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FR2921388B1 - Dispositif et procede de depot cvd assiste par plasma tres haute frequence a la pression atmospherique, et ses applications - Google Patents

Dispositif et procede de depot cvd assiste par plasma tres haute frequence a la pression atmospherique, et ses applications

Info

Publication number
FR2921388B1
FR2921388B1 FR0757720A FR0757720A FR2921388B1 FR 2921388 B1 FR2921388 B1 FR 2921388B1 FR 0757720 A FR0757720 A FR 0757720A FR 0757720 A FR0757720 A FR 0757720A FR 2921388 B1 FR2921388 B1 FR 2921388B1
Authority
FR
France
Prior art keywords
applications
atmospheric pressure
pressure plasma
deposition device
plasma assisted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0757720A
Other languages
English (en)
Other versions
FR2921388A1 (fr
Inventor
Jean Christophe Rostaing
Daniel Guerin
Frederic Noel
Helene Daniel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Air Liquide SA
LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude
Original Assignee
Air Liquide SA
LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Liquide SA, LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude filed Critical Air Liquide SA
Priority to FR0757720A priority Critical patent/FR2921388B1/fr
Priority to JP2010525400A priority patent/JP5453271B2/ja
Priority to EP08837638A priority patent/EP2195472A1/fr
Priority to CN2008801078006A priority patent/CN101802259B/zh
Priority to US12/679,239 priority patent/US20110045205A1/en
Priority to PCT/FR2008/051660 priority patent/WO2009047442A1/fr
Publication of FR2921388A1 publication Critical patent/FR2921388A1/fr
Application granted granted Critical
Publication of FR2921388B1 publication Critical patent/FR2921388B1/fr
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/511—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using microwave discharges
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H05H1/461—Microwave discharges
    • H05H1/463—Microwave discharges using antennas or applicators

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
FR0757720A 2007-09-20 2007-09-20 Dispositif et procede de depot cvd assiste par plasma tres haute frequence a la pression atmospherique, et ses applications Expired - Fee Related FR2921388B1 (fr)

Priority Applications (6)

Application Number Priority Date Filing Date Title
FR0757720A FR2921388B1 (fr) 2007-09-20 2007-09-20 Dispositif et procede de depot cvd assiste par plasma tres haute frequence a la pression atmospherique, et ses applications
JP2010525400A JP5453271B2 (ja) 2007-09-20 2008-09-16 大気圧下における超高周波プラズマ補助ｃｖｄのための装置および方法、並びにその応用
EP08837638A EP2195472A1 (fr) 2007-09-20 2008-09-16 Dispositif et procede de depot cvd assiste par plasma tres haute frequence a la pression atmospherique, et ses applications
CN2008801078006A CN101802259B (zh) 2007-09-20 2008-09-16 用于大气压力下的甚高频等离子体辅助cvd的设备和方法及其应用
US12/679,239 US20110045205A1 (en) 2007-09-20 2008-09-16 Device and Process for Very High-Frequency Plasma-Assisted CVD under Atmospheric Pressure, and Applications Thereof
PCT/FR2008/051660 WO2009047442A1 (fr) 2007-09-20 2008-09-16 Dispositif et procede de depot cvd assiste par plasma tres haute frequence a la pression atmospherique, et ses applications

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0757720A FR2921388B1 (fr) 2007-09-20 2007-09-20 Dispositif et procede de depot cvd assiste par plasma tres haute frequence a la pression atmospherique, et ses applications

Publications (2)

Publication Number Publication Date
FR2921388A1 FR2921388A1 (fr) 2009-03-27
FR2921388B1 true FR2921388B1 (fr) 2010-11-26

Family

ID=39410467

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0757720A Expired - Fee Related FR2921388B1 (fr) 2007-09-20 2007-09-20 Dispositif et procede de depot cvd assiste par plasma tres haute frequence a la pression atmospherique, et ses applications

Country Status (6)

Country Link
US (1) US20110045205A1 (fr)
EP (1) EP2195472A1 (fr)
JP (1) JP5453271B2 (fr)
CN (1) CN101802259B (fr)
FR (1) FR2921388B1 (fr)
WO (1) WO2009047442A1 (fr)

