FR2350694A1 - Transistor a effet de champ a canal superficiel - Google Patents
Transistor a effet de champ a canal superficielInfo
- Publication number
- FR2350694A1 FR2350694A1 FR7712982A FR7712982A FR2350694A1 FR 2350694 A1 FR2350694 A1 FR 2350694A1 FR 7712982 A FR7712982 A FR 7712982A FR 7712982 A FR7712982 A FR 7712982A FR 2350694 A1 FR2350694 A1 FR 2350694A1
- Authority
- FR
- France
- Prior art keywords
- field effect
- effect transistor
- channel field
- surface channel
- transistor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D48/00—Individual devices not covered by groups H10D1/00 - H10D44/00
- H10D48/387—Devices controllable only by the variation of applied heat
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/60—Insulated-gate field-effect transistors [IGFET]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/17—Semiconductor regions connected to electrodes not carrying current to be rectified, amplified or switched, e.g. channel regions
- H10D62/213—Channel regions of field-effect devices
- H10D62/221—Channel regions of field-effect devices of FETs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/17—Semiconductor regions connected to electrodes not carrying current to be rectified, amplified or switched, e.g. channel regions
- H10D62/213—Channel regions of field-effect devices
- H10D62/221—Channel regions of field-effect devices of FETs
- H10D62/235—Channel regions of field-effect devices of FETs of IGFETs
- H10D62/314—Channel regions of field-effect devices of FETs of IGFETs having vertical doping variations
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
- H10D62/83—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group IV materials, e.g. B-doped Si or undoped Ge
- H10D62/834—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group IV materials, e.g. B-doped Si or undoped Ge further characterised by the dopants
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
- H10D62/85—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group III-V materials, e.g. GaAs
- H10D62/854—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group III-V materials, e.g. GaAs further characterised by the dopants
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2619663A DE2619663C3 (de) | 1976-05-04 | 1976-05-04 | Feldeffekttransistor, Verfahren zu seinem Betrieb und Verwendung als schneller Schalter sowie in einer integrierten Schaltung |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2350694A1 true FR2350694A1 (fr) | 1977-12-02 |
| FR2350694B1 FR2350694B1 (fr) | 1982-02-05 |
Family
ID=5977037
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7712982A Granted FR2350694A1 (fr) | 1976-05-04 | 1977-04-29 | Transistor a effet de champ a canal superficiel |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US4219829A (fr) |
| JP (1) | JPS52134382A (fr) |
| BE (1) | BE854267A (fr) |
| DE (1) | DE2619663C3 (fr) |
| FR (1) | FR2350694A1 (fr) |
| GB (1) | GB1511637A (fr) |
| IT (1) | IT1076036B (fr) |
| NL (1) | NL7704867A (fr) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0005183A1 (fr) * | 1978-05-03 | 1979-11-14 | International Business Machines Corporation | Détecteur de champs notamment magnétiques du type transistor à effet de champ à semi-conducteur |
| FR2550662A1 (fr) * | 1983-08-12 | 1985-02-15 | American Telephone & Telegraph | Dispositif a effet de champ utilisant une condition de figeage des porteurs majoritaires |
Families Citing this family (30)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IT1214805B (it) * | 1984-08-21 | 1990-01-18 | Ates Componenti Elettron | Spositivi a semiconduttore con giunprocesso per la fabbricazione di dizioni planari a concentrazione di carica variabile e ad altissima tensione di breakdown |
