2324755A1 (en) * 1975-09-19 1977-04-15 Anvar HIGH SPEED OF DEPOSIT CATHODIC SPRAY DEVICE
CA2065581C (en) * 1991-04-22 2002-03-12 Andal Corp. Plasma enhancement apparatus and method for physical vapor deposition
US5689031A (en) 1995-10-17 1997-11-18 Exxon Research & Engineering Company Synthetic diesel fuel and process for its production

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3139396A (en) * 1962-06-28 1964-06-30 Bell Telephone Labor Inc Tin oxide resistors
US3294669A (en) * 1963-07-22 1966-12-27 Bell Telephone Labor Inc Apparatus for sputtering in a highly purified gas atmosphere
US3296115A (en) * 1964-03-02 1967-01-03 Schjeldahl Co G T Sputtering of metals wherein gas flow is confined to increase the purity of deposition
US3287243A (en) * 1965-03-29 1966-11-22 Bell Telephone Labor Inc Deposition of insulating films by cathode sputtering in an rf-supported discharge
US3451917A (en) * 1966-01-10 1969-06-24 Bendix Corp Radio frequency sputtering apparatus
US3458426A (en) * 1966-05-25 1969-07-29 Fabri Tek Inc Symmetrical sputtering apparatus with plasma confinement
US3409529A (en) * 1967-07-07 1968-11-05 Kennecott Copper Corp High current duoplasmatron having an apertured anode comprising a metal of high magnetic permeability

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0502242A2 (en) * 1991-03-04 1992-09-09 Leybold Aktiengesellschaft Process and apparatus for reactive coating of a substrate
US5169509A (en) * 1991-03-04 1992-12-08 Leybold Aktiengesellschaft Apparatus for the reactive coating of a substrate
EP0502242A3 (en) * 1991-03-04 1993-12-15 Leybold Ag Process and apparatus for reactive coating of a substrate
EP0790326A1 (en) 1996-02-17 1997-08-20 Leybold Systems GmbH Process for depositing an optical transparent and electrical conductive layer on a substrate of transparent material
DE19605932A1 (en) * 1996-02-17 1997-08-21 Leybold Systems Gmbh Method for depositing an optically transparent and electrically conductive layer on a substrate made of translucent material

Also Published As

Publication number Publication date
US3629095A (en) 1971-12-21
DE1767863A1 (en) 1972-02-17

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PLNP Patent lapsed through nonpayment of renewal fees