FI58221C - Ljuskaensligt kopieringsskikt - Google Patents

Ljuskaensligt kopieringsskikt Download PDF

Info

Publication number: FI58221C
Authority: FI; Finland
Prior art keywords: weight; parts; naphthoquinone; diazide; sulfonic acid
Prior art date: 1973-06-20

Application number

FI1860/74A

Other languages

English (en)

Finnish (fi)

Other versions

FI186074A (da

FI58221B (fi

Inventor

Paul Stahlhofen

Rainer Beutel

Original Assignee

Hoechst Ag

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1973-06-20

Filing date

1974-06-18

Publication date

1980-12-10

1974-06-18 Application filed by Hoechst Ag filed Critical Hoechst Ag

1974-12-21 Publication of FI186074A publication Critical patent/FI186074A/fi

1980-08-29 Application granted granted Critical

1980-08-29 Publication of FI58221B publication Critical patent/FI58221B/fi

1980-12-10 Publication of FI58221C publication Critical patent/FI58221C/fi

Links

KETQAJRQOHHATG-UHFFFAOYSA-N 1,2-naphthoquinone Chemical compound C1=CC=C2C(=O)C(=O)C=CC2=C1 KETQAJRQOHHATG-UHFFFAOYSA-N 0.000 claims description 50
239000000975 dye Substances 0.000 claims description 20
-1 o-naphthoquinone diazide compounds Chemical class 0.000 claims description 14
239000003086 colorant Substances 0.000 claims description 3
150000002148 esters Chemical class 0.000 claims description 3
150000001408 amides Chemical class 0.000 claims description 2
150000001732 carboxylic acid derivatives Chemical class 0.000 claims description 2
FHIVAFMUCKRCQO-UHFFFAOYSA-N diazinon Chemical compound CCOP(=S)(OCC)OC1=CC(C)=NC(C(C)C)=N1 FHIVAFMUCKRCQO-UHFFFAOYSA-N 0.000 claims description 2
150000003839 salts Chemical class 0.000 claims description 2
229930192627 Naphthoquinone Natural products 0.000 claims 1
239000001045 blue dye Substances 0.000 claims 1
239000001046 green dye Substances 0.000 claims 1
150000002791 naphthoquinones Chemical class 0.000 claims 1
150000002894 organic compounds Chemical class 0.000 claims 1
239000001044 red dye Substances 0.000 claims 1
239000000243 solution Substances 0.000 description 24
239000011248 coating agent Substances 0.000 description 20
238000000576 coating method Methods 0.000 description 20
239000011888 foil Substances 0.000 description 18
230000032050 esterification Effects 0.000 description 16
238000005886 esterification reaction Methods 0.000 description 16
229920003986 novolac Polymers 0.000 description 15
229910052782 aluminium Inorganic materials 0.000 description 12
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 12
238000007639 printing Methods 0.000 description 10
239000011877 solvent mixture Substances 0.000 description 10
230000033458 reproduction Effects 0.000 description 9
WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 8
125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 7
239000004014 plasticizer Substances 0.000 description 7
DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 6
RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 6
239000013078 crystal Substances 0.000 description 6
FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 6
ZXDDPOHVAMWLBH-UHFFFAOYSA-N 2,4-Dihydroxybenzophenone Chemical compound OC1=CC(O)=CC=C1C(=O)C1=CC=CC=C1 ZXDDPOHVAMWLBH-UHFFFAOYSA-N 0.000 description 5
XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 5
229910052802 copper Inorganic materials 0.000 description 5
239000010949 copper Substances 0.000 description 5
QFVDKARCPMTZCS-UHFFFAOYSA-N methylrosaniline Chemical compound C1=CC(N(C)C)=CC=C1C(O)(C=1C=CC(=CC=1)N(C)C)C1=CC=C(N(C)C)C=C1 QFVDKARCPMTZCS-UHFFFAOYSA-N 0.000 description 5
VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 4
229910052804 chromium Inorganic materials 0.000 description 4
239000011651 chromium Substances 0.000 description 4
229920001577 copolymer Polymers 0.000 description 4
239000003822 epoxy resin Substances 0.000 description 4
VNWKTOKETHGBQD-UHFFFAOYSA-N methane Natural products C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
229960003926 methylrosaniline Drugs 0.000 description 4
NKTOLZVEWDHZMU-UHFFFAOYSA-N p-cumyl phenol Natural products CC1=CC=C(C)C(O)=C1 NKTOLZVEWDHZMU-UHFFFAOYSA-N 0.000 description 4
229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 4
229920000647 polyepoxide Polymers 0.000 description 4
YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 4
ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 3
XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 3
238000005530 etching Methods 0.000 description 3
125000002887 hydroxy group Chemical group [H]O* 0.000 description 3
238000004519 manufacturing process Methods 0.000 description 3
238000002360 preparation method Methods 0.000 description 3
229920005989 resin Polymers 0.000 description 3
239000011347 resin Substances 0.000 description 3
239000000126 substance Substances 0.000 description 3
229910052725 zinc Inorganic materials 0.000 description 3
239000011701 zinc Substances 0.000 description 3
KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 2
NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
239000007864 aqueous solution Substances 0.000 description 2
239000000969 carrier Substances 0.000 description 2
150000001875 compounds Chemical class 0.000 description 2
238000010586 diagram Methods 0.000 description 2
238000009472 formulation Methods 0.000 description 2
239000012528 membrane Substances 0.000 description 2
229910052751 metal Inorganic materials 0.000 description 2
239000002184 metal Substances 0.000 description 2
239000000203 mixture Substances 0.000 description 2
ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
229920000728 polyester Polymers 0.000 description 2
238000007650 screen-printing Methods 0.000 description 2
239000002904 solvent Substances 0.000 description 2
WOAHJDHKFWSLKE-UHFFFAOYSA-N 1,2-benzoquinone Chemical compound O=C1C=CC=CC1=O WOAHJDHKFWSLKE-UHFFFAOYSA-N 0.000 description 1
HTQNYBBTZSBWKL-UHFFFAOYSA-N 2,3,4-trihydroxbenzophenone Chemical compound OC1=C(O)C(O)=CC=C1C(=O)C1=CC=CC=C1 HTQNYBBTZSBWKL-UHFFFAOYSA-N 0.000 description 1
SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
