ES8305841A1 - Procedimiento y dispositivo para la obtencion de tiras exentas de metal durante la evaporacion de metal de una banda de material aislante. - Google Patents
Procedimiento y dispositivo para la obtencion de tiras exentas de metal durante la evaporacion de metal de una banda de material aislante.Info
- Publication number
- ES8305841A1 ES8305841A1 ES515390A ES515390A ES8305841A1 ES 8305841 A1 ES8305841 A1 ES 8305841A1 ES 515390 A ES515390 A ES 515390A ES 515390 A ES515390 A ES 515390A ES 8305841 A1 ES8305841 A1 ES 8305841A1
- Authority
- ES
- Spain
- Prior art keywords
- band
- insulating material
- metal
- procedure
- free strips
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000011810 insulating material Substances 0.000 title 1
- 238000001883 metal evaporation Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
- Physical Vapour Deposition (AREA)
Abstract
PROCEDIMIENTO Y DISPOSITIVO PARA LA FABRICACION DE BANDAS DE MATERIAL AISLANTE PARA CONDENSADORES ELECTRICOS. LA BANDA DE MATERIAL AISLANTE A METALIZAR (12) SE CUBRE, EN LA ZONA DE LAS TIRAS EXENTAS DE METAL, MEDIANTE UNA BANDA DE COBERTURA SIN FIN (13). ANTES DE LA ENTRADA EN LA ZONA DE VAPORIZACION, UNA PELICULA (15), PREPARADA MEDIANTE LA EVAPORACION DE ACEITE, CUBRE LAS SUPERFICIES LATERALES (16) DE LA BANDA DE COBERTURA, ASI COMO LAS ZONAS LIMITROFES (14) DE LA BANDA DE MATERIAL AISLANTE. A CONTINUACION SE VERIFICA LA EVAPORACION DEL METAL Y EL DESPELLEJADO DE LA BANDA.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE3134589 | 1981-09-01 | ||
DE19823224234 DE3224234A1 (de) | 1981-09-01 | 1982-06-29 | Verfahren zur herstellung von metallfreien streifen bei der metallbedampfung eines isolierstoffbandes und vorrichtung zur durchfuehrung des verfahrens |
Publications (2)
Publication Number | Publication Date |
---|---|
ES515390A0 ES515390A0 (es) | 1983-05-01 |
ES8305841A1 true ES8305841A1 (es) | 1983-05-01 |
Family
ID=25795689
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
ES515390A Expired ES8305841A1 (es) | 1981-09-01 | 1982-08-31 | Procedimiento y dispositivo para la obtencion de tiras exentas de metal durante la evaporacion de metal de una banda de material aislante. |
Country Status (5)
Country | Link |
---|---|
US (1) | US4478878A (es) |
EP (1) | EP0073949A3 (es) |
DE (1) | DE3224234A1 (es) |
ES (1) | ES8305841A1 (es) |
FI (1) | FI823010L (es) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4681780A (en) * | 1983-12-01 | 1987-07-21 | Polaroid Corporation | Continuously cleaned rotary coating mask |
JPS6173875A (ja) * | 1984-09-17 | 1986-04-16 | Mitsubishi Heavy Ind Ltd | 流路幅調整板付き真空蒸着装置 |
US4682565A (en) * | 1984-11-19 | 1987-07-28 | Sfe Technologies | Vapor nozzle with gas barrier bars |
DE3514824A1 (de) * | 1985-04-24 | 1986-11-06 | Siemens Ag | Verfahren zur bildung von schmalen, metallfreien streifen in der metallschicht von kunststoffolien |
DE3922187A1 (de) * | 1989-07-06 | 1991-01-17 | Leybold Ag | Vorrichtung zum herstellen von metallfreien streifen bei im vakuum beschichteten folienbahnen, insbesondere fuer kondensatoren |
EP0488535A3 (en) * | 1990-11-08 | 1992-09-23 | Bmc Technology Corporation | Method and apparatus for manufacturing electrodes for multilayer ceramic capacitors |
DE4310085A1 (de) * | 1993-03-27 | 1994-09-29 | Leybold Ag | Verfahren und Vorrichtung zur Erzeugung von Mustern auf Substraten |
US5512315A (en) * | 1994-06-01 | 1996-04-30 | Roederstein Electronics, Inc. | Capacitor manufacturing technique |
DE19527604A1 (de) * | 1995-07-28 | 1997-01-30 | Leybold Ag | Verfahren und Vorrichtung zur Herstellung von metallfreien Streifen bei der Metallbedampfung |
DE19912707B4 (de) * | 1999-03-20 | 2010-01-21 | Applied Materials Gmbh & Co. Kg | Behandlungsanlage für flache Substrate |
DE10008097A1 (de) * | 2000-02-22 | 2001-09-20 | Forschungszentrum Juelich Gmbh | Markierungseinrichtung sowie Verfahren zum Auslesen einer solchen Markierungseinrichtung |
EP1917842B1 (en) * | 2005-08-26 | 2015-03-11 | FUJIFILM Manufacturing Europe B.V. | Method and arrangement for generating and controlling a discharge plasma |
EP1693481A1 (en) | 2005-11-23 | 2006-08-23 | Galileo Vacuum Systems S.R.L. | Vacuum metallization device with means to create metal-free areas |
JP2009538989A (ja) * | 2006-05-30 | 2009-11-12 | フジフィルム マニュファクチャリング ユーロプ ビー.ブイ. | パルス化大気圧グロー放電を使用する堆積の方法及び装置 |
US20090324971A1 (en) * | 2006-06-16 | 2009-12-31 | Fujifilm Manufacturing Europe B.V. | Method and apparatus for atomic layer deposition using an atmospheric pressure glow discharge plasma |
WO2008100139A1 (en) * | 2007-02-13 | 2008-08-21 | Fujifilm Manufacturing Europe B.V. | Substrate plasma treatment using magnetic mask device |
EP1975272A1 (en) | 2007-03-27 | 2008-10-01 | Galileo Vacuum Systems S.p.A. | Device for vacuum deposition of a coating on a continuous material, with liquid applicator |
DE102007027435A1 (de) * | 2007-06-14 | 2008-12-18 | X-Fab Semiconductor Foundries Ag | Verfahren und Vorrichtung zur strukturierten Schichtabscheidung auf prozessierten Mikrosystemtechnikwafern |
DE102007031457A1 (de) | 2007-07-05 | 2009-01-08 | Leybold Optics Gmbh | Verfahren und Vorrichtung zur Aufbringung einer Schicht eines Trennmittels auf ein Substrat |
WO2009096785A1 (en) * | 2008-02-01 | 2009-08-06 | Fujifilm Manufacturing Europe B.V. | Method and apparatus for plasma surface treatment of a moving substrate |
EP2241165B1 (en) * | 2008-02-08 | 2011-08-31 | Fujifilm Manufacturing Europe B.V. | Method for manufacturing a multi_layer stack structure with improved wvtr barrier property |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB836991A (en) * | 1955-12-05 | 1960-06-09 | Telephone Mfg Co Ltd | Improvements in and relating to coating extended supports |
DE1262732B (de) * | 1962-07-04 | 1968-03-07 | Siemens Ag | Vorrichtung zum gleichzeitigen Aufdampfen von mehreren parallelen Streifen aus fluessigen oder fettartigen Stoffen mit niedrigem Dampfdruck auf insbesondere fuer die Herstellung elektrischer Kondensatoren bestimmten Baendern als Abdeckmittel fuer eine nachfolgende Metallbedampfung |
DE1521588A1 (de) * | 1966-12-05 | 1969-09-18 | Lokomotivbau Elektrotech | Einrichtung zum Schutz gegen Bedampfung in Vakuumschmelz- und-verdampfungsanlagen |
DE2112405A1 (de) * | 1971-03-15 | 1972-09-21 | Siemens Ag | Vorrichtung zum Erzeugen metallisierter Laengsstreifen auf Folien |
DE2652438B2 (de) * | 1976-11-17 | 1978-08-31 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Verfahren zur Herstellung von metallfreien Streifen bei der Metallbedampfung eines Isolierstoffbandes und Vorrichtung zu dessen Durchführung |
JPS5928630B2 (ja) * | 1977-04-19 | 1984-07-14 | 松下電器産業株式会社 | 連続式真空蒸着装置 |
JPS5579867A (en) * | 1978-12-11 | 1980-06-16 | Honshu Paper Co Ltd | Vacuum evaporation method |
-
1982
- 1982-06-29 DE DE19823224234 patent/DE3224234A1/de active Granted
- 1982-08-12 EP EP82107330A patent/EP0073949A3/de not_active Withdrawn
- 1982-08-23 US US06/410,478 patent/US4478878A/en not_active Expired - Fee Related
- 1982-08-31 ES ES515390A patent/ES8305841A1/es not_active Expired
- 1982-08-31 FI FI823010A patent/FI823010L/fi not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
US4478878A (en) | 1984-10-23 |
DE3224234A1 (de) | 1983-03-10 |
FI823010A0 (fi) | 1982-08-31 |
ES515390A0 (es) | 1983-05-01 |
EP0073949A2 (de) | 1983-03-16 |
DE3224234C2 (es) | 1988-01-14 |
FI823010L (fi) | 1983-03-02 |
EP0073949A3 (de) | 1984-01-11 |
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