[go: up one dir, main page]

EP1155423B1 - Noyau magnetique plat - Google Patents

Noyau magnetique plat Download PDF

Info

Publication number
EP1155423B1
EP1155423B1 EP00910511A EP00910511A EP1155423B1 EP 1155423 B1 EP1155423 B1 EP 1155423B1 EP 00910511 A EP00910511 A EP 00910511A EP 00910511 A EP00910511 A EP 00910511A EP 1155423 B1 EP1155423 B1 EP 1155423B1
Authority
EP
European Patent Office
Prior art keywords
magnetic
component
magnetic films
films
surface roughness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP00910511A
Other languages
German (de)
English (en)
Other versions
EP1155423A1 (fr
Inventor
Harald Hundt
Johannes Beichler
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Vacuumschmelze GmbH and Co KG
Original Assignee
Vacuumschmelze GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Vacuumschmelze GmbH and Co KG filed Critical Vacuumschmelze GmbH and Co KG
Publication of EP1155423A1 publication Critical patent/EP1155423A1/fr
Application granted granted Critical
Publication of EP1155423B1 publication Critical patent/EP1155423B1/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/02Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
    • H01F41/0206Manufacturing of magnetic cores by mechanical means
    • H01F41/0213Manufacturing of magnetic circuits made from strip(s) or ribbon(s)
    • H01F41/0226Manufacturing of magnetic circuits made from strip(s) or ribbon(s) from amorphous ribbons
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F17/00Fixed inductances of the signal type
    • H01F17/04Fixed inductances of the signal type with magnetic core
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F1/00Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
    • H01F1/01Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials
    • H01F1/03Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity
    • H01F1/12Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials
    • H01F1/14Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials metals or alloys
    • H01F1/147Alloys characterised by their composition
    • H01F1/153Amorphous metallic alloys, e.g. glassy metals
    • H01F1/15333Amorphous metallic alloys, e.g. glassy metals containing nanocrystallites, e.g. obtained by annealing
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F17/00Fixed inductances of the signal type
    • H01F17/0006Printed inductances
    • H01F17/0013Printed inductances with stacked layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01FMAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F3/00Cores, Yokes, or armatures
    • H01F3/02Cores, Yokes, or armatures made from sheets

Definitions

  • the invention relates to a component of low overall height for printed circuit boards with a magnetic region formed by at least one layer of a soft magnetic material.
  • Such a device is known from US-A-5,529,831.
  • the known device is produced by applying insulating layers, conductor layers and a magnetic layer to the substrate. To apply these layers, a conventional sputtering method is used.
  • a disadvantage of such a device is that it can be produced only by means of a complex thin-film process.
  • due to the process only small layer thicknesses in the range of a few ⁇ m can be produced. Accordingly small are the cross sections of the magnetic regions produced by means of these methods.
  • Another disadvantage is that in such a device, the windings must be made using a complex thin-film process.
  • the present invention seeks to provide a readily manufacturable high inductance device for use on circuit boards.
  • the magnetic region is formed by at least one soft magnetic film.
  • the surface roughness of each film is at least equal to the skin penetration depth at the frequency of use.
  • Magnetic foils can typically be produced with thicknesses in the range of 10 to 25 ⁇ m. Stacked up Thus, compared to magnetic regions produced in thin-film process substantially larger cross-sections of the magnetic field. Consequently, the inductance of a device provided with such a magnetic region is relatively high. Nevertheless, the device according to the invention has a low overall height and is therefore also suitable for SMD technology. That the surface roughness of each film is at least equal to the skin penetration depth at the use frequency is particularly favorable for high frequency applications.
  • FIGS. 1A to 1C Various embodiments of a magnetic sheet 1 are shown in FIGS. 1A to 1C.
  • the magnetic film 1 shown in FIG. 1A has a circular ring shape.
  • the magnetic sheets 1 of FIGS. 1B and 1C have an annular shape with rectangular contours.
  • the magnetic foils 1 are expediently made of an amorphous or nanocrystalline alloy.
  • Amorphous iron-based alloys are known, for example, from US-A-4,144,058.
  • Cobalt-based amorphous alloys are disclosed, for example, in EP-A-0 021 101.
  • Nanocrystalline alloys are finally described in EP-A-0 271 657. From the materials mentioned thin films can be produced with a typical thickness of 10 to 25 microns, sometimes with smaller or larger thicknesses. From the thin films can then punch out the annular magnetic films 1.
  • the stacked magnetic films 1 result, as shown in Figure 2, a toroidal core 3, wherein in Figure 2, the thickness of the magnetic films 1 increases in comparison to the diameter is shown, since the diameter of the magnetic films 1 is in the range of a few millimeters, while the thickness of the magnetic films 1 are in the range of 10 microns.
  • the magnetic films 1 may be glued together.
  • the adhesive layer can take on the task of an insulating layer.
  • a slot 4 is introduced into the ring core 3 shown in FIG. 3, through which the hysteresis loop is sheared.
  • the slot 4 has been introduced after the stacking of the magnetic films 1 and the bonding of the magnetic films 1 subsequently.
  • the magnetic films 1 are first provided individually with the slot 4 and then stacked and glued together.
  • the production of the embodiment shown in Figure 4 is more expensive, but for the ring core 3 of Figure 4 has a higher mechanical strength.
  • FIG. 5 In order to protect the toroidal core 3 from mechanical damage, it is provided according to FIG. 5 to introduce the toroidal core 3 into a trough 5 made of plastic.
  • the trough 5 can then be wrapped by an inner hole 5 'through with a winding, without the risk that the magnetic core 1 formed by the toroidal core 3 is damaged during winding.
  • This polymer layer 6 is expediently a polymer layer deposited from the gaseous phase, for example a polyparaxylylene.
  • This method has the advantage that the gaseous polymer material penetrates into very fine cracks and that in this way the magnetic films 1 are also mechanically connected to each other, without the magnetic films 1 are mechanically stressed. Because a mechanical stress can change due to the magnetostriction, the magnetic properties of the magnetic sheet 1 to the detriment.
  • the surface roughness R A of the magnetic films 1 is approximately equal to the skin penetration depth ⁇ skin at the use frequencies.
  • the definition of the roughness depth is explained below with reference to FIG.
  • the X-axis is parallel to the surface of a body whose surface roughness R A is to be determined.
  • the Y axis is parallel to the surface normal of the surface to be measured.
  • the surface roughness R A then corresponds to the height of a rectangle 7 whose length is equal to a Rescuemeßorder l m and the area equal to the sum of enclosed between a roughness profile 8 and a central line 9 surfaces 10.
  • the surface roughness R A of the magnetic films 1 has an effect on the length of the current paths relevant for the eddy currents. If the skin penetration depth ⁇ skin is less than half the film thickness at the application frequencies, then the currents flowing in the magnetic film 1 are mainly limited to an edge layer of the magnetic film 1 of the thickness of the skin penetration depth ⁇ skin . Now, if the surface roughness R A If the magnetic foil 1 lies in the area of the skin penetration depth ⁇ skin , the eddy currents must follow the surface modulated by the surface roughness R A , which leads to elongated current paths and thus to an apparently increased specific resistance. However, this also results in an increased eddy current limit frequency.
  • FIGS. 8 and 9 These relationships are illustrated in FIGS. 8 and 9.
  • the winding currents 11 flowing in an external winding cause eddy currents 12 in the magnetic film 1 in a surface area of the thickness of the skin penetration depth ⁇ skin .
  • the surface roughness of the magnetic sheet 1 is greater than the skin penetration depth ⁇ skin , resulting in the eddy currents 12 elongated current paths, which leads to an increased eddy current cutoff frequency.
  • the surface roughness can not be chosen arbitrarily large, since the magnetic films 1 in extreme cases then have holes, which greatly reduces the achievable permeabilities.
  • the measured magnetic films 1 are magnetic films 1 of an alloy with the composition (CoFeNi) 78.5 (MnSiB) 21.5 .
  • a dashed curve 13 represents the dependence of the permeability ⁇ on the frequency f at a total surface roughness of 2.1% relative to the thickness of the magnetic film 1.
  • a solid curve 14 further illustrates the dependence of the permeability ⁇ on the frequency f at the thickness of the magnetic sheet 1 related total surface roughness of 4.7%. It can be seen clearly that the eddy current cutoff frequency is shifted towards higher values by the larger surface roughness. As low has been found when the relative to the thickness of the magnetic films 1, both-sided surface roughness of the top and bottom is> 3%.
  • throttles used in telecommunications are to be used.
  • the inductance L is A L x N 2 , where N is the number of turns.
  • the typical operating frequencies of such a choke are in the range of 20 kHz to 100 kHz, occasionally higher.
  • the smallest ferrite core currently available on the market is a MnZn ferrite toroid made by Taiyo Yuden with an outside diameter of 2.54 mm, an inside diameter of 1.27 mm and a height of 0.8 mm.
  • the toroidal core 3 with an outer diameter of 2.54 mm, an inner diameter of 1.8 mm and a height of 0.4 mm.
  • this toroidal core 3 has a twice as large inner hole, which allows either more turns or turns with increased conductor cross-section.
  • the same A L value can also be achieved with the ring core 3 with an outer diameter of 4.0 mm, an inner diameter of 2.85 mm and a height of 0.4 mm.
  • This ring core 3 has a larger by comparison with the ferrite core by a factor of 5 inner hole.
  • the overall height of the toroidal core can be 3 be further reduced.
  • the toroidal core 3 made of this alloy has a construction height which is smaller by a factor of 6.4.
  • ring cores 3 are used as S 0 transformer in PCMCIA cards.
  • S 0 transformers with a height of 2.2 mm are required, so that the permissible height of 3.3 mm for a PCMCIA card is not exceeded.
  • a maximum height of 1 mm is required.
  • a toroidal core 3 with an outer diameter of 8.6 mm an inner diameter of 3.1 mm and a height of 1 mm is required.
  • the previously used for this purpose toroidal cores are mechanically very sensitive and can therefore be produced only with a high reject rate.
  • One problem is, for example, the high winding offset, which does not meet the core height.
  • the ring cores 3 can be produced in a simple manner with high dimensional accuracy.
  • the amorphous or nanocrystalline alloys Through the use of the amorphous or nanocrystalline alloys, it is possible to achieve linear hysteresis loops with low losses and high permeability by means of suitable heat treatments in an external magnetic field. Moreover, due to the natural insulating surface layer of these alloys, it is contrary to crystalline alloy not necessary to isolate the magnetic films 1 by an additional insulating layer against each other. In addition, compared to crystalline alloys, the amorphous or nanocrystalline alloys have a higher resistivity, resulting in higher eddy current cutoff frequencies. Moreover, due to the manufacturing process, the amorphous and nanocrystalline alloys have a more or less strong natural surface roughness, which, however, can be further increased by grinding or etching. The thickness of the magnetic films 1 are between 5 and 40 microns. In extreme cases, the toroidal core 3 is formed by a single magnetic sheet 1. Thus, extremely low heights can be achieved with simultaneous, favorable high-frequency behavior.

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Coils Or Transformers For Communication (AREA)
  • Soft Magnetic Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Claims (11)

  1. Composant de faible hauteur pour des plaquettes de circuit imprimé comprenant une zone magnétique formée par au moins une couche d'un matériau magnétique doux,
    caractérisé en ce que
    la zone magnétique est formée par au moins un film magnétique doux (1) et
    la rugosité de surface de chaque film magnétique (1) est au moins égale à la profondeur de pénétration de peau à la fréquence d'utilisation.
  2. Composant selon la revendication 1,
    caractérisé en ce que
    les films magnétiques (1) sont fabriqués à partir d'un alliage nanocris-tallin ou amorphe.
  3. Composant selon la revendication 2,
    caractérisé en ce que
    la rugosité de surface de chaque film magnétique (1) par rapport à l'épaisseur est > 3 %.
  4. Composant selon l'une des revendications 1 à 3,
    caractérisé en ce que
    la zone magnétique est formée par une pluralité de films magnétiques collés les uns aux autres.
  5. Composant selon l'une des revendications 1 à 4,
    caractérisé en ce que
    les films magnétiques (1) sont isolés les uns des autres par des couches intermédiaires isolantes.
  6. Composant selon l'une des revendications 1 à 5,
    caractérisé en ce que
    les films magnétiques (1) sont annulaires.
  7. Composant selon la revendication 6,
    caractérisé en ce que
    les films magnétiques (1) annulaires présentent des fentes (4).
  8. Composant selon la revendication 7,
    caractérisé en ce que
    les fentes (4) sont disposées les unes sur les autres.
  9. Composant selon la revendication 7,
    caractérisé en ce que
    les fentes (4) sont disposées de manière décalée selon un angle.
  10. Composant selon l'une des revendications 1 à 9,
    caractérisé en ce que
    les films magnétiques empilés (1) sont intégrés dans une cuvette en matière plastique (5).
  11. Composant selon l'une des revendications 1 à 10,
    caractérisé en ce que
    les films magnétiques (1) empilés les uns sur les autres sont entourés par une couche polymère (6).
EP00910511A 1999-02-22 2000-02-01 Noyau magnetique plat Expired - Lifetime EP1155423B1 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE19907542A DE19907542C2 (de) 1999-02-22 1999-02-22 Flacher Magnetkern
DE19907542 1999-02-22
PCT/DE2000/000300 WO2000051146A1 (fr) 1999-02-22 2000-02-01 Noyau magnetique plat

Publications (2)

Publication Number Publication Date
EP1155423A1 EP1155423A1 (fr) 2001-11-21
EP1155423B1 true EP1155423B1 (fr) 2006-10-25

Family

ID=7898417

Family Applications (1)

Application Number Title Priority Date Filing Date
EP00910511A Expired - Lifetime EP1155423B1 (fr) 1999-02-22 2000-02-01 Noyau magnetique plat

Country Status (5)

Country Link
US (1) US6580348B1 (fr)
EP (1) EP1155423B1 (fr)
DE (2) DE19907542C2 (fr)
TW (1) TW493105B (fr)
WO (1) WO2000051146A1 (fr)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10134056B8 (de) * 2001-07-13 2014-05-28 Vacuumschmelze Gmbh & Co. Kg Verfahren zur Herstellung von nanokristallinen Magnetkernen sowie Vorrichtung zur Durchführung des Verfahrens
US6873239B2 (en) * 2002-11-01 2005-03-29 Metglas Inc. Bulk laminated amorphous metal inductive device
US7178755B2 (en) * 2003-07-30 2007-02-20 Lincoln Global, Inc Retainer ring for wire package
US7367452B1 (en) * 2004-06-22 2008-05-06 Lincoln Global, Inc. Retainer ring for a wire package and method of using the same
DE102004051129A1 (de) * 2004-10-18 2006-04-20 Siemens Ag Drossel, insbesondere zum Betrieb in einem Frequenzumrichtersystem, sowie Frequenzumrichtersystem
DE102005034486A1 (de) * 2005-07-20 2007-02-01 Vacuumschmelze Gmbh & Co. Kg Verfahren zur Herstellung eines weichmagnetischen Kerns für Generatoren sowie Generator mit einem derartigen Kern
DE102007001606A1 (de) * 2007-01-10 2008-07-17 Vacuumschmelze Gmbh & Co. Kg Anordnung zur Messung der Position eines Magneten relativ zu einem Magnetkern
US7771545B2 (en) * 2007-04-12 2010-08-10 General Electric Company Amorphous metal alloy having high tensile strength and electrical resistivity
KR20150143251A (ko) * 2014-06-13 2015-12-23 삼성전기주식회사 코어 및 이를 갖는 코일 부품
EP3312618B1 (fr) * 2016-10-18 2022-03-30 LEM International SA Transducteur de courant électrique

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT29331B (de) 1906-02-21 1907-07-25 Louis Detaine Turngerät.
US4144058A (en) 1974-09-12 1979-03-13 Allied Chemical Corporation Amorphous metal alloys composed of iron, nickel, phosphorus, boron and, optionally carbon
DE2924280A1 (de) 1979-06-15 1981-01-08 Vacuumschmelze Gmbh Amorphe weichmagnetische legierung
JPS5841649B2 (ja) * 1980-04-30 1983-09-13 株式会社東芝 巻鉄芯
JPS575314A (en) * 1980-06-11 1982-01-12 Mitsubishi Electric Corp Inductor
US4608297A (en) * 1982-04-21 1986-08-26 Showa Denka Kabushiki Kaisha Multilayer composite soft magnetic material comprising amorphous and insulating layers and a method for manufacturing the core of a magnetic head and a reactor
JPS6039160B2 (ja) 1982-07-22 1985-09-04 新日本製鐵株式会社 絶縁性、耐食性の優れた磁性アモルフアス合金材料
DE3244823A1 (de) 1982-12-03 1984-06-07 E. Blum GmbH & Co, 7143 Vaihingen Elektroblech zur herstellung von lamellierten eisenkernen fuer statische oder dynamische elektrische maschinen
FR2560711B1 (fr) * 1984-03-02 1987-03-20 Metalimphy Circuit magnetique composite et procede de fabrication dudit circuit
DE3503019C2 (de) * 1985-01-30 1994-10-06 Blum Gmbh & Co E Elektroblech zur Herstellung von aus einer Vielzahl von Blechlagen bestehenden Eisenkernen für elektrische Geräte
US4881989A (en) 1986-12-15 1989-11-21 Hitachi Metals, Ltd. Fe-base soft magnetic alloy and method of producing same
US4882834A (en) * 1987-04-27 1989-11-28 Armco Advanced Materials Corporation Forming a laminate by applying pressure to remove excess sealing liquid between facing surfaces laminations
DE3926556A1 (de) * 1989-08-11 1991-02-14 Renk Ag Axialdrucklager mit gleitschuhen
ATE146008T1 (de) * 1990-09-28 1996-12-15 Mitsui Petrochemical Ind Verfahren zur geräuschverminderung in einem magnetkern
DE4310401A1 (de) * 1993-03-31 1994-10-06 Vacuumschmelze Gmbh Verfahren zur Umhüllung eines Ringkerns als Kantenschutz
JP3027081B2 (ja) 1993-12-09 2000-03-27 アルプス電気株式会社 薄膜素子
JP3482046B2 (ja) * 1995-09-28 2003-12-22 株式会社東芝 平面磁気素子およびそれを用いた平面磁気デバイス
TW306006B (fr) * 1995-10-09 1997-05-21 Kawasaki Steel Co
JPH09246034A (ja) * 1996-03-07 1997-09-19 Alps Electric Co Ltd パルストランス磁心
TW342506B (en) * 1996-10-11 1998-10-11 Matsushita Electric Ind Co Ltd Inductance device and wireless terminal equipment
TW455631B (en) * 1997-08-28 2001-09-21 Alps Electric Co Ltd Bulky magnetic core and laminated magnetic core
US6469259B2 (en) * 2000-02-29 2002-10-22 Kyocera Corporation Wiring board
US6818907B2 (en) * 2000-10-17 2004-11-16 The President And Fellows Of Harvard College Surface plasmon enhanced illumination system

Also Published As

Publication number Publication date
EP1155423A1 (fr) 2001-11-21
DE19907542A1 (de) 2000-08-31
US6580348B1 (en) 2003-06-17
WO2000051146A1 (fr) 2000-08-31
DE50013663D1 (de) 2006-12-07
TW493105B (en) 2002-07-01
DE19907542C2 (de) 2003-07-31

Similar Documents

Publication Publication Date Title
DE68925171T2 (de) Planar-Induktivität
DE4306655C2 (de) Verfahren zum Herstellen eines planaren Induktionselements
DE60013402T2 (de) Verfahren zum behandeln eines dünnen und zerbrechlichen metallbandes und aus einem nanokristallinen legierungsband hergestellte magnetische werkstücke
DE4117878C2 (de) Planares magnetisches Element
DE69104671T2 (de) Strukturen von Dünnschichten für Magnetköpfe.
WO2004066438A1 (fr) Noyau d'antenne
EP1155423B1 (fr) Noyau magnetique plat
DE69200169T2 (de) Magnetresistive Materialien.
DE69813093T2 (de) Amorphes Magnetmaterial und Magnetkern davon
DE19700506A1 (de) Magnetisches Speichermedium
DE4322698A1 (de) Dünnfilm-Magnetkopf
DE3888287T2 (de) Film-Magnetkopf.
DE10302646B4 (de) Antennenkern und Verfahren zum Herstellen eines Antennenkerns
DE69714103T2 (de) Magnetkern für Impulsübertrager
DE3703561A1 (de) Induktives bauelement
DE102022105016A1 (de) Magnetsensor
DE3435519C2 (fr)
DE2917388C2 (fr)
DE3879518T2 (de) Elektronisches bauelement mit rollenfolie und sein herstellungsverfahren.
DE69828073T2 (de) Verfahren zur erhöhung der arbeitsfrequenz eines magnetkreises und korrespondierender magnetkreis
EP1188235B1 (fr) Branche passe-haut d'un diplexeur pour systemes lnpa
DE102022105014A1 (de) Magnetsensor
DE112020006325T5 (de) Magnetsensor
DE69308596T2 (de) Verfahren zur bestimmung von intrinsieken magnetischen permeabilität von langgestreckten ferromagnetischen elementen
DE102021129807A1 (de) Magnetsensor

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 20010822

AK Designated contracting states

Kind code of ref document: A1

Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE

RBV Designated contracting states (corrected)

Designated state(s): DE FR GB IT

GRAP Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOSNIGR1

GRAS Grant fee paid

Free format text: ORIGINAL CODE: EPIDOSNIGR3

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): DE FR GB IT

REG Reference to a national code

Ref country code: GB

Ref legal event code: FG4D

Free format text: NOT ENGLISH

REF Corresponds to:

Ref document number: 50013663

Country of ref document: DE

Date of ref document: 20061207

Kind code of ref document: P

GBT Gb: translation of ep patent filed (gb section 77(6)(a)/1977)

Effective date: 20070122

ET Fr: translation filed
PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

26N No opposition filed

Effective date: 20070726

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: IT

Payment date: 20100226

Year of fee payment: 11

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: GB

Payment date: 20100219

Year of fee payment: 11

GBPC Gb: european patent ceased through non-payment of renewal fee

Effective date: 20110201

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: IT

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20110201

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: GB

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20110201

REG Reference to a national code

Ref country code: FR

Ref legal event code: PLFP

Year of fee payment: 16

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: FR

Payment date: 20150217

Year of fee payment: 16

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: DE

Payment date: 20160330

Year of fee payment: 17

REG Reference to a national code

Ref country code: FR

Ref legal event code: ST

Effective date: 20161028

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: FR

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20160229

REG Reference to a national code

Ref country code: DE

Ref legal event code: R119

Ref document number: 50013663

Country of ref document: DE

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: DE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20170901