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FR2929134B1 (fr) 2008-03-28 2010-12-31 Air Liquide Procede de fabrication d'un garnissage ondule-croise
CN102387653B (zh) 2010-09-02 2015-08-05 松下电器产业株式会社 等离子体处理装置及等离子体处理方法
CN103094038B (zh) 2011-10-27 2017-01-11 松下知识产权经营株式会社 等离子体处理装置以及等离子体处理方法
JP5617817B2 (ja) 2011-10-27 2014-11-05 パナソニック株式会社 誘導結合型プラズマ処理装置及び誘導結合型プラズマ処理方法
US10115565B2 (en) * 2012-03-02 2018-10-30 Panasonic Intellectual Property Management Co., Ltd. Plasma processing apparatus and plasma processing method
WO2018104988A1 (fr) * 2016-12-05 2018-06-14 東芝三菱電機産業システム株式会社 Dispositif de génération de gaz actif
KR20240159008A (ko) * 2017-10-12 2024-11-05 젤리스트 인코퍼레이티드 박막 제조를 위한 공급원 화학물질의 통합된 합성, 전달 및 처리 방법 및 시스템
KR101922507B1 (ko) * 2017-11-29 2018-11-28 주식회사 서린메디케어 프락셔널 플라즈마를 이용한 피부 치료장치
FR3091875B1 (fr) * 2019-01-17 2021-09-24 Innovative Systems Et Tech Isytech Procédé et dispositif de traitement pour le dépôt d’un revêtement à effet barrière
US11488796B2 (en) * 2019-04-24 2022-11-01 Applied Materials, Inc. Thermal break for high-frequency antennae
CN114774880A (zh) * 2022-04-29 2022-07-22 深圳优普莱等离子体技术有限公司 一种基片台倒置的化学气相沉积系统及设备

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US4893584A (en) * 1988-03-29 1990-01-16 Energy Conversion Devices, Inc. Large area microwave plasma apparatus
US5114770A (en) * 1989-06-28 1992-05-19 Canon Kabushiki Kaisha Method for continuously forming functional deposited films with a large area by a microwave plasma cvd method
US5023056A (en) * 1989-12-27 1991-06-11 The United States Of America As Represented By The Secretary Of The Navy Plasma generator utilizing dielectric member for carrying microwave energy
JPH04362094A (ja) * 1991-06-07 1992-12-15 Fujitsu Ltd ダイヤモンドの気相合成方法
US5908565A (en) * 1995-02-03 1999-06-01 Sharp Kabushiki Kaisha Line plasma vapor phase deposition apparatus and method
DE19943953A1 (de) * 1999-09-14 2001-04-12 Bosch Gmbh Robert Vorrichtung und Verfahren zur Erzeugung eines lokalen Plasmas durch Mikrostrukturelektrodenentladungen mit Mikrowellen
JP3399887B2 (ja) * 1999-09-22 2003-04-21 パール工業株式会社 プラズマ処理装置
JP2001207269A (ja) * 2000-01-25 2001-07-31 Sharp Corp プラズマ処理装置
MY138190A (en) * 2000-10-26 2009-05-29 Dow Corning Ireland Ltd An Irish Company An atmospheric pressure plasma assembly
JP3745700B2 (ja) * 2002-03-29 2006-02-15 三井造船株式会社 マイクロ波プラズマ生成用アンテナ
CN1304103C (zh) * 2002-05-08 2007-03-14 达纳公司 等离子体辅助碳结构的形成
JP3962280B2 (ja) * 2002-05-21 2007-08-22 積水化学工業株式会社 放電プラズマ処理装置
AU2003303538A1 (en) * 2002-12-30 2004-07-29 Northeastern University Low power plasma generator
JP2005116901A (ja) * 2003-10-09 2005-04-28 Sekisui Chem Co Ltd プラズマ成膜装置
JP4946860B2 (ja) * 2005-02-17 2012-06-06 コニカミノルタホールディングス株式会社 ガスバリアフィルム及びその製造方法、並びに該ガスバリアフィルムを用いた、有機ｅｌ素子用樹脂基材、有機ｅｌ素子
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Also Published As

Publication number Publication date
CN101802259A (zh) 2010-08-11
JP5453271B2 (ja) 2014-03-26
JP2010539336A (ja) 2010-12-16
EP2195472A1 (fr) 2010-06-16
WO2009047442A1 (fr) 2009-04-16
US20110045205A1 (en) 2011-02-24
CN101802259B (zh) 2013-02-13
FR2921388A1 (fr) 2009-03-27

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Year of fee payment: 9

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Effective date: 20170531