[go: up one dir, main page]

ES2070463T3 - Aparato y crisol para deposito en fase de vapor. - Google Patents

Aparato y crisol para deposito en fase de vapor.

Info

Publication number
ES2070463T3
ES2070463T3 ES91403232T ES91403232T ES2070463T3 ES 2070463 T3 ES2070463 T3 ES 2070463T3 ES 91403232 T ES91403232 T ES 91403232T ES 91403232 T ES91403232 T ES 91403232T ES 2070463 T3 ES2070463 T3 ES 2070463T3
Authority
ES
Spain
Prior art keywords
compartments
diffusers
compartment
pot
deposit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES91403232T
Other languages
English (en)
Inventor
Dominique Valentian
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Societe Europeenne de Propulsion SEP SA
Original Assignee
Societe Europeenne de Propulsion SEP SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Societe Europeenne de Propulsion SEP SA filed Critical Societe Europeenne de Propulsion SEP SA
Application granted granted Critical
Publication of ES2070463T3 publication Critical patent/ES2070463T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/52—Means for observation of the coating process
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
    • C30B23/02—Epitaxial-layer growth
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B30/00—Production of single crystals or homogeneous polycrystalline material with defined structure characterised by the action of electric or magnetic fields, wave energy or other specific physical conditions
    • C30B30/08—Production of single crystals or homogeneous polycrystalline material with defined structure characterised by the action of electric or magnetic fields, wave energy or other specific physical conditions in conditions of zero-gravity or low gravity

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

EL APARATO PARA DEPOSICION EN FASE DE VAPOR A ALTA TEMPERATURA COMPRENDE UN RECINTO TERMICAMENTE AISLANTE, UN PRIMER, UN SEGUNDO Y UN TERCER DIFUSOR (3, 4, 5) PARA CONSTITUIR UNA PRIMERA, UNA SEGUNDA Y UNA TERCERA ZONA DE CALENTAMIENTO ISOTERMICO RESPECTIVAMENTE ALREDEDOR DEL PRIMER, SEGUNDO Y TERCER COMPARTIMENTO (21, 22, 23) DE UN CRISOL CERRADO AMOVIBLE (1) DESTINADO A CONTENER UN MATERIAL FUERTE EN EL PRIMER COMPARTIMENTO (21) Y UN SUSTRATO EN EL SEGUNDO COMPARTIMENTO (22). EL PRIMER, SEGUNDO Y TERCER DIFUSOR (3, 4, 5) SON POR CONSTRUCCION INDEPENDIENTES TERMICAMENTE UNOS DE OTROS Y PRESENTAN CADA UNO UNA SECCION EN FORMA DE U PARA CONTENER RESPECTIVAMENTE EL PRIMER, SEGUNDO Y TERCER COMPARTIMENTO (21 A 23) DEL CRISOL. ESTE PRIMER, SEGUNDO Y TERCER COMPARTIMENTO (21 A 23) ESTAN DISPUESTOS DE MANERA NO ALINEADA, SEGUN UNA LINEA QUEBRADA, DE TAL MANERA QUE LOS DECALAJES ANGULARES ASEGURAN UN DESACOPLAMIENTO TERMICO RADIACTIVO ENTRE EL PRIMER, SEGUNDO Y TERCER COMPARTIMENTO (21 A 23).
ES91403232T 1990-12-07 1991-11-29 Aparato y crisol para deposito en fase de vapor. Expired - Lifetime ES2070463T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9015368A FR2670219B1 (fr) 1990-12-07 1990-12-07 Appareil et creuset pour depot en phase vapeur.

Publications (1)

Publication Number Publication Date
ES2070463T3 true ES2070463T3 (es) 1995-06-01

Family

ID=9403020

Family Applications (1)

Application Number Title Priority Date Filing Date
ES91403232T Expired - Lifetime ES2070463T3 (es) 1990-12-07 1991-11-29 Aparato y crisol para deposito en fase de vapor.

Country Status (9)

