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DE68926151D1 - Verfahren zur Herstellung einer positiven Photolackzusammensetzung - Google Patents

Verfahren zur Herstellung einer positiven Photolackzusammensetzung

Info

Publication number
DE68926151D1
DE68926151D1 DE68926151T DE68926151T DE68926151D1 DE 68926151 D1 DE68926151 D1 DE 68926151D1 DE 68926151 T DE68926151 T DE 68926151T DE 68926151 T DE68926151 T DE 68926151T DE 68926151 D1 DE68926151 D1 DE 68926151D1
Authority
DE
Germany
Prior art keywords
preparation
photoresist composition
positive photoresist
positive
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68926151T
Other languages
English (en)
Other versions
DE68926151T2 (de
Inventor
Takeshi Hioki
Koji Kuwana
Jun Tomioka
Hirotoshi Nakanishi
Yasunori Uetani
Yukio Hanamoto
Fumio - - Oi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=17982489&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE68926151(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Publication of DE68926151D1 publication Critical patent/DE68926151D1/de
Application granted granted Critical
Publication of DE68926151T2 publication Critical patent/DE68926151T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/72—Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Paints Or Removers (AREA)
DE68926151T 1988-12-06 1989-12-06 Verfahren zur Herstellung einer positiven Photolackzusammensetzung Expired - Fee Related DE68926151T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63308559A JP2697039B2 (ja) 1988-12-06 1988-12-06 ポジ型レジスト組成物の製造方法

Publications (2)

Publication Number Publication Date
DE68926151D1 true DE68926151D1 (de) 1996-05-09
DE68926151T2 DE68926151T2 (de) 1996-08-22

Family

ID=17982489

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68926151T Expired - Fee Related DE68926151T2 (de) 1988-12-06 1989-12-06 Verfahren zur Herstellung einer positiven Photolackzusammensetzung

Country Status (7)

Country Link
US (1) US5080997A (de)
EP (1) EP0372504B1 (de)
JP (1) JP2697039B2 (de)
KR (1) KR0137764B1 (de)
CA (1) CA2004593A1 (de)
DE (1) DE68926151T2 (de)
MX (1) MX171835B (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5300396A (en) * 1990-11-28 1994-04-05 Hoechst Celanese Corporation Process of making naphthoquinone diazide esters using lactone solvents
JP2976597B2 (ja) * 1991-04-17 1999-11-10 住友化学工業株式会社 キノンジアジドスルホン酸エステルの製造方法
US5618655A (en) * 1995-07-17 1997-04-08 Olin Corporation Process of reducing trace levels of metal impurities from resist components
US5623042A (en) * 1995-07-19 1997-04-22 Olin Corporation Process for reducing trace levels of metallic impurities in cyclized polyisoprene resin
US7015291B2 (en) 2002-04-01 2006-03-21 Daicel Chemical Industries, Ltd. Process for the production of high-molecular compounds for photoresist
US20060172231A1 (en) * 2002-08-08 2006-08-03 Fujifilm Electronic Materials U.S.A., Inc Use of an oxidizer to improve trace metals removal from photoresist and photoresist components
AU2004249284A1 (en) * 2003-06-18 2004-12-29 The Board Of Trustees Of The Leland Stanford Junior University Electro-adhesive tissue manipulator
JP4699482B2 (ja) * 2005-02-02 2011-06-08 コーロン インダストリーズ インク ポジティブ型ドライフィルムフォトレジストの製造方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE795809A (fr) * 1972-02-22 1973-08-22 Eastman Kodak Co Nouveaux polymeres photosensibles a groupes o-quinone diazide
DE3100077A1 (de) * 1981-01-03 1982-08-05 Hoechst Ag, 6000 Frankfurt Lichtempfindliches gemisch, das einen naphthochinondiazidsulfonsaeureester enthaelt, und verfahren zur herstellung des naphthochinondiazidsulfonsaeureesters
JPS58205147A (ja) * 1982-05-25 1983-11-30 Sumitomo Chem Co Ltd ポジ型フオトレジスト組成物
US4550069A (en) * 1984-06-11 1985-10-29 American Hoechst Corporation Positive photoresist compositions with o-quinone diazide, novolak, and propylene glycol alkyl ether acetate
JPS61118744A (ja) * 1984-11-15 1986-06-06 Tokyo Ohka Kogyo Co Ltd ポジ型ホトレジスト組成物
JPS61185741A (ja) * 1985-02-13 1986-08-19 Mitsubishi Chem Ind Ltd ポジ型フオトレジスト組成物
JPH0654384B2 (ja) * 1985-08-09 1994-07-20 東京応化工業株式会社 ポジ型ホトレジスト組成物
US4732836A (en) * 1986-05-02 1988-03-22 Hoechst Celanese Corporation Novel mixed ester O-quinone photosensitizers
JPS63178228A (ja) * 1987-01-20 1988-07-22 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物
JP2560266B2 (ja) * 1987-03-25 1996-12-04 日本合成ゴム株式会社 感放射線性樹脂組成物
JPS63305348A (ja) * 1987-06-05 1988-12-13 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物

Also Published As

Publication number Publication date
KR0137764B1 (ko) 1998-04-27
JPH02154259A (ja) 1990-06-13
JP2697039B2 (ja) 1998-01-14
EP0372504B1 (de) 1996-04-03
US5080997A (en) 1992-01-14
MX171835B (es) 1993-11-18
CA2004593A1 (en) 1990-06-06
KR900010465A (ko) 1990-07-07
DE68926151T2 (de) 1996-08-22
EP0372504A1 (de) 1990-06-13

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Legal Events

Date Code Title Description
8363 Opposition against the patent
8339 Ceased/non-payment of the annual fee