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DE3376713D1 - Double heterojunction field effect transistors - Google Patents

Double heterojunction field effect transistors

Info

Publication number
DE3376713D1
DE3376713D1 DE8383111647T DE3376713T DE3376713D1 DE 3376713 D1 DE3376713 D1 DE 3376713D1 DE 8383111647 T DE8383111647 T DE 8383111647T DE 3376713 T DE3376713 T DE 3376713T DE 3376713 D1 DE3376713 D1 DE 3376713D1
Authority
DE
Germany
Prior art keywords
field effect
effect transistors
heterojunction field
double heterojunction
double
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8383111647T
Other languages
German (de)
Inventor
James J Rosenberg
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of DE3376713D1 publication Critical patent/DE3376713D1/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/60—Electrodes characterised by their materials
    • H10D64/602—Heterojunction gate electrodes for FETs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00—Field-effect transistors [FET]
    • H10D30/40—FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels
    • H10D30/47—FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels having 2D charge carrier gas channels, e.g. nanoribbon FETs or high electron mobility transistors [HEMT]
    • H10D30/471—High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT]
    • H10D30/475—High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT] having wider bandgap layer formed on top of lower bandgap active layer, e.g. undoped barrier HEMTs such as i-AlGaN/GaN HEMTs
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/80—Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
    • H10D62/82—Heterojunctions
DE8383111647T 1982-12-30 1983-11-22 Double heterojunction field effect transistors Expired DE3376713D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/454,741 US4583105A (en) 1982-12-30 1982-12-30 Double heterojunction FET with ohmic semiconductor gate and controllable low threshold voltage

Publications (1)

Publication Number Publication Date
DE3376713D1 true DE3376713D1 (en) 1988-06-23

Family

ID=23805881

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8383111647T Expired DE3376713D1 (en) 1982-12-30 1983-11-22 Double heterojunction field effect transistors

Country Status (4)

Country Link
US (1) US4583105A (en)
EP (1) EP0114962B1 (en)
JP (1) JPS59124171A (en)
DE (1) DE3376713D1 (en)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3334167A1 (en) * 1983-09-21 1985-04-04 Siemens AG, 1000 Berlin und 8000 München SEMICONDUCTOR DIODE
JPS613465A (en) * 1984-06-18 1986-01-09 Fujitsu Ltd Semiconductor device and its manufacturing method
GB2163002B (en) * 1984-08-08 1989-01-05 Japan Res Dev Corp Tunnel injection static induction transistor and its integrated circuit
US4641161A (en) * 1984-09-28 1987-02-03 Texas Instruments Incorporated Heterojunction device
EP0185104B1 (en) * 1984-12-18 1989-04-05 International Business Machines Corporation Low temperature tunneling transistor
GB2172742B (en) * 1985-03-21 1988-08-24 Stc Plc Photoconductor
JPS61241968A (en) * 1985-04-19 1986-10-28 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション semiconductor storage device
US4616242A (en) * 1985-05-08 1986-10-07 International Business Machines Corporation Enhancement and depletion mode selection layer for field effect transistor
US4710478A (en) * 1985-05-20 1987-12-01 United States Of America As Represented By The Secretary Of The Navy Method for making germanium/gallium arsenide high mobility complementary logic transistors
US4689869A (en) * 1986-04-07 1987-09-01 International Business Machines Corporation Fabrication of insulated gate gallium arsenide FET with self-aligned source/drain and submicron channel length
US4860067A (en) * 1986-06-20 1989-08-22 International Business Machines Corporation Semiconductor heterostructure adapted for low temperature operation
JPS633467A (en) * 1986-06-20 1988-01-08 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション semiconductor equipment
EP0264932A1 (en) * 1986-10-24 1988-04-27 Sumitomo Electric Industries Limited Field effect transistor
US4962409A (en) * 1987-01-20 1990-10-09 International Business Machines Corporation Staggered bandgap gate field effect transistor
JPS63196079A (en) * 1987-02-06 1988-08-15 インターナシヨナル・ビジネス・マシーンズ・コーポレーシヨン heterojunction FET
US4866491A (en) * 1987-02-06 1989-09-12 International Business Machines Corporation Heterojunction field effect transistor having gate threshold voltage capability
US4965645A (en) * 1987-03-20 1990-10-23 International Business Machines Corp. Saturable charge FET
JPS6412581A (en) * 1987-07-02 1989-01-17 Ibm Semiconductor device structure
US4821082A (en) * 1987-10-30 1989-04-11 International Business Machines Corporation Heterojunction bipolar transistor with substantially aligned energy levels
US5245207A (en) * 1989-04-21 1993-09-14 Nobuo Mikoshiba Integrated circuit
FR2689683B1 (en) * 1992-04-07 1994-05-20 Thomson Composants Microondes SEMICONDUCTOR DEVICE WITH COMPLEMENTARY TRANSISTORS.
US6121642A (en) * 1998-07-20 2000-09-19 International Business Machines Corporation Junction mott transition field effect transistor (JMTFET) and switch for logic and memory applications
US6518621B1 (en) * 1999-09-14 2003-02-11 General Semiconductor, Inc. Trench DMOS transistor having reduced punch-through
US20040188703A1 (en) * 2003-03-07 2004-09-30 Tongwei Cheng Switch
US7271457B2 (en) * 2005-03-04 2007-09-18 Bae Systems Information And Electronic Systems Integration Inc. Abrupt channel doping profile for fermi threshold field effect transistors
US7465976B2 (en) * 2005-05-13 2008-12-16 Intel Corporation Tunneling field effect transistor using angled implants for forming asymmetric source/drain regions
CN102576727B (en) 2010-06-23 2016-01-27 康奈尔大学 Gated III-V semiconductor structure and method
TWI696290B (en) * 2014-11-26 2020-06-11 南韓商三星電子股份有限公司 Semiconductor device, electronic device and electronic device terminal structure
CN110828564B (en) * 2018-08-13 2022-04-08 香港科技大学 Field effect transistor with semiconducting gate

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3673471A (en) * 1970-10-08 1972-06-27 Fairchild Camera Instr Co Doped semiconductor electrodes for mos type devices
US4151635A (en) * 1971-06-16 1979-05-01 Signetics Corporation Method for making a complementary silicon gate MOS structure
US4075652A (en) * 1974-04-17 1978-02-21 Matsushita Electronics Corporation Junction gate type gaas field-effect transistor and method of forming
CA1145482A (en) * 1979-12-28 1983-04-26 Takashi Mimura High electron mobility single heterojunction semiconductor device
FR2497603A1 (en) * 1981-01-06 1982-07-09 Thomson Csf TRANSISTOR WITH LOW SWITCHING TIME OF NORMALLY BLOCKING TYPE
JPS5851574A (en) * 1981-09-22 1983-03-26 Fujitsu Ltd semiconductor equipment
JPS58119671A (en) * 1982-01-09 1983-07-16 Agency Of Ind Science & Technol Field effect transistor and integrated circuit wherein it is used

Also Published As

Publication number Publication date
EP0114962B1 (en) 1988-05-18
JPS59124171A (en) 1984-07-18
EP0114962A2 (en) 1984-08-08
US4583105A (en) 1986-04-15
JPH0371776B2 (en) 1991-11-14
EP0114962A3 (en) 1985-07-31

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition