EP0769799B1
(de)
*
|
1995-10-19 |
2010-02-17 |
Hitachi, Ltd. |
Rasterelektronenmikroskop
|
US5981947A
(en)
*
|
1997-02-03 |
1999-11-09 |
Nikon Corporation |
Apparatus for detecting or collecting secondary electrons, charged-particle beam exposure apparatus comprising same, and related methods
|
JP3434165B2
(ja)
*
|
1997-04-18 |
2003-08-04 |
株式会社日立製作所 |
走査電子顕微鏡
|
JP3514070B2
(ja)
*
|
1997-04-25 |
2004-03-31 |
株式会社日立製作所 |
走査電子顕微鏡
|
US6504393B1
(en)
*
|
1997-07-15 |
2003-01-07 |
Applied Materials, Inc. |
Methods and apparatus for testing semiconductor and integrated circuit structures
|
DE19732093B4
(de)
|
1997-07-25 |
2008-09-25 |
Carl Zeiss Nts Gmbh |
Korpuskularstrahlgerät
|
JP3564958B2
(ja)
*
|
1997-08-07 |
2004-09-15 |
株式会社日立製作所 |
電子ビームを用いた検査方法及び検査装置
|
JPH1167139A
(ja)
*
|
1997-08-25 |
1999-03-09 |
Hitachi Ltd |
走査電子顕微鏡
|
GB9719417D0
(en)
*
|
1997-09-13 |
1997-11-12 |
Univ York |
Electron microscope
|
AU748781B2
(en)
*
|
1997-12-08 |
2002-06-13 |
Fei Company |
Environmental SEM with a magnetic field for improved secondary electron detection
|
WO1999046798A1
(fr)
*
|
1998-03-09 |
1999-09-16 |
Hitachi, Ltd. |
Microscope electronique a balayage
|
DE19828476A1
(de)
|
1998-06-26 |
1999-12-30 |
Leo Elektronenmikroskopie Gmbh |
Teilchenstrahlgerät
|
JP4300710B2
(ja)
|
1998-09-25 |
2009-07-22 |
株式会社日立製作所 |
走査形電子顕微鏡
|
US6300629B1
(en)
*
|
1998-09-30 |
2001-10-09 |
Applied Materials, Inc. |
Defect review SEM with automatically switchable detector
|
JP4236742B2
(ja)
*
|
1998-10-29 |
2009-03-11 |
株式会社日立製作所 |
走査形電子顕微鏡
|
US6252412B1
(en)
|
1999-01-08 |
2001-06-26 |
Schlumberger Technologies, Inc. |
Method of detecting defects in patterned substrates
|
US6414308B1
(en)
*
|
1999-03-12 |
2002-07-02 |
International Business Machines Corporation |
Method for determining opened/unopened semiconductor contacts using a scanning electron microscope
|
EP1049132B1
(de)
*
|
1999-03-31 |
2002-06-12 |
Advantest Corporation |
Verfahren und Vorrichtung zur Abbildung eines Oberflächenpotentials
|
US6642520B2
(en)
|
1999-04-13 |
2003-11-04 |
Kabushiki Kaisha Topcon |
Scanning electron microscope
|
JP4727777B2
(ja)
|
1999-05-24 |
2011-07-20 |
株式会社日立製作所 |
走査形電子顕微鏡による測長方法
|
JP2001110351A
(ja)
*
|
1999-10-05 |
2001-04-20 |
Hitachi Ltd |
走査電子顕微鏡
|
JP2001119006A
(ja)
*
|
1999-10-19 |
2001-04-27 |
Sony Corp |
撮像デバイス及びその製造方法
|
DE69943203D1
(de)
*
|
1999-10-29 |
2011-03-31 |
Hitachi Ltd |
Elektronenstrahlvorrichtung
|
US6787772B2
(en)
|
2000-01-25 |
2004-09-07 |
Hitachi, Ltd. |
Scanning electron microscope
|
DE10012314A1
(de)
*
|
2000-03-14 |
2001-09-20 |
Leo Elektronenmikroskopie Gmbh |
Detektorsystem für ein Korpuskularstrahlgerät und Korpuskularstrahlgerät mit einem solchen Detektorsystem
|
US6847038B2
(en)
*
|
2002-07-15 |
2005-01-25 |
Hitachi, Ltd. |
Scanning electron microscope
|
DE60042758D1
(de)
|
2000-03-31 |
2009-09-24 |
Hitachi Ltd |
Abtast-elektronenmikroskop
|
DE60143751D1
(de)
*
|
2000-04-24 |
2011-02-10 |
Fei Co |
Sammeln von sekundärelektronen durch die objektivl
|
JP4290316B2
(ja)
*
|
2000-05-11 |
2009-07-01 |
Necエレクトロニクス株式会社 |
配線ショート箇所の検査方法及び検査装置
|
DE60038007T2
(de)
*
|
2000-05-31 |
2008-05-29 |
Advantest Corporation |
Teilchenstrahlgerät
|
WO2001097245A2
(en)
|
2000-06-15 |
2001-12-20 |
Kla-Tencor, Inc. |
Sectored magnetic lens and method of use
|
US6891167B2
(en)
*
|
2000-06-15 |
2005-05-10 |
Kla-Tencor Technologies |
Apparatus and method for applying feedback control to a magnetic lens
|
US6545277B1
(en)
*
|
2000-08-15 |
2003-04-08 |
Applied Materials, Inc. |
High efficiency, enhanced detecting in-lens light guide scintillator detector for SEM
|
JP3987276B2
(ja)
*
|
2000-10-12 |
2007-10-03 |
株式会社日立製作所 |
試料像形成方法
|
JP2003068241A
(ja)
*
|
2000-11-08 |
2003-03-07 |
Seiko Instruments Inc |
走査型電子線装置
|
JP2002175971A
(ja)
*
|
2000-12-08 |
2002-06-21 |
Nikon Corp |
磁気レンズ、磁気シールド体の製造方法、荷電粒子線露光装置及び半導体デバイスの製造方法
|
GB2374723B
(en)
*
|
2001-04-20 |
2005-04-20 |
Leo Electron Microscopy Ltd |
Scanning electron microscope
|
US6946656B2
(en)
*
|
2001-07-12 |
2005-09-20 |
Hitachi, Ltd. |
Sample electrification measurement method and charged particle beam apparatus
|
EP1288996B1
(de)
*
|
2001-09-04 |
2006-03-22 |
Advantest Corporation |
Teilchenstrahlgerät
|
US7236847B2
(en)
*
|
2002-01-16 |
2007-06-26 |
Kla-Tencor Technologies Corp. |
Systems and methods for closed loop defect reduction
|
US6674075B2
(en)
*
|
2002-05-13 |
2004-01-06 |
Applied Materials, Inc. |
Charged particle beam apparatus and method for inspecting samples
|
JP2003331770A
(ja)
*
|
2002-05-15 |
2003-11-21 |
Seiko Instruments Inc |
電子線装置
|
US7223974B2
(en)
*
|
2002-05-22 |
2007-05-29 |
Applied Materials, Israel, Ltd. |
Charged particle beam column and method for directing a charged particle beam
|
US7352133B2
(en)
*
|
2002-08-05 |
2008-04-01 |
Semiconductor Energy Laboratory Co., Ltd. |
Light emitting device
|
US6825475B2
(en)
*
|
2002-09-19 |
2004-11-30 |
Applied Materials Israel, Ltd. |
Deflection method and system for use in a charged particle beam column
|
US7528614B2
(en)
*
|
2004-12-22 |
2009-05-05 |
Applied Materials, Inc. |
Apparatus and method for voltage contrast analysis of a wafer using a tilted pre-charging beam
|
DE10301579A1
(de)
*
|
2003-01-16 |
2004-07-29 |
Leo Elektronenmikroskopie Gmbh |
Elektronenstrahlgerät und Detektoranordnung
|
US6735279B1
(en)
*
|
2003-01-21 |
2004-05-11 |
University Of Florida |
Snapshot backscatter radiography system and protocol
|
US6979820B2
(en)
*
|
2003-07-29 |
2005-12-27 |
Taiwan Semiconductor Manufacturing Co., Ltd. |
CD SEM automatic focus methodology and apparatus for constant electron beam dosage control
|
US7847267B2
(en)
*
|
2003-07-30 |
2010-12-07 |
Applied Materials Israel, Ltd. |
Scanning electron microscope having multiple detectors and a method for multiple detector based imaging
|
US7786452B2
(en)
*
|
2003-10-16 |
2010-08-31 |
Alis Corporation |
Ion sources, systems and methods
|
US7786451B2
(en)
*
|
2003-10-16 |
2010-08-31 |
Alis Corporation |
Ion sources, systems and methods
|
US9159527B2
(en)
*
|
2003-10-16 |
2015-10-13 |
Carl Zeiss Microscopy, Llc |
Systems and methods for a gas field ionization source
|
US8110814B2
(en)
|
2003-10-16 |
2012-02-07 |
Alis Corporation |
Ion sources, systems and methods
|
US7842933B2
(en)
*
|
2003-10-22 |
2010-11-30 |
Applied Materials Israel, Ltd. |
System and method for measuring overlay errors
|
US7112803B2
(en)
*
|
2004-07-23 |
2006-09-26 |
Applied Materials, Israel, Ltd. |
Beam directing system and method for use in a charged particle beam column
|
JP4519567B2
(ja)
|
2004-08-11 |
2010-08-04 |
株式会社日立ハイテクノロジーズ |
走査型電子顕微鏡およびこれを用いた試料観察方法
|
JP4708854B2
(ja)
*
|
2005-05-13 |
2011-06-22 |
株式会社日立ハイテクノロジーズ |
荷電粒子線装置
|
US7241991B1
(en)
*
|
2005-08-30 |
2007-07-10 |
Kla-Tencor Technologies Corporation |
Region-of-interest based electron beam metrology
|
US20070090288A1
(en)
*
|
2005-10-20 |
2007-04-26 |
Dror Shemesh |
Method and system for enhancing resolution of a scanning electron microscope
|
WO2007060017A2
(en)
*
|
2005-11-28 |
2007-05-31 |
Carl Zeiss Smt Ag |
Particle-optical component
|
US7875851B1
(en)
*
|
2006-05-01 |
2011-01-25 |
Advanced Micro Devices, Inc. |
Advanced process control framework using two-dimensional image analysis
|
US7804068B2
(en)
*
|
2006-11-15 |
2010-09-28 |
Alis Corporation |
Determining dopant information
|
JP5097512B2
(ja)
*
|
2006-11-21 |
2012-12-12 |
株式会社日立ハイテクノロジーズ |
荷電粒子ビーム用軌道補正器、及び荷電粒子ビーム装置
|
JP4801573B2
(ja)
*
|
2006-12-11 |
2011-10-26 |
株式会社日立ハイテクノロジーズ |
走査電子顕微鏡
|
JP5054990B2
(ja)
*
|
2007-01-30 |
2012-10-24 |
株式会社日立ハイテクノロジーズ |
走査形電子顕微鏡
|
US7872236B2
(en)
|
2007-01-30 |
2011-01-18 |
Hermes Microvision, Inc. |
Charged particle detection devices
|
WO2009014811A2
(en)
*
|
2007-06-08 |
2009-01-29 |
Carl Zeiss Smt, Inc. |
Ice layers in charged particle systems and methods
|
US7601955B2
(en)
*
|
2007-09-04 |
2009-10-13 |
Visera Technologies Company Limited |
Scanning electron microscope
|
US20090246171A1
(en)
*
|
2008-03-27 |
2009-10-01 |
Van Antwerp William P |
Automatic system for dose control in treating hepatitis c using infusion pumps
|
EP2288905A2
(de)
*
|
2008-06-02 |
2011-03-02 |
Carl Zeiss NTS, LLC. |
Elektronendetektionssysteme und verfahren
|
JP2010055756A
(ja)
*
|
2008-08-26 |
2010-03-11 |
Hitachi High-Technologies Corp |
荷電粒子線の照射方法及び荷電粒子線装置
|
JP5164754B2
(ja)
*
|
2008-09-08 |
2013-03-21 |
株式会社日立ハイテクノロジーズ |
走査型荷電粒子顕微鏡装置及び走査型荷電粒子顕微鏡装置で取得した画像の処理方法
|
US7960697B2
(en)
|
2008-10-23 |
2011-06-14 |
Hermes-Microvision, Inc. |
Electron beam apparatus
|
US7919760B2
(en)
*
|
2008-12-09 |
2011-04-05 |
Hermes-Microvision, Inc. |
Operation stage for wafer edge inspection and review
|
JP5280174B2
(ja)
*
|
2008-12-10 |
2013-09-04 |
日本電子株式会社 |
電子線装置及び電子線装置の動作方法
|
US8094924B2
(en)
*
|
2008-12-15 |
2012-01-10 |
Hermes-Microvision, Inc. |
E-beam defect review system
|
DE112011102731T5
(de)
|
2010-08-18 |
2013-08-22 |
Hitachi High-Technologies Corporation |
Elektronenstrahlvorrichtung
|
US9046475B2
(en)
|
2011-05-19 |
2015-06-02 |
Applied Materials Israel, Ltd. |
High electron energy based overlay error measurement methods and systems
|
JP5860642B2
(ja)
*
|
2011-09-07 |
2016-02-16 |
株式会社日立ハイテクノロジーズ |
走査電子顕微鏡
|
JP5814741B2
(ja)
*
|
2011-10-20 |
2015-11-17 |
株式会社日立ハイテクノロジーズ |
走査電子顕微鏡
|
JP6046046B2
(ja)
|
2011-11-02 |
2016-12-14 |
株式会社東芝 |
固体シンチレータおよびそれを用いた電子線検出器
|
US8759764B2
(en)
*
|
2012-06-29 |
2014-06-24 |
Fei Company |
On-axis detector for charged particle beam system
|
DE102014221279A1
(de)
|
2014-10-21 |
2016-04-21 |
Bayerische Motoren Werke Aktiengesellschaft |
Kompositelektrode und diese umfassende Lithiumionenbatterie sowie Verwendung der Lithiumionenbatterie in einem Kraftfahrzeug
|
DE102014226390A1
(de)
|
2014-12-18 |
2016-06-23 |
Bayerische Motoren Werke Aktiengesellschaft |
Kompositanode und diese umfassende Lithiumionenbatterie sowie Verfahren zur Herstellung der Kompositanode
|
DE102014226396A1
(de)
|
2014-12-18 |
2016-06-23 |
Bayerische Motoren Werke Aktiengesellschaft |
Kompositkathode und diese umfassende Lithiumionenbatterie sowie Verfahren zur Herstellung der Kompositkathode
|
DE102015200758A1
(de)
|
2015-01-20 |
2016-07-21 |
Bayerische Motoren Werke Aktiengesellschaft |
Kompositelektrode und diese umfassende Lithiumionenbatterie sowie Verfahren zur Herstellung der Kompositelektrode
|
DE102015201409A1
(de)
|
2015-01-28 |
2016-07-28 |
Bayerische Motoren Werke Aktiengesellschaft |
Komposit-Separator und diesen umfassende Lithiumionenbatterie sowie Verfahren zur Herstellung des Komposit-Separators
|
JP6177817B2
(ja)
|
2015-01-30 |
2017-08-09 |
松定プレシジョン株式会社 |
荷電粒子線装置及び走査電子顕微鏡
|
JP2018174016A
(ja)
|
2015-07-29 |
2018-11-08 |
株式会社日立ハイテクノロジーズ |
荷電粒子線装置
|
US10497535B2
(en)
|
2015-12-03 |
2019-12-03 |
Matsusada Precision, Inc. |
Charged particle beam device and scanning electron microscope
|
CZ2016597A3
(cs)
|
2016-09-26 |
2018-05-02 |
Tescan Brno, S.R.O. |
Objektivová čočka pro zařízení využívající nejméně jednoho svazku nabitých částic
|
US11861716B1
(en)
|
2016-10-27 |
2024-01-02 |
State Farm Mutual Automobile Insurance Company |
Systems and methods for utilizing electricity monitoring devices to reconstruct an electrical event
|
WO2018163240A1
(ja)
*
|
2017-03-06 |
2018-09-13 |
株式会社日立ハイテクノロジーズ |
荷電粒子線装置
|
US11139144B2
(en)
|
2017-03-24 |
2021-10-05 |
Hitachi High-Tech Corporation |
Charged particle beam apparatus
|
US10896802B2
(en)
|
2017-12-27 |
2021-01-19 |
Fei Company |
Combined SEM-CL and FIB-IOE microscopy
|
US10692694B2
(en)
*
|
2017-12-27 |
2020-06-23 |
Fei Company |
Method and apparatus for enhancing SE detection in mirror-based light imaging charged particle microscopes
|
US10395887B1
(en)
*
|
2018-02-20 |
2019-08-27 |
Technische Universiteit Delft |
Apparatus and method for inspecting a surface of a sample, using a multi-beam charged particle column
|
US10770262B1
(en)
*
|
2018-05-30 |
2020-09-08 |
National Technology & Engineering Solutions Of Sandia, Llc |
Apparatus, method and system for imaging and utilization of SEM charged particles
|
CN112889127B
(zh)
*
|
2018-10-19 |
2024-12-13 |
Asml荷兰有限公司 |
用于对准多束检查装置中的电子束的系统和方法
|
US20220359149A1
(en)
*
|
2019-07-02 |
2022-11-10 |
Hitachi High-Tech Corporation |
Charged particle beam device
|
JP7396954B2
(ja)
*
|
2020-04-01 |
2023-12-12 |
株式会社日立ハイテク |
荷電粒子線装置
|
WO2021204740A1
(en)
*
|
2020-04-10 |
2021-10-14 |
Asml Netherlands B.V. |
Charged particle beam apparatus with multiple detectors and methods for imaging
|
CN114220725B
(zh)
|
2020-12-02 |
2024-05-07 |
聚束科技(北京)有限公司 |
一种电子显微镜
|
JP7647271B2
(ja)
*
|
2021-04-13 |
2025-03-18 |
株式会社ニューフレアテクノロジー |
荷電粒子ビーム描画装置
|
DE102023127825A1
(de)
|
2023-10-11 |
2025-04-17 |
Carl Zeiss Microscopy Gmbh |
Elektronenstrahlmikroskop
|