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CN202084018U - touch panel - Google Patents

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CN202084018U
CN202084018U CN2011201473305U CN201120147330U CN202084018U CN 202084018 U CN202084018 U CN 202084018U CN 2011201473305 U CN2011201473305 U CN 2011201473305U CN 201120147330 U CN201120147330 U CN 201120147330U CN 202084018 U CN202084018 U CN 202084018U
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metal
contact panel
metal wire
line
transparent
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李志晏
黄冠铭
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RitFast Corp
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Abstract

本实用新型的一实施例提供一种触控面板,包含:一透明基板,包含一感测区域及一外围区域;多个透明桥接线,局部覆盖该感测区域;一绝缘层,局部覆盖该透明桥接线;多个金属线,局部覆盖该外围区域;以及一透明导电层,至少覆盖该透明桥接线及该金属线,该透明导电层包含多个第一单元、多个第二单元及多个连接线,所述多个第一单元及所述多个第二单元交错布置,该连接线连接两相邻的该第二单元,该透明桥接线连接两相邻的该第一单元,所述多个金属线连接于邻近该外围区域的该第一单元或该第二单元。本实用新型的触控面板通过设置透明导电层覆盖金属线,以避免金属线的氧化问题并避免金属线的刮伤问题。

Figure 201120147330

An embodiment of the present invention provides a touch panel, comprising: a transparent substrate, comprising a sensing area and a peripheral area; a plurality of transparent bridge lines, partially covering the sensing area; an insulating layer, partially covering the transparent bridge line; a plurality of metal lines, partially covering the peripheral area; and a transparent conductive layer, at least covering the transparent bridge line and the metal line, the transparent conductive layer comprising a plurality of first units, a plurality of second units and a plurality of connecting lines, the plurality of first units and the plurality of second units are arranged in a staggered manner, the connecting line connects two adjacent second units, the transparent bridge line connects two adjacent first units, and the plurality of metal lines are connected to the first unit or the second unit adjacent to the peripheral area. The touch panel of the present invention avoids oxidation and scratching of the metal lines by setting a transparent conductive layer to cover the metal lines.

Figure 201120147330

Description

触控面板touch panel

技术领域 technical field

本实用新型是关于一种触控面板,特别是关于一种使用高硬度的金属化合物覆盖金属线的触控面板,以避免金属线的氧化问题并避免金属线的刮伤问题。  The utility model relates to a touch panel, in particular to a touch panel which uses a high-hardness metal compound to cover metal wires, so as to avoid the problem of oxidation of the metal wires and the problem of scratching of the metal wires. the

背景技术 Background technique

触控面板已被广泛应用于家庭用品、通讯装置及电子信息装置等领域。通常触控面板的应用为个人数字助理(PDA)、电子产品及游戏机等输入接口。目前触控面板和显示屏的整合趋势可允许使用者以手指或接触笔选取面板上显示的代表图像(icon),如此可使个人数字助理、电子产品及游戏机执行喜好的功能。此种触控面板亦应用于公共信息查询系统,可以提供公众有效率的操作系统。  Touch panels have been widely used in fields such as household products, communication devices, and electronic information devices. Usually, touch panels are applied as input interfaces of personal digital assistants (PDAs), electronic products, and game consoles. The current trend of integration of touch panels and display screens allows users to select representative icons displayed on the panel with fingers or stylus, so that personal digital assistants, electronic products and game consoles can perform favorite functions. This kind of touch panel is also applied to the public information inquiry system, which can provide the public with an efficient operating system. the

传统触控面板包含一透明基板,该透明基板具有多个感测区域所构成的一表面,所述分布的感测区域用于感测使用者以手指或接触笔触摸所造成的信号,以进行输入或控制。该感测区域由透明导电薄膜所构成,例如:氧化铟锡(ITO),使用者可以触摸显示于显示屏上特定位置的对应透明导电薄膜,即可有效操作该装置。  The traditional touch panel includes a transparent substrate, and the transparent substrate has a surface composed of a plurality of sensing areas, and the distributed sensing areas are used to sense signals caused by a user's touch with a finger or a stylus to perform input or control. The sensing area is made of a transparent conductive film, such as indium tin oxide (ITO), and the user can effectively operate the device by touching the corresponding transparent conductive film displayed on a specific position on the display screen. the

为能有效侦测使用者以手指或接触笔触摸面板的正确位置,有很多种触控面板的技术被发展出来。图1例示现有的触控面板200,图2为沿图1中线1-1的剖面图。该触控面板200包含一透明基板201、一第一透明导电层203、一绝缘层209及一第二透明导电层211。该第一透明导电层203以光学蚀刻制程被图案化及形成于该透明基板201上,其包含多个第一单元205及连接沿纵向对齐排列第一单元205的多个第一导线207。该绝缘层209覆盖该第一透明导电层203及该基板201。图案化的第二透明导电层211形成于该绝缘层209上,且包含多个第二电极单元213及连接沿横向对齐排列第二单元213的多个第二导线215。  In order to effectively detect the correct position where the user touches the panel with a finger or a stylus, many touch panel technologies have been developed. FIG. 1 illustrates a conventional touch panel 200 , and FIG. 2 is a cross-sectional view along line 1 - 1 in FIG. 1 . The touch panel 200 includes a transparent substrate 201 , a first transparent conductive layer 203 , an insulating layer 209 and a second transparent conductive layer 211 . The first transparent conductive layer 203 is patterned and formed on the transparent substrate 201 by a photoetching process, and includes a plurality of first units 205 and a plurality of first wires 207 connected to the first units 205 aligned in the longitudinal direction. The insulating layer 209 covers the first transparent conductive layer 203 and the substrate 201 . The patterned second transparent conductive layer 211 is formed on the insulating layer 209 and includes a plurality of second electrode units 213 and a plurality of second wires 215 connected to the second units 213 aligned in the lateral direction. the

