DE3584105D1 - Ionenquelle. - Google Patents

Ionenquelle.

Info

Publication number: DE3584105D1
Authority: DE; Germany
Prior art keywords: ion source; ion; source
Prior art date: 1984-03-16
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Lifetime

Application number

DE8585101560T

Other languages

English (en)

Inventor

Katsumi Tokiguchi

Hidemi Koike

Noriyuki Sakudo

Osami Okada

Ken Ninomiya

Susumu Ozasa

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Hitachi Ltd

Original Assignee

Hitachi Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1984-03-16

Filing date

1985-02-13

Publication date

1991-10-24

1984-03-16 Priority claimed from JP59049065A external-priority patent/JPH0622107B2/ja

1984-03-16 Priority claimed from JP59049064A external-priority patent/JPS60195853A/ja

1985-02-13 Application filed by Hitachi Ltd filed Critical Hitachi Ltd

1991-10-24 Application granted granted Critical

1991-10-24 Publication of DE3584105D1 publication Critical patent/DE3584105D1/de

2005-02-14 Anticipated expiration legal-status Critical

Status Expired - Lifetime legal-status Critical Current

Classifications

- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D401/00—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom
- C07D401/02—Heterocyclic compounds containing two or more hetero rings, having nitrogen atoms as the only ring hetero atoms, at least one ring being a six-membered ring with only one nitrogen atom containing two hetero rings
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/08—Ion sources; Ion guns
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/022—Details
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
- H01J27/18—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation with an applied axial magnetic field

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Combustion & Propulsion (AREA)
Organic Chemistry (AREA)
Analytical Chemistry (AREA)
Electron Sources, Ion Sources (AREA)

DE8585101560T 1984-03-16 1985-02-13 Ionenquelle. Expired - Lifetime DE3584105D1 (de)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
JP59049065A JPH0622107B2 (ja)	1984-03-16	1984-03-16	イオン源
JP59049064A JPS60195853A (ja)	1984-03-16	1984-03-16	マイクロ波イオン源

Publications (1)

Publication Number	Publication Date
DE3584105D1 true DE3584105D1 (de)	1991-10-24

Family

ID=26389412

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DE8585101560T Expired - Lifetime DE3584105D1 (de)	1984-03-16	1985-02-13	Ionenquelle.

Country Status (4)

Country	Link
US (1)	US4658143A (de)
EP (1)	EP0154824B1 (de)
KR (1)	KR920003156B1 (de)
DE (1)	DE3584105D1 (de)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH0616384B2 (ja) *	1984-06-11	1994-03-02	日本電信電話株式会社	マイクロ波イオン源
JP2530434B2 (ja) *	1986-08-13	1996-09-04	日本テキサス・インスツルメンツ株式会社	イオン発生装置
YU46728B (sh) *	1986-10-23	1994-04-05	VUJO dr. MILJEVIĆ	Jonsko-elektronski izvor sa šupljom anodom
US4797597A (en) *	1986-12-22	1989-01-10	Bostrom Norman A	Microwave ion source
EP0360932A1 (de) *	1988-09-28	1990-04-04	Norman A. Bostrom	Mikrowellen-Ionenquelle
US5053678A (en) *	1988-03-16	1991-10-01	Hitachi, Ltd.	Microwave ion source
US5089746A (en) *	1989-02-14	1992-02-18	Varian Associates, Inc.	Production of ion beams by chemically enhanced sputtering of solids
GB2230644B (en) *	1989-02-16	1994-03-23	Tokyo Electron Ltd	Electron beam excitation ion source
JP2700280B2 (ja) *	1991-03-28	1998-01-19	理化学研究所	イオンビーム発生装置および成膜装置および成膜方法
US5206516A (en) *	1991-04-29	1993-04-27	International Business Machines Corporation	Low energy, steered ion beam deposition system having high current at low pressure
US5196706A (en) *	1991-07-30	1993-03-23	International Business Machines Corporation	Extractor and deceleration lens for ion beam deposition apparatus
US5523652A (en) *	1994-09-26	1996-06-04	Eaton Corporation	Microwave energized ion source for ion implantation
US5914494A (en) *	1996-03-27	1999-06-22	Thermoceramix, Llc	Arc chamber for an ion implantation system
US6022258A (en) *	1996-03-27	2000-02-08	Thermoceramix, Llc	ARC chamber for an ion implantation system
US5857889A (en) *	1996-03-27	1999-01-12	Thermoceramix, Llc	Arc Chamber for an ion implantation system
US6239440B1 (en)	1996-03-27	2001-05-29	Thermoceramix, L.L.C.	Arc chamber for an ion implantation system
US6355933B1 (en) *	1999-01-13	2002-03-12	Advanced Micro Devices, Inc.	Ion source and method for using same
US6627901B2 (en)	2001-01-04	2003-09-30	Nec Electronics, Inc.	Apparatus and method for distribution of dopant gases or vapors in an arc chamber for use in an ionization source
US7122966B2 (en) *	2004-12-16	2006-10-17	General Electric Company	Ion source apparatus and method
KR101103410B1 (ko) *	2009-09-22	2012-01-05	엑스퍼트(주)	이온생성챔버
TWI466179B (zh)	2010-02-26	2014-12-21	Advanced Tech Materials	用以增進離子植入系統中之離子源的壽命及性能之方法與設備
US8779383B2 (en)	2010-02-26	2014-07-15	Advanced Technology Materials, Inc.	Enriched silicon precursor compositions and apparatus and processes for utilizing same
US8686379B1 (en)	2010-09-07	2014-04-01	Joseph C. Robinson	Method and apparatus for preparing serial planar cross sections
US8878147B2 (en)	2010-09-07	2014-11-04	Joseph C. Robinson	Method and apparatus for in situ preparation of serial planar surfaces for microscopy
JP2016534560A (ja)	2013-08-16	2016-11-04	インテグリス・インコーポレーテッド	基板へのシリコン注入およびそのためのシリコン前駆体組成物の提供
US11768176B2 (en)	2022-01-06	2023-09-26	Mks Instruments, Inc.	Ion source with gas delivery for high-fidelity analysis

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE2408829C2 (de) *	1974-02-23	1984-03-22	Ibm Deutschland Gmbh, 7000 Stuttgart	Bor-Ionenquell-Material und Verfahren zu seiner Herstellung
US4058748A (en) *	1976-05-13	1977-11-15	Hitachi, Ltd.	Microwave discharge ion source
US4175234A (en) *	1977-08-05	1979-11-20	University Of Virginia	Apparatus for producing ions of thermally labile or nonvolatile solids
US4139772A (en) *	1977-08-08	1979-02-13	Western Electric Co., Inc.	Plasma discharge ion source
JPS5852297B2 (ja) *	1979-06-04	1983-11-21	株式会社日立製作所	マイクロ波イオン源
US4318028A (en) *	1979-07-20	1982-03-02	Phrasor Scientific, Inc.	Ion generator
US4393333A (en) *	1979-12-10	1983-07-12	Hitachi, Ltd.	Microwave plasma ion source
US4447773A (en) *	1981-06-22	1984-05-08	California Institute Of Technology	Ion beam accelerator system
JPS5923432A (ja) *	1982-07-30	1984-02-06	Hitachi Ltd	プラズマイオン源

1985
- 1985-02-13 EP EP85101560A patent/EP0154824B1/de not_active Expired - Lifetime
- 1985-02-13 DE DE8585101560T patent/DE3584105D1/de not_active Expired - Lifetime
- 1985-02-21 KR KR1019850001084A patent/KR920003156B1/ko not_active IP Right Cessation
- 1985-03-14 US US06/711,824 patent/US4658143A/en not_active Expired - Lifetime

Also Published As

Publication number	Publication date
EP0154824A2 (de)	1985-09-18
EP0154824B1 (de)	1991-09-18
EP0154824A3 (en)	1987-04-29
US4658143A (en)	1987-04-14
KR850006965A (ko)	1985-10-25
KR920003156B1 (ko)	1992-04-20

Publication	Publication Date	Title
DE3689349D1 (de)	1994-01-13	Ionenquelle.
DE3580521D1 (de)	1990-12-20	Mikrowellen-ionenquelle.
DE3584105D1 (de)	1991-10-24	Ionenquelle.
FI853313A0 (fi)	1985-08-29	Speciallins foer glasoegon.
DE3585915D1 (de)	1992-10-15	Ionensensor.
NO170047C (no)	1992-09-02	Elektron-ione-plasmakilde
DE3576880D1 (de)	1990-05-03	Elektronenimpuls-typ-ionenquelle.
FI854248A0 (fi)	1985-10-29	Hermetiskt slutet hoelje foer tunnfilmanordningar.
DE3689232D1 (de)	1993-12-02	Ionenquelle.
DE3881579D1 (de)	1993-07-15	Ionenquelle.
FI842674A (fi)	1986-01-04	Kopplingsanordning foer en borrnacke foer slagborrmaskin.
DE3685374D1 (de)	1992-06-25	Ionenimplantierung.
FI843030A0 (fi)	1984-08-01	Faestanordning foer klaedesplagg.
FI842637A0 (fi)	1984-06-29	Lysaemne.
FI842507A0 (fi)	1984-06-20	Varvraeknare.
IT8523063A0 (it)	1985-12-03	Mezzi fungicidi-selettivi.
FI854369A (fi)	1986-06-04	Styranordning foer plasmagenerator.
FI842309A (fi)	1985-12-08	Skivformig displaykonstruktion.
DD160985A3 (de)	1984-07-11	Ionenquelle
DD229865B1 (de)	1989-07-05	Breitstrahlionenquelle
FI841373A0 (fi)	1984-04-06	Broms foer fordon.
ATE45742T1 (de)	1989-09-15	Hydrazon-substituierte peneme.
FI841093A0 (fi)	1984-03-19	Aendhaollare.
FI841973A (fi)	1985-11-17	Barkningstrumma.
FI841143A0 (fi)	1984-03-21	Bojkrok foer baot.

Legal Events

Date	Code	Title	Description
1992-10-15	8364	No opposition during term of opposition