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DE60104705D1 - Verbesserte regelung mit adaptives abtastverfahren zur halbleiterherstellung - Google Patents

Verbesserte regelung mit adaptives abtastverfahren zur halbleiterherstellung

Info

Publication number
DE60104705D1
DE60104705D1 DE60104705T DE60104705T DE60104705D1 DE 60104705 D1 DE60104705 D1 DE 60104705D1 DE 60104705 T DE60104705 T DE 60104705T DE 60104705 T DE60104705 T DE 60104705T DE 60104705 D1 DE60104705 D1 DE 60104705D1
Authority
DE
Germany
Prior art keywords
scaning
adaptive
improved control
semiconductor production
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60104705T
Other languages
English (en)
Other versions
DE60104705T2 (de
Inventor
James Pasadyn
John Toprac
Lee Miller
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advanced Micro Devices Inc
Original Assignee
Advanced Micro Devices Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Micro Devices Inc filed Critical Advanced Micro Devices Inc
Publication of DE60104705D1 publication Critical patent/DE60104705D1/de
Application granted granted Critical
Publication of DE60104705T2 publication Critical patent/DE60104705T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B13/00—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion
    • G05B13/02—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B21/00—Systems involving sampling of the variable controlled
    • G05B21/02—Systems involving sampling of the variable controlled electric
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B11/00—Automatic controllers
    • G05B11/01—Automatic controllers electric
    • G05B11/36—Automatic controllers electric with provision for obtaining particular characteristics, e.g. proportional, integral, differential
    • G05B11/42—Automatic controllers electric with provision for obtaining particular characteristics, e.g. proportional, integral, differential for obtaining a characteristic which is both proportional and time-dependent, e.g. P. I., P. I. D.
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B13/00—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion
    • G05B13/02—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric
    • G05B13/04—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric involving the use of models or simulators
    • G05B13/048—Adaptive control systems, i.e. systems automatically adjusting themselves to have a performance which is optimum according to some preassigned criterion electric involving the use of models or simulators using a predictor
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B17/00—Systems involving the use of models or simulators of said systems
    • G05B17/02—Systems involving the use of models or simulators of said systems electric

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Artificial Intelligence (AREA)
  • Health & Medical Sciences (AREA)
  • Evolutionary Computation (AREA)
  • Medical Informatics (AREA)
  • Software Systems (AREA)
  • Feedback Control In General (AREA)
  • Drying Of Semiconductors (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • General Factory Administration (AREA)
DE60104705T 2000-09-15 2001-09-07 Verbesserte regelung mit adaptives abtastverfahren zur halbleiterherstellung Expired - Lifetime DE60104705T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US66373200A 2000-09-15 2000-09-15
US663732 2000-09-15
PCT/US2001/028003 WO2002023289A2 (en) 2000-09-15 2001-09-07 Adaptive sampling method for improved control in semiconductor manufacturing

Publications (2)

Publication Number Publication Date
DE60104705D1 true DE60104705D1 (de) 2004-09-09
DE60104705T2 DE60104705T2 (de) 2005-09-15

Family

ID=24663051

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60104705T Expired - Lifetime DE60104705T2 (de) 2000-09-15 2001-09-07 Verbesserte regelung mit adaptives abtastverfahren zur halbleiterherstellung

Country Status (9)

Country Link
US (1) US6988017B2 (de)
EP (1) EP1317694B1 (de)
JP (1) JP2004509407A (de)
KR (1) KR100824443B1 (de)
CN (1) CN1186700C (de)
AU (1) AU2001288856A1 (de)
DE (1) DE60104705T2 (de)
TW (1) TW563218B (de)
WO (1) WO2002023289A2 (de)