Country Link
US (1) US5140939A (es)
EP (1) EP0490727B1 (es)
JP (1) JPH04293768A (es)
AT (1) ATE117736T1 (es)
CA (1) CA2056816A1 (es)
DE (1) DE69107038T2 (es)
ES (1) ES2070463T3 (es)
FR (1) FR2670219B1 (es)
IE (1) IE914131A1 (es)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0421780A (ja) * 1990-05-14 1992-01-24 Sharp Corp 気相成長装置
US5253266A (en) * 1992-07-20 1993-10-12 Intevac, Inc. MBE effusion source with asymmetrical heaters
KR100401544B1 (ko) 2001-02-06 2003-10-17 삼성전자주식회사 반도체 공정에 사용되는 가스를 제공하는 방법 및 장치그리고 이를 갖는 가공 장치
KR100754404B1 (ko) * 2006-05-25 2007-08-31 삼성전자주식회사 확산튜브와, 확산공정용 도펀트 소스 및 상기 확산튜브와도펀트 소스를 이용한 확산방법
CN108004512A (zh) * 2018-01-17 2018-05-08 京东方科技集团股份有限公司 一种蒸发源以及蒸镀装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1112044B (de) * 1959-12-05 1961-08-03 Akad Wissenschaften Ddr Verfahren und Vorrichtung zur Gewinnung von Kristallen aus der Dampfphase
US3343518A (en) * 1964-09-30 1967-09-26 Hayes Inc C I High temperature furnace
US3828722A (en) * 1970-05-01 1974-08-13 Cogar Corp Apparatus for producing ion-free insulating layers
US3632429A (en) * 1970-06-30 1972-01-04 Matsushita Electric Ind Co Ltd Method for making metal oxide film resistors
DE2033444C3 (de) * 1970-07-06 1979-02-15 Siemens Ag Vorrichtung zum Eindiffundieren von Dotierstoffen in Scheiben aus Halbleitermaterial
AU485215B2 (en) * 1973-11-28 1976-05-20 Unisearch Limited Method for vapour growing crystals
US4211182A (en) * 1978-05-05 1980-07-08 Rca Corporation Diffusion apparatus
US4204893A (en) * 1979-02-16 1980-05-27 Bell Telephone Laboratories, Incorporated Process for depositing chrome doped epitaxial layers of gallium arsenide utilizing a preliminary formed chemical vapor-deposited chromium oxide dopant source
JPS62153192A (ja) * 1985-12-26 1987-07-08 Sharp Corp 化合物半導体の結晶成長方法

Also Published As

Publication number Publication date
EP0490727B1 (fr) 1995-01-25
FR2670219A1 (fr) 1992-06-12
IE914131A1 (en) 1992-06-17
DE69107038T2 (de) 1995-06-22
DE69107038D1 (de) 1995-03-09
FR2670219B1 (fr) 1993-03-19
JPH04293768A (ja) 1992-10-19
CA2056816A1 (en) 1992-06-08
ATE117736T1 (de) 1995-02-15
US5140939A (en) 1992-08-25
EP0490727A1 (fr) 1992-06-17

Similar Documents

Publication Publication Date Title
IT8019767A0 (it) Riscaldatore a calore raggiante per apparecchiature di cottura.
DK161483C (da) Reguleringsapparat for overhedningstemperaturen af et koele- eller varmepumpeanlaegs fordamper
ES2165137T3 (es) Procedimiento y dispositivo para la distribucion colectiva de comidas.
DE59814433D1 (de) Thermopile-Sensor und Strahlungsthermometer mit einem Thermopile-Sensor
ATE85489T1 (de) Mikrowellenheizung.
MX9200258A (es) Aparato de enfriamiento portatil y montaje de enfriamiento portatil para ser instalado en el aparato de enfriamiento.
IT8024429A0 (it) Impianto di riscaldamento o trattamento termico.
FR2660053B1 (fr) Procede de cuisson pour un four a chauffage combine par convection, gril et micro-ondes.
IT1111708B (it) Complesso termicamente isolante specialmente per raccordi di generatori o scambiatori di calore
ITTO940107A0 (it) Gruppo termoregolato per la distribuzione di pasti caldi in contenitori isotermici.
ES2070463T3 (es) Aparato y crisol para deposito en fase de vapor.
ATE352180T1 (de) Konvektions- und mikrowellenofen mit mehreren einschüben
BE903256A (fr) Chariot-armoire a aliments comprenant un compartiment chaud et un compartiment froid climatises
FR2339150A1 (fr) Echangeur de chaleur pour appareils de chauffage par convection
ATE139025T1 (de) Vakuumofen
DE59509398D1 (de) Kühlmöbel mit wenigstens zwei Fächern unterschiedlicher Temperatur
IT8404883A0 (it) Dispositivo per la regolazione e rispettivamente la limitazione di almeno un valore di temperatura o rispettivamente di un campo di temperature di corpi riscaldanti radianti e rispettivamente di contatto di apparecchi da cucina elettrici.
FR2380698A7 (fr) Four, notamment four de laboratoire chauffe electriquement, four a recuire, armoire chauffante, et analogues
IT8023464A0 (it) Dispositivo per il rilevamento centralizzato dell'energia termica prelevata da parecchi utilizzatori di calore.
FR2651307B1 (fr) Four de traitement thermique equipe de moyens de refroidissement perfectionnes.
JPS5677631A (en) High-frequency heating apparatus
US847402A (en) Fireless cook-stove or cooking-oven.
ITMI910941A1 (it) Dispositivo per isolare termicamente elettrodomestici o loro parti in cui si ha uno sviluppo di calore, quali per esempio le camere di cottura di forni elettrici, a gas o combinati
BR8004381A (pt) Aparelho para conduzir o tratamento termico por aplicacao de energia de microonda
ES2116141A1 (es) Perfeccionamientos introducidos en la patente de invencion 9302104 por horno de aire a conveccion.

Legal Events

Date Code Title Description
FG2A Definitive protection

Ref document number: 490727

Country of ref document: ES