CN221107508U - Waste gas treatment device and photoresist removing equipment - Google Patents

Abstract

The utility model provides an exhaust gas treatment device and photoresist removing equipment, wherein the exhaust gas treatment device comprises an exhaust pipeline, a filtering unit and a cooling unit, wherein the filtering unit is detachably arranged on the exhaust pipeline and can filter exhaust gas in the exhaust pipeline so as to filter impurities in the exhaust gas, thereby reducing or avoiding crystallization of the impurities in the exhaust gas in the pipeline and further reducing the probability of pipeline blockage. In addition, because the detachable filter unit sets up on the blast pipe way, it is comparatively convenient to dismantle, can be convenient for wash. And the cooling unit is arranged on the outer side wall of the filtering unit to cool the exhaust gas in the exhaust pipeline, so that the temperature in the exhaust pipeline is reduced, and the problem of high-temperature fracture of the pipeline is avoided.

Description

Waste gas treatment device and photoresist removing equipment

Technical Field

The utility model relates to the technical field of semiconductors, in particular to an exhaust gas treatment device and photoresist removing equipment.

Background

In semiconductor processing, photolithography is a relatively common process step, and a photoresist (also referred to as photoresist) is generally used to form a desired pattern, and after the photolithography is completed, the remaining photoresist is removed, which requires a photoresist removing apparatus. The photoresist removing apparatus works on the principle that photoresist is chemically reacted and volatilized, so that during the operation of the photoresist removing apparatus, waste gases are generated in the process chamber, and the waste gases need to be periodically discharged through the waste gas treatment device. However, in the conventional exhaust gas treatment device, some impurities are often contained in the exhaust line of the exhaust gas treatment device, and crystallization is likely to occur, which results in blockage of the exhaust line. And because the temperature of the exhaust gas is relatively high (usually more than 250 ℃), the components on the exhaust pipeline or the components connected with the exhaust pipeline (such as a hose) are in a high-temperature environment for a long time, so that breakage can occur, and the exhaust gas in the process cavity is influenced.

Disclosure of utility model

The utility model aims to provide an exhaust gas treatment device and photoresist stripping equipment, which can reduce or avoid crystallization in an exhaust pipeline and is beneficial to reducing the temperature in the exhaust pipeline.

In order to achieve the above object, the present utility model provides an exhaust gas treatment device comprising:

the exhaust pipeline is communicated with a process cavity to exhaust the waste gas in the process cavity;

The filtering unit is detachably arranged on the exhaust pipeline to filter the exhaust gas in the exhaust pipeline;

and the cooling unit is arranged on the outer side wall of the filtering unit to cool the exhaust gas in the exhaust pipeline.

Optionally, in the exhaust gas treatment device, the filtering unit is detachably disposed on the exhaust pipe through a flange connection.

Optionally, in the exhaust gas treatment device, the filtering unit includes a cavity structure, and the cooling unit surrounds at least a portion of an outer side wall of the cavity structure.

Optionally, in the exhaust gas treatment device, the filtering unit further includes at least two adsorption layers, and the at least two adsorption layers are disposed in the cavity structure at intervals along an axial direction of the cavity structure.

Optionally, in the exhaust gas treatment device, the exhaust gas treatment device further includes a cleaning pipe and a cleaning nozzle, the cleaning nozzle is communicated with the cleaning pipe, and an opening of the cleaning nozzle faces the adsorption layer.

Optionally, in the exhaust gas treatment device, the exhaust gas treatment device includes two cleaning nozzles, the two cleaning nozzles are located at two opposite sides of the filtering unit, and each cleaning nozzle is connected to one cleaning pipeline respectively.

Optionally, in the exhaust gas treatment device, the exhaust gas treatment device includes two cleaning nozzles, the two cleaning nozzles are located on the same side of the filtering unit, and the two cleaning nozzles are connected to the same cleaning pipeline.

Optionally, in the exhaust gas treatment device, the exhaust gas treatment device further includes an electric valve, and the electric valve is disposed on an exhaust line between the process chamber and the filtering unit.

Optionally, in the exhaust gas treatment device, the exhaust gas treatment device further includes a first vacuum valve, a second vacuum valve, an air pipe and an air cylinder, wherein the first vacuum valve and the second vacuum valve are both disposed on an exhaust pipe of one end of the electric valve, which is far away from the filtering unit, and the air cylinder is connected with the first vacuum valve through the air pipe.

Based on the same conception, the utility model also provides a photoresist stripping device which comprises the waste gas treatment device.

The exhaust gas treatment device provided by the utility model is provided with the exhaust pipeline, the filtering unit and the cooling unit, wherein the filtering unit is detachably arranged on the exhaust pipeline and can filter the exhaust gas in the exhaust pipeline so as to filter impurities in the exhaust gas, thereby reducing or avoiding crystallization of the impurities in the exhaust gas in the pipeline and further reducing the probability of pipeline blockage. In addition, because the detachable filter unit sets up on the blast pipe way, it is comparatively convenient to dismantle, can be convenient for wash. And the cooling unit is arranged on the outer side wall of the filtering unit to cool the exhaust gas in the exhaust pipeline, so that the temperature in the exhaust pipeline is reduced, and the problem of high-temperature fracture of the pipeline is avoided.

Drawings

FIG. 1 is a schematic diagram of an exhaust gas treatment device according to an embodiment of the present utility model;

FIG. 2 is a schematic cross-sectional view of a filter unit and a cooling unit in an exhaust gas treatment device according to an embodiment of the present utility model;

FIG. 3 is a schematic cross-sectional view of another filter unit and cooling unit in an exhaust gas treatment device according to an embodiment of the present utility model;

wherein reference numerals are as follows:

100-an exhaust line;

101-a process chamber;

102-wafer;

103-a bearing table;

110-a filtration unit;

111-cavity structure;

112-an adsorption layer;

120-a cooling unit;

121-a water storage part;

122-water inlet;

123-a drain port;

130-cleaning the pipeline;

131-cleaning a spray head;

140-an electric valve;

150-a first vacuum valve;

160-a second vacuum valve;

170-trachea;

180-cylinder;

190-vacuum pump.

Detailed Description

The exhaust gas treatment device and the photoresist removing apparatus according to the present utility model will be described in further detail with reference to the accompanying drawings and specific embodiments. The advantages and features of the present utility model will become more apparent from the following description. It should be noted that the drawings are in a very simplified form and are all to a non-precise scale, merely for convenience and clarity in aiding in the description of embodiments of the utility model.

The terms "first," "second," and the like, as used in this document, do not denote any order, quantity, or importance, but rather are used to distinguish one element from another. Likewise, the terms "a" or "an" and the like do not denote a limitation of quantity, but rather denote the presence of at least one. "plurality" or "plurality" means two or more. Unless otherwise indicated, the terms "front," "rear," "lower," and/or "upper" and the like are merely for convenience of description and are not limited to one location or one spatial orientation. The word "comprising" or "comprises", and the like, means that elements or items appearing before "comprising" or "comprising" are encompassed by the element or item recited after "comprising" or "comprising" and equivalents thereof, and that other elements or items are not excluded. The terms "connected" or "connected," and the like, are not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect. As used in this document, the singular forms "a", "an" and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise. It should also be understood that the term "and/or" as used in this document refers to and encompasses any or all possible combinations of one or more of the associated listed items.

Fig. 1 is a schematic diagram of an exhaust gas treatment device according to an embodiment of the present utility model. As shown in fig. 1, the present embodiment provides an exhaust gas treatment device including an exhaust gas line 100, a filtering unit 110, and a cooling unit 120.

The exhaust line 100 is used to communicate with the process chamber 101 to exhaust the exhaust gas in the process chamber 101, i.e., the inlet end of the exhaust line 100 communicates with the process chamber. In this embodiment, the process chamber 101 may be a process chamber of a photoresist stripping apparatus, and the process chamber 101 may house a carrier 103, where the carrier 103 may be used to carry a wafer 102 to perform a related process on the wafer 102. The exhaust end of the exhaust line 100 is connected to a vacuum pump 190, and the vacuum pump 190 may suck the exhaust gas in the process chamber 110 through the exhaust line 100 to exhaust the exhaust gas in the process chamber 101. The photoresist remover operates on the principle that photoresist is chemically reacted and volatilized, so that the exhaust gas in the process chamber 101 needs to be exhausted during the photoresist removing process. At the same time, the temperature of the process chamber 101 during use is typically above 250 ℃ so that the photoresist is removed cleanly.

