[go: up one dir, main page]

DE69638126D1 - Rasterelektronenmikroskop - Google Patents

Rasterelektronenmikroskop

Info

Publication number
DE69638126D1
DE69638126D1 DE69638126T DE69638126T DE69638126D1 DE 69638126 D1 DE69638126 D1 DE 69638126D1 DE 69638126 T DE69638126 T DE 69638126T DE 69638126 T DE69638126 T DE 69638126T DE 69638126 D1 DE69638126 D1 DE 69638126D1
Authority
DE
Germany
Prior art keywords
electron microscope
scanning electron
scanning
microscope
electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69638126T
Other languages
English (en)
Inventor
Hideo Todokoro
Makoto Ezumi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Application granted granted Critical
Publication of DE69638126D1 publication Critical patent/DE69638126D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/244Detectors; Associated components or circuits therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10Lenses
    • H01J37/145Combinations of electrostatic and magnetic lenses
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/266Measurement of magnetic or electric fields in the object; Lorentzmicroscopy
    • H01J37/268Measurement of magnetic or electric fields in the object; Lorentzmicroscopy with scanning beams
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04Means for controlling the discharge
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04Means for controlling the discharge
    • H01J2237/047Changing particle velocity
    • H01J2237/0475Changing particle velocity decelerating
    • H01J2237/04756Changing particle velocity decelerating with electrostatic means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244Detection characterized by the detecting means
    • H01J2237/2449Detector devices with moving charges in electric or magnetic fields

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
DE69638126T 1995-10-19 1996-10-15 Rasterelektronenmikroskop Expired - Lifetime DE69638126D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27146095 1995-10-19

Publications (1)

Publication Number Publication Date
DE69638126D1 true DE69638126D1 (de) 2010-04-01

Family

ID=17500350

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69638126T Expired - Lifetime DE69638126D1 (de) 1995-10-19 1996-10-15 Rasterelektronenmikroskop

Country Status (3)

Country Link
US (4) US5872358A (de)
EP (1) EP0769799B1 (de)
DE (1) DE69638126D1 (de)

