FI20115628L - Uusi polymeerikoostumus ja menetelmä sen valmistamiseksi - Google Patents
Uusi polymeerikoostumus ja menetelmä sen valmistamiseksi Download PDFInfo
- Publication number
- FI20115628L FI20115628L FI20115628A FI20115628A FI20115628L FI 20115628 L FI20115628 L FI 20115628L FI 20115628 A FI20115628 A FI 20115628A FI 20115628 A FI20115628 A FI 20115628A FI 20115628 L FI20115628 L FI 20115628L
- Authority
- FI
- Finland
- Prior art keywords
- preparation
- polymer composition
- new polymer
- bisphenofluorenes
- biphenols
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
- C08G8/02—Condensation polymers of aldehydes or ketones with phenols only of ketones
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
- C08K5/0025—Crosslinking or vulcanising agents; including accelerators
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/04—Oxygen-containing compounds
- C08K5/14—Peroxides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/29—Compounds containing one or more carbon-to-nitrogen double bonds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
- C08L61/04—Condensation polymers of aldehydes or ketones with phenols only
- C08L61/16—Condensation polymers of aldehydes or ketones with phenols only of ketones with phenols
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2261/00—Macromolecular compounds obtained by reactions forming a carbon-to-carbon link in the main chain of the macromolecule
- C08G2261/30—Monomer units or repeat units incorporating structural elements in the main chain
- C08G2261/31—Monomer units or repeat units incorporating structural elements in the main chain incorporating aromatic structural elements in the main chain
- C08G2261/314—Condensed aromatic systems, e.g. perylene, anthracene or pyrene
- C08G2261/3142—Condensed aromatic systems, e.g. perylene, anthracene or pyrene fluorene-based, e.g. fluorene, indenofluorene, or spirobifluorene
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/3105—After-treatment
- H01L21/311—Etching the insulating layers by chemical or physical means
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Phenolic Resins Or Amino Resins (AREA)
- Formation Of Insulating Films (AREA)
- Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FI20115628A FI20115628L (fi) | 2011-06-20 | 2011-06-20 | Uusi polymeerikoostumus ja menetelmä sen valmistamiseksi |
US13/489,515 US8952121B2 (en) | 2011-06-20 | 2012-06-06 | Polymer composition and method of making the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FI20115628A FI20115628L (fi) | 2011-06-20 | 2011-06-20 | Uusi polymeerikoostumus ja menetelmä sen valmistamiseksi |
Publications (2)
Publication Number | Publication Date |
---|---|
FI20115628A0 FI20115628A0 (fi) | 2011-06-20 |
FI20115628L true FI20115628L (fi) | 2012-12-21 |
Family
ID=44206838
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FI20115628A FI20115628L (fi) | 2011-06-20 | 2011-06-20 | Uusi polymeerikoostumus ja menetelmä sen valmistamiseksi |
Country Status (2)
Country | Link |
---|---|
US (1) | US8952121B2 (fi) |
FI (1) | FI20115628L (fi) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5556773B2 (ja) * | 2010-09-10 | 2014-07-23 | 信越化学工業株式会社 | ナフタレン誘導体及びその製造方法、レジスト下層膜材料、レジスト下層膜形成方法及びパターン形成方法 |
KR101432605B1 (ko) * | 2010-12-16 | 2014-08-21 | 제일모직주식회사 | 하드마스크 조성물, 이를 사용한 패턴 형성 방법 및 상기 패턴을 포함하는 반도체 집적회로 디바이스 |
US9244353B2 (en) * | 2012-08-10 | 2016-01-26 | Nissan Chemical Industries, Ltd. | Resist underlayer film forming composition |
KR102066229B1 (ko) * | 2013-03-26 | 2020-01-15 | 주식회사 동진쎄미켐 | 레지스트 하층막 조성물 및 이를 이용한 패턴 형성 방법 |
KR20150079199A (ko) * | 2013-12-31 | 2015-07-08 | 제일모직주식회사 | 하드마스크 조성물, 이를 사용한 패턴 형성 방법 및 상기 패턴을 포함하는 반도체 집적회로 디바이스 |
US9274426B2 (en) * | 2014-04-29 | 2016-03-01 | Az Electronic Materials (Luxembourg) S.A.R.L. | Antireflective coating compositions and processes thereof |
KR101747229B1 (ko) * | 2014-07-15 | 2017-06-14 | 삼성에스디아이 주식회사 | 하드마스크 조성물 및 상기 하드마스크 조성물을 사용하는 패턴형성방법 |
JP2019086545A (ja) | 2017-11-01 | 2019-06-06 | メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングMerck Patent GmbH | アリルオキシ誘導体、これを用いたレジスト下層膜形成組成物、ならびにこれを用いたレジスト下層膜および半導体デバイスの製造方法 |
EP3729196A1 (en) | 2017-12-20 | 2020-10-28 | Merck Patent GmbH | An ethynyl derived composite, a composition comprising thereof, a method for manufacturing a coating by it, and a method for manufacturing a device comprising the coating |
KR102716551B1 (ko) * | 2019-04-26 | 2024-10-15 | 메르크 파텐트 게엠베하 | 경화막의 제조방법 및 이의 용도 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4618566A (en) * | 1984-10-31 | 1986-10-21 | Ecoplastics Limited | Fluorene containing compounds and negative photoresist compositions therefrom |
US5034296A (en) * | 1989-04-03 | 1991-07-23 | Xerox Corporation | Photoconductive imaging members with fluorene polyester hole transporting layers |
US20040106758A1 (en) * | 2001-04-09 | 2004-06-03 | Shouji Nishiguchi | Curable polyvinylbenzyl compound and process for producing the same |
US7514379B2 (en) * | 2001-04-09 | 2009-04-07 | Showa Highpolymer Co., Ltd. | Curable polyvinyl benzyl compound and process for producing the same |
US7303855B2 (en) * | 2003-10-03 | 2007-12-04 | Shin-Etsu Chemical Co., Ltd. | Photoresist undercoat-forming material and patterning process |
TW200517469A (en) * | 2003-10-30 | 2005-06-01 | Nissan Chemical Ind Ltd | Charge-transporting compound, charge-transporting material, charge-transporting varnish, charge-transporting thin film, and organic electroluminescent device |
KR100874655B1 (ko) | 2007-07-20 | 2008-12-17 | 금호석유화학 주식회사 | 스핀 온 카본 하드마스크용 축중합체 및 이의 제조방법과축중합체를 포함하는 스핀 온 카본 하드마스크 조성물 및이를 이용한 반도체 소자의 패턴 형성 방법 |
JP2010100770A (ja) * | 2008-10-27 | 2010-05-06 | Mitsubishi Gas Chemical Co Inc | 熱可塑性樹脂の製造方法、ポリエステル樹脂及びポリカーボネート樹脂、ならびにそれらの用途 |
US8410243B2 (en) * | 2008-12-17 | 2013-04-02 | The Governors Of The University Of Alberta | Aromatic ether-containing fluorene monomers, processes for their preparation and polymerization thereof |
JP5951286B2 (ja) * | 2012-03-01 | 2016-07-13 | 大阪ガスケミカル株式会社 | フルオレン骨格を有する熱可塑性(メタ)アクリル樹脂 |
-
2011
- 2011-06-20 FI FI20115628A patent/FI20115628L/fi not_active Application Discontinuation
-
2012
- 2012-06-06 US US13/489,515 patent/US8952121B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
FI20115628A0 (fi) | 2011-06-20 |
US20120322010A1 (en) | 2012-12-20 |
US8952121B2 (en) | 2015-02-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FD | Application lapsed |