该触控面板200另有多个金属线217,设于绝缘层209的一侧,通过所 述多个金属线217使得该第二单元213的各横向连接得以转向所述多个该金属线217的汇流端。该第一透明导电层203和该第二透明导电层211覆盖于该基板201上,且该绝缘层209覆盖于该基板201上整个面积。  The touch panel 200 also has a plurality of metal wires 217, which are arranged on one side of the insulating layer 209, and through the plurality of metal wires 217, each lateral connection of the second unit 213 can be turned to the plurality of the metal wires 217. the confluence end. The first transparent conductive layer 203 and the second transparent conductive layer 211 cover the substrate 201 , and the insulating layer 209 covers the entire area of the substrate 201 . the

然而,该金属线217易于与空气中的氧气反应而发生氧化,因而增加电阻;为了避免该金属线217的氧化问题,现有技术必须在该金属线217的表面涂布一保护层(未显示于图中),将该金属线217与空气隔离并避免刮伤。然而,该保护层除了增加制造成本之外,亦会吸收光线,因而造成光穿透率变差。因此,市场上需要一种触控面板能克服上述现有触控面板所具有的缺点。  However, the metal wire 217 is prone to oxidation by reacting with oxygen in the air, thereby increasing resistance; in order to avoid the oxidation problem of the metal wire 217, the prior art must coat a protective layer (not shown) on the surface of the metal wire 217 In the figure), the metal wire 217 is isolated from the air and avoids scratches. However, in addition to increasing the manufacturing cost, the protective layer also absorbs light, thus resulting in poor light transmittance. Therefore, there is a need in the market for a touch panel capable of overcoming the above-mentioned shortcomings of existing touch panels. the

发明内容 Contents of the invention

本实用新型提供一种触控面板,以避免金属线的氧化问题并避免金属线的刮伤问题。  The utility model provides a touch panel to avoid the problem of oxidation of metal wires and the problem of scratching of metal wires. the

本实用新型的一实施例提供一种触控面板,包含:一透明基板,包含一感测区域及一外围区域;多个透明桥接线,局部覆盖该感测区域;一绝缘层,局部覆盖该透明桥接线;多个金属线,局部覆盖该外围区域;以及一透明导电层,至少覆盖该透明桥接线及该金属线,该透明导电层包含多个第一单元、多个第二单元及多个连接线,所述多个第一单元及所述多个第二单元交错布置,该连接线连接两相邻的该第二单元,该透明桥接线连接两相邻的该第一单元,所述多个金属线连接于邻近该外围区域的该第一单元或该第二单元。  An embodiment of the present invention provides a touch panel, comprising: a transparent substrate including a sensing area and a peripheral area; a plurality of transparent bridging wires partially covering the sensing area; an insulating layer partially covering the sensing area Transparent bridging lines; a plurality of metal lines partially covering the peripheral area; and a transparent conductive layer covering at least the transparent bridging lines and the metal lines, the transparent conductive layer comprising a plurality of first units, a plurality of second units and a plurality of a connection line, the plurality of first units and the plurality of second units are arranged alternately, the connection line connects two adjacent second units, and the transparent bridging line connects two adjacent first units, so The plurality of metal lines are connected to the first unit or the second unit adjacent to the peripheral area. the

进一步地,该透明导电层直接覆盖该金属线。  Further, the transparent conductive layer directly covers the metal wire. the

进一步地,该绝缘层包含:  Further, the insulating layer includes:

一第一绝缘区域,局部覆盖该透明桥接线;以及  a first insulating region partially covering the transparent bridging line; and

一第二绝缘区域,局部覆盖该金属线。  A second insulating region partially covers the metal line. the

进一步地,该透明导电层设置在该金属线上的该第二绝缘区域。  Further, the transparent conductive layer is disposed on the second insulating region on the metal line. the

进一步地,各该桥接线是衔接两相邻该第一单元间最短的路径。  Further, each bridging line connects the shortest path between two adjacent first units. the

进一步地,该桥接线为导电氧化物线或金属线。  Further, the bridging lines are conductive oxide lines or metal lines. the

进一步地,该透明导电层为金属化合物层。  Further, the transparent conductive layer is a metal compound layer. the

进一步地,该透明基板为玻璃板或透明高分子板材。  Further, the transparent substrate is a glass plate or a transparent polymer plate. the

本实用新型的另一实施例提供一种触控面板,包含:一透明基板,包含 一感测区域及一外围区域;一金属层,包含多个局部覆盖该感测区域的第一金属线以及多个局部覆盖该外围区域的第二金属线;一绝缘层,局部覆盖该第一金属线;以及一透明导电层,局部覆盖该第一金属线及该第二金属线,该透明导电层包含多个第一单元、多个第二单元及多个连接线,所述多个第一单元及所述多个第二单元交错布置,该连接线连接两相邻的该第二单元,该第一金属线连接两相邻的该第一单元,所述多个第二金属线连接于邻近该外围区域的该第一单元或该第二单元。  Another embodiment of the present invention provides a touch panel, including: a transparent substrate, including a sensing area and a peripheral area; a metal layer, including a plurality of first metal wires partially covering the sensing area; a plurality of second metal lines partially covering the peripheral area; an insulating layer partially covering the first metal lines; and a transparent conductive layer partially covering the first metal lines and the second metal lines, the transparent conductive layer comprising A plurality of first units, a plurality of second units, and a plurality of connection lines, the plurality of first units and the plurality of second units are arranged alternately, the connection line connects two adjacent second units, the first A metal line connects two adjacent first units, and the plurality of second metal lines are connected to the first unit or the second unit adjacent to the peripheral area. the

进一步地,该透明导电层直接覆盖该第二金属线。  Further, the transparent conductive layer directly covers the second metal wire. the

进一步地,该绝缘层包含:  Further, the insulating layer includes:

一第一绝缘区域,局部覆盖该第一金属线;以及  a first insulating region partially covering the first metal line; and

一第二绝缘区域,局部覆盖该第二金属线。  A second insulating region partially covers the second metal line. the