| US4697198A (en) * | 1984-08-22 | 1987-09-29 | Hitachi, Ltd. | MOSFET which reduces the short-channel effect |
| US5162877A (en) * | 1987-01-27 | 1992-11-10 | Fujitsu Limited | Semiconductor integrated circuit device and method of producing same |
| US6784492B1 (en) * | 1991-03-18 | 2004-08-31 | Canon Kabushiki Kaisha | Semiconductor device including a gate-insulated transistor |
| US5739569A (en) * | 1991-05-15 | 1998-04-14 | Texas Instruments Incorporated | Non-volatile memory cell with oxide and nitride tunneling layers |
| US5708398A (en) * | 1996-07-01 | 1998-01-13 | Motorola | Dual voltage controlled oscillator using integrated transistor and negative differential resistance diode |
| KR100262457B1 (ko) * | 1998-05-04 | 2000-08-01 | 윤종용 | 반도체 장치의 오픈 드레인 입출력단 구조 및 그 제조방법 |
| US6512274B1 (en) * | 2000-06-22 | 2003-01-28 | Progressant Technologies, Inc. | CMOS-process compatible, tunable NDR (negative differential resistance) device and method of operating same |
| US6593612B2 (en) | 2000-12-05 | 2003-07-15 | Infineon Technologies Ag | Structure and method for forming a body contact for vertical transistor cells |
| US7071811B2 (en) * | 2003-09-23 | 2006-07-04 | Lsi Logic Corporation | High performance voltage control diffusion resistor |
| US7855128B2 (en) * | 2008-05-28 | 2010-12-21 | Sarnoff Corporation | Back-illuminated imager using ultra-thin silicon on insulator substrates |
| CN103094478B (zh) * | 2013-01-21 | 2015-01-21 | 中国科学技术大学 | 基于硅-分子复合体系单分子负微分电阻器件及制备方法 |
| US10777566B2 (en) | 2017-11-10 | 2020-09-15 | Macronix International Co., Ltd. | 3D array arranged for memory and in-memory sum-of-products operations |
| US10719296B2 (en) | 2018-01-17 | 2020-07-21 | Macronix International Co., Ltd. | Sum-of-products accelerator array |
| US10957392B2 (en) | 2018-01-17 | 2021-03-23 | Macronix International Co., Ltd. | 2D and 3D sum-of-products array for neuromorphic computing system |
| US10242737B1 (en) | 2018-02-13 | 2019-03-26 | Macronix International Co., Ltd. | Device structure for neuromorphic computing system |
| US10635398B2 (en) | 2018-03-15 | 2020-04-28 | Macronix International Co., Ltd. | Voltage sensing type of matrix multiplication method for neuromorphic computing system |
| US10664746B2 (en) | 2018-07-17 | 2020-05-26 | Macronix International Co., Ltd. | Neural network system |
| US11138497B2 (en) | 2018-07-17 | 2021-10-05 | Macronix International Co., Ltd | In-memory computing devices for neural networks |
| US11636325B2 (en) | 2018-10-24 | 2023-04-25 | Macronix International Co., Ltd. | In-memory data pooling for machine learning |
| US11562229B2 (en) | 2018-11-30 | 2023-01-24 | Macronix International Co., Ltd. | Convolution accelerator using in-memory computation |
| US10672469B1 (en) | 2018-11-30 | 2020-06-02 | Macronix International Co., Ltd. | In-memory convolution for machine learning |
| US11934480B2 (en) | 2018-12-18 | 2024-03-19 | Macronix International Co., Ltd. | NAND block architecture for in-memory multiply-and-accumulate operations |
| US11119674B2 (en) | 2019-02-19 | 2021-09-14 | Macronix International Co., Ltd. | Memory devices and methods for operating the same |
| US10783963B1 (en) | 2019-03-08 | 2020-09-22 | Macronix International Co., Ltd. | In-memory computation device with inter-page and intra-page data circuits |
| US11132176B2 (en) | 2019-03-20 | 2021-09-28 | Macronix International Co., Ltd. | Non-volatile computing method in flash memory |
| US10910393B2 (en) | 2019-04-25 | 2021-02-02 | Macronix International Co., Ltd. | 3D NOR memory having vertical source and drain structures |