Families Citing this family (122)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8510476B2 (en) * 2001-02-15 2013-08-13 Brooks Automation, Inc. Secure remote diagnostic customer support network
US7698012B2 (en) * 2001-06-19 2010-04-13 Applied Materials, Inc. Dynamic metrology schemes and sampling schemes for advanced process control in semiconductor processing
US7160739B2 (en) 2001-06-19 2007-01-09 Applied Materials, Inc. Feedback control of a chemical mechanical polishing device providing manipulation of removal rate profiles
US7505879B2 (en) 2002-06-05 2009-03-17 Tokyo Electron Limited Method for generating multivariate analysis model expression for processing apparatus, method for executing multivariate analysis of processing apparatus, control device of processing apparatus and control system for processing apparatus
US7402257B1 (en) * 2002-07-30 2008-07-22 Advanced Micro Devices, Inc. Plasma state monitoring to control etching processes and across-wafer uniformity, and system for performing same
US7376472B2 (en) * 2002-09-11 2008-05-20 Fisher-Rosemount Systems, Inc. Integrated model predictive control and optimization within a process control system
US7295954B2 (en) * 2002-09-26 2007-11-13 Lam Research Corporation Expert knowledge methods and systems for data analysis
US8017411B2 (en) * 2002-12-18 2011-09-13 GlobalFoundries, Inc. Dynamic adaptive sampling rate for model prediction
US7653515B2 (en) * 2002-12-20 2010-01-26 Lam Research Corporation Expert knowledge methods and systems for data analysis
US6766214B1 (en) * 2003-04-03 2004-07-20 Advanced Micro Devices, Inc. Adjusting a sampling rate based on state estimation results
CN100419983C (zh) * 2003-05-16 2008-09-17 东京毅力科创株式会社 处理系统健康指数及其使用方法
US6988045B2 (en) * 2003-08-04 2006-01-17 Advanced Micro Devices, Inc. Dynamic metrology sampling methods, and system for performing same
US7328126B2 (en) * 2003-09-12 2008-02-05 Tokyo Electron Limited Method and system of diagnosing a processing system using adaptive multivariate analysis
DE10345626A1 (de) * 2003-09-29 2005-05-12 Heidenhain Gmbh Dr Johannes Numerische Steuerung mit Werkzeugmaschinensimulator
US7187989B2 (en) * 2003-12-22 2007-03-06 Fakhruddin T Attarwala Use of core process models in model predictive controller
US7473566B1 (en) * 2004-02-03 2009-01-06 Advanced Micro Devices, Inc. Method and apparatus for controlling a film formation process with multiple objectives
US7203554B2 (en) * 2004-03-16 2007-04-10 United Technologies Corporation Model predictive controller with life extending control
US7127358B2 (en) * 2004-03-30 2006-10-24 Tokyo Electron Limited Method and system for run-to-run control
US7203555B2 (en) * 2004-05-14 2007-04-10 University Of Delaware Predictive regulatory controller
US7502715B1 (en) * 2004-09-21 2009-03-10 Asml Netherlands B.V Observability in metrology measurements
US7076321B2 (en) * 2004-10-05 2006-07-11 Advanced Micro Devices, Inc. Method and system for dynamically adjusting metrology sampling based upon available metrology capacity
US8676538B2 (en) * 2004-11-02 2014-03-18 Advanced Micro Devices, Inc. Adjusting weighting of a parameter relating to fault detection based on a detected fault
US8095240B2 (en) * 2004-11-18 2012-01-10 Applied Materials, Inc. Methods for starting and operating a thermal abatement system
US7682574B2 (en) * 2004-11-18 2010-03-23 Applied Materials, Inc. Safety, monitoring and control features for thermal abatement reactor
US7477960B2 (en) * 2005-02-16 2009-01-13 Tokyo Electron Limited Fault detection and classification (FDC) using a run-to-run controller
JP2008542854A (ja) * 2005-02-28 2008-11-27 シーメンス アクチエンゲゼルシヤフト 工作機械の電子的な運転のための方法
US7117059B1 (en) * 2005-04-18 2006-10-03 Promos Technologies Inc. Run-to-run control system and operating method of the same
US7299154B1 (en) * 2005-05-16 2007-11-20 Advanced Micro Devices, Inc. Method and apparatus for fast disturbance detection and classification
DE102005024915B4 (de) 2005-05-31 2016-09-15 Advanced Micro Devices, Inc. Verfahren und System für eine fortschrittliche Prozesssteuerung mit anlagenabhängigen Maschinenkonstanten
