FR2273375A1 - FET with drain and source electrodes coupled by semiconductor zone - has channel zone adjacent gate zone with specified impurities concentration - Google Patents
FET with drain and source electrodes coupled by semiconductor zone - has channel zone adjacent gate zone with specified impurities concentrationInfo
- Publication number
- FR2273375A1 FR2273375A1 FR7508281A FR7508281A FR2273375A1 FR 2273375 A1 FR2273375 A1 FR 2273375A1 FR 7508281 A FR7508281 A FR 7508281A FR 7508281 A FR7508281 A FR 7508281A FR 2273375 A1 FR2273375 A1 FR 2273375A1
- Authority
- FR
- France
- Prior art keywords
- zone
- semiconductor
- channel
- impurities concentration
- semiconductor zone
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title abstract 7
- 239000012535 impurity Substances 0.000 title abstract 3
- 230000004888 barrier function Effects 0.000 abstract 1
- 230000005669 field effect Effects 0.000 abstract 1
- 230000007935 neutral effect Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D99/00—Subject matter not provided for in other groups of this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/01—Manufacture or treatment
- H10D30/012—Manufacture or treatment of static induction transistors [SIT], e.g. permeable base transistors [PBT]
Landscapes
- Junction Field-Effect Transistors (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2961674A JPS50123280A (fr) | 1974-03-16 | 1974-03-16 | |
JP3847374A JPS50132877A (fr) | 1974-04-06 | 1974-04-06 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2273375A1 true FR2273375A1 (en) | 1975-12-26 |
FR2273375B1 FR2273375B1 (fr) | 1978-02-03 |
Family
ID=26367834
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR7508281A Granted FR2273375A1 (en) | 1974-03-16 | 1975-03-17 | FET with drain and source electrodes coupled by semiconductor zone - has channel zone adjacent gate zone with specified impurities concentration |
Country Status (3)
Country | Link |
---|---|
DE (1) | DE2511487C2 (fr) |
FR (1) | FR2273375A1 (fr) |
NL (1) | NL163898C (fr) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3976512A (en) * | 1975-09-22 | 1976-08-24 | Signetics Corporation | Method for reducing the defect density of an integrated circuit utilizing ion implantation |
GB2151844A (en) * | 1983-12-20 | 1985-07-24 | Philips Electronic Associated | Semiconductor devices |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3497777A (en) * | 1967-06-13 | 1970-02-24 | Stanislas Teszner | Multichannel field-effect semi-conductor device |
JPS5217720B1 (fr) * | 1971-07-31 | 1977-05-17 |
-
1975
- 1975-03-14 NL NL7503054.A patent/NL163898C/xx not_active IP Right Cessation
- 1975-03-15 DE DE2511487A patent/DE2511487C2/de not_active Expired
- 1975-03-17 FR FR7508281A patent/FR2273375A1/fr active Granted
Also Published As
Publication number | Publication date |
---|---|
NL163898C (nl) | 1980-10-15 |
NL163898B (nl) | 1980-05-16 |
FR2273375B1 (fr) | 1978-02-03 |
DE2511487A1 (de) | 1975-09-18 |
DE2511487C2 (de) | 1986-07-24 |
NL7503054A (nl) | 1975-09-18 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ST | Notification of lapse |