KUBDPQJOLOUJRM-UHFFFAOYSA-N 2-(chloromethyl)oxirane;4-[2-(4-hydroxyphenyl)propan-2-yl]phenol Chemical compound ClCC1CO1.C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 KUBDPQJOLOUJRM-UHFFFAOYSA-N 0.000 description 1
NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
ATACSYDDCNWCLV-UHFFFAOYSA-N 2-chloroacetic acid;sodium Chemical compound [Na].OC(=O)CCl ATACSYDDCNWCLV-UHFFFAOYSA-N 0.000 description 1
ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
ACNUVXZPCIABEX-UHFFFAOYSA-N 3',6'-diaminospiro[2-benzofuran-3,9'-xanthene]-1-one Chemical compound O1C(=O)C2=CC=CC=C2C21C1=CC=C(N)C=C1OC1=CC(N)=CC=C21 ACNUVXZPCIABEX-UHFFFAOYSA-N 0.000 description 1
ZRYCRPNCXLQHPN-UHFFFAOYSA-N 3-hydroxy-2-methylbenzaldehyde Chemical compound CC1=C(O)C=CC=C1C=O ZRYCRPNCXLQHPN-UHFFFAOYSA-N 0.000 description 1
IHZXTIBMKNSJCJ-UHFFFAOYSA-N 3-{[(4-{[4-(dimethylamino)phenyl](4-{ethyl[(3-sulfophenyl)methyl]amino}phenyl)methylidene}cyclohexa-2,5-dien-1-ylidene)(ethyl)azaniumyl]methyl}benzene-1-sulfonate Chemical compound C=1C=C(C(=C2C=CC(C=C2)=[N+](C)C)C=2C=CC(=CC=2)N(CC)CC=2C=C(C=CC=2)S([O-])(=O)=O)C=CC=1N(CC)CC1=CC=CC(S(O)(=O)=O)=C1 IHZXTIBMKNSJCJ-UHFFFAOYSA-N 0.000 description 1
AXDJCCTWPBKUKL-UHFFFAOYSA-N 4-[(4-aminophenyl)-(4-imino-3-methylcyclohexa-2,5-dien-1-ylidene)methyl]aniline;hydron;chloride Chemical compound Cl.C1=CC(=N)C(C)=CC1=C(C=1C=CC(N)=CC=1)C1=CC=C(N)C=C1 AXDJCCTWPBKUKL-UHFFFAOYSA-N 0.000 description 1
239000004925 Acrylic resin Substances 0.000 description 1
KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 1
WWKGVZASJYXZKN-UHFFFAOYSA-N Methyl violet 2B Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC(N)=CC=1)=C1C=CC(=[N+](C)C)C=C1 WWKGVZASJYXZKN-UHFFFAOYSA-N 0.000 description 1
GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
206010034972 Photosensitivity reaction Diseases 0.000 description 1
239000004698 Polyethylene Substances 0.000 description 1
239000004372 Polyvinyl alcohol Substances 0.000 description 1
XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
TVWHNULVHGKJHS-UHFFFAOYSA-N Uric acid Natural products N1C(=O)NC(=O)C2NC(=O)NC21 TVWHNULVHGKJHS-UHFFFAOYSA-N 0.000 description 1
125000000218 acetic acid group Chemical group C(C)(=O)* 0.000 description 1
239000000654 additive Substances 0.000 description 1
229910000147 aluminium phosphate Inorganic materials 0.000 description 1
230000003321 amplification Effects 0.000 description 1
239000012237 artificial material Substances 0.000 description 1
239000000981 basic dye Substances 0.000 description 1
FAJDWNKDRFAWLS-UHFFFAOYSA-N benzyl-[9-(diethylamino)benzo[a]phenoxazin-5-ylidene]azanium;chloride Chemical compound [Cl-].O1C2=CC(N(CC)CC)=CC=C2N=C(C2=CC=CC=C22)C1=CC2=[NH+]CC1=CC=CC=C1 FAJDWNKDRFAWLS-UHFFFAOYSA-N 0.000 description 1
MSZJEPVVQWJCIF-UHFFFAOYSA-N butylazanide Chemical compound CCCC[NH-] MSZJEPVVQWJCIF-UHFFFAOYSA-N 0.000 description 1
125000004063 butyryl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
229920002678 cellulose Polymers 0.000 description 1
239000001913 cellulose Substances 0.000 description 1
229920002301 cellulose acetate Polymers 0.000 description 1
238000006243 chemical reaction Methods 0.000 description 1
238000007596 consolidation process Methods 0.000 description 1
239000012050 conventional carrier Substances 0.000 description 1
238000001816 cooling Methods 0.000 description 1
239000011889 copper foil Substances 0.000 description 1
230000001627 detrimental effect Effects 0.000 description 1
238000002845 discoloration Methods 0.000 description 1
238000001035 drying Methods 0.000 description 1
238000004043 dyeing Methods 0.000 description 1
238000005516 engineering process Methods 0.000 description 1
SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
XLLIQLLCWZCATF-UHFFFAOYSA-N ethylene glycol monomethyl ether acetate Natural products COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 1
239000004744 fabric Substances 0.000 description 1
210000003608 fece Anatomy 0.000 description 1
238000007710 freezing Methods 0.000 description 1
230000008014 freezing Effects 0.000 description 1
238000005286 illumination Methods 0.000 description 1
238000007654 immersion Methods 0.000 description 1
238000009413 insulation Methods 0.000 description 1
JMMWKPVZQRWMSS-UHFFFAOYSA-N isopropanol acetate Natural products CC(C)OC(C)=O JMMWKPVZQRWMSS-UHFFFAOYSA-N 0.000 description 1
239000010871 livestock manure Substances 0.000 description 1
FDZZZRQASAIRJF-UHFFFAOYSA-M malachite green Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C(C=1C=CC=CC=1)=C1C=CC(=[N+](C)C)C=C1 FDZZZRQASAIRJF-UHFFFAOYSA-M 0.000 description 1
229940107698 malachite green Drugs 0.000 description 1
FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
239000000463 material Substances 0.000 description 1
238000002844 melting Methods 0.000 description 1
230000008018 melting Effects 0.000 description 1
125000005395 methacrylic acid group Chemical group 0.000 description 1
238000000034 method Methods 0.000 description 1
238000004377 microelectronic Methods 0.000 description 1
QVEIBLDXZNGPHR-UHFFFAOYSA-N naphthalene-1,4-dione;diazide Chemical group [N-]=[N+]=[N-].[N-]=[N+]=[N-].C1=CC=C2C(=O)C=CC(=O)C2=C1 QVEIBLDXZNGPHR-UHFFFAOYSA-N 0.000 description 1
GLVRJEJEXGVOMJ-UHFFFAOYSA-N neutral red base Chemical compound C1=C(C)C(N)=CC2=NC3=CC(N(C)C)=CC=C3N=C21 GLVRJEJEXGVOMJ-UHFFFAOYSA-N 0.000 description 1
229910017604 nitric acid Inorganic materials 0.000 description 1
238000003199 nucleic acid amplification method Methods 0.000 description 1
150000004893 oxazines Chemical class 0.000 description 1
150000002988 phenazines Chemical class 0.000 description 1
229920002432 poly(vinyl methyl ether) polymer Polymers 0.000 description 1
229920000120 polyethyl acrylate Polymers 0.000 description 1
229920000573 polyethylene Polymers 0.000 description 1
229920002451 polyvinyl alcohol Polymers 0.000 description 1
YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 1
150000004961 triphenylmethanes Chemical class 0.000 description 1
229940116269 uric acid Drugs 0.000 description 1