DE102005030586A1 (de) 2005-06-30 2007-01-11 Advanced Micro Devices, Inc., Sunnyvale Verfahren und System für eine fortschrittliche Prozesssteuerung unter Anwendung der Messunsicherheit als Steuerungseingang
DE102005035735B4 (de) * 2005-07-29 2007-08-16 Advanced Micro Devices, Inc., Sunnyvale Verfahren und System zum Abschätzen eines Zustands einer nicht initialisierten fortschrittlichen Prozesssteuerung durch Anwendung unterteilter Steuerungsdaten
KR100702843B1 (ko) * 2005-08-12 2007-04-03 삼성전자주식회사 로트가변 배치처리가 가능한 반도체 제조설비 및 그로트가변 배치처리방법
DE102005046972A1 (de) * 2005-09-30 2007-04-05 Advanced Micro Devices, Inc., Sunnyvale Verfahren und System für eine fortschrittliche Prozesssteuerung unter Anwendung einer Kombination aus gewichteten relativen Voreinstellungswerten
US8036760B2 (en) * 2005-10-04 2011-10-11 Fisher-Rosemount Systems, Inc. Method and apparatus for intelligent control and monitoring in a process control system
US20070088448A1 (en) * 2005-10-19 2007-04-19 Honeywell International Inc. Predictive correlation model system
US7200523B1 (en) * 2005-11-30 2007-04-03 Taiwan Semiconductor Manufacturing Company, Ltd. Method and system for filtering statistical process data to enhance process performance
US20080042830A1 (en) * 2005-12-30 2008-02-21 Skyetek, Inc. Virtual rfid-based tag sensor
JP4825530B2 (ja) * 2006-02-06 2011-11-30 株式会社日立ハイテクノロジーズ パターン欠陥検査方法および装置
JP4791840B2 (ja) * 2006-02-06 2011-10-12 株式会社日立ハイテクノロジーズ 荷電粒子線装置、走査電子顕微鏡、および試料検査方法
KR20080104372A (ko) * 2006-03-16 2008-12-02 어플라이드 머티어리얼스, 인코포레이티드 전자 장치 제조 시스템의 압력 제어 방법 및 장치
US7577483B2 (en) * 2006-05-25 2009-08-18 Honeywell Asca Inc. Automatic tuning method for multivariable model predictive controllers
US8005575B2 (en) 2006-06-01 2011-08-23 General Electric Company Methods and apparatus for model predictive control in a real time controller
GB2438893B (en) * 2006-06-09 2010-10-27 Applied Materials Inc Ion beams in an ion implanter
US7373215B2 (en) * 2006-08-31 2008-05-13 Advanced Micro Devices, Inc. Transistor gate shape metrology using multiple data sources
US7580768B2 (en) * 2006-09-22 2009-08-25 Texas Instruments Deutschland Gmbh Method of adjusting process variables in a processing flow
US7738986B2 (en) 2006-10-09 2010-06-15 GlobalFoundries, Inc. Method and apparatus for compensating metrology data for site bias prior to filtering
US7509186B2 (en) * 2006-11-07 2009-03-24 International Business Machines Corporation Method and system for reducing the variation in film thickness on a plurality of semiconductor wafers having multiple deposition paths in a semiconductor manufacturing process
DE102006059430A1 (de) * 2006-12-15 2008-06-19 Robert Bosch Gmbh Automatisierte Erstellung und Adaption eines Maschinen- oder Anlagenmodells
US7991499B2 (en) * 2006-12-27 2011-08-02 Molnar Charles J Advanced finishing control
US8244644B2 (en) * 2007-02-07 2012-08-14 International Business Machines Corporation Supply chain multi-dimensional serial containment process
US7716230B2 (en) * 2007-02-07 2010-05-11 International Business Machines Corporation Multi-dimensional serial containment process
US20080216077A1 (en) * 2007-03-02 2008-09-04 Applied Materials, Inc. Software sequencer for integrated substrate processing system
US8145337B2 (en) * 2007-05-04 2012-03-27 Taiwan Semiconductor Manufacturing Company, Ltd. Methodology to enable wafer result prediction of semiconductor wafer batch processing equipment
KR20150069034A (ko) * 2007-05-25 2015-06-22 어플라이드 머티어리얼스, 인코포레이티드 저감 시스템의 효율적 작동을 위한 방법들 및 장치
EP2153363A4 (de) * 2007-05-25 2013-02-27 Applied Materials Inc Verfahren und vorrichtungen zum zusammenbauen und betreiben von elektronischen bauelementeherstellungssystemen
US20090018688A1 (en) * 2007-06-15 2009-01-15 Applied Materials, Inc. Methods and systems for designing and validating operation of abatement systems
US20090012744A1 (en) * 2007-07-03 2009-01-08 Texas Instruments Incorporated System and Method for Statistically Evaluating the Operation of Integrated Circuit Fabrication Tools
US8095907B2 (en) * 2007-10-19 2012-01-10 International Business Machines Corporation Reliability evaluation and system fail warning methods using on chip parametric monitors
WO2009055750A1 (en) * 2007-10-26 2009-04-30 Applied Materials, Inc. Methods and apparatus for smart abatement using an improved fuel circuit
DE102008000038A1 (de) * 2008-01-11 2009-07-16 Robert Bosch Gmbh Vorrichtung
US7622308B2 (en) * 2008-03-07 2009-11-24 Mks Instruments, Inc. Process control using process data and yield data
US8271122B2 (en) 2008-03-07 2012-09-18 Mks Instruments, Inc. Process control using process data and yield data
US8355810B2 (en) * 2009-01-29 2013-01-15 Applied Materials, Inc. Method and system for estimating context offsets for run-to-run control in a semiconductor fabrication facility
US8229588B2 (en) * 2009-03-03 2012-07-24 Taiwan Semiconductor Manufacturing Company, Ltd. Method and system for tuning advanced process control parameters
US8433434B2 (en) * 2009-07-09 2013-04-30 Taiwan Semiconductor Manufacturing Company, Ltd. Near non-adaptive virtual metrology and chamber control
US8620461B2 (en) * 2009-09-24 2013-12-31 Honeywell International, Inc. Method and system for updating tuning parameters of a controller
JP5547472B2 (ja) * 2009-12-28 2014-07-16 株式会社荏原製作所 基板研磨装置、基板研磨方法、及び基板研磨装置の研磨パッド面温調装置
EP2365410B1 (de) * 2010-03-09 2018-06-27 Siemens Aktiengesellschaft Steuerung eines Herstellungsverfahrens
US8606386B2 (en) * 2010-03-12 2013-12-10 Ana Maria Dias Medureira Pereira Multi-agent system for distributed manufacturing scheduling with Genetic Algorithms and Tabu Search
US9026239B2 (en) * 2010-06-03 2015-05-05 Taiwan Semiconductor Manufacturing Company, Ltd. APC model extension using existing APC models
US10295993B2 (en) * 2011-09-01 2019-05-21 Kla-Tencor Corporation Method and system for detecting and correcting problematic advanced process control parameters
US9677493B2 (en) 2011-09-19 2017-06-13 Honeywell Spol, S.R.O. Coordinated engine and emissions control system
US9650934B2 (en) 2011-11-04 2017-05-16 Honeywell spol.s.r.o. Engine and aftertreatment optimization system
US20130111905A1 (en) 2011-11-04 2013-05-09 Honeywell Spol. S.R.O. Integrated optimization and control of an engine and aftertreatment system
US9002498B2 (en) * 2012-02-02 2015-04-07 Taiwan Semiconductor Manufacturing Co., Ltd. Tool function to improve fab process in semiconductor manufacturing
CN102540895B (zh) * 2012-02-28 2015-04-15 中国科学院微电子研究所 一种先进过程控制系统及其测试方法
US9158867B2 (en) * 2012-10-09 2015-10-13 Taiwan Semiconductor Manufacturing Co., Ltd. 2D/3D analysis for abnormal tools and stages diagnosis
US9292010B2 (en) * 2012-11-05 2016-03-22 Rockwell Automation Technologies, Inc. Online integration of model-based optimization and model-less control
US9187800B2 (en) * 2013-02-15 2015-11-17 Ford Motor Company Process control for post-form heat treating parts for an assembly operation
US9395708B2 (en) * 2013-03-11 2016-07-19 Johnson Controls Technology Company Systems and methods for adaptive sampling rate adjustment
US10324424B2 (en) 2013-03-11 2019-06-18 Johnson Controls Technology Company Control system with response time estimation and automatic operating parameter adjustment
US9282048B1 (en) * 2013-03-14 2016-03-08 Moat, Inc. System and method for dynamically controlling sample rates and data flow in a networked measurement system by dynamic determination of statistical significance
US9245067B2 (en) 2013-03-15 2016-01-26 General Electric Company Probabilistic method and system for testing a material
US9567660B2 (en) 2013-06-27 2017-02-14 Ford Global Technologies, Llc Method and system for using an irreversible thermo-chromatic indicator for quality assurance of a part subjected to heat treating
US10576603B2 (en) * 2014-04-22 2020-03-03 Kla-Tencor Corporation Patterned wafer geometry measurements for semiconductor process controls
US9733627B2 (en) 2014-08-13 2017-08-15 Honeywell International Inc. Cloud computing system and method for advanced process control
