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DE60238703D1 - Photokatalysator und verfahren zu seiner herstellung - Google Patents

Photokatalysator und verfahren zu seiner herstellung

Info

Publication number
DE60238703D1
DE60238703D1 DE60238703T DE60238703T DE60238703D1 DE 60238703 D1 DE60238703 D1 DE 60238703D1 DE 60238703 T DE60238703 T DE 60238703T DE 60238703 T DE60238703 T DE 60238703T DE 60238703 D1 DE60238703 D1 DE 60238703D1
Authority
DE
Germany
Prior art keywords
production
photo catalyst
photo
catalyst
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60238703T
Other languages
English (en)
Inventor
Junji Hiraoka
Takahiro Doke
Hisato Haraga
Daisuke Noguchi
Yoshio Kawamata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shibaura Mechatronics Corp
Original Assignee
Shibaura Mechatronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shibaura Mechatronics Corp filed Critical Shibaura Mechatronics Corp
Application granted granted Critical
Publication of DE60238703D1 publication Critical patent/DE60238703D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
    • B01J37/02—Impregnation, coating or precipitation
    • B01J37/0215—Coating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J35/00—Catalysts, in general, characterised by their form or physical properties
    • B01J35/30—Catalysts, in general, characterised by their form or physical properties characterised by their physical properties
    • B01J35/39—Photocatalytic properties
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J21/00—Catalysts comprising the elements, oxides, or hydroxides of magnesium, boron, aluminium, carbon, silicon, titanium, zirconium, or hafnium
    • B01J21/06—Silicon, titanium, zirconium or hafnium; Oxides or hydroxides thereof
    • B01J21/063—Titanium; Oxides or hydroxides thereof
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J33/00—Protection of catalysts, e.g. by coating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J35/00—Catalysts, in general, characterised by their form or physical properties
    • B01J35/30—Catalysts, in general, characterised by their form or physical properties characterised by their physical properties
    • B01J35/391—Physical properties of the active metal ingredient
    • B01J35/395—Thickness of the active catalytic layer
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
    • B01J37/02—Impregnation, coating or precipitation
    • B01J37/024—Multiple impregnation or coating
    • B01J37/0244—Coatings comprising several layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
    • B01J37/34—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation
    • B01J37/341—Irradiation by, or application of, electric, magnetic or wave energy, e.g. ultrasonic waves ; Ionic sputtering; Flame or plasma spraying; Particle radiation making use of electric or magnetic fields, wave energy or particle radiation
    • B01J37/347—Ionic or cathodic spraying; Electric discharge
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G23/00—Compounds of titanium
    • C01G23/04—Oxides; Hydroxides
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
    • C01G23/00—Compounds of titanium
    • C01G23/04—Oxides; Hydroxides
    • C01G23/047—Titanium dioxide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/083—Oxides of refractory metals or yttrium
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J2235/00—Indexing scheme associated with group B01J35/00, related to the analysis techniques used to determine the catalysts form or properties
    • B01J2235/15—X-ray diffraction
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J35/00—Catalysts, in general, characterised by their form or physical properties
    • B01J35/60—Catalysts, in general, characterised by their form or physical properties characterised by their surface properties or porosity
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
    • C01P2002/72—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by d-values or two theta-values, e.g. as X-ray diagram
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
    • C01P2002/74—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by peak-intensities or a ratio thereof only
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/01—Particle morphology depicted by an image
    • C01P2004/03—Particle morphology depicted by an image obtained by SEM
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/01—Particle morphology depicted by an image
    • C01P2004/04—Particle morphology depicted by an image obtained by TEM, STEM, STM or AFM
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/80—Particles consisting of a mixture of two or more inorganic phases
    • C01P2004/82—Particles consisting of a mixture of two or more inorganic phases two phases having the same anion, e.g. both oxidic phases
    • C01P2004/84—Particles consisting of a mixture of two or more inorganic phases two phases having the same anion, e.g. both oxidic phases one phase coated with the other
    • C01P2004/86—Thin layer coatings, i.e. the coating thickness being less than 0.1 time the particle radius

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Geology (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Optics & Photonics (AREA)
  • Toxicology (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • Nanotechnology (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Composite Materials (AREA)
  • Catalysts (AREA)
  • Physical Vapour Deposition (AREA)
DE60238703T 2001-09-28 2002-09-27 Photokatalysator und verfahren zu seiner herstellung Expired - Lifetime DE60238703D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001303953 2001-09-28
PCT/JP2002/010007 WO2003028885A1 (en) 2001-09-28 2002-09-27 Photocatalyst element, method and device for preparing the same

Publications (1)

Publication Number Publication Date
DE60238703D1 true DE60238703D1 (de) 2011-02-03

Family

ID=19123954

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60238703T Expired - Lifetime DE60238703D1 (de) 2001-09-28 2002-09-27 Photokatalysator und verfahren zu seiner herstellung

Country Status (7)

Country Link
US (3) US7799731B2 (de)
EP (1) EP1442793B1 (de)
JP (1) JP4261353B2 (de)
KR (2) KR100948542B1 (de)
CN (1) CN1332763C (de)
DE (1) DE60238703D1 (de)
WO (1) WO2003028885A1 (de)

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KR100948542B1 (ko) 2001-09-28 2010-03-18 시바우라 메카트로닉스 가부시끼가이샤 광촉매체, 광촉매체의 제조 방법 및 광촉매체의 제조 장치
CN101695655B (zh) 2001-11-29 2012-11-21 芝浦机械电子装置股份有限公司 光催化剂的制造装置
JP4576619B2 (ja) * 2003-06-02 2010-11-10 独立行政法人 日本原子力研究開発機構 結晶配向した微結晶から成る二酸化チタン膜の作製方法
ATE377580T1 (de) 2004-07-12 2007-11-15 Cardinal Cg Co Wartungsarme beschichtungen
ITPR20040059A1 (it) * 2004-08-06 2004-11-06 Vacuum Surtec Srl Procedimento per depositare strati sottili di biossido di titanio su superfici di supporto e manufatti realizzati mediante detto procedimento.
KR101431230B1 (ko) 2006-04-11 2014-08-18 카디날 씨지 컴퍼니 개선된 낮은 유지 특성이 있는 광촉매성 코팅
US20080011599A1 (en) 2006-07-12 2008-01-17 Brabender Dennis M Sputtering apparatus including novel target mounting and/or control
US20080134420A1 (en) * 2006-12-07 2008-06-12 Edward Ho Led toilet seat cover
US7820296B2 (en) 2007-09-14 2010-10-26 Cardinal Cg Company Low-maintenance coating technology
GB0803574D0 (en) * 2008-02-27 2008-04-02 Pilkington Group Ltd Coated glazing
CN102159317B (zh) * 2008-09-16 2014-04-16 株式会社东芝 亲水性薄膜以及使用该亲水性薄膜的构件和结构物
FR2948037B1 (fr) * 2009-07-17 2012-12-28 Saint Gobain Materiau photocatalytique
KR20120029872A (ko) * 2010-09-17 2012-03-27 (주)엘지하우시스 표면 모폴로지 처리를 통한 코팅막의 친수성 개선 방법 및 이를 이용하여 제조한 초친수 유리 코팅층
CN103974811B (zh) * 2011-12-06 2016-08-24 日东纺绩株式会社 长纤维强化热塑性树脂预制坯以及使用了该预制坯的纤维强化树脂成型体
KR20160056017A (ko) * 2014-11-11 2016-05-19 고려대학교 산학협력단 항균 구조물의 제조 방법
US20180318799A1 (en) * 2015-11-16 2018-11-08 Sabic Global Technologies B.V. Multi-layered water-splitting photocatalyst having a plasmonic metal layer with optimized plasmonic effects
US10604442B2 (en) 2016-11-17 2020-03-31 Cardinal Cg Company Static-dissipative coating technology
JP2024158887A (ja) * 2023-04-28 2024-11-08 ニデック株式会社 親水膜及び光学部材

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JP2004502422A (ja) 2000-06-30 2004-01-29 エス．エス．スタイナー，インコーポレイテッド ビール苦味付け法の改良
FR2814094B1 (fr) 2000-09-20 2003-08-15 Saint Gobain Substrat a revetement photocatalytique et son procede de fabrication
JP2002256416A (ja) * 2001-03-01 2002-09-11 Andes Denki Kk 光触媒薄膜材料およびその応用品
KR100948542B1 (ko) 2001-09-28 2010-03-18 시바우라 메카트로닉스 가부시끼가이샤 광촉매체, 광촉매체의 제조 방법 및 광촉매체의 제조 장치
CN101695655B (zh) 2001-11-29 2012-11-21 芝浦机械电子装置股份有限公司 光催化剂的制造装置

Also Published As

Publication number Publication date
KR100948542B1 (ko) 2010-03-18
EP1442793A4 (de) 2007-04-25
KR20040047873A (ko) 2004-06-05
US7799731B2 (en) 2010-09-21
EP1442793B1 (de) 2010-12-22
WO2003028885A1 (en) 2003-04-10
KR100882345B1 (ko) 2009-02-12
JP4261353B2 (ja) 2009-04-30
US20040248725A1 (en) 2004-12-09
CN1332763C (zh) 2007-08-22
CN1578701A (zh) 2005-02-09
US20100206723A1 (en) 2010-08-19
US20100210447A1 (en) 2010-08-19
JPWO2003028885A1 (ja) 2005-01-13
KR20080102321A (ko) 2008-11-24
EP1442793A1 (de) 2004-08-04
US8022011B2 (en) 2011-09-20

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