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DE3689179D1 - Verfahren zur Herstellung von ätzresistenten Schutzlacken durch bevorzugtes Eindringen. - Google Patents

Verfahren zur Herstellung von ätzresistenten Schutzlacken durch bevorzugtes Eindringen.

Info

Publication number
DE3689179D1
DE3689179D1 DE86107186T DE3689179T DE3689179D1 DE 3689179 D1 DE3689179 D1 DE 3689179D1 DE 86107186 T DE86107186 T DE 86107186T DE 3689179 T DE3689179 T DE 3689179T DE 3689179 D1 DE3689179 D1 DE 3689179D1
Authority
DE
Germany
Prior art keywords
etch
production
resistant protective
protective lacquers
preferential penetration
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE86107186T
Other languages
English (en)
Other versions
DE3689179T2 (de
Inventor
Kaolin Chiong
Bea-Jane Lin Yang
Jer-Ming Yang
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of DE3689179D1 publication Critical patent/DE3689179D1/de
Publication of DE3689179T2 publication Critical patent/DE3689179T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/265—Selective reaction with inorganic or organometallic reagents after image-wise exposure, e.g. silylation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Drying Of Semiconductors (AREA)
DE86107186T 1985-06-06 1986-05-27 Verfahren zur Herstellung von ätzresistenten Schutzlacken durch bevorzugtes Eindringen. Expired - Fee Related DE3689179T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/741,779 US4613398A (en) 1985-06-06 1985-06-06 Formation of etch-resistant resists through preferential permeation

Publications (2)

Publication Number Publication Date
DE3689179D1 true DE3689179D1 (de) 1993-11-25
DE3689179T2 DE3689179T2 (de) 1994-05-05

Family

ID=24982156

Family Applications (1)

Application Number Title Priority Date Filing Date
DE86107186T Expired - Fee Related DE3689179T2 (de) 1985-06-06 1986-05-27 Verfahren zur Herstellung von ätzresistenten Schutzlacken durch bevorzugtes Eindringen.

Country Status (5)

Country Link
US (1) US4613398A (de)
EP (1) EP0204253B1 (de)
JP (1) JPS61284924A (de)
CA (1) CA1251680A (de)
DE (1) DE3689179T2 (de)

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US5362606A (en) * 1989-10-18 1994-11-08 Massachusetts Institute Of Technology Positive resist pattern formation through focused ion beam exposure and surface barrier silylation
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Also Published As

Publication number Publication date
EP0204253A3 (en) 1988-07-27
JPS61284924A (ja) 1986-12-15
EP0204253B1 (de) 1993-10-20
DE3689179T2 (de) 1994-05-05
US4613398A (en) 1986-09-23
EP0204253A2 (de) 1986-12-10
CA1251680A (en) 1989-03-28

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