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FR2609576B1 - Element a magnetoresistance et procede de fabrication - Google Patents

Element a magnetoresistance et procede de fabrication

Info

Publication number
FR2609576B1
FR2609576B1 FR8800092A FR8800092A FR2609576B1 FR 2609576 B1 FR2609576 B1 FR 2609576B1 FR 8800092 A FR8800092 A FR 8800092A FR 8800092 A FR8800092 A FR 8800092A FR 2609576 B1 FR2609576 B1 FR 2609576B1
Authority
FR
France
Prior art keywords
manufacturing
magnetoresistance element
magnetoresistance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR8800092A
Other languages
English (en)
Other versions
FR2609576A1 (fr
Inventor
Ichiro Shibasaki
Yoshiyasu Sugimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Kasei Corp
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Chemical Industry Co Ltd
Asahi Kasei Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Chemical Industry Co Ltd, Asahi Kasei Kogyo KK filed Critical Asahi Chemical Industry Co Ltd
Publication of FR2609576A1 publication Critical patent/FR2609576A1/fr
Application granted granted Critical
Publication of FR2609576B1 publication Critical patent/FR2609576B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N50/00—Galvanomagnetic devices
    • H10N50/10—Magnetoresistive devices
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
    • G01B7/30—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring angles or tapers; for testing the alignment of axes
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00—Arrangements or instruments for measuring magnetic variables
    • G01R33/02—Measuring direction or magnitude of magnetic fields or magnetic flux
    • G01R33/06—Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
    • G01R33/09—Magnetoresistive devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N50/00—Galvanomagnetic devices
    • H10N50/01—Manufacture or treatment
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49082—Resistor making

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Hall/Mr Elements (AREA)
  • Measuring Magnetic Variables (AREA)
FR8800092A 1987-01-09 1988-01-07 Element a magnetoresistance et procede de fabrication Expired - Fee Related FR2609576B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62001808A JP2587822B2 (ja) 1987-01-09 1987-01-09 強磁性体磁気抵抗素子

Publications (2)

Publication Number Publication Date
FR2609576A1 FR2609576A1 (fr) 1988-07-15
FR2609576B1 true FR2609576B1 (fr) 1994-07-08

Family

ID=11511870

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8800092A Expired - Fee Related FR2609576B1 (fr) 1987-01-09 1988-01-07 Element a magnetoresistance et procede de fabrication

Country Status (6)

Country Link
US (1) US4835510A (fr)
JP (1) JP2587822B2 (fr)
KR (1) KR910002314B1 (fr)
DE (1) DE3800243A1 (fr)
FR (1) FR2609576B1 (fr)
NL (1) NL192232C (fr)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02231586A (ja) * 1989-03-06 1990-09-13 Japan Servo Co Ltd 磁気センサ
US5155643A (en) * 1990-10-30 1992-10-13 Mars Incorporated Unshielded horizontal magnetoresistive head and method of fabricating same
JP2581421Y2 (ja) * 1991-06-17 1998-09-21 株式会社村田製作所 磁気センサ
US5617071A (en) * 1992-11-16 1997-04-01 Nonvolatile Electronics, Incorporated Magnetoresistive structure comprising ferromagnetic thin films and intermediate alloy layer having magnetic concentrator and shielding permeable masses
DE4436876A1 (de) * 1994-10-15 1996-04-18 Lust Antriebstechnik Gmbh Sensorchip
US5784772A (en) * 1995-12-21 1998-07-28 Storage Technology Corporation Method of simultaneously forming MR sensors in a dual element MR head
DE19608730C2 (de) * 1996-03-06 1998-05-28 Siemens Ag Magnetfeldempfindlicher Sensor mit einem Dünnschichtaufbau und Verwendung des Sensors
US20050260331A1 (en) * 2002-01-22 2005-11-24 Xingwu Wang Process for coating a substrate
JP2009194143A (ja) * 2008-02-14 2009-08-27 Elpida Memory Inc 半導体装置
JP2012173206A (ja) * 2011-02-23 2012-09-10 Yamanashi Nippon Denki Kk 磁気センサ及びその製造方法
CN103954927B (zh) * 2014-05-21 2016-03-23 常州天合光能有限公司 体积电阻与方块电阻转换校准装置及其校准方法
US11532783B2 (en) * 2020-03-05 2022-12-20 Tdk Corporation Magnetic recording array, neuromorphic device, and method of controlling magnetic recording array
JP7173104B2 (ja) 2020-07-21 2022-11-16 Tdk株式会社 磁気センサ

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56172901U (fr) * 1980-05-23 1981-12-21
JPS57171219A (en) * 1981-04-14 1982-10-21 Ishida Scales Mfg Co Ltd Computer scale
CA1209260A (fr) * 1982-10-29 1986-08-05 Tetsuo Sekiya Transducteur magnetique agissant par magnetoresistance
US4725776A (en) * 1984-01-25 1988-02-16 Matsushita Electric Industry Co., Ltd. Magnetic position detector using a thin film magnetoresistor element inclined relative to a moving object
JPS60194557A (ja) * 1984-03-16 1985-10-03 Nec Corp 混成集積回路
JPS6122677A (ja) * 1984-07-10 1986-01-31 Sanyo Electric Co Ltd 磁気センサの製造方法
JPH0728060B2 (ja) * 1984-07-18 1995-03-29 株式会社日立製作所 磁気低抗素子
JPS6218077A (ja) * 1985-07-16 1987-01-27 Dai Ichi Seiko Co Ltd 磁気抵抗素子

Also Published As

Publication number Publication date
NL8800046A (nl) 1988-08-01
JPS63170981A (ja) 1988-07-14
NL192232B (nl) 1996-11-01
DE3800243C2 (fr) 1993-07-29
KR910002314B1 (ko) 1991-04-11
DE3800243A1 (de) 1988-07-21
FR2609576A1 (fr) 1988-07-15
US4835510A (en) 1989-05-30
NL192232C (nl) 1997-03-04
JP2587822B2 (ja) 1997-03-05
KR880009414A (ko) 1988-09-15

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Legal Events

Date Code Title Description
ST Notification of lapse