As shown in fig. 1, the filtering unit 110 is detachably disposed on the exhaust pipe 100 to filter the exhaust gas in the exhaust pipe 100, thereby reducing or avoiding crystallization of impurities in the exhaust gas, and thus reducing or even completely avoiding pipe blockage. In addition, since the filtering unit 110 is detachably disposed on the exhaust pipeline 100, the disassembly is convenient and the cleaning is convenient.

Specifically, the filtering unit 110 is detachably disposed on the exhaust pipe 100 through flange connection. Wherein, two ends of the filter unit 110 are respectively connected with the flange of the exhaust pipeline 100, that is, each end of the filter unit 110 is fixed on one flange, the position where the exhaust pipeline 100 is connected with the filter unit 110 is fixed with the other flange, the two flanges (the flange connected with one end of the filter unit 110 and the flange connected with the exhaust pipeline 100) are fixed by bolts, and a flange pad is arranged between the two flanges to tightly connect the two flanges.

Fig. 2 is a schematic cross-sectional view of a filtering unit and a cooling unit in an exhaust gas treatment device according to an embodiment of the present utility model. Referring to fig. 2, the filter unit 110 includes a cavity structure 111, and exhaust gas discharged from the process chamber 101 enters the cavity structure 111 of the filter unit 110 through the exhaust pipe 100, and is filtered by the filter unit 110 and then discharged into the exhaust pipe 100. That is, the filter unit 110 is constructed as a hollow cylinder. Preferably, the inner diameter of the filter unit 110 may be the same as the inner diameter of the exhaust pipe 100, so that the filter unit 110 may be better connected to the exhaust pipe 100.

In this embodiment, the filtering unit 110 further includes at least two adsorption layers 112, and the adsorption layers 112 are disposed in the cavity structure 111 at intervals along the axial direction of the cavity structure 111, so that the exhaust gas in the process chamber 101 can enter the cavity structure 111 and be discharged after being filtered by the adsorption layers 112, thereby filtering out impurities in the exhaust gas. In detail, the adsorption layer 112 has an adsorbent, which is activated carbon, activated carbon fiber, calcium oxide, molecular sieve or adsorption resin, so that the filtering of impurities in the exhaust gas can be achieved by the adsorbent. Because the filter unit 110 is detachably disposed on the exhaust pipeline 100, the adsorption layer 112 is convenient to detach, which is beneficial to replacing the adsorption layer 112.

As shown in fig. 2, the cooling unit 120 is disposed on an outer sidewall of the filtering unit 110 to cool the exhaust gas in the exhaust pipe 100. Further, the cooling unit 120 can reduce the temperature in the cavity structure 111, and the exhaust gas in the cavity structure 111 enters the exhaust pipeline 100 after being cooled, so that the temperature in the exhaust pipeline 100 can be reduced, and the exhaust pipeline 100 is prevented from being in a high-temperature environment, thereby avoiding the problem of high-temperature fracture of the pipeline.

In this embodiment, the cooling unit 120 surrounds at least a portion of the outer sidewall of the cavity structure 111. At the time of actual installation, the cooling unit 120 may be detachably connected with the filtering unit 110 by a snap. The buckle comprises at least two limiting buckle plates which are distributed in an annular mode and limiting protruding blocks matched with the limiting buckle plates.

As shown in fig. 2, the cooling unit 120 includes a water storage part 121, the water storage part 121 surrounds at least a portion of the outer sidewall of the cavity structure 111, and the water storage part 121 may receive cooling water to reduce the temperature inside the cavity structure 111 by the cooling water. Wherein, the inside wall of the water storage part 121 is attached to a part of the outside wall of the cavity structure 111. Preferably, the surface of the water storage part 121, which is attached to a part of the outer side wall of the cavity structure 111, is cylindrical, so that the water storage part 121 can be better attached to a part of the outer side wall of the cavity structure 111.