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Engineering & Computer Science (AREA)
Architecture (AREA)
Structural Engineering (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)
Materials For Photolithography (AREA)
Compositions Of Macromolecular Compounds (AREA)
Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Silver Salt Photography Or Processing Solution Therefor (AREA)
Color Printing (AREA)

FI1860/74A 1973-06-20 1974-06-18 Ljuskaensligt kopieringsskikt FI58221C (fi)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
DE2331377		1973-06-20
DE2331377A DE2331377C2 (de)	1973-06-20	1973-06-20	Lichtempfindliches Kopiermaterial

Publications (3)

Publication Number	Publication Date
FI186074A FI186074A (da)	1974-12-21
FI58221B FI58221B (fi)	1980-08-29
FI58221C true FI58221C (fi)	1980-12-10

Family

ID=5884548

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
FI1860/74A FI58221C (fi)	1973-06-20	1974-06-18	Ljuskaensligt kopieringsskikt

Country Status (20)

Country	Link
US (1)	US3969118A (da)
JP (1)	JPS5652301B2 (da)
AR (1)	AR199440A1 (da)
AT (1)	AT331636B (da)
BE (1)	BE816580A (da)
BR (1)	BR7404981D0 (da)
CA (1)	CA1046332A (da)
CH (1)	CH601842A5 (da)
CS (1)	CS167209B2 (da)
DE (1)	DE2331377C2 (da)
DK (1)	DK144345C (da)
ES (1)	ES427391A1 (da)
FI (1)	FI58221C (da)
FR (1)	FR2234584B1 (da)
GB (1)	GB1463717A (da)
IT (1)	IT1016063B (da)
NL (1)	NL177353C (da)
NO (1)	NO139458C (da)
SE (1)	SE391404B (da)
ZA (1)	ZA743882B (da)

Families Citing this family (74)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE2626419C2 (de) *	1976-06-12	1982-10-21	Ibm Deutschland Gmbh, 7000 Stuttgart	Lichtempfindliches Gemisch
JPS538128A (en) *	1976-07-09	1978-01-25	Fuji Photo Film Co Ltd	Photosolubilizable composition
DE2641099A1 (de) *	1976-09-13	1978-03-16	Hoechst Ag	Lichtempfindliche kopierschicht
DE2641100C2 (de) *	1976-09-13	1987-02-26	Hoechst Ag, 6230 Frankfurt	Lichtempfindliches Gemisch
US4108664A (en) *	1976-11-01	1978-08-22	Gaf Corporation	Light-sensitive negative-working film containing a diazo oxide sensitizer and a p-toluenesulfonyl halide or a 2,4-dihalo-S-triazine
DE2650978A1 (de) *	1976-11-08	1978-05-11	Graenges Oxeloesunds Jaernverk	Frischverfahren durch sauerstoffaufblasen
GB1604652A (en) *	1977-04-12	1981-12-16	Vickers Ltd	Radiation sensitive materials
GB2005855A (en) *	1977-10-03	1979-04-25	Polychrome Corp	Lithographic imaging composition having improved image visibility
US4212935A (en) *	1978-02-24	1980-07-15	International Business Machines Corporation	Method of modifying the development profile of photoresists
JPS5562444A (en) *	1978-11-02	1980-05-10	Konishiroku Photo Ind Co Ltd	Photosensitive composition
DE2847878A1 (de) *	1978-11-04	1980-05-22	Hoechst Ag	Lichtempfindliches gemisch
US4308368A (en) *	1979-03-16	1981-12-29	Daicel Chemical Industries Ltd.	Photosensitive compositions with reaction product of novolak co-condensate with o-quinone diazide
JPS55126235A (en) *	1979-03-22	1980-09-29	Fuji Photo Film Co Ltd	Photosensitive composition
JPS55129341A (en) *	1979-03-29	1980-10-07	Daicel Chem Ind Ltd	Photosensitive covering composition
JPS569740A (en) *	1979-07-05	1981-01-31	Fuji Photo Film Co Ltd	Image forming method
JPS56140342A (en) *	1980-04-02	1981-11-02	Tokyo Ohka Kogyo Co Ltd	Image forming composition and formation of resist image
DE3100077A1 (de)	1981-01-03	1982-08-05	Hoechst Ag, 6000 Frankfurt	Lichtempfindliches gemisch, das einen naphthochinondiazidsulfonsaeureester enthaelt, und verfahren zur herstellung des naphthochinondiazidsulfonsaeureesters
AU8021782A (en) *	1981-02-20	1982-08-26	Polychrome Corp.	Non-silver positive working radiation sensitive compositions
JPS57163234A (en) *	1981-04-01	1982-10-07	Fuji Photo Film Co Ltd	Photosensitive composition
US4350753A (en) *	1981-06-15	1982-09-21	Polychrome Corporation	Positive acting composition yielding pre-development high visibility image after radiation exposure comprising radiation sensitive diazo oxide and haloalkyl-s-triazine with novolak and dyestuff
US4348471A (en) *	1981-06-15	1982-09-07	Polychrome Corporation	Positive acting composition yielding pre-development high visibility image after radiation exposure comprising acid free novolak, diazo oxide and acid sensitive dyestuff
DE3144499A1 (de) *	1981-11-09	1983-05-19	Hoechst Ag, 6230 Frankfurt	Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches kopiermaterial
DE3144480A1 (de) *	1981-11-09	1983-05-19	Hoechst Ag, 6230 Frankfurt	Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches kopiermaterial
JPS59104421A (ja) *	1982-12-04	1984-06-16	Nippon Steel Corp	含クロム溶鋼の脱炭法
GB2139369B (en) *	1983-05-06	1987-01-21	Sericol Group Ltd	Photosensitive systems showing visible indication of exposure
DE3510220A1 (de) *	1985-03-21	1986-09-25	Hoechst Ag, 6230 Frankfurt	Positiv arbeitende strahlungsempfindliche beschichtungsloesung
DE3582697D1 (de) *	1984-06-07	1991-06-06	Hoechst Ag	Positiv arbeitende strahlungsempfindliche beschichtungsloesung.
DE3445276A1 (de) *	1984-12-12	1986-06-19	Hoechst Ag, 6230 Frankfurt	Strahlungsempfindliches gemisch, daraus hergestelltes lichtempfindliches aufzeichnungsmaterial und verfahren zur herstellung einer flachdruckform
US4672021A (en) *	1985-06-03	1987-06-09	Fairmount Chemical Company	Contrast enhancement layer composition with naphthoquinone diazide, indicator dye and polymeric binder
JPS6478249A (en) *	1987-09-18	1989-03-23	Fuji Photo Film Co Ltd	Photosensitive material and image forming method
JPH07120045B2 (ja) *	1987-10-22	1995-12-20	富士写真フイルム株式会社	パターン形成方法
JPH01142721A (ja) *	1987-11-30	1989-06-05	Fujitsu Ltd	ポジ型感光性パターン形成材料およびパターン形成方法
US5250669A (en) *	1987-12-04	1993-10-05	Wako Pure Chemical Industries, Ltd.	Photosensitive compound
GB8729510D0 (en) *	1987-12-18	1988-02-03	Ucb Sa	Photosensitive compositions containing phenolic resins & diazoquinone compounds
US5272026A (en) *	1987-12-18	1993-12-21	Ucb S.A.	Negative image process utilizing photosensitive compositions containing aromatic fused polycyclic sulfonic acid and partial ester or phenolic resin with diazoquinone sulfonic acid or diazoquinone carboxylic acid, and associated imaged article
JP2623309B2 (ja) *	1988-02-22	1997-06-25	ユーシービーソシエテアノニム	レジストパターンを得る方法
EP0410606B1 (en)	1989-07-12	1996-11-13	Fuji Photo Film Co., Ltd.	Siloxane polymers and positive working light-sensitive compositions comprising the same
US5002856A (en) *	1989-08-02	1991-03-26	E. I. Du Pont De Nemours And Company	Thermally stable carbazole diazonium salts as sources of photo-initiated strong acid
US5206110A (en) *	1991-02-04	1993-04-27	Ocg Microelectronic Materials, Inc.	Negative-working radiation-sensitive mixtures containing cyclized rubber polymer and contrast enhancing azo dye
US5250392A (en) *	1991-02-04	1993-10-05	Ocg Microelectronic Materials, Inc.	Process of developing a negative-working radiation-sensitive photoresist containing cyclized rubber polymer and contrast enhancing azo dye
DE4110057A1 (de) *	1991-03-27	1992-10-01	Hoechst Ag	Verfahren zur herstellung eines mehrfarben-pruefbildes und hierfuer geeignetes strahlungsempfindliches aufzeichnungsmaterial
JP2944296B2 (ja)	1992-04-06	1999-08-30	富士写真フイルム株式会社	感光性平版印刷版の製造方法
GB2277382A (en) *	1993-04-19	1994-10-26	Pan Graphics Ind Limited	Photoresist composition
GB9326150D0 (en) *	1993-12-22	1994-02-23	Alcan Int Ltd	Electrochemical roughening method
JP3290316B2 (ja)	1994-11-18	2002-06-10	富士写真フイルム株式会社	感光性平版印刷版
DE69905959T2 (de)	1998-04-06	2003-12-04	Fuji Photo Film Co., Ltd.	Lichtempfindliche Harzzusammensetzung
ATE385463T1 (de)	1999-05-21	2008-02-15	Fujifilm Corp	Fotoempfindliche zusammensetzung und flachdruckplatte, die diese zusammensetzung verwendet
US6296982B1 (en) *	1999-11-19	2001-10-02	Kodak Polychrome Graphics Llc	Imaging articles
JP2001264979A (ja) *	2000-03-22	2001-09-28	Fuji Photo Film Co Ltd	ポジ型感光性平版印刷版
DE60144036D1 (de)	2000-11-30	2011-03-24	Fujifilm Corp	Flachdruckplattenvorläufer
US20040067435A1 (en)	2002-09-17	2004-04-08	Fuji Photo Film Co., Ltd.	Image forming material
EP1619023B1 (en)	2004-07-20	2008-06-11	FUJIFILM Corporation	Image forming material
JP2006058430A (ja)	2004-08-18	2006-03-02	Fuji Photo Film Co Ltd	平版印刷版原版
JP4404734B2 (ja)	2004-09-27	2010-01-27	富士フイルム株式会社	平版印刷版原版
JP4474296B2 (ja)	2005-02-09	2010-06-02	富士フイルム株式会社	平版印刷版原版
JP4404792B2 (ja)	2005-03-22	2010-01-27	富士フイルム株式会社	平版印刷版原版
JP4092593B2 (ja)	2006-05-18	2008-05-28	富士フイルム株式会社	被乾燥物の乾燥方法及び装置
JP2009083106A (ja)	2007-09-27	2009-04-23	Fujifilm Corp	平版印刷版用版面保護剤及び平版印刷版の製版方法
JP4890403B2 (ja)	2007-09-27	2012-03-07	富士フイルム株式会社	平版印刷版原版
JP2009085984A (ja)	2007-09-27	2009-04-23	Fujifilm Corp	平版印刷版原版
JP4994175B2 (ja)	2007-09-28	2012-08-08	富士フイルム株式会社	平版印刷版原版、及びそれに用いる共重合体の製造方法
JP4790682B2 (ja)	2007-09-28	2011-10-12	富士フイルム株式会社	平版印刷版原版
JPWO2009063824A1 (ja)	2007-11-14	2011-03-31	富士フイルム株式会社	塗布膜の乾燥方法及び平版印刷版原版の製造方法
JP2009236355A (ja)	2008-03-26	2009-10-15	Fujifilm Corp	乾燥方法及び装置
JP5164640B2 (ja)	2008-04-02	2013-03-21	富士フイルム株式会社	平版印刷版原版
JP5183380B2 (ja)	2008-09-09	2013-04-17	富士フイルム株式会社	赤外線レーザ用感光性平版印刷版原版
JP2010237435A (ja)	2009-03-31	2010-10-21	Fujifilm Corp	平版印刷版原版
WO2011037005A1 (ja)	2009-09-24	2011-03-31	富士フイルム株式会社	平版印刷版原版
US8828648B2 (en)	2010-02-17	2014-09-09	Fujifilm Corporation	Method for producing a planographic printing plate
JP5253433B2 (ja)	2010-02-19	2013-07-31	富士フイルム株式会社	平版印刷版の作製方法
EP2555054B1 (en)	2010-03-31	2018-06-20	FUJIFILM Corporation	Method for manufacturing a lithographic printing plate and printing method
JP5490168B2 (ja)	2012-03-23	2014-05-14	富士フイルム株式会社	平版印刷版原版及び平版印刷版の作製方法
JP5512730B2 (ja)	2012-03-30	2014-06-04	富士フイルム株式会社	平版印刷版の作製方法
US11675266B2 (en) *	2021-04-15	2023-06-13	Industrial Technology Research Institute	Photosensitive compound, photosensitive composition, and patterning method

