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GB1163496A - Improvements in or relating to Radio Frequency Sputtering - Google Patents

Improvements in or relating to Radio Frequency Sputtering

Info

Publication number
GB1163496A
GB1163496A GB29142/67A GB2914267A GB1163496A GB 1163496 A GB1163496 A GB 1163496A GB 29142/67 A GB29142/67 A GB 29142/67A GB 2914267 A GB2914267 A GB 2914267A GB 1163496 A GB1163496 A GB 1163496A
Authority
GB
United Kingdom
Prior art keywords
electrode
relating
radio frequency
june
sputtering
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB29142/67A
Inventor
Geoffrey Norman Jackson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Edwards High Vacuum International Ltd
Original Assignee
Edwards High Vacuum International Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Edwards High Vacuum International Ltd filed Critical Edwards High Vacuum International Ltd
Priority to GB29142/67A priority Critical patent/GB1163496A/en
Priority to DE19681765609 priority patent/DE1765609C/en
Priority to US738872A priority patent/US3558467A/en
Publication of GB1163496A publication Critical patent/GB1163496A/en
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physical Vapour Deposition (AREA)
  • Coating By Spraying Or Casting (AREA)

Abstract

1,163,496. Coating by sputtering. EDWARDS HIGH VACUUM INTERNATIONAL Ltd. June 12, 1968 [June 23, 1967], No. 29142/67. Heading C7F. A R. F. sputtering apparatus has two chambers each of which may be evacuated to different pressures by providing apertures connected to pumps and inlets for gas, e.g. asgon, a wall of the inner chamber being formed by an electrode having an insulating target 16. The substrate is fixed or rotatably mounted on the plate 15. The pressure in the outer chamber 11 is such as to prevent discharge between the electrode 17 and the metal components of the apparatus. In a modification Fig. 7, the insulating target 16 is supported on the electrode 17 which is shrouded by a dielectric shield 21.
GB29142/67A 1967-06-23 1967-06-23 Improvements in or relating to Radio Frequency Sputtering Expired GB1163496A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
GB29142/67A GB1163496A (en) 1967-06-23 1967-06-23 Improvements in or relating to Radio Frequency Sputtering
DE19681765609 DE1765609C (en) 1967-06-23 1968-06-19 High frequency spray device
US738872A US3558467A (en) 1967-06-23 1968-06-21 Relating to radio frequency sputtering

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB29142/67A GB1163496A (en) 1967-06-23 1967-06-23 Improvements in or relating to Radio Frequency Sputtering

Publications (1)

Publication Number Publication Date
GB1163496A true GB1163496A (en) 1969-09-04

Family

ID=10286815

Family Applications (1)

Application Number Title Priority Date Filing Date
GB29142/67A Expired GB1163496A (en) 1967-06-23 1967-06-23 Improvements in or relating to Radio Frequency Sputtering

Country Status (2)

Country Link
US (1) US3558467A (en)
GB (1) GB1163496A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3933644A (en) * 1972-03-23 1976-01-20 Varian Associates Sputter coating apparatus having improved target electrode structure
JPS6454733A (en) * 1987-08-26 1989-03-02 Toshiba Corp Production device for semiconductor
WO2018142179A1 (en) * 2017-02-02 2018-08-09 C4E Technology Gmbh Apparatus for applying a deposition onto a substrate by a deposition process and method for carrying out a deposition process by use of such an apparatus

Also Published As

Publication number Publication date
US3558467A (en) 1971-01-26
DE1765609B2 (en) 1972-10-19
DE1765609A1 (en) 1972-01-05

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Legal Events

Date Code Title Description
PS Patent sealed [section 19, patents act 1949]
PLNP Patent lapsed through nonpayment of renewal fees