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DE3173516D1 - Process for forming film of fluoroalkyl acrylate polymer on substrate and process for preparing patterned resist from the film - Google Patents

Process for forming film of fluoroalkyl acrylate polymer on substrate and process for preparing patterned resist from the film

Info

Publication number
DE3173516D1
DE3173516D1 DE8181108158T DE3173516T DE3173516D1 DE 3173516 D1 DE3173516 D1 DE 3173516D1 DE 8181108158 T DE8181108158 T DE 8181108158T DE 3173516 T DE3173516 T DE 3173516T DE 3173516 D1 DE3173516 D1 DE 3173516D1
Authority
DE
Germany
Prior art keywords
film
substrate
acrylate polymer
patterned resist
fluoroalkyl acrylate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8181108158T
Other languages
English (en)
Inventor
Shuzo Hattori
Shinzo Morita
Tsuneo Fujii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daikin Industries Ltd
Original Assignee
Daikin Industries Ltd
Daikin Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP14219880A external-priority patent/JPS5789753A/ja
Priority claimed from JP8409381A external-priority patent/JPS585735A/ja
Priority claimed from JP8409281A external-priority patent/JPS585734A/ja
Application filed by Daikin Industries Ltd, Daikin Kogyo Co Ltd filed Critical Daikin Industries Ltd
Application granted granted Critical
Publication of DE3173516D1 publication Critical patent/DE3173516D1/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/167—Coating processes; Apparatus therefor from the gas phase, by plasma deposition
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/52—Polymerisation initiated by wave energy or particle radiation by electric discharge, e.g. voltolisation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/22—Esters containing halogen
    • C08F20/24—Esters containing halogen containing perhaloalkyl radicals
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/36—Imagewise removal not covered by groups G03F7/30 - G03F7/34, e.g. using gas streams, using plasma

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polymerisation Methods In General (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE8181108158T 1980-10-11 1981-10-10 Process for forming film of fluoroalkyl acrylate polymer on substrate and process for preparing patterned resist from the film Expired DE3173516D1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP14219880A JPS5789753A (en) 1980-10-11 1980-10-11 Formation of fluoroalkyl acrylate polymer film on substrate
JP8409381A JPS585735A (ja) 1981-06-01 1981-06-01 基板上にパタ−ンが形成されたレジスト被膜を製造する方法
JP8409281A JPS585734A (ja) 1981-06-01 1981-06-01 基板上にパタ−ンが形成されたレジスト被膜を製造する方法

Publications (1)

Publication Number Publication Date
DE3173516D1 true DE3173516D1 (en) 1986-02-27

Family

ID=27304439

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8181108158T Expired DE3173516D1 (en) 1980-10-11 1981-10-10 Process for forming film of fluoroalkyl acrylate polymer on substrate and process for preparing patterned resist from the film

Country Status (3)

Country Link
US (3) US4382985A (de)
EP (1) EP0049884B1 (de)
DE (1) DE3173516D1 (de)

Families Citing this family (42)

