JPS55126235A - Photosensitive composition - Google Patents
Photosensitive compositionInfo
- Publication number
- JPS55126235A JPS55126235A JP3349379A JP3349379A JPS55126235A JP S55126235 A JPS55126235 A JP S55126235A JP 3349379 A JP3349379 A JP 3349379A JP 3349379 A JP3349379 A JP 3349379A JP S55126235 A JPS55126235 A JP S55126235A
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive composition
- compound
- phenolic resin
- forming
- quinonediazide compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 150000001875 compounds Chemical class 0.000 abstract 2
- 229910052757 nitrogen Inorganic materials 0.000 abstract 2
- 239000005011 phenolic resin Substances 0.000 abstract 2
- 229920001568 phenolic resin Polymers 0.000 abstract 2
- 229910052711 selenium Inorganic materials 0.000 abstract 2
- 229910052717 sulfur Inorganic materials 0.000 abstract 2
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 abstract 1
- WTQZSMDDRMKJRI-UHFFFAOYSA-N 4-diazoniophenolate Chemical compound [O-]C1=CC=C([N+]#N)C=C1 WTQZSMDDRMKJRI-UHFFFAOYSA-N 0.000 abstract 1
- 239000002253 acid Substances 0.000 abstract 1
- 230000032683 aging Effects 0.000 abstract 1
- 239000013078 crystal Substances 0.000 abstract 1
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 150000002367 halogens Chemical class 0.000 abstract 1
- 229910052760 oxygen Inorganic materials 0.000 abstract 1
- 150000003839 salts Chemical class 0.000 abstract 1
- 125000004385 trihaloalkyl group Chemical group 0.000 abstract 1
Landscapes
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
PURPOSE: To obtain a photosensitive composition capable of forming a visible image superior in contrast and aging stability immediately after exposure, by adding a dye and a specified compound to a quinonediazide compound-phenolic resin type photosensitive composition.
CONSTITUTION: To a photosensitive composition consisting of an o-quinonediazide compound and a phenolic resin are added (a) an organic dye capable of forming a salt (e.g., Crystal Violet) 0.3W5wt%; (b) o-naphthoquinonediazide-4-sulphonic acid halogenide 0.2W7wt%; and (c) a compound having halogen and releasing acid on receiving active rays represented by general formula I (Ra is 1W3C trihaloalkyl or trihaloalkenyl; X is N, S, Se, or P; Y is O, N, S, Se, or P; and Z is an atomic group having a chromophore and necessary to cyclize X and Y), e.g. formula II, 0.2W7wt%.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3349379A JPS55126235A (en) | 1979-03-22 | 1979-03-22 | Photosensitive composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3349379A JPS55126235A (en) | 1979-03-22 | 1979-03-22 | Photosensitive composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55126235A true JPS55126235A (en) | 1980-09-29 |
| JPH0128369B2 JPH0128369B2 (en) | 1989-06-02 |
Family
ID=12388075
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3349379A Granted JPS55126235A (en) | 1979-03-22 | 1979-03-22 | Photosensitive composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55126235A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58211141A (en) * | 1982-06-02 | 1983-12-08 | Fuji Photo Film Co Ltd | Negative type photosensitive lithographic plate |
| JPS6088942A (en) * | 1983-10-21 | 1985-05-18 | Fuji Photo Film Co Ltd | Photosensitive composition |
| JPS62175735A (en) * | 1986-01-30 | 1987-08-01 | Fuji Photo Film Co Ltd | Photosensitive composition |
| JPH0296165A (en) * | 1988-10-03 | 1990-04-06 | Konica Corp | Photosensitive composition |
| JPH0296755A (en) * | 1988-10-03 | 1990-04-09 | Konica Corp | photosensitive composition |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4836281A (en) * | 1971-09-03 | 1973-05-28 | ||
| JPS5036209A (en) * | 1973-06-20 | 1975-04-05 | ||
| JPS5336223A (en) * | 1976-09-13 | 1978-04-04 | Hoechst Ag | Photosensitive composition |
| JPS53133428A (en) * | 1977-04-25 | 1978-11-21 | Hoechst Ag | Radiation sensitive copying constitute |
-
1979
- 1979-03-22 JP JP3349379A patent/JPS55126235A/en active Granted
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4836281A (en) * | 1971-09-03 | 1973-05-28 | ||
| JPS5036209A (en) * | 1973-06-20 | 1975-04-05 | ||
| JPS5336223A (en) * | 1976-09-13 | 1978-04-04 | Hoechst Ag | Photosensitive composition |
| JPS53133428A (en) * | 1977-04-25 | 1978-11-21 | Hoechst Ag | Radiation sensitive copying constitute |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58211141A (en) * | 1982-06-02 | 1983-12-08 | Fuji Photo Film Co Ltd | Negative type photosensitive lithographic plate |
| JPS6088942A (en) * | 1983-10-21 | 1985-05-18 | Fuji Photo Film Co Ltd | Photosensitive composition |
| JPS62175735A (en) * | 1986-01-30 | 1987-08-01 | Fuji Photo Film Co Ltd | Photosensitive composition |
| JPH0296165A (en) * | 1988-10-03 | 1990-04-06 | Konica Corp | Photosensitive composition |
| JPH0296755A (en) * | 1988-10-03 | 1990-04-09 | Konica Corp | photosensitive composition |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0128369B2 (en) | 1989-06-02 |
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