| US11737274B2 (en) | 2021-02-08 | 2023-08-22 | Macronix International Co., Ltd. | Curved channel 3D memory device |
| US11916011B2 (en) | 2021-04-14 | 2024-02-27 | Macronix International Co., Ltd. | 3D virtual ground memory and manufacturing methods for same |
| US11710519B2 (en) | 2021-07-06 | 2023-07-25 | Macronix International Co., Ltd. | High density memory with reference memory using grouped cells and corresponding operations |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4053915A (en) * | 1976-03-22 | 1977-10-11 | Motorola, Inc. | Temperature compensated constant current source device |
| US4078947A (en) * | 1976-08-05 | 1978-03-14 | International Business Machines Corporation | Method for forming a narrow channel length MOS field effect transistor |
| US4145233A (en) * | 1978-05-26 | 1979-03-20 | Ncr Corporation | Method for making narrow channel FET by masking and ion-implantation |
-
1976
- 1976-05-04 DE DE2619663A patent/DE2619663C3/de not_active Expired
-
1977
- 1977-04-12 GB GB15194/77A patent/GB1511637A/en not_active Expired
- 1977-04-29 FR FR7712982A patent/FR2350694A1/fr active Granted
- 1977-04-29 IT IT23003/77A patent/IT1076036B/it active
- 1977-05-03 NL NL7704867A patent/NL7704867A/xx not_active Application Discontinuation
- 1977-05-04 JP JP5169377A patent/JPS52134382A/ja active Pending
- 1977-05-04 US US05/793,714 patent/US4219829A/en not_active Expired - Lifetime
- 1977-05-04 BE BE177277A patent/BE854267A/fr unknown
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0005183A1 (fr) * | 1978-05-03 | 1979-11-14 | International Business Machines Corporation | Détecteur de champs notamment magnétiques du type transistor à effet de champ à semi-conducteur |
| FR2550662A1 (fr) * | 1983-08-12 | 1985-02-15 | American Telephone & Telegraph | Dispositif a effet de champ utilisant une condition de figeage des porteurs majoritaires |
| NL8402474A (nl) * | 1983-08-12 | 1985-03-01 | American Telephone & Telegraph | Vaste-toestandsinrichting van het veldeffecttype. |
Also Published As
| Publication number | Publication date |
|---|---|
| GB1511637A (en) | 1978-05-24 |
| DE2619663A1 (de) | 1977-11-10 |
| US4219829A (en) | 1980-08-26 |
| DE2619663C3 (de) | 1982-07-22 |
| JPS52134382A (en) | 1977-11-10 |
| BE854267A (fr) | 1977-09-01 |
| FR2350694B1 (fr) | 1982-02-05 |
| NL7704867A (nl) | 1977-11-08 |
| DE2619663B2 (de) | 1981-11-26 |
| IT1076036B (it) | 1985-04-22 |
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|---|---|---|
| FR2350694A1 (fr) | Transistor a effet de champ a canal superficiel | |
| FR2344967A1 (fr) | Transistor a effet de champ a canal de longueur tres courte | |
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| SE7810478L (sv) | Sett och anordning for skyddad kommunikation over en skyddad kanal | |
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| JPS54131884A (en) | Field effect transistor having narrow channel | |
| FR2520170B1 (fr) | Oscillateur a transistor a effet de champ | |
| IT1067036B (it) | Dispositivo di regolazione per fucili a due canne | |
| FR2336829A1 (fr) | Appareil de selection de canal | |
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| MX144291A (es) | Dispositivo de hidrociclon mejorado | |
| FR2458147B1 (fr) | Transistor a effet de champ a jonction | |
| FR2350004A1 (fr) | Selecteur de canaux | |
| NL7608638A (nl) | Zaaiinrichting. | |
| AT362007B (de) | Installationskanal | |
| SE7712110L (sv) | Rullplugg | |
| SE7703059L (sv) | Instellningsanordning | |
| BE841105A (nl) | Telekommunikatie toestel | |
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| AT360103B (de) | Steckvorrichtung | |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |