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DE60116322D1 - Vorrichtung zur aktiven kompensation von aberrationen in einem optischen system - Google Patents

Vorrichtung zur aktiven kompensation von aberrationen in einem optischen system

Info

Publication number
DE60116322D1
DE60116322D1 DE60116322T DE60116322T DE60116322D1 DE 60116322 D1 DE60116322 D1 DE 60116322D1 DE 60116322 T DE60116322 T DE 60116322T DE 60116322 T DE60116322 T DE 60116322T DE 60116322 D1 DE60116322 D1 DE 60116322D1
Authority
DE
Germany
Prior art keywords
berrations
optical system
active compensation
compensation
active
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60116322T
Other languages
English (en)
Other versions
DE60116322T2 (de
Inventor
F Meehan
G Taub
S Ivaldi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML Holding NV
Original Assignee
ASML Holding NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML Holding NV filed Critical ASML Holding NV
Publication of DE60116322D1 publication Critical patent/DE60116322D1/de
Application granted granted Critical
Publication of DE60116322T2 publication Critical patent/DE60116322T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/18—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical projection, e.g. combination of mirror and condenser and objective
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/1822—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors comprising means for aligning the optical axis
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
    • G02B7/185—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors with means for adjusting the shape of the mirror surface
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Lens Barrels (AREA)
DE60116322T 2000-04-25 2001-04-24 Vorrichtung,system und verfahren für aktive kompensation von aberrationen in einem optischen system Expired - Lifetime DE60116322T2 (de)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US19940000P 2000-04-25 2000-04-25
US199400P 2000-04-25
US09/702,854 US6411426B1 (en) 2000-04-25 2000-11-01 Apparatus, system, and method for active compensation of aberrations in an optical system
US702854 2000-11-01
PCT/US2001/013020 WO2001081976A2 (en) 2000-04-25 2001-04-24 Apparatus, system, and method for active compensation of aberrations in an optical system

Publications (2)

Publication Number Publication Date
DE60116322D1 true DE60116322D1 (de) 2006-02-02
DE60116322T2 DE60116322T2 (de) 2006-06-29

Family

ID=26894730

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60116322T Expired - Lifetime DE60116322T2 (de) 2000-04-25 2001-04-24 Vorrichtung,system und verfahren für aktive kompensation von aberrationen in einem optischen system

Country Status (7)

Country Link
US (2) US6411426B1 (de)
EP (1) EP1301818B1 (de)
JP (1) JP4567273B2 (de)
KR (1) KR100729681B1 (de)
AU (1) AU2001253757A1 (de)
DE (1) DE60116322T2 (de)
WO (1) WO2001081976A2 (de)

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JP2003234269A (ja) * 2002-02-07 2003-08-22 Nikon Corp 反射ミラーの保持方法、反射ミラーの保持部材及び露光装置
DE10219514A1 (de) * 2002-04-30 2003-11-13 Zeiss Carl Smt Ag Beleuchtungssystem, insbesondere für die EUV-Lithographie
US6842277B2 (en) * 2002-07-23 2005-01-11 Nikon Corporation Deformable mirror with high-bandwidth servo for rigid body control
JP3787556B2 (ja) * 2003-02-17 2006-06-21 キヤノン株式会社 保持装置、露光装置及びデバイス製造方法
AU2003229725A1 (en) * 2003-04-24 2004-11-19 Carl Zeiss Smt Ag Projection optical system
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US7708415B2 (en) * 2003-10-20 2010-05-04 Bae Systems Plc Mirror structure having piezoelectric element bonded to a mirror substrate
US7265917B2 (en) 2003-12-23 2007-09-04 Carl Zeiss Smt Ag Replacement apparatus for an optical element
US20080151365A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
EP1716455B1 (de) * 2004-02-20 2011-05-11 Carl Zeiss SMT GmbH Projektionsobjektiv einer mikrolithographischen projektionsbelichtungsanlage
CN100483174C (zh) 2004-05-17 2009-04-29 卡尔蔡司Smt股份公司 具有中间图像的反射折射投影物镜
US7324185B2 (en) 2005-03-04 2008-01-29 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US8248577B2 (en) 2005-05-03 2012-08-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2007266511A (ja) * 2006-03-29 2007-10-11 Nikon Corp 光学系、露光装置、及び光学特性の調整方法
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US8649353B2 (en) 2008-03-04 2014-02-11 Interdigital Patent Holdings, Inc. Method and apparatus for accessing a random access channel by selectively using dedicated or contention-based preambles during handover
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DE102008000967B4 (de) * 2008-04-03 2015-04-09 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die EUV-Mikrolithographie
KR101487358B1 (ko) 2008-06-30 2015-01-30 인터디지탈 패튼 홀딩스, 인크 Ｅ－ｕｔｒａｎ에서 핸드오버를 수행하기 위한 방법 및 장치
CN101685192B (zh) * 2008-09-26 2011-02-16 中国科学院西安光学精密机械研究所 抑制大镜面像散变形的支撑装调方法
US20100226010A1 (en) * 2009-03-04 2010-09-09 Kai Cheong Kwan Anti-Shaking Optical Element For Optical Imaging Systems
JP2010219080A (ja) * 2009-03-13 2010-09-30 Canon Inc 光学装置、ステージ装置、光学系及び露光装置
US8551096B2 (en) * 2009-05-13 2013-10-08 Boston Scientific Scimed, Inc. Directional delivery of energy and bioactives
US9097577B2 (en) * 2011-06-29 2015-08-04 KLA—Tencor Corporation Adaptive optics for compensating aberrations in light-sustained plasma cells
FR2980278B1 (fr) * 2011-09-16 2014-05-02 Thales Sa Miroir comprenant des moyens mecaniques de generation d'aberrations geometriques primaires
CN102608727B (zh) * 2012-03-23 2014-03-26 中国科学院西安光学精密机械研究所 一种定心工装及用该工装确定非球面反射镜基准的方法
US10216093B2 (en) * 2013-01-28 2019-02-26 Asml Netherlands B.V. Projection system and minor and radiation source for a lithographic apparatus
TW201443479A (zh) * 2013-05-09 2014-11-16 Hon Hai Prec Ind Co Ltd 微機電系統鏡片及微機電系統反射裝置
CN104697758B (zh) * 2013-12-04 2017-05-31 广州汽车集团股份有限公司 二力杆件试验台架
DE102014103157B3 (de) * 2014-03-10 2015-06-18 Jenoptik Optical Systems Gmbh Justierbarer deformierbarer Spiegel zum Ausgleich von Aberrationen eines Strahlenbündels
CN104950420A (zh) * 2015-06-25 2015-09-30 中国科学院西安光学精密机械研究所 标定非球面反射镜光轴的系统及方法
CN105093848B (zh) * 2015-08-06 2018-01-16 武汉华星光电技术有限公司 一种曝光设备
CN105428966A (zh) * 2015-12-21 2016-03-23 华中科技大学 一种外光路补偿调节装置及由其构成的激光器
DE102016219330A1 (de) * 2016-10-06 2018-04-12 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage und Verfahren zur Verringerung aus dynamischen Beschleunigungen herrührenden Deformationen von Komponenten der Projektionsbelichtungsanlage
JP6896404B2 (ja) * 2016-11-30 2021-06-30 キヤノン株式会社 露光装置及び物品の製造方法
CN106970449B (zh) * 2017-05-23 2023-09-01 中国工程物理研究院激光聚变研究中心 一种大口径晶体光学元件面型预测与再现的调节系统和方法
DE102017117468B3 (de) 2017-08-02 2018-09-20 Jenoptik Optical Systems Gmbh Vorrichtung zur variierbaren Beeinflussung der Wellenfront eines Strahlenbündels mit einer über ihre Umfangsfläche deformierbaren Planoptik
DE102018116570B3 (de) 2017-08-02 2018-10-18 Jenoptik Optical Systems Gmbh Vorrichtung zur variierbaren Beeinflussung der Wellenfront eines Strahlenbündels mit einer über deren Rückseite deformierbaren Planoptik
JP7005364B2 (ja) * 2018-01-29 2022-01-21 キヤノン株式会社 投影光学系、露光装置、物品の製造方法及び調整方法
CN108445601B (zh) * 2018-02-09 2019-12-13 中国科学院长春光学精密机械与物理研究所 一种被动式大口径主镜支撑效果提高方法和装置
CN109932804B (zh) * 2019-03-04 2021-06-01 杭州电子科技大学 一种小口径轻型反射镜的柔性记忆合金支撑装置
DE102020205752A1 (de) 2020-05-07 2021-11-11 Carl Zeiss Smt Gmbh Verfahren zum Betreiben eines deformierbaren Spiegels, sowie optisches System mit einem deformierbaren Spiegel
FR3117617B1 (fr) * 2020-12-11 2022-12-23 Commissariat Energie Atomique Système de correction de surface d’onde à base d’actionneurs de couple, et procédé associé.
FR3117618B1 (fr) * 2020-12-11 2022-12-02 Commissariat Energie Atomique Actionneur de couple et élément de transmission associé.
IL317882A (en) * 2023-05-03 2025-02-01 Illumina Inc Optical arrangement for compensating for heat-induced eye misfocus

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Also Published As

Publication number Publication date
KR100729681B1 (ko) 2007-06-18
EP1301818A2 (de) 2003-04-16
JP2003532138A (ja) 2003-10-28
US20020089734A1 (en) 2002-07-11
WO2001081976A2 (en) 2001-11-01
AU2001253757A1 (en) 2001-11-07
JP4567273B2 (ja) 2010-10-20
WO2001081976A3 (en) 2003-01-23
US6411426B1 (en) 2002-06-25
KR20020057807A (ko) 2002-07-12
DE60116322T2 (de) 2006-06-29
EP1301818B1 (de) 2005-12-28

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