进一步地,该透明导电层设置在该第二金属线上的该第二绝缘区域。  Further, the transparent conductive layer is disposed on the second insulating region of the second metal line. the

进一步地,各该连接线是衔接两相邻该第二单元间最短的路径。  Further, each connecting line connects the shortest path between two adjacent second units. the

进一步地,该连接线为导电氧化物线或金属线。  Further, the connecting wire is a conductive oxide wire or a metal wire. the

进一步地,该透明导电层为金属化合物层。  Further, the transparent conductive layer is a metal compound layer. the

进一步地,该透明基板为玻璃板或透明高分子板材。  Further, the transparent substrate is a glass plate or a transparent polymer plate. the

本实用新型的触控面板通过设置透明导电层覆盖金属线,以避免金属线的氧化问题并避免金属线的刮伤问题。  The touch panel of the present invention covers the metal wires with a transparent conductive layer, so as to avoid the oxidation of the metal wires and the scratching of the metal wires. the

上文已相当广泛地概述本实用新型的技术特征及优点,使下文的本实用新型详细描述得以获得较佳了解。构成本实用新型的申请专利范围标的之其它技术特征及优点将描述于下文。本实用新型所属技术领域中具有通常知识者应了解,可相当容易地利用下文揭示的概念与特定实施例可作为修改或设计其它结构或工艺而实现与本实用新型相同的目的。本实用新型所属技术领域中具有通常知识者亦应了解,这类等效建构无法脱离后附的申请专利范围所界定的本实用新型的精神和范围。  The technical features and advantages of the present invention have been broadly summarized above, so that the following detailed description of the present invention can be better understood. Other technical features and advantages constituting the subject of the patent application scope of the present utility model will be described below. Those skilled in the technical field of the present invention should understand that the concepts and specific embodiments disclosed below can be used to modify or design other structures or processes to achieve the same purpose as the present invention. Those with ordinary knowledge in the technical field to which the utility model belongs should also understand that this type of equivalent construction cannot depart from the spirit and scope of the utility model defined by the appended claims. the

附图说明 Description of drawings

图1例示现有的触控面板;  Fig. 1 illustrates an existing touch panel;

图2是沿图1中线1-1的剖面图;  Fig. 2 is a sectional view along line 1-1 in Fig. 1;

图3至图6是俯视图,例示本实用新型一实施例的触控面板的制备方法;  3 to 6 are top views illustrating a method for manufacturing a touch panel according to an embodiment of the present invention;

图7是沿图6中线2-2的剖面图的一实施例;  Fig. 7 is an embodiment along the sectional view of line 2-2 in Fig. 6;

图8是沿图6中线3-3的剖面图的一实施例;  Fig. 8 is an embodiment along the sectional view of line 3-3 in Fig. 6;

图9是沿图6中线3-3的剖面图的另一实施例;  Fig. 9 is another embodiment along the sectional view of line 3-3 in Fig. 6;

图10是沿图6中线3-3的剖面图的再一实施例;  Fig. 10 is another embodiment along the sectional view of line 3-3 in Fig. 6;

图11至图14是俯视图,例示本实用新型另一实施例的触控面板的制备方法;  11 to 14 are top views illustrating a method for manufacturing a touch panel according to another embodiment of the present invention;

图15是沿图14中线4-4的剖面图的一实施例;  Fig. 15 is an embodiment along the sectional view of line 4-4 in Fig. 14;

图16是沿图14中线5-5的剖面图的一实施例;  Fig. 16 is an embodiment along the sectional view of line 5-5 in Fig. 14;

图17是沿图14中线5-5的剖面图的另一实施例;  Fig. 17 is another embodiment of the sectional view along line 5-5 in Fig. 14;

图18是沿图14中线5-5的剖面图的另一实施例;  Fig. 18 is another embodiment of the sectional view along line 5-5 in Fig. 14;

图19是沿图14中线5-5的剖面图的再一实施例;  Fig. 19 is another embodiment of the sectional view along line 5-5 in Fig. 14;

图20至图22是俯视图,例示本实用新型另一实施例的触控面板的制备方法;  20 to 22 are top views illustrating a method for manufacturing a touch panel according to another embodiment of the present invention;

图23是沿图22中线6-6的剖面图;  Figure 23 is a sectional view along line 6-6 in Figure 22;

图24是沿图22中线7-7的剖面图;以及  Figure 24 is a sectional view along line 7-7 in Figure 22; and

图25是沿图22中线7-7的剖面图的另一实施例。  Fig. 25 is another embodiment of a cross-sectional view taken along line 7-7 in Fig. 22 . the

具体实施方式 Detailed ways

图3至图6是俯视图,例示本实用新型一实施例的触控面板10的制备方法。参考图3,首先提供一透明基板11,其包含一感测区域13及一外围区域15。在本实用新型的一实施例中,该透明基板11的材料是玻璃或透明高分子板材,例如:聚碳酸酯(PC)及聚氯乙烯(PVC)。之后,形成多个透明桥接线17,其局部覆盖该感测区域13。在本实用新型的一实施例中,所述多个透明桥接线17以一光学蚀刻工艺所形成,其材料是导电氧化物,例如氧化铟锡(ITO)、氧化铝锌(AZO)或氧化铟锌(IZO),或是金属。该光学蚀刻工艺包含溅镀、涂敷、曝光、软烤、硬烤、显影、烘烤和其它步骤。  FIG. 3 to FIG. 6 are top views illustrating a method for manufacturing the touch panel 10 according to an embodiment of the present invention. Referring to FIG. 3 , firstly, a transparent substrate 11 is provided, which includes a sensing area 13 and a peripheral area 15 . In an embodiment of the present invention, the material of the transparent substrate 11 is glass or a transparent polymer plate, such as polycarbonate (PC) and polyvinyl chloride (PVC). Afterwards, a plurality of transparent bridging lines 17 are formed, which partially cover the sensing region 13 . In an embodiment of the present invention, the plurality of transparent bridging lines 17 are formed by an optical etching process, and the material thereof is a conductive oxide, such as indium tin oxide (ITO), aluminum zinc oxide (AZO) or indium oxide Zinc (IZO), or metal. The optical etching process includes sputtering, coating, exposing, soft baking, hard baking, developing, baking and other steps. the

参考图4,形成一绝缘层18,其包含多个绝缘区域19,各局部覆盖该透明桥接线17。在本实用新型的一实施例中,所述多个绝缘区域19以一光学蚀刻工艺所形成,且分别局部覆盖所述多个桥接线17,该光学蚀刻工艺包含溅镀、涂敷、曝光、软烤、硬烤、显影、烘烤和其它步骤。在本实用新型的 一实施例中,各桥接线17的相对的两端部则未被该绝缘区域19覆盖,该绝缘区域19的材料是一透明高分子材料,例如:光阻材料。  Referring to FIG. 4 , an insulating layer 18 is formed, which includes a plurality of insulating regions 19 , each partially covering the transparent bridge line 17 . In an embodiment of the present invention, the plurality of insulating regions 19 are formed by an optical etching process, and respectively partially cover the plurality of bridge lines 17, the optical etching process includes sputtering, coating, exposure, Soft bake, hard bake, developing, baking and other steps. In an embodiment of the present invention, the opposite ends of each bridging line 17 are not covered by the insulating region 19, and the material of the insulating region 19 is a transparent polymer material, such as a photoresist material. the

参考图5,形成多个金属线21,其局部覆盖该外围区域15。在本实用新型的一实施例中,所述多个金属线21是以一光学蚀刻工艺所形成,该光学蚀刻工艺包含溅镀、涂敷、曝光、软烤、硬烤、显影、烘烤和其它步骤。  Referring to FIG. 5 , a plurality of metal lines 21 are formed partially covering the peripheral region 15 . In an embodiment of the present invention, the plurality of metal lines 21 are formed by an optical etching process, the optical etching process includes sputtering, coating, exposure, soft baking, hard baking, developing, baking and other steps. the

参考图6,形成一透明导电层30,至少覆盖该透明桥接线17及该金属线21,该透明导电层30包含多个第一单元31、多个第二单元35、多个第一连接线33及多个第二连接线37,所述多个第一单元31及所述多个第二单元35是交错布置,该第一连接线33连接两相邻的该第二单元35,该透明桥接线17连接两相邻的该第一单元31,所述多个金属线21是连接于邻近该外围区域15的该第一单元31或该第二单元35,所述多个第二连接线37覆盖所述多个金属线21。  Referring to FIG. 6, a transparent conductive layer 30 is formed to at least cover the transparent bridge line 17 and the metal line 21. The transparent conductive layer 30 includes a plurality of first units 31, a plurality of second units 35, and a plurality of first connection lines. 33 and a plurality of second connection lines 37, the plurality of first units 31 and the plurality of second units 35 are arranged in a staggered manner, the first connection line 33 connects two adjacent second units 35, the transparent The bridge line 17 connects two adjacent first units 31, the plurality of metal lines 21 are connected to the first unit 31 or the second unit 35 adjacent to the peripheral area 15, and the plurality of second connection lines 37 covers the plurality of metal wires 21 . the

在本实用新型的一实施例中,各该透明桥接线17是衔接两相邻第一单元31间最短的路径。在本实用新型的一实施例中,该透明导电层30的材料是金属化合物,例氧化铟锡(ITO)、氧化铝锌(AZO)或氧化铟锌(IZO)。该光学蚀刻工艺包含溅镀、涂敷、曝光、软烤、硬烤、显影、烘烤和其它步骤。该透明基板31的材料是玻璃或透明高分子板材,例如:聚碳酸酯(PC)及聚氯乙烯(PVC)。  In an embodiment of the present invention, each of the transparent bridging lines 17 is the shortest path connecting two adjacent first units 31 . In an embodiment of the present invention, the material of the transparent conductive layer 30 is a metal compound, such as indium tin oxide (ITO), aluminum zinc oxide (AZO) or indium zinc oxide (IZO). The optical etching process includes sputtering, coating, exposing, soft baking, hard baking, developing, baking and other steps. The material of the transparent substrate 31 is glass or a transparent polymer plate, such as polycarbonate (PC) and polyvinyl chloride (PVC). the

图7是沿图6中线2-2的剖面图,图8是沿图6中线3-3的剖面图的一实施例。参考图7,该透明桥接线17及所述多个第一连接线33是被该绝缘区域19所相互隔绝。参考图8,该透明导电层30覆盖所述多个金属线21。本实用新型使用该透明导电层30的第二连接线37覆盖该金属线21,而该透明导电层30是金属化合物,不易氧化;此外,该透明导电层30的硬度高于该金属线21的硬度,不易被刮伤。  Fig. 7 is a cross-sectional view along line 2-2 in Fig. 6, and Fig. 8 is an embodiment of a cross-sectional view along line 3-3 in Fig. 6 . Referring to FIG. 7 , the transparent bridging line 17 and the plurality of first connecting lines 33 are isolated from each other by the insulating region 19 . Referring to FIG. 8 , the transparent conductive layer 30 covers the plurality of metal lines 21 . The utility model uses the second connecting line 37 of the transparent conductive layer 30 to cover the metal wire 21, and the transparent conductive layer 30 is a metal compound, which is not easily oxidized; in addition, the hardness of the transparent conductive layer 30 is higher than that of the metal wire 21. Hardness, not easy to be scratched. the

图9是沿图6中线3-3的剖面图的另一实施例。相较于图8的实施例将该金属线21直接形成于该透明基板11上;图9的实施例是将该透明桥接线17直接形成于该透明基板11上,再将该金属线21直接形成于该透明桥接线17上。总而言之,图8及图9的实施例均使用该透明导电层30的第二连接线37覆盖该金属线21,而该透明导电层30是金属化合物,不易氧化;此外,透明导电层30的硬度高于该金属线21的硬度,不易被刮伤。  FIG. 9 is another embodiment of a cross-sectional view taken along line 3-3 in FIG. 6 . Compared with the embodiment of FIG. 8, the metal line 21 is directly formed on the transparent substrate 11; in the embodiment of FIG. 9, the transparent bridge line 17 is directly formed on the transparent substrate 11, and the metal line 21 is directly formed on the transparent bridging lines 17 . In a word, the embodiments of Fig. 8 and Fig. 9 all use the second connection line 37 of the transparent conductive layer 30 to cover the metal line 21, and the transparent conductive layer 30 is a metal compound, which is not easily oxidized; in addition, the hardness of the transparent conductive layer 30 The hardness is higher than that of the metal wire 21 and is not easy to be scratched. the

图10是沿图6中线3-3的剖面图的再一实施例。相较于图8的实施例将该金属线21直接形成于该透明基板11上;图10的实施例是将该透明桥接线17直接形成于该透明基板11上并以该绝缘层18的绝缘区域19覆盖该透明桥接线17,再将该金属线21直接形成于该绝缘区域19上。总而言之,图8及图10的实施例均使用该透明导电层30的第二连接线37覆盖该金属线21,而该透明导电层30是金属化合物,不易氧化;此外,透明导电层30的硬度高于该金属线21的硬度,不易被刮伤。  Fig. 10 is another embodiment of the cross-sectional view taken along line 3-3 in Fig. 6 . Compared with the embodiment of FIG. 8, the metal line 21 is directly formed on the transparent substrate 11; the embodiment of FIG. The area 19 covers the transparent bridging line 17 , and the metal line 21 is directly formed on the insulating area 19 . In a word, the embodiments of Fig. 8 and Fig. 10 all use the second connection line 37 of the transparent conductive layer 30 to cover the metal line 21, and the transparent conductive layer 30 is a metal compound, which is not easily oxidized; in addition, the hardness of the transparent conductive layer 30 The hardness is higher than that of the metal wire 21 and is not easy to be scratched. the

现有的金属线因易于与空气中的氧气反应而发生氧化现象,必须在该金属线的表面涂布一保护层;相对地,本实用新型使用该透明导电层30覆盖所述多个金属线21可省略去现有技术必须在金属线的表面涂布一保护层,却仍可避免金属线氧化及刮伤问题。  The existing metal wires are easily oxidized due to the reaction with oxygen in the air, and a protective layer must be coated on the surface of the metal wires; on the contrary, the utility model uses the transparent conductive layer 30 to cover the plurality of metal wires 21 can omit the need to coat a protective layer on the surface of the metal wire in the prior art, but still avoid the problems of metal wire oxidation and scratches. the

图11至图14是俯视图,例示本实用新型另一实施例的触控面板60的制备方法。参考图11,首先提供一透明基板61,其包含一感测区域63及一外围区域65。在本实用新型的一实施例中,该透明基板61的材料是玻璃或透明高分子板材,例如:聚碳酸酯(PC)及聚氯乙烯(PVC)。之后,形成多个局部覆盖该感测区域63的透明桥接线67。在本实用新型的一实施例中,所述多个透明桥接线67是以一光学蚀刻工艺所形成,其材料是导电氧化物,例如氧化铟锡(ITO)、氧化铝锌(AZO)或氧化铟锌(IZO)。该光学蚀刻工艺包含溅镀、涂敷、曝光、软烤、硬烤、显影、烘烤和其它步骤。  FIG. 11 to FIG. 14 are top views illustrating a method of manufacturing a touch panel 60 according to another embodiment of the present invention. Referring to FIG. 11 , firstly, a transparent substrate 61 is provided, which includes a sensing region 63 and a peripheral region 65 . In an embodiment of the present invention, the material of the transparent substrate 61 is glass or a transparent polymer plate, such as polycarbonate (PC) and polyvinyl chloride (PVC). After that, a plurality of transparent bridging lines 67 partially covering the sensing area 63 are formed. In an embodiment of the present invention, the plurality of transparent bridging lines 67 are formed by a photoetching process, and the material is a conductive oxide, such as indium tin oxide (ITO), aluminum zinc oxide (AZO) or oxide Indium Zinc (IZO). The optical etching process includes sputtering, coating, exposing, soft baking, hard baking, developing, baking and other steps. the

参考图12,形成多个局部覆盖该外围区域65的金属线69。在本实用新型的一实施例中,所述多个金属线69是以一光学蚀刻工艺所形成。该光学蚀刻工艺包含溅镀、涂敷、曝光、软烤、硬烤、显影、烘烤和其它步骤。  Referring to FIG. 12 , a plurality of metal lines 69 partially covering the peripheral region 65 are formed. In an embodiment of the present invention, the plurality of metal lines 69 are formed by an optical etching process. The optical etching process includes sputtering, coating, exposing, soft baking, hard baking, developing, baking and other steps. the

参考图13,形成一绝缘层70,包含多个第一绝缘区域71及第二绝缘区域73,该第一绝缘区域71局部覆盖该透明桥接线67,该第二绝缘区域73局部覆盖该金属线69。在本实用新型的一实施例中,该绝缘层70是以一光学蚀刻工艺所形成,且各桥接线67的相对的两端部则未被该绝缘层70覆盖,该绝缘层70的材料是一透明高分子材料,例如:光阻材料。  Referring to FIG. 13 , an insulating layer 70 is formed, including a plurality of first insulating regions 71 and second insulating regions 73. The first insulating regions 71 partially cover the transparent bridge lines 67, and the second insulating regions 73 partially cover the metal lines. 69. In an embodiment of the present utility model, the insulating layer 70 is formed by an optical etching process, and the opposite ends of each bridge line 67 are not covered by the insulating layer 70, and the material of the insulating layer 70 is A transparent polymer material, such as photoresist material. the

参考图14,形成一透明导电层80,至少覆盖该透明桥接线67及该金属线69,该透明导电层80包含多个第一单元81、多个第二单元85、多个第一连接线83及多个第二连接线87,所述多个第一单元81及所述多个第二单元 85是交错布置,该第一连接线83连接两相邻的该第二单元85,该透明桥接线67连接两相邻的该第一单元81,所述多个金属线69是连接于邻近该外围区域65的该第一单元81或该第二单元85,所述多个第二连接线87覆盖所述多个金属线69。该第一连接线83是衔接两相邻该第二单元85间最短的路径。  Referring to FIG. 14, a transparent conductive layer 80 is formed to at least cover the transparent bridge line 67 and the metal line 69. The transparent conductive layer 80 includes a plurality of first units 81, a plurality of second units 85, and a plurality of first connection lines. 83 and a plurality of second connection lines 87, the plurality of first units 81 and the plurality of second units 85 are arranged in a staggered manner, the first connection line 83 connects two adjacent second units 85, the transparent The bridge line 67 connects two adjacent first units 81, the plurality of metal lines 69 are connected to the first unit 81 or the second unit 85 adjacent to the peripheral area 65, and the plurality of second connection lines 87 covers the plurality of metal lines 69 . The first connection line 83 connects the shortest path between two adjacent second units 85 . the

在本实用新型的一实施例中,各该桥接线67是衔接两相邻第一单元81间最短的路径。在本实用新型的一实施例中,该透明导电层80的材料是金属化合物,例氧化铟锡(ITO)、氧化铝锌(AZO)或氧化铟锌(IZO)。该光学蚀刻工艺包含溅镀、涂敷、曝光、软烤、硬烤、显影、烘烤和其它步骤。  In an embodiment of the present invention, each of the bridging lines 67 is the shortest path connecting two adjacent first units 81 . In an embodiment of the present invention, the material of the transparent conductive layer 80 is a metal compound, such as indium tin oxide (ITO), aluminum zinc oxide (AZO) or indium zinc oxide (IZO). The optical etching process includes sputtering, coating, exposing, soft baking, hard baking, developing, baking and other steps. the

图15是沿图14中线4-4的剖面图,图16是沿图14中线5-5的剖面图。参考图15,该透明桥接线67及所述多个第一连接线83是被该第一绝缘区域71所相互隔绝。参考图16,在本实用新型的一实施例中,该透明导电层80的多个第二连接线87覆盖所述多个金属线69。本实用新型使用该透明导电层80的第二连接线87覆盖该金属线69,而该透明导电层80是金属化合物,不易氧化;此外,且该透明导电层80的硬度高于该金属线69的硬度,不易被刮伤。  Fig. 15 is a cross-sectional view along line 4-4 in Fig. 14, and Fig. 16 is a cross-sectional view along line 5-5 in Fig. 14 . Referring to FIG. 15 , the transparent bridge line 67 and the plurality of first connection lines 83 are isolated from each other by the first insulating region 71 . Referring to FIG. 16 , in an embodiment of the present invention, the plurality of second connection lines 87 of the transparent conductive layer 80 cover the plurality of metal lines 69 . The utility model uses the second connection wire 87 of the transparent conductive layer 80 to cover the metal wire 69, and the transparent conductive layer 80 is a metal compound, which is not easily oxidized; in addition, the hardness of the transparent conductive layer 80 is higher than that of the metal wire 69 Hardness, not easy to be scratched. the

图17是沿图14中线5-5的剖面图的另一实施例。相较于图16的实施例将该金属线69直接形成于该透明基板61上并以该绝缘层70的绝缘区域73覆盖该金属线69之后,再将该透明导电层80的多个第二连接线87形成于该绝缘区域73上;图17的实施例是将该金属线69形成于该透明基板61上之后,即直接将该透明导电层80的多个第二连接线87形成于该金属线69上。  Fig. 17 is another embodiment of a cross-sectional view taken along line 5-5 in Fig. 14 . Compared with the embodiment of FIG. 16 , the metal wire 69 is directly formed on the transparent substrate 61 and the metal wire 69 is covered with the insulating region 73 of the insulating layer 70 , and then the plurality of second transparent conductive layers 80 The connection wires 87 are formed on the insulating region 73; in the embodiment of FIG. on metal wire 69. the

图18是沿图14中线5-5的剖面图的另一实施例。相较于图16的实施例将该金属线69直接形成于该透明基板61上并以该绝缘层70的绝缘区域73覆盖该金属线69之后,再将该透明导电层80的多个第二连接线87形成于该绝缘区域73上;图18的实施例是将该透明桥接线67形成于该透明基板61上,并将该金属线69形成于该透明桥接线67上,再将该透明导电层80的多个第二连接线87形成于该金属线69上。  Fig. 18 is another embodiment of a cross-sectional view taken along line 5-5 in Fig. 14 . Compared with the embodiment of FIG. 16 , the metal wire 69 is directly formed on the transparent substrate 61 and the metal wire 69 is covered with the insulating region 73 of the insulating layer 70 , and then the plurality of second transparent conductive layers 80 The connection line 87 is formed on the insulating region 73; the embodiment of FIG. 18 forms the transparent bridge line 67 on the transparent substrate 61, and forms the metal line 69 on the transparent bridge line 67, and then the transparent A plurality of second connection lines 87 of the conductive layer 80 are formed on the metal line 69 . the

图19是沿图14中线5-5的剖面图的另一实施例。相较于图16的实施例将该金属线69直接形成于该透明基板61上并以该绝缘层70的绝缘区域73 覆盖该金属线69之后,再将该透明导电层80的多个第二连接线87形成于该绝缘区域73上;图19的实施例是将该透明桥接线67形成于该透明基板61上,并将该金属线69形成于该透明桥接线67上,再以该绝缘层70的绝缘区域73覆盖该金属线69,以及将该透明导电层80的多个第二连接线87形成于该绝缘区域73上。  Fig. 19 is another embodiment of a cross-sectional view taken along line 5-5 in Fig. 14 . Compared with the embodiment of FIG. 16 , the metal wire 69 is directly formed on the transparent substrate 61 and the metal wire 69 is covered with the insulating region 73 of the insulating layer 70, and then the plurality of second transparent conductive layers 80 The connection line 87 is formed on the insulating region 73; the embodiment of FIG. An insulating region 73 of layer 70 covers the metal line 69 , and a plurality of second connection lines 87 of the transparent conductive layer 80 are formed on the insulating region 73 . the

总而言之,图16至图19的实施例均使用该透明导电层80的多个第二连接线87覆盖该金属线69,而该透明导电层80是金属化合物,不易氧化;此外,透明导电层80的硬度高于该金属线69的硬度,不易被刮伤。现有的金属线因易于与空气中的氧气反应而发生氧化现象,必须在该金属线的表面涂布一保护层;相对地,本实用新型使用该透明导电层80覆盖所述多个金属线71可省略去现有技术必须在金属线的表面涂布一保护层,却仍可避免金属线氧化及刮伤问题。  In a word, the embodiments of FIG. 16 to FIG. 19 all use a plurality of second connection lines 87 of the transparent conductive layer 80 to cover the metal line 69, and the transparent conductive layer 80 is a metal compound, which is not easily oxidized; in addition, the transparent conductive layer 80 The hardness is higher than that of the metal wire 69, so it is not easy to be scratched. The existing metal wires are easily oxidized due to the reaction with oxygen in the air, so a protective layer must be coated on the surface of the metal wires; on the contrary, the utility model uses the transparent conductive layer 80 to cover the plurality of metal wires 71 can omit the need to coat a protective layer on the surface of the metal wire in the prior art, but still avoid the problems of oxidation and scratching of the metal wire. the

图20至图22是俯视图,例示本实用新型另一实施例的触控面板100的制备方法。参考图20,首先提供一透明基板101,其包含一感测区域103及一外围区域105。在本实用新型的一实施例中,该透明基板101的材料是玻璃或透明高分子板材,例如:聚碳酸酯(PC)及聚氯乙烯(PVC)。之后,形成一金属层110,包含多个局部覆盖该感测区域103的第一金属线107以及多个局部覆盖该外围区域105的第二金属线109。在本实用新型的一实施例中,该金属层110是以一光学蚀刻工艺所形成,包含溅镀、涂敷、曝光、软烤、硬烤、显影、烘烤和其它步骤。  FIG. 20 to FIG. 22 are top views illustrating a method for manufacturing a touch panel 100 according to another embodiment of the present invention. Referring to FIG. 20 , firstly, a transparent substrate 101 is provided, which includes a sensing region 103 and a peripheral region 105 . In an embodiment of the present invention, the material of the transparent substrate 101 is glass or a transparent polymer plate, such as polycarbonate (PC) and polyvinyl chloride (PVC). After that, a metal layer 110 is formed, including a plurality of first metal lines 107 partially covering the sensing area 103 and a plurality of second metal lines 109 partially covering the peripheral area 105 . In an embodiment of the present invention, the metal layer 110 is formed by an optical etching process, including sputtering, coating, exposure, soft baking, hard baking, developing, baking and other steps. the

参考图21,形成一绝缘层120,包含多个第一绝缘区域121及第二绝缘区域123,该第一绝缘区域121局部覆盖该第一金属线107,该第二绝缘区域123局部覆盖该第二金属线109。在本实用新型的一实施例中,该绝缘层120是以一光学蚀刻工艺所形成,且各第一金属线107的相对的两端部则未被该绝缘层120覆盖,该绝缘层120的材料是一透明高分子材料,例如:光阻材料。  Referring to FIG. 21, an insulating layer 120 is formed, including a plurality of first insulating regions 121 and second insulating regions 123. The first insulating region 121 partially covers the first metal line 107, and the second insulating region 123 partially covers the first insulating region 123. Two metal wires 109 . In an embodiment of the present invention, the insulating layer 120 is formed by an optical etching process, and the opposite ends of each first metal line 107 are not covered by the insulating layer 120, the insulating layer 120 The material is a transparent polymer material, such as photoresist material. the

参考图22,形成一透明导电层130,至少覆盖该第一金属线107及该第二金属线109。在本实用新型的一实施例中,该透明导电层130包含多个第一单元131、多个第二单元135、多个第一连接线133及多个第二连接线137,所述多个第一单元131及所述多个第二单元135是交错布置,该第一连接线 133连接两相邻的该第二单元135,该第一金属线107线连接两相邻的该第一单元131,所述多个第二金属线109连接于邻近该外围区域105的该第一单元131或该第二单元135,所述多个第二连接线137覆盖所述多个金属线109。  Referring to FIG. 22 , a transparent conductive layer 130 is formed to at least cover the first metal line 107 and the second metal line 109 . In an embodiment of the present utility model, the transparent conductive layer 130 includes a plurality of first units 131, a plurality of second units 135, a plurality of first connection lines 133 and a plurality of second connection lines 137, the plurality of The first unit 131 and the plurality of second units 135 are arranged in a staggered manner, the first connecting line 133 connects two adjacent second units 135, and the first metal line 107 connects two adjacent first units 131 , the plurality of second metal lines 109 are connected to the first unit 131 or the second unit 135 adjacent to the peripheral region 105 , and the plurality of second connection lines 137 cover the plurality of metal lines 109 . the

在本实用新型的一实施例中,各该第一金属线107是衔接两相邻第一单元131间最短的路径。在本实用新型的一实施例中,该透明导电层130的材料是金属化合物,例氧化铟锡(ITO)、氧化铝锌(AZO)或氧化铟锌(IZO)。该光学蚀刻工艺包含溅镀、涂敷、曝光、软烤、硬烤、显影、烘烤和其它步骤。  In an embodiment of the present invention, each of the first metal lines 107 connects the shortest path between two adjacent first units 131 . In an embodiment of the present invention, the material of the transparent conductive layer 130 is a metal compound, such as indium tin oxide (ITO), aluminum zinc oxide (AZO) or indium zinc oxide (IZO). The optical etching process includes sputtering, coating, exposing, soft baking, hard baking, developing, baking and other steps. the

