GB2143082B - Bipolar lateral transistor - Google Patents
Bipolar lateral transistorInfo
- Publication number
- GB2143082B GB2143082B GB08318320A GB8318320A GB2143082B GB 2143082 B GB2143082 B GB 2143082B GB 08318320 A GB08318320 A GB 08318320A GB 8318320 A GB8318320 A GB 8318320A GB 2143082 B GB2143082 B GB 2143082B
- Authority
- GB
- United Kingdom
- Prior art keywords
- lateral transistor
- bipolar lateral
- bipolar
- transistor
- lateral
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/40—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00 with at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of IGFETs with BJTs
- H10D84/401—Combinations of FETs or IGBTs with BJTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D10/00—Bipolar junction transistors [BJT]
- H10D10/60—Lateral BJTs
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/80—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs
- H10D84/82—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components
- H10D84/83—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D12/00 or H10D30/00, e.g. integration of IGFETs of only field-effect components of only insulated-gate FETs [IGFET]
- H10D84/85—Complementary IGFETs, e.g. CMOS
- H10D84/857—Complementary IGFETs, e.g. CMOS comprising an N-type well but not a P-type well
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB08318320A GB2143082B (en) | 1983-07-06 | 1983-07-06 | Bipolar lateral transistor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB08318320A GB2143082B (en) | 1983-07-06 | 1983-07-06 | Bipolar lateral transistor |
Publications (3)
Publication Number | Publication Date |
---|---|
GB8318320D0 GB8318320D0 (en) | 1983-08-10 |
GB2143082A GB2143082A (en) | 1985-01-30 |
GB2143082B true GB2143082B (en) | 1987-06-17 |
Family
ID=10545330
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB08318320A Expired GB2143082B (en) | 1983-07-06 | 1983-07-06 | Bipolar lateral transistor |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB2143082B (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2581248B1 (en) * | 1985-04-26 | 1987-05-29 | Efcis | METHOD FOR MANUFACTURING FIELD-EFFECT TRANSISTORS AND LATERAL BIPOLAR TRANSISTORS ON THE SAME SUBSTRATE |
US4727046A (en) * | 1986-07-16 | 1988-02-23 | Fairchild Semiconductor Corporation | Method of fabricating high performance BiCMOS structures having poly emitters and silicided bases |
KR900001062B1 (en) * | 1987-09-15 | 1990-02-26 | 강진구 | Manufacturing Method of Semiconductor By Sea Morse Device |
EP0396948B1 (en) * | 1989-04-21 | 1997-12-29 | Nec Corporation | Bi-cmos integrated circuit |
DE4137101A1 (en) * | 1991-02-28 | 1992-09-03 | Daimler Benz Ag | LATERAL SEMICONDUCTOR COMPONENT |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3873989A (en) * | 1973-05-07 | 1975-03-25 | Fairchild Camera Instr Co | Double-diffused, lateral transistor structure |
JPS56131954A (en) * | 1980-03-19 | 1981-10-15 | Nippon Telegr & Teleph Corp <Ntt> | Semiconductor device |
-
1983
- 1983-07-06 GB GB08318320A patent/GB2143082B/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
GB2143082A (en) | 1985-01-30 |
GB8318320D0 (en) | 1983-08-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
732E | Amendments to the register in respect of changes of name or changes affecting rights (sect. 32/1977) | ||
PCNP | Patent ceased through non-payment of renewal fee |
Effective date: 19930706 |