The limiting buckle plate can be arranged on part of the outer side wall of the cavity structure 111 or part of the inner side wall of the water storage part 121, and the limiting protruding block is correspondingly arranged on part of the inner side wall of the water storage part 121 or part of the outer side wall of the cavity structure 111, so that the cooling unit 120 and the filtering unit 110 can be detachably connected.

As shown in fig. 2, the cooling unit 120 further includes a water inlet 122 and a water outlet 123, cooling water may enter the water storage part 121 through the water inlet 122, and the water storage part 121 may be discharged through the water outlet 123, and the temperature in the cavity structure 111 may be lowered by introducing cooling water into the water storage part 121, thereby lowering the temperature of exhaust gas in the exhaust pipe 100. In this embodiment, the water inlet 122 and the water outlet 123 of the cooling unit 120 may be connected to a factory end, cooling water is supplied from the factory end into the water inlet 122, and the cooling water discharged from the water outlet 123 is processed, such as a cooling process, by the factory end.

Referring to fig. 2, the exhaust gas treatment device further includes a cleaning pipe 130 and a cleaning nozzle 131, wherein the cleaning nozzle 131 is communicated with the cleaning pipe 130, and an opening of the cleaning nozzle 131 faces the adsorption layer 112. The cleaning nozzle 131 is disposed on a sidewall of the filtering unit 110 that is not surrounded by the cooling unit 120, and the cleaning gas may be introduced into the cleaning nozzle 131 through the cleaning pipe 130, and the cleaning gas may be introduced into the cavity structure 111 through the cleaning nozzle 131 and sprayed onto the adsorption layer 112 to clean the adsorption layer 112.

As shown in fig. 2, in one embodiment, the exhaust gas treatment device includes two cleaning nozzles 131, where the two cleaning nozzles 131 are located on opposite sides of the filter unit 110, and each cleaning nozzle 131 is connected to one cleaning pipeline 130, and cleaning gas may be respectively introduced into the cavity structure 111 through the two non-communicating cleaning nozzles 131.

Fig. 3 is a schematic cross-sectional view of another filtering unit and cooling unit in an exhaust gas treatment device according to an embodiment of the present utility model. As shown in fig. 3, in another embodiment, the exhaust gas treatment device includes two cleaning nozzles 131, the two cleaning nozzles 131 are located on the same side of the filtering unit 110, and the two cleaning nozzles 131 are connected to the same cleaning pipeline 130, and the two cleaning nozzles 131 are communicated with each other, so that the two cleaning nozzles 131 only need to be connected to one cleaning pipeline 130, and the connection of the pipelines is relatively simple.

As shown in fig. 1, in the present embodiment, the exhaust gas treatment device further includes an electric valve 140, and the electric valve 140 is disposed on the exhaust line 100 between the process chamber 101 and the filtering unit 110 to control the exhaust gas in the process chamber 101. The electric valve 140 may be a normally closed electric valve 140, and after exhaust gas in the process chamber 101 is exhausted, the exhaust pipe 100 may be closed, so that the process chamber 101 is in a vacuum state. In addition, the electric valve 140 is used for controlling the exhaust gas in the process chamber 101, the valve of the electric valve 140 is convenient to control, intelligent control can be realized, and the production efficiency is improved.

With continued reference to fig. 1, the exhaust gas treatment device further includes a first vacuum valve 150, a second vacuum valve 160, an air pipe 170, and an air cylinder 180, where the first vacuum valve 150 and the second vacuum valve 160 are disposed on the exhaust pipe 100 at an end of the electric valve 140 remote from the filter unit 110. The cylinder 180 is connected with the first vacuum valve 150 through the air pipe 170 to realize the control of the opening and closing of the first vacuum valve 150. In addition, since impurities in the exhaust gas are filtered out by the filtering unit 110, crystallization of the exhaust gas can be prevented, and thus the first vacuum valve 150 does not need to wrap a heating jacket (the heating jacket is to prevent crystallization of the exhaust gas in a low temperature environment after passing through the first vacuum valve 150).

In this embodiment, the first vacuum valve 150 and the second vacuum valve 160 are used to regulate the flow rate of the exhaust gas from the process chamber 101, and the flow rate of the exhaust gas from the first vacuum valve 150 is smaller than the flow rate of the exhaust gas from the second vacuum valve 160.

Illustratively, the first vacuum valve 150 and the second vacuum valve 160 operate as follows: the exhaust gas in the process chamber 101 is exhausted, the first vacuum valve 150 is opened to exhaust the exhaust gas in the process chamber 101, and when the air pressure in the process chamber 101 reaches a predetermined value (for example, 300000 mTorr), the first vacuum valve 150 is closed, the second vacuum valve 160 is opened, and then the exhaust gas in the process chamber 101 is exhausted through the second vacuum valve 160 until the process chamber 101 is in a vacuum state.

Based on the same conception, the embodiment also provides a photoresist stripping device. The photoresist removing equipment comprises a process cavity and the waste gas treatment device. By adopting the waste gas treatment device, the machine fault alarming times and the times of processing machine faults by engineers can be reduced, and meanwhile, the operation time of the machine is prolonged.

In summary, in the exhaust gas treatment device and the photoresist removing equipment provided by the utility model, the exhaust gas treatment device comprises the exhaust pipeline, the filtering unit and the cooling unit, wherein the filtering unit is detachably arranged on the exhaust pipeline and can filter the exhaust gas in the exhaust pipeline so as to filter impurities in the exhaust gas, thereby reducing or avoiding crystallization of the impurities in the exhaust gas in the pipeline and further reducing the probability of pipeline blockage. In addition, because the detachable filter unit sets up on the blast pipe way, it is comparatively convenient to dismantle, can be convenient for wash. And the cooling unit is arranged on the outer side wall of the filtering unit to cool the exhaust gas in the exhaust pipeline, so that the temperature in the exhaust pipeline is reduced, and the problem of high-temperature fracture of the pipeline is avoided.

The above description is only illustrative of the preferred embodiments of the present utility model and is not intended to limit the scope of the present utility model, and any alterations and modifications made by those skilled in the art based on the above disclosure shall fall within the scope of the appended claims.

Claims (10)

1. An exhaust gas treatment device, comprising:

the exhaust pipeline is communicated with a process cavity to exhaust the waste gas in the process cavity;

The filtering unit is detachably arranged on the exhaust pipeline to filter the exhaust gas in the exhaust pipeline;

and the cooling unit is arranged on the outer side wall of the filtering unit to cool the exhaust gas in the exhaust pipeline.

2. The exhaust gas treatment device of claim 1, wherein the filter unit is detachably disposed on the exhaust line by means of a flange connection.

3. The exhaust treatment device of claim 1, wherein the filter unit includes a cavity structure, and the cooling unit surrounds at least a portion of an outer sidewall of the cavity structure.

4. The exhaust treatment device of claim 3, wherein the filter unit further comprises at least two adsorbent layers disposed within the cavity structure at intervals along an axial direction of the cavity structure.

5. The exhaust gas treatment device of claim 4, further comprising a purge line and a purge nozzle in communication with the purge line, the purge nozzle opening toward the adsorbent layer.

6. The exhaust gas treatment device of claim 5, comprising two of said cleaning heads, two of said cleaning heads being located on opposite sides of said filter unit, and each of said cleaning heads being connected to one of said cleaning lines.

7. The exhaust gas treatment device of claim 5, comprising two of said cleaning heads, both of said cleaning heads being located on the same side of said filter unit and both of said cleaning heads being connected to the same cleaning line.

8. The exhaust gas treatment device of claim 1, further comprising an electrically operated valve disposed on the exhaust line between the process chamber and the filter unit.

9. The exhaust gas treatment device according to claim 8, further comprising a first vacuum valve, a second vacuum valve, an air pipe, and an air cylinder, wherein the first vacuum valve and the second vacuum valve are both disposed on an exhaust pipe of an end of the electric valve remote from the filter unit, and the air cylinder is connected to the first vacuum valve through the air pipe.

10. A photoresist stripping apparatus comprising an exhaust gas treatment device according to any one of claims 1 to 9.