US10133263B1 (en) 2014-08-18 2018-11-20 Kla-Tencor Corporation Process condition based dynamic defect inspection
EP3051367B1 (de) 2015-01-28 2020-11-25 Honeywell spol s.r.o. Ansatz und system zur handhabung von einschränkungen für gemessene störungen mit unsicherer vorschau
EP3056706A1 (de) 2015-02-16 2016-08-17 Honeywell International Inc. Ansatz zur nachbehandlungssystemmodellierung und modellidentifizierung
WO2016148705A1 (en) * 2015-03-17 2016-09-22 Halliburton Energy Services, Inc. Optimization of downhole logging tool data resolution
US10551247B1 (en) * 2015-04-27 2020-02-04 National Technology & Engineering Solutions Of Sandia, Llc Global analysis peak fitting for chemical spectroscopy data
EP3091212A1 (de) 2015-05-06 2016-11-09 Honeywell International Inc. Identifikationsansatz für verbrennungsmotor-mittelwertmodelle
TWI539298B (zh) * 2015-05-27 2016-06-21 國立成功大學 具取樣率決定機制的量測抽樣方法 與其電腦程式產品
EP3734375B1 (de) 2015-07-31 2023-04-05 Garrett Transportation I Inc. Quadratischer programmlöser für mpc mit variabler anordnung
US10272779B2 (en) 2015-08-05 2019-04-30 Garrett Transportation I Inc. System and approach for dynamic vehicle speed optimization
US10359371B2 (en) 2015-08-24 2019-07-23 Kla-Tencor Corp. Determining one or more characteristics of a pattern of interest on a specimen
US10415492B2 (en) 2016-01-29 2019-09-17 Garrett Transportation I Inc. Engine system with inferential sensor
JP6647931B2 (ja) * 2016-03-16 2020-02-14 株式会社Kelk 半導体ウェーハの温度制御装置、および半導体ウェーハの温度制御方法
US10124750B2 (en) 2016-04-26 2018-11-13 Honeywell International Inc. Vehicle security module system
US10036338B2 (en) 2016-04-26 2018-07-31 Honeywell International Inc. Condition-based powertrain control system
CN106294126B (zh) * 2016-07-22 2019-01-04 上海华力微电子有限公司 Sen离子注入机台的自动化程式正确性管理方法及装置
US11199120B2 (en) 2016-11-29 2021-12-14 Garrett Transportation I, Inc. Inferential flow sensor
US10868857B2 (en) 2017-04-21 2020-12-15 Johnson Controls Technology Company Building management system with distributed data collection and gateway services
US10333810B2 (en) 2017-06-09 2019-06-25 Johnson Controls Technology Company Control system with asynchronous wireless data transmission
US10739028B2 (en) 2017-06-09 2020-08-11 Johnson Controls Technology Company Thermostat with efficient wireless data transmission
CN107546998B (zh) * 2017-07-25 2019-12-10 华南理工大学 一种基于双环预测控制的切换型控制方法
CA3017667A1 (en) 2017-09-18 2019-03-18 Ecolab Usa Inc. Adaptive range titration systems and methods
US11057213B2 (en) 2017-10-13 2021-07-06 Garrett Transportation I, Inc. Authentication system for electronic control unit on a bus
JP7035457B2 (ja) * 2017-11-01 2022-03-15 ブラザー工業株式会社 パラメータ更新方法、パラメータ更新システム、及びプログラム
CN108008695A (zh) * 2017-12-05 2018-05-08 鄂州职业大学 一种智能模具制造的数控加工方法及控制系统
CN110246775B (zh) * 2018-03-09 2022-05-03 联华电子股份有限公司 控制机台操作的装置与方法
US11113168B2 (en) * 2018-03-09 2021-09-07 Toyota Motor Engineering & Manufacturing North America, Inc. Distributed architecture for fault monitoring
BR112020020717B1 (pt) 2018-04-09 2023-10-24 Ecolab Usa Inc Sistema de titulação automatizado, e, método para quantificar uma concentração de analito alvo em uma corrente de amostra
US11397170B2 (en) * 2018-04-16 2022-07-26 Ecolab Usa Inc. Repetition time interval adjustment in adaptive range titration systems and methods
EP3611570A1 (de) * 2018-08-16 2020-02-19 ASML Netherlands B.V. Verfahren zur steuerung eines herstellungsverfahrens und zugehörige vorrichtungen
US10700605B1 (en) 2018-12-12 2020-06-30 Infineon Technologies Austria Ag Electrical power converter with predictor
CN112513758B (zh) * 2019-06-25 2024-08-02 株式会社Tmeic 数据收集装置、成套设备监视系统以及数据收集方法
CN114930514A (zh) 2019-11-01 2022-08-19 玛特森技术公司 用于热处理系统的自适应控制的控制系统
TWI728576B (zh) * 2019-11-27 2021-05-21 台灣積體電路製造股份有限公司 半導體結構的製造方法及電腦可讀取記錄媒體
US11429091B2 (en) 2020-10-29 2022-08-30 Kla Corporation Method of manufacturing a semiconductor device and process control system for a semiconductor manufacturing assembly
JPWO2023106038A1 (de) * 2021-12-10 2023-06-15
US20240019818A1 (en) * 2022-06-30 2024-01-18 Advanced Energy Industries, Inc. Adaptive pid controller

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3777128A (en) * 1972-03-31 1973-12-04 Kearney & Trecker Corp Input data sampling scheme for computer controlled machine tools
US5740033A (en) * 1992-10-13 1998-04-14 The Dow Chemical Company Model predictive controller
JP3293680B2 (ja) * 1993-03-08 2002-06-17 中部電力株式会社 火力発電用ボイラの離散時間モデル規範形適応蒸気温度制御装置
US5519605A (en) * 1994-10-24 1996-05-21 Olin Corporation Model predictive control apparatus and method
US5896294A (en) * 1997-03-11 1999-04-20 Advanced Micro Devices, Inc. Method and apparatus for inspecting manufactured products for defects in response to in-situ monitoring
US5926690A (en) * 1997-05-28 1999-07-20 Advanced Micro Devices, Inc. Run-to-run control process for controlling critical dimensions
US6161054A (en) 1997-09-22 2000-12-12 On-Line Technologies, Inc. Cell control method and apparatus
JPH11272305A (ja) * 1998-03-23 1999-10-08 Toshiba Corp プラント制御装置
US6248602B1 (en) * 1999-11-01 2001-06-19 Amd, Inc. Method and apparatus for automated rework within run-to-run control semiconductor manufacturing
US6337217B1 (en) * 2000-02-14 2002-01-08 Advanced Micro Devices, Inc. Method and apparatus for improved focus in optical processing
US6245581B1 (en) * 2000-04-19 2001-06-12 Advanced Micro Devices, Inc. Method and apparatus for control of critical dimension using feedback etch control

Also Published As

Publication number Publication date
AU2001288856A1 (en) 2002-03-26
CN1459052A (zh) 2003-11-26
EP1317694A2 (de) 2003-06-11
KR20030036791A (ko) 2003-05-09
DE60104705T2 (de) 2005-09-15
TW563218B (en) 2003-11-21
JP2004509407A (ja) 2004-03-25
KR100824443B1 (ko) 2008-04-23
US6988017B2 (en) 2006-01-17
WO2002023289A2 (en) 2002-03-21
CN1186700C (zh) 2005-01-26
WO2002023289A3 (en) 2002-08-29
EP1317694B1 (de) 2004-08-04
US20050221514A1 (en) 2005-10-06

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