图23是沿图22中线6-6的剖面图,图24是沿图22中线7-7的剖面图。参考图23,该第一金属线107及该第一连接线133是被该第一绝缘区域121所相互隔绝。参考图24,该透明导电层130的第二连接线137覆盖所述多个金属线109。本实用新型使用该透明导电层130的第二连接线137覆盖该金属线106,而该透明导电层130是金属化合物,不易氧化;此外,该透明导电层130的硬度高于该金属线109的硬度,不易被刮伤。  Fig. 23 is a cross-sectional view along line 6-6 in Fig. 22, and Fig. 24 is a cross-sectional view along line 7-7 in Fig. 22 . Referring to FIG. 23 , the first metal line 107 and the first connection line 133 are isolated from each other by the first insulating region 121 . Referring to FIG. 24 , the second connection lines 137 of the transparent conductive layer 130 cover the plurality of metal lines 109 . The utility model uses the second connection line 137 of the transparent conductive layer 130 to cover the metal wire 106, and the transparent conductive layer 130 is a metal compound, which is not easily oxidized; in addition, the hardness of the transparent conductive layer 130 is higher than that of the metal wire 109 Hardness, not easy to be scratched. the

图25是沿图22中线7-7的剖面图的另一实施例。相较于图24的实施例将该金属线109直接形成于该透明基板101上并以该绝缘层120的绝缘区域123覆盖该金属线109,再将该透明导电层130的多个第二连接线137形成于该绝缘区域123上;图25的实施例将该金属线109形成于该透明基板101上后,即直接将该透明导电层130的多个第二连接线137形成于该金属线109上。  Fig. 25 is another embodiment of a cross-sectional view taken along line 7-7 in Fig. 22 . Compared with the embodiment of FIG. 24 , the metal line 109 is directly formed on the transparent substrate 101 and the metal line 109 is covered with the insulating region 123 of the insulating layer 120 , and then the plurality of second connections of the transparent conductive layer 130 Lines 137 are formed on the insulating region 123; after the embodiment of FIG. 25 forms the metal lines 109 on the transparent substrate 101, a plurality of second connection lines 137 of the transparent conductive layer 130 are directly formed on the metal lines. 109 on. the

现有的金属线因易于与空气中的氧气反应而发生氧化现象,必须在该金属线的表面涂布一保护层;相对地,本实用新型使用该透明导电层130覆盖所述多个金属线109可省略去现有技术必须在金属线的表面涂一保护层,却仍可避免金属线氧化及刮伤问题。  The existing metal wires are easily oxidized due to the reaction with oxygen in the air, so a protective layer must be coated on the surface of the metal wires; on the contrary, the utility model uses the transparent conductive layer 130 to cover the plurality of metal wires 109 can omit the need to coat a protective layer on the surface of the metal wire in the prior art, but still avoid the problems of metal wire oxidation and scratches. the

本实用新型的技术内容及技术特点已揭示如上,然而本实用新型所属技术领域中具有通常知识者应了解,在不背离后附申请专利范围所界定的本实用新型精神和范围内,本实用新型的教示及揭示可作种种的替换及修饰。例如,上文揭示的许多工艺可以不同的方法实施或以其它工艺予以取代,或者采用上述二种方式的组合。  The technical content and technical characteristics of the present utility model have been disclosed as above, but those with ordinary knowledge in the technical field of the utility model should understand that within the spirit and scope of the utility model defined by the appended patent scope, the utility model The teachings and disclosures are subject to various substitutions and modifications. For example, many of the processes disclosed above could be performed differently or replaced by other processes, or a combination of both. the

此外,本案的权利范围并不局限于上文揭示的特定实施例的工艺、机台、 制造、物质的成份、装置、方法或步骤。本实用新型所属技术领域中具有通常知识者应了解,基于本实用新型教示及揭示工艺、机台、制造、物质的成份、装置、方法或步骤,无论现在已存在或日后开发者,其与本案实施例揭示者是以实质相同的方式执行实质相同的功能,而达到实质相同的结果,亦可使用于本实用新型。因此,以下的申请专利范围是用以涵盖用以此类工艺、机台、制造、物质的成份、装置、方法或步骤。  In addition, the scope of rights in this case is not limited to the processes, machines, manufacturing, material components, devices, methods or steps of the specific embodiments disclosed above. Those with ordinary knowledge in the technical field to which this utility model belongs should understand that, based on the teachings and disclosures of this utility model, processes, machines, manufacturing, material components, devices, methods or steps, whether they exist now or will be developed in the future, they are not related to this case Embodiments disclosed by those who perform substantially the same functions in substantially the same manner and achieve substantially the same results can also be used in the present invention. Therefore, the scope of claims below is intended to cover components, devices, methods or steps used in such processes, machines, manufacture, and substances. the

Claims (16)

1. a contact panel is characterized in that, this contact panel comprises:
One transparency carrier comprises a sensing region and an outer peripheral areas;
A plurality of transparent bridging lines, local this sensing region that covers;
One insulation course, local this transparent bridging line that covers;
A plurality of metal wires, local this outer peripheral areas that covers; And
One transparency conducting layer, at least cover this transparent bridging line and this metal wire, this transparency conducting layer comprises a plurality of first modules, a plurality of Unit second and a plurality of connecting line, described a plurality of first module and described a plurality of second unit alternative arrangement, this connecting line connects two these adjacent Unit second, this transparent bridging line connects two these adjacent first modules, and described a plurality of metal wires are connected in this first module or this Unit second of contiguous this outer peripheral areas.
2. contact panel as claimed in claim 1 is characterized in that: this transparency conducting layer directly covers this metal wire.