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EP0090089B1 (de) * 1981-12-19 1988-10-05 Daikin Kogyo Co., Ltd. Resistmaterial und Verfahren zur Herstellung eines feinen Resistmusters
GB2121198A (en) * 1982-05-26 1983-12-14 Philips Electronic Associated Plasma-etch resistant mask formation
JPS5924846A (ja) * 1982-07-26 1984-02-08 エスヴィージー・リトグラフィー・システムズ・インコーポレイテッド ホトレジストの乾式現像法
US4562091A (en) * 1982-12-23 1985-12-31 International Business Machines Corporation Use of plasma polymerized orgaosilicon films in fabrication of lift-off masks
US4493855A (en) * 1982-12-23 1985-01-15 International Business Machines Corporation Use of plasma polymerized organosilicon films in fabrication of lift-off masks
JPH0766528B2 (ja) * 1983-03-18 1995-07-19 富士写真フイルム株式会社 磁気記録媒体
US4711809A (en) * 1983-09-26 1987-12-08 Fuji Photo Film Co., Ltd. Magnetic recording medium
JPS60191446A (ja) * 1984-03-09 1985-09-28 Daikin Ind Ltd 光デイスク材料
EP0157262B1 (de) * 1984-03-19 1988-06-08 Nippon Oil Co. Ltd. Elektronenstrahlenempfindliche Materialien
DE3782833T2 (de) * 1986-02-10 1993-05-19 Loctite Ireland Ltd Im vakuum aufgebrachte photolacke aus anionisch polymerisierbaren monomeren.
JPH0778629B2 (ja) * 1986-12-19 1995-08-23 ミノルタ株式会社 ポジ型レジスト膜及びそのレジストパターンの形成方法
EP0393271A1 (de) * 1987-08-08 1990-10-24 The Standard Oil Company Dünnschichtüberzüge aus Fluorpolymer und Verfahren zu ihrer Herstellung durch Plasmapolymerisation
EP0380667A4 (en) * 1987-10-07 1991-04-24 Terumo Kabushiki Kaisha Ultraviolet-absorbing polymer material and photoetching process
US5035917A (en) * 1989-06-22 1991-07-30 Siemens Aktiengesellschaft Method of preparing layers of vinylidene fluoride polymers and vinylidene fluoride/trifluoroethylene copolymers on a substrate
US5013139A (en) * 1989-10-30 1991-05-07 General Electric Company Alignment layer for liquid crystal devices and method of forming
US5254372A (en) * 1991-02-27 1993-10-19 Nichols Technologies, Inc. Method and apparatus for plasma treatment of a filament
US5683540A (en) * 1995-06-26 1997-11-04 Boeing North American, Inc. Method and system for enhancing the surface of a material for cleaning, material removal or as preparation for adhesive bonding or etching
GB9712338D0 (en) 1997-06-14 1997-08-13 Secr Defence Surface coatings
PT988412E (pt) * 1997-06-14 2006-05-31 Secr Defence Revestimentos de superficies
GB9812457D0 (en) * 1998-06-10 1998-08-05 Secr Defence Surface coatings
US6849377B2 (en) 1998-09-23 2005-02-01 E. I. Du Pont De Nemours And Company Photoresists, polymers and processes for microlithography
US6593058B1 (en) 1998-09-23 2003-07-15 E. I. Du Pont De Nemours And Company Photoresists, polymers and processes for microlithography
DE19933230C2 (de) * 1999-04-15 2002-06-13 Fraunhofer Ges Forschung Release-Schicht, Verfahren zu ihrer Herstellung sowie Verwendung
DE19935181C5 (de) * 1999-07-27 2004-05-27 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren zum Schutz eines vakuumtechnisch bearbeiteten Substrates und Verwendung des Verfahrens
WO2001037047A2 (en) * 1999-11-17 2001-05-25 E.I. Du Pont De Nemours And Company Nitrile/fluoroalcohol polymer-containing photoresists and associated processes for microlithography
US6951705B2 (en) 2000-05-05 2005-10-04 E. I. Du Pont De Nemours And Company Polymers for photoresist compositions for microlithography
US6809216B2 (en) * 2001-06-18 2004-10-26 Honeywell International Inc. Fluorine-containing compounds and polymers derived therefrom
CA2381128A1 (en) * 2002-04-09 2003-10-09 Quantiscript Inc. Plasma polymerized electron beam resist
GB0406049D0 (en) * 2004-03-18 2004-04-21 Secr Defence Surface coatings
GB0423685D0 (en) 2004-10-26 2004-11-24 Dow Corning Ireland Ltd Improved method for coating a substrate
DE102006060932A1 (de) * 2006-12-20 2008-07-03 Carl Freudenberg Kg Temperaturstabile plasmabehandelte Gebilde und Verfahren zu deren Herstellung
KR101228690B1 (ko) * 2008-06-10 2013-02-01 가부시키가이샤 가네카 불소 수지 필름 및 불소 수지 적층 아크릴계 수지 필름
US8852693B2 (en) 2011-05-19 2014-10-07 Liquipel Ip Llc Coated electronic devices and associated methods
EP2756008A4 (de) * 2011-09-14 2015-05-13 Pacifitech Pty Ltd Plasmabehandlung von halogenierten verbindungen
US9341945B2 (en) * 2013-08-22 2016-05-17 Taiwan Semiconductor Manufacturing Company, Ltd. Photoresist and method of formation and use
BE1021288B1 (nl) 2013-10-07 2015-10-20 Europlasma Nv Verbeterde manieren om plasma te genereren op continue vermogens wijze voor lage druk plasma processen
US9968963B2 (en) * 2015-08-31 2018-05-15 Sigma Laboratories Of Arizona, Llc Functional coating
CN107201511B (zh) * 2017-05-21 2018-07-13 江苏菲沃泰纳米科技有限公司 一种循环周期交替放电制备多功能性纳米防护涂层的方法
US11742186B2 (en) 2017-05-21 2023-08-29 Jiangsu Favored Nanotechnology Co., LTD Multi-functional protective coating
CN107142466B (zh) * 2017-05-21 2018-05-11 江苏菲沃泰纳米科技有限公司 一种小功率连续放电制备多功能性纳米防护涂层的方法
US10847336B2 (en) * 2017-08-17 2020-11-24 Bruker AXS, GmbH Analytical X-ray tube with high thermal performance
US11262654B2 (en) * 2019-12-27 2022-03-01 Intel Corporation Chain scission resist compositions for EUV lithography applications

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4087584A (en) * 1975-10-31 1978-05-02 Ricoh Co., Ltd. Lithographic printing plate
DE2835625A1 (de) * 1978-02-28 1979-09-06 Univ California Polymerisationsverfahren

Also Published As

Publication number Publication date
EP0049884B1 (de) 1986-01-15
EP0049884A1 (de) 1982-04-21
US4421842A (en) 1983-12-20
US4382985A (en) 1983-05-10
US4421843A (en) 1983-12-20

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee