DE3881579D1 - Ionenquelle. - Google Patents

Ionenquelle.

Info

Publication number: DE3881579D1
Authority: DE; Germany
Prior art keywords: ion source; ion; source
Prior art date: 1987-05-12
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Fee Related

Application number

DE8888303598T

Other languages

English (en)

Other versions

DE3881579T2 (de

Inventor

Stephen Esquejo Sampayan

Monroe Lee King

Robert Alan Moore

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Axcelis Technologies Inc

Original Assignee

Eaton Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1987-05-12

Filing date

1988-04-21

Publication date

1993-07-15

1988-04-21 Application filed by Eaton Corp filed Critical Eaton Corp

1993-07-15 Publication of DE3881579D1 publication Critical patent/DE3881579D1/de

1993-09-23 Application granted granted Critical

1993-09-23 Publication of DE3881579T2 publication Critical patent/DE3881579T2/de

2008-04-22 Anticipated expiration legal-status Critical

Status Expired - Fee Related legal-status Critical Current

Classifications

- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/08—Ion sources; Ion guns using arc discharge

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Combustion & Propulsion (AREA)
Electron Sources, Ion Sources (AREA)

DE8888303598T 1987-05-12 1988-04-21 Ionenquelle. Expired - Fee Related DE3881579T2 (de)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US07/049,759 US4760262A (en)	1987-05-12	1987-05-12	Ion source

Publications (2)

Publication Number	Publication Date
DE3881579D1 true DE3881579D1 (de)	1993-07-15
DE3881579T2 DE3881579T2 (de)	1993-09-23

Family

ID=21961563

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
DE8888303598T Expired - Fee Related DE3881579T2 (de)	1987-05-12	1988-04-21	Ionenquelle.

Country Status (5)

Country	Link
US (1)	US4760262A (de)
EP (1)	EP0291185B1 (de)
JP (1)	JP2724464B2 (de)
CN (1)	CN1017102B (de)
DE (1)	DE3881579T2 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
GB8820359D0 (en) *	1988-08-26	1988-09-28	Atomic Energy Authority Uk	Charged particle grid
US5105123A (en) *	1988-10-27	1992-04-14	Battelle Memorial Institute	Hollow electrode plasma excitation source
US4891525A (en)	1988-11-14	1990-01-02	Eaton Corporation	SKM ion source
US5162699A (en) *	1991-10-11	1992-11-10	Genus, Inc.	Ion source
US5523646A (en) *	1994-08-17	1996-06-04	Tucciarone; John F.	An arc chamber assembly for use in an ionization source
JP3268180B2 (ja) *	1994-11-18	2002-03-25	株式会社東芝	イオン発生装置、イオン照射装置、及び半導体装置の製造方法
US5576600A (en) *	1994-12-23	1996-11-19	Dynatenn, Inc.	Broad high current ion source
US6037587A (en) *	1997-10-17	2000-03-14	Hewlett-Packard Company	Chemical ionization source for mass spectrometry
US6271529B1 (en)	1997-12-01	2001-08-07	Ebara Corporation	Ion implantation with charge neutralization
US6084241A (en) *	1998-06-01	2000-07-04	Motorola, Inc.	Method of manufacturing semiconductor devices and apparatus therefor
AUPP479298A0 (en) *	1998-07-21	1998-08-13	Sainty, Wayne	Ion source
US6630774B2 (en) *	2001-03-21	2003-10-07	Advanced Electron Beams, Inc.	Electron beam emitter
US7804076B2 (en) *	2006-05-10	2010-09-28	Taiwan Semiconductor Manufacturing Co., Ltd	Insulator for high current ion implanters
US9691584B1 (en) *	2016-06-30	2017-06-27	Varian Semiconductor Equipment Associates, Inc.	Ion source for enhanced ionization

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
GB916703A (en) *	1960-05-18	1963-01-23	Atomic Energy Authority Uk	Improvements in or relating to ion sources
US4139772A (en) *	1977-08-08	1979-02-13	Western Electric Co., Inc.	Plasma discharge ion source
DE2855864A1 (de) *	1978-12-22	1980-07-10	Ibm Deutschland	Ionenquelle, insbesondere fuer ionenimplantationsanlagen
JPS59160941A (ja) *	1984-02-17	1984-09-11	Hitachi Ltd	イオン源
US4608513A (en) *	1984-09-13	1986-08-26	Varian Associates, Inc.	Dual filament ion source with improved beam characteristics
JPS61142645A (ja) *	1984-12-17	1986-06-30	Hitachi Ltd	正，負兼用イオン源
JPH06258546A (ja) *	1993-03-09	1994-09-16	Hitachi Ltd	光分配素子、光分配回路及び分配回路構成方法

1987
- 1987-05-12 US US07/049,759 patent/US4760262A/en not_active Expired - Lifetime
1988
- 1988-04-21 EP EP88303598A patent/EP0291185B1/de not_active Expired - Lifetime
- 1988-04-21 DE DE8888303598T patent/DE3881579T2/de not_active Expired - Fee Related
- 1988-05-10 JP JP63113417A patent/JP2724464B2/ja not_active Expired - Fee Related
- 1988-05-11 CN CN88102716A patent/CN1017102B/zh not_active Expired

Also Published As

Publication number	Publication date
EP0291185A3 (en)	1989-12-06
CN1017102B (zh)	1992-06-17
JPS63308854A (ja)	1988-12-16
EP0291185B1 (de)	1993-06-09
DE3881579T2 (de)	1993-09-23
JP2724464B2 (ja)	1998-03-09
US4760262A (en)	1988-07-26
EP0291185A2 (de)	1988-11-17
CN1030327A (zh)	1989-01-11

Publication	Publication Date	Title
DE3689349D1 (de)	1994-01-13	Ionenquelle.
FI883062L (fi)	1988-12-26	Bloeja foer engaongsbruk.
DE3783432D1 (de)	1993-02-18	End-hall-ionenquelle.
DE3880632D1 (de)	1993-06-03	Kuevette.
DE3862564D1 (de)	1991-05-29	Erdanker.
DE3584105D1 (de)	1991-10-24	Ionenquelle.
DE3867976D1 (de)	1992-03-05	Polymergebundene antioxydationsmittel.
IT8821018A0 (it)	1988-06-17	Proietto.
DE3883705D1 (de)	1993-10-07	Alkenylbicyclohexane.
DE3876873D1 (de)	1993-02-04	Weblitzenuebergabevorrichtung.
DE3785663D1 (de)	1993-06-03	Loetgeraet.
FI896364A0 (fi)	1989-12-29	Borrande skaerverktyg foer traeindustri.
DE3876304D1 (de)	1993-01-14	Polysilacylobutasilazane.
DE3882446D1 (de)	1993-08-26	Polydisilacyclobutasilazane.
DE3689232D1 (de)	1993-12-02	Ionenquelle.
DE3881579D1 (de)	1993-07-15	Ionenquelle.
NO872466D0 (no)	1987-06-12	Seismisk kilde.
DE3870513D1 (de)	1992-06-04	Tennisball.
DE3888991D1 (de)	1994-05-19	Aminokohlenwasserstoff-substituierte Ketoximosilane.
FI882409L (fi)	1988-11-23	Svetsbart mikroporoest florplaoster foer medicinskt bruk. pi path slues6208 s880415 mlues6205 m881130
DE3877421D1 (de)	1993-02-25	Polyamidbenzazole.
DE3879348D1 (de)	1993-04-22	Fm-cw-radargeraet.
KR900017084A (ko)	1990-11-15	이온원
NO166619C (no)	1991-08-21	Trinse for skistav.
DE3878970D1 (de)	1993-04-15	Praeparative chromatographiesaeule.

Legal Events

Date	Code	Title	Description
1994-07-07	8364	No opposition during term of opposition
2001-10-11	8327	Change in the person/name/address of the patent owner	Owner name: AXCELIS TECHNOLOGIES, INC., BEVERLY, MASS., US
2005-02-17	8339	Ceased/non-payment of the annual fee