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
NL78797C (da) *	1949-07-23
BE508664A (da) *	1951-02-02
NL129161C (da) *	1959-01-14
DE1114705C2 (de) *	1959-04-16	1962-04-12	Kalle Ag	Lichtempfindliche Schichten fuer die photomechanische Herstellung von Druckformen
NL280959A (da) *	1961-07-28
NL292007A (da) *	1962-04-27
DE1447011A1 (de) *	1963-07-12	1969-01-02	Kalle Ag	Mit o-Naphtholchinondiaziden vorsensibilisierte Druckplatten
GB1052699A (da) *	1963-12-03
DE1447975A1 (de) *	1965-11-05	1969-01-16	Standard Elek K Lorenz Ag	Verfahren zur Herstellung von Photokopiedacken
GB1116674A (en) *	1966-02-28	1968-06-12	Agfa Gevaert Nv	Naphthoquinone diazide sulphofluoride
DE1572085B2 (de) *	1966-07-08	1976-10-14	Hoechst Ag, 6000 Frankfurt	Verfahren und kopiermaterial zur duplizierung von silberfilmen
US3635709A (en) *	1966-12-15	1972-01-18	Polychrome Corp	Light-sensitive lithographic plate
JPS492284B1 (da) *	1969-05-30	1974-01-19
US3669658A (en) *	1969-06-11	1972-06-13	Fuji Photo Film Co Ltd	Photosensitive printing plate
US3647443A (en) *	1969-09-12	1972-03-07	Eastman Kodak Co	Light-sensitive quinone diazide polymers and polymer compositions
GB1342088A (en) *	1970-06-02	1973-12-25	Agfa Gevaert	Process for producing multicolour photographic images
US3759711A (en) *	1970-09-16	1973-09-18	Eastman Kodak Co	Er compositions and elements nitrogen linked apperding quinone diazide light sensitive vinyl polym
GB1347759A (en) *	1971-06-17	1974-02-27	Howson Algraphy Ltd	Light sensitive materials