Families Citing this family (106)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0769799B1 (de) * 1995-10-19 2010-02-17 Hitachi, Ltd. Rasterelektronenmikroskop
US5981947A (en) * 1997-02-03 1999-11-09 Nikon Corporation Apparatus for detecting or collecting secondary electrons, charged-particle beam exposure apparatus comprising same, and related methods
JP3434165B2 (ja) * 1997-04-18 2003-08-04 株式会社日立製作所 走査電子顕微鏡
JP3514070B2 (ja) * 1997-04-25 2004-03-31 株式会社日立製作所 走査電子顕微鏡
US6504393B1 (en) * 1997-07-15 2003-01-07 Applied Materials, Inc. Methods and apparatus for testing semiconductor and integrated circuit structures
DE19732093B4 (de) 1997-07-25 2008-09-25 Carl Zeiss Nts Gmbh Korpuskularstrahlgerät
JP3564958B2 (ja) * 1997-08-07 2004-09-15 株式会社日立製作所 電子ビームを用いた検査方法及び検査装置
JPH1167139A (ja) * 1997-08-25 1999-03-09 Hitachi Ltd 走査電子顕微鏡
GB9719417D0 (en) * 1997-09-13 1997-11-12 Univ York Electron microscope
AU748781B2 (en) * 1997-12-08 2002-06-13 Fei Company Environmental SEM with a magnetic field for improved secondary electron detection
WO1999046798A1 (fr) * 1998-03-09 1999-09-16 Hitachi, Ltd. Microscope electronique a balayage
DE19828476A1 (de) 1998-06-26 1999-12-30 Leo Elektronenmikroskopie Gmbh Teilchenstrahlgerät
JP4300710B2 (ja) 1998-09-25 2009-07-22 株式会社日立製作所 走査形電子顕微鏡
US6300629B1 (en) * 1998-09-30 2001-10-09 Applied Materials, Inc. Defect review SEM with automatically switchable detector
JP4236742B2 (ja) * 1998-10-29 2009-03-11 株式会社日立製作所 走査形電子顕微鏡
US6252412B1 (en) 1999-01-08 2001-06-26 Schlumberger Technologies, Inc. Method of detecting defects in patterned substrates
US6414308B1 (en) * 1999-03-12 2002-07-02 International Business Machines Corporation Method for determining opened/unopened semiconductor contacts using a scanning electron microscope
EP1049132B1 (de) * 1999-03-31 2002-06-12 Advantest Corporation Verfahren und Vorrichtung zur Abbildung eines Oberflächenpotentials
US6642520B2 (en) 1999-04-13 2003-11-04 Kabushiki Kaisha Topcon Scanning electron microscope
JP4727777B2 (ja) 1999-05-24 2011-07-20 株式会社日立製作所 走査形電子顕微鏡による測長方法
JP2001110351A (ja) * 1999-10-05 2001-04-20 Hitachi Ltd 走査電子顕微鏡
JP2001119006A (ja) * 1999-10-19 2001-04-27 Sony Corp 撮像デバイス及びその製造方法
DE69943203D1 (de) * 1999-10-29 2011-03-31 Hitachi Ltd Elektronenstrahlvorrichtung
US6787772B2 (en) 2000-01-25 2004-09-07 Hitachi, Ltd. Scanning electron microscope
DE10012314A1 (de) * 2000-03-14 2001-09-20 Leo Elektronenmikroskopie Gmbh Detektorsystem für ein Korpuskularstrahlgerät und Korpuskularstrahlgerät mit einem solchen Detektorsystem
US6847038B2 (en) * 2002-07-15 2005-01-25 Hitachi, Ltd. Scanning electron microscope
DE60042758D1 (de) 2000-03-31 2009-09-24 Hitachi Ltd Abtast-elektronenmikroskop
DE60143751D1 (de) * 2000-04-24 2011-02-10 Fei Co Sammeln von sekundärelektronen durch die objektivl
JP4290316B2 (ja) * 2000-05-11 2009-07-01 Necエレクトロニクス株式会社 配線ショート箇所の検査方法及び検査装置
DE60038007T2 (de) * 2000-05-31 2008-05-29 Advantest Corporation Teilchenstrahlgerät
WO2001097245A2 (en) 2000-06-15 2001-12-20 Kla-Tencor, Inc. Sectored magnetic lens and method of use
US6891167B2 (en) * 2000-06-15 2005-05-10 Kla-Tencor Technologies Apparatus and method for applying feedback control to a magnetic lens
US6545277B1 (en) * 2000-08-15 2003-04-08 Applied Materials, Inc. High efficiency, enhanced detecting in-lens light guide scintillator detector for SEM
JP3987276B2 (ja) * 2000-10-12 2007-10-03 株式会社日立製作所 試料像形成方法
JP2003068241A (ja) * 2000-11-08 2003-03-07 Seiko Instruments Inc 走査型電子線装置
JP2002175971A (ja) * 2000-12-08 2002-06-21 Nikon Corp 磁気レンズ、磁気シールド体の製造方法、荷電粒子線露光装置及び半導体デバイスの製造方法
GB2374723B (en) * 2001-04-20 2005-04-20 Leo Electron Microscopy Ltd Scanning electron microscope
US6946656B2 (en) * 2001-07-12 2005-09-20 Hitachi, Ltd. Sample electrification measurement method and charged particle beam apparatus
EP1288996B1 (de) * 2001-09-04 2006-03-22 Advantest Corporation Teilchenstrahlgerät
US7236847B2 (en) * 2002-01-16 2007-06-26 Kla-Tencor Technologies Corp. Systems and methods for closed loop defect reduction
US6674075B2 (en) * 2002-05-13 2004-01-06 Applied Materials, Inc. Charged particle beam apparatus and method for inspecting samples
JP2003331770A (ja) * 2002-05-15 2003-11-21 Seiko Instruments Inc 電子線装置
US7223974B2 (en) * 2002-05-22 2007-05-29 Applied Materials, Israel, Ltd. Charged particle beam column and method for directing a charged particle beam
US7352133B2 (en) * 2002-08-05 2008-04-01 Semiconductor Energy Laboratory Co., Ltd. Light emitting device
US6825475B2 (en) * 2002-09-19 2004-11-30 Applied Materials Israel, Ltd. Deflection method and system for use in a charged particle beam column
US7528614B2 (en) * 2004-12-22 2009-05-05 Applied Materials, Inc. Apparatus and method for voltage contrast analysis of a wafer using a tilted pre-charging beam
DE10301579A1 (de) * 2003-01-16 2004-07-29 Leo Elektronenmikroskopie Gmbh Elektronenstrahlgerät und Detektoranordnung
US6735279B1 (en) * 2003-01-21 2004-05-11 University Of Florida Snapshot backscatter radiography system and protocol
US6979820B2 (en) * 2003-07-29 2005-12-27 Taiwan Semiconductor Manufacturing Co., Ltd. CD SEM automatic focus methodology and apparatus for constant electron beam dosage control
US7847267B2 (en) * 2003-07-30 2010-12-07 Applied Materials Israel, Ltd. Scanning electron microscope having multiple detectors and a method for multiple detector based imaging
US7786452B2 (en) * 2003-10-16 2010-08-31 Alis Corporation Ion sources, systems and methods
US7786451B2 (en) * 2003-10-16 2010-08-31 Alis Corporation Ion sources, systems and methods
US9159527B2 (en) * 2003-10-16 2015-10-13 Carl Zeiss Microscopy, Llc Systems and methods for a gas field ionization source
US8110814B2 (en) 2003-10-16 2012-02-07 Alis Corporation Ion sources, systems and methods
US7842933B2 (en) * 2003-10-22 2010-11-30 Applied Materials Israel, Ltd. System and method for measuring overlay errors
US7112803B2 (en) * 2004-07-23 2006-09-26 Applied Materials, Israel, Ltd. Beam directing system and method for use in a charged particle beam column
JP4519567B2 (ja) 2004-08-11 2010-08-04 株式会社日立ハイテクノロジーズ 走査型電子顕微鏡およびこれを用いた試料観察方法
JP4708854B2 (ja) * 2005-05-13 2011-06-22 株式会社日立ハイテクノロジーズ 荷電粒子線装置
US7241991B1 (en) * 2005-08-30 2007-07-10 Kla-Tencor Technologies Corporation Region-of-interest based electron beam metrology
US20070090288A1 (en) * 2005-10-20 2007-04-26 Dror Shemesh Method and system for enhancing resolution of a scanning electron microscope
WO2007060017A2 (en) * 2005-11-28 2007-05-31 Carl Zeiss Smt Ag Particle-optical component
US7875851B1 (en) * 2006-05-01 2011-01-25 Advanced Micro Devices, Inc. Advanced process control framework using two-dimensional image analysis
US7804068B2 (en) * 2006-11-15 2010-09-28 Alis Corporation Determining dopant information
JP5097512B2 (ja) * 2006-11-21 2012-12-12 株式会社日立ハイテクノロジーズ 荷電粒子ビーム用軌道補正器、及び荷電粒子ビーム装置
JP4801573B2 (ja) * 2006-12-11 2011-10-26 株式会社日立ハイテクノロジーズ 走査電子顕微鏡
JP5054990B2 (ja) * 2007-01-30 2012-10-24 株式会社日立ハイテクノロジーズ 走査形電子顕微鏡
US7872236B2 (en) 2007-01-30 2011-01-18 Hermes Microvision, Inc. Charged particle detection devices
WO2009014811A2 (en) * 2007-06-08 2009-01-29 Carl Zeiss Smt, Inc. Ice layers in charged particle systems and methods
US7601955B2 (en) * 2007-09-04 2009-10-13 Visera Technologies Company Limited Scanning electron microscope
US20090246171A1 (en) * 2008-03-27 2009-10-01 Van Antwerp William P Automatic system for dose control in treating hepatitis c using infusion pumps
EP2288905A2 (de) * 2008-06-02 2011-03-02 Carl Zeiss NTS, LLC. Elektronendetektionssysteme und verfahren
JP2010055756A (ja) * 2008-08-26 2010-03-11 Hitachi High-Technologies Corp 荷電粒子線の照射方法及び荷電粒子線装置
JP5164754B2 (ja) * 2008-09-08 2013-03-21 株式会社日立ハイテクノロジーズ 走査型荷電粒子顕微鏡装置及び走査型荷電粒子顕微鏡装置で取得した画像の処理方法
US7960697B2 (en) 2008-10-23 2011-06-14 Hermes-Microvision, Inc. Electron beam apparatus
US7919760B2 (en) * 2008-12-09 2011-04-05 Hermes-Microvision, Inc. Operation stage for wafer edge inspection and review
JP5280174B2 (ja) * 2008-12-10 2013-09-04 日本電子株式会社 電子線装置及び電子線装置の動作方法
US8094924B2 (en) * 2008-12-15 2012-01-10 Hermes-Microvision, Inc. E-beam defect review system
DE112011102731T5 (de) 2010-08-18 2013-08-22 Hitachi High-Technologies Corporation Elektronenstrahlvorrichtung
US9046475B2 (en) 2011-05-19 2015-06-02 Applied Materials Israel, Ltd. High electron energy based overlay error measurement methods and systems
JP5860642B2 (ja) * 2011-09-07 2016-02-16 株式会社日立ハイテクノロジーズ 走査電子顕微鏡
JP5814741B2 (ja) * 2011-10-20 2015-11-17 株式会社日立ハイテクノロジーズ 走査電子顕微鏡
JP6046046B2 (ja) 2011-11-02 2016-12-14 株式会社東芝 固体シンチレータおよびそれを用いた電子線検出器
US8759764B2 (en) * 2012-06-29 2014-06-24 Fei Company On-axis detector for charged particle beam system
DE102014221279A1 (de) 2014-10-21 2016-04-21 Bayerische Motoren Werke Aktiengesellschaft Kompositelektrode und diese umfassende Lithiumionenbatterie sowie Verwendung der Lithiumionenbatterie in einem Kraftfahrzeug
DE102014226390A1 (de) 2014-12-18 2016-06-23 Bayerische Motoren Werke Aktiengesellschaft Kompositanode und diese umfassende Lithiumionenbatterie sowie Verfahren zur Herstellung der Kompositanode
DE102014226396A1 (de) 2014-12-18 2016-06-23 Bayerische Motoren Werke Aktiengesellschaft Kompositkathode und diese umfassende Lithiumionenbatterie sowie Verfahren zur Herstellung der Kompositkathode
DE102015200758A1 (de) 2015-01-20 2016-07-21 Bayerische Motoren Werke Aktiengesellschaft Kompositelektrode und diese umfassende Lithiumionenbatterie sowie Verfahren zur Herstellung der Kompositelektrode
DE102015201409A1 (de) 2015-01-28 2016-07-28 Bayerische Motoren Werke Aktiengesellschaft Komposit-Separator und diesen umfassende Lithiumionenbatterie sowie Verfahren zur Herstellung des Komposit-Separators
JP6177817B2 (ja) 2015-01-30 2017-08-09 松定プレシジョン株式会社 荷電粒子線装置及び走査電子顕微鏡
JP2018174016A (ja) 2015-07-29 2018-11-08 株式会社日立ハイテクノロジーズ 荷電粒子線装置
US10497535B2 (en) 2015-12-03 2019-12-03 Matsusada Precision, Inc. Charged particle beam device and scanning electron microscope
CZ2016597A3 (cs) 2016-09-26 2018-05-02 Tescan Brno, S.R.O. Objektivová čočka pro zařízení využívající nejméně jednoho svazku nabitých částic
US11861716B1 (en) 2016-10-27 2024-01-02 State Farm Mutual Automobile Insurance Company Systems and methods for utilizing electricity monitoring devices to reconstruct an electrical event
WO2018163240A1 (ja) * 2017-03-06 2018-09-13 株式会社日立ハイテクノロジーズ 荷電粒子線装置
US11139144B2 (en) 2017-03-24 2021-10-05 Hitachi High-Tech Corporation Charged particle beam apparatus
US10896802B2 (en) 2017-12-27 2021-01-19 Fei Company Combined SEM-CL and FIB-IOE microscopy
US10692694B2 (en) * 2017-12-27 2020-06-23 Fei Company Method and apparatus for enhancing SE detection in mirror-based light imaging charged particle microscopes
US10395887B1 (en) * 2018-02-20 2019-08-27 Technische Universiteit Delft Apparatus and method for inspecting a surface of a sample, using a multi-beam charged particle column
US10770262B1 (en) * 2018-05-30 2020-09-08 National Technology & Engineering Solutions Of Sandia, Llc Apparatus, method and system for imaging and utilization of SEM charged particles
CN112889127B (zh) * 2018-10-19 2024-12-13 Asml荷兰有限公司 用于对准多束检查装置中的电子束的系统和方法
US20220359149A1 (en) * 2019-07-02 2022-11-10 Hitachi High-Tech Corporation Charged particle beam device
JP7396954B2 (ja) * 2020-04-01 2023-12-12 株式会社日立ハイテク 荷電粒子線装置
WO2021204740A1 (en) * 2020-04-10 2021-10-14 Asml Netherlands B.V. Charged particle beam apparatus with multiple detectors and methods for imaging
CN114220725B (zh) 2020-12-02 2024-05-07 聚束科技(北京)有限公司 一种电子显微镜
JP7647271B2 (ja) * 2021-04-13 2025-03-18 株式会社ニューフレアテクノロジー 荷電粒子ビーム描画装置
DE102023127825A1 (de) 2023-10-11 2025-04-17 Carl Zeiss Microscopy Gmbh Elektronenstrahlmikroskop

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7100609A (de) * 1970-02-07 1971-08-10
US3792263A (en) * 1972-09-13 1974-02-12 Jeol Ltd Scanning electron microscope with means to remove low energy electrons from the primary electron beam
DE2921151C2 (de) * 1979-05-25 1982-12-02 Ernst Leitz Wetzlar Gmbh, 6330 Wetzlar Vorrichtung zum Nachweis von in einem Abtast-Elektronenstrahlmikroskop von einer Probe ausgehenden Rückstreuelektronen
DE2922325A1 (de) * 1979-06-01 1980-12-11 Philips Patentverwaltung Rasterelektronenmikroskop
EP0113746B1 (de) * 1982-07-16 1988-01-07 Lintech Instruments Limited Elektrodensystem für ein gegenfeldspektrometer eines elektronenstrahl-spannungsmessgerätes
JPS60212953A (ja) * 1984-04-06 1985-10-25 Hitachi Ltd 電子線装置
JP2748956B2 (ja) * 1984-05-18 1998-05-13 株式会社日立製作所 走査形電子顕微鏡
JPS62186451A (ja) * 1986-02-12 1987-08-14 Hitachi Ltd 走査電子顕微鏡
EP0242602B1 (de) * 1986-04-24 1993-07-21 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Elektrostatisch-magnetische-Linse für Korpuskularstrahlgeräte
DE3766092D1 (de) * 1986-12-12 1990-12-13 Integrated Circuit Testing Detektoranordnung mit einem detektorobjektiv fuer korpuskularstrahlgeraete.
JPS63224137A (ja) * 1987-03-11 1988-09-19 Hitachi Ltd 走査型電子顕微鏡の試料ホルダ−
JP2578446B2 (ja) * 1987-11-10 1997-02-05 富士通株式会社 二次電子検出器
US4926054A (en) * 1988-03-17 1990-05-15 Ict Integrated Circuit Testing Gesellschaft Fur Halbleiterpruftechnik Mbh Objective lens for focusing charged particles in an electron microscope
US5146090A (en) * 1990-06-11 1992-09-08 Siemens Aktiengesellschaft Particle beam apparatus having an immersion lens arranged in an intermediate image of the beam
JP3148353B2 (ja) * 1991-05-30 2001-03-19 ケーエルエー・インストルメンツ・コーポレーション 電子ビーム検査方法とそのシステム
JP2919170B2 (ja) * 1992-03-19 1999-07-12 株式会社日立製作所 走査電子顕微鏡
DE4216730C2 (de) * 1992-05-20 2003-07-24 Advantest Corp Rasterelektronenstrahlgerät
JP3730263B2 (ja) * 1992-05-27 2005-12-21 ケーエルエー・インストルメンツ・コーポレーション 荷電粒子ビームを用いた自動基板検査の装置及び方法
JP3081393B2 (ja) * 1992-10-15 2000-08-28 株式会社日立製作所 走査電子顕微鏡
JP2927627B2 (ja) * 1992-10-20 1999-07-28 株式会社日立製作所 走査電子顕微鏡
JP3291880B2 (ja) * 1993-12-28 2002-06-17 株式会社日立製作所 走査形電子顕微鏡
EP0769799B1 (de) * 1995-10-19 2010-02-17 Hitachi, Ltd. Rasterelektronenmikroskop

Also Published As

Publication number Publication date
US6069356A (en) 2000-05-30
EP0769799A3 (de) 2004-11-24
EP0769799B1 (de) 2010-02-17
US5872358A (en) 1999-02-16
US6084238A (en) 2000-07-04
EP0769799A2 (de) 1997-04-23
US5900629A (en) 1999-05-04

Similar Documents

Publication Publication Date Title
DE69638126D1 (de) Rasterelektronenmikroskop
DE69611739D1 (de) Rasterelektronenmikroskop
DE69432399D1 (de) Rasterelektronenmikroskop
DE69840533D1 (de) Rasterelektronenmikroskop
DE69334284D1 (de) Rasterelektronenmikroskop
DE69332995D1 (de) Raster-Elektronenmikroskop
DE69317847D1 (de) Raster-Elektronenmikroskop
DE59609547D1 (de) Mikroskop
DE69717538D1 (de) Konfokales Rastermikroskop
DE69422092D1 (de) Rastersondenmikroskop
DE69822562D1 (de) Rastersondenmikroskop
DE69824909D1 (de) Rastersondenmikroskop
DE69525980D1 (de) Elektronenquelle
DE69635628D1 (de) Konfokales Mikroskop
DE69624192D1 (de) Rasterelektronenmikroskop
DE69621540D1 (de) Elektronenmikroskop
DE69131593D1 (de) Rasterelektronenmikroskop
DE69823413D1 (de) Rastersondemikroskop
PT789202E (pt) Deflector
DE69519623D1 (de) Operations-mikroskope
DE69602140D1 (de) Elektronenmikroskopprobenträger
DE69807151D1 (de) Rasterelektronenmikroskop
DE69628367D1 (de) Rasterelektronenmikroskop
DE69623841D1 (de) Rasterelektronenmikroskop
AU7735796A (en) Spin-split scanning electron microscope

Legal Events

Date Code Title Description
8364 No opposition during term of opposition