1973
- 1973-06-20 DE DE2331377A patent/DE2331377C2/de not_active Expired
1974
- 1974-06-07 NL NLAANVRAGE7407678,A patent/NL177353C/xx not_active IP Right Cessation
- 1974-06-11 JP JP6643274A patent/JPS5652301B2/ja not_active Expired
- 1974-06-14 SE SE7407871A patent/SE391404B/xx not_active IP Right Cessation
- 1974-06-17 CA CA202,661A patent/CA1046332A/en not_active Expired
- 1974-06-17 FR FR7420898A patent/FR2234584B1/fr not_active Expired
- 1974-06-17 US US05/480,226 patent/US3969118A/en not_active Expired - Lifetime
- 1974-06-18 GB GB2694074A patent/GB1463717A/en not_active Expired
- 1974-06-18 IT IT51578/74A patent/IT1016063B/it active
- 1974-06-18 ES ES427391A patent/ES427391A1/es not_active Expired
- 1974-06-18 FI FI1860/74A patent/FI58221C/fi active
- 1974-06-18 BR BR4981/74A patent/BR7404981D0/pt unknown
- 1974-06-18 ZA ZA00743882A patent/ZA743882B/xx unknown
- 1974-06-19 BE BE145639A patent/BE816580A/xx not_active IP Right Cessation
- 1974-06-19 CS CS4323A patent/CS167209B2/cs unknown
- 1974-06-19 AR AR254279A patent/AR199440A1/es active
- 1974-06-19 AT AT508274A patent/AT331636B/de not_active IP Right Cessation
- 1974-06-19 DK DK327274A patent/DK144345C/da not_active IP Right Cessation
- 1974-06-19 NO NO742238A patent/NO139458C/no unknown
- 1974-06-19 CH CH841174A patent/CH601842A5/xx not_active IP Right Cessation

Also Published As

Publication number	Publication date
GB1463717A (en)	1977-02-09
BE816580A (fr)	1974-12-19
BR7404981D0 (pt)	1975-09-30
NO139458B (no)	1978-12-04
DK144345B (da)	1982-02-22
NL7407678A (da)	1974-12-24
ATA508274A (de)	1975-11-15
FR2234584A1 (da)	1975-01-17
IT1016063B (it)	1977-05-30
DE2331377A1 (de)	1975-01-16
JPS5652301B2 (da)	1981-12-11
NL177353C (nl)	1985-09-02
ZA743882B (en)	1975-06-25
NL177353B (nl)	1985-04-01
SE391404B (sv)	1977-02-14
FI186074A (da)	1974-12-21
FI58221B (fi)	1980-08-29
SE7407871L (da)	1974-12-23
ES427391A1 (es)	1977-03-01
US3969118A (en)	1976-07-13
DK144345C (da)	1982-07-19
CA1046332A (en)	1979-01-16
AR199440A1 (es)	1974-08-30
CH601842A5 (da)	1978-07-14
CS167209B2 (da)	1976-04-29
DK327274A (da)	1975-03-03
JPS5036209A (da)	1975-04-05
AU7015774A (en)	1975-12-18
FR2234584B1 (da)	1981-09-18
NO139458C (no)	1979-03-14
DE2331377C2 (de)	1982-10-14
AT331636B (de)	1976-08-25
NO742238L (da)	1975-01-13

Publication	Publication Date	Title
FI58221C (fi)	1980-12-10	Ljuskaensligt kopieringsskikt
US4160671A (en)	1979-07-10	Photosensitive composition
US4207106A (en)	1980-06-10	Positive working O-quinone diazide photocopying process with organic resin overlayer
US4467025A (en)	1984-08-21	Photosensitive compositions
US4123279A (en)	1978-10-31	Light-sensitive o-quinonediazide containing planographic printing plate
US3669658A (en)	1972-06-13	Photosensitive printing plate
SU544394A3 (ru)	1977-01-25	Светочувствительный материал
US3326682A (en)	1967-06-20	Color-proofing foils
US4163672A (en)	1979-08-07	Photosensitive composition
JPS6156499B2 (da)	1986-12-02
KR960007443B1 (ko)	1996-05-31	1,2-나프토퀴논-디아지드계 감광성 혼합물, 이로부터 제조된 기록재료 및 이의 용도
US4139384A (en)	1979-02-13	Photosensitive polymeric o-quinone diazide containing lithographic printing plate and process of using the plate
US4948693A (en)	1990-08-14	Positive working color proofing system comprising polyvinyl acetal/polyvinyl alcohol/polyvinyl acetate resin
US3764318A (en)	1973-10-09	Process for producing multicolour photographic images
JPH01102456A (ja)	1989-04-20	感光性組成物
US5318874A (en)	1994-06-07	O-naphthoquinone diazide photosensitive coating composition containing a polyvinyl pyrrolidone compound and a stannic halide
KR960016307B1 (ko)	1996-12-09	1,2-나프토퀴논디아지드-기본 감광성 혼합물 및 이 혼합물을 사용하여 제조한 복사물질
US5200293A (en)	1993-04-06	Photoresist composition containing specific amounts of a naphthoquinone diazide sulfonyl ester of tetrahydroxy diphenyl sulfide and a polyhydroxy compound
JPH0128369B2 (da)	1989-06-02
US5143815A (en)	1992-09-01	Light-sensitive mixture based on 1,2-naphthoquinone-diazides, and reproduction material produced with this mixture
JPH04221956A (ja)	1992-08-12	感光性平版印刷版
JPS61245154A (ja)	1986-10-31	感光性組成物
JPH0469661A (ja)	1992-03-04	感光性組成物
US5080996A (en)	1992-01-14	Color proofing system having a graduated layer of resins with different solubilities
EP0550893A1 (en)	1993-07-14	Light sensitive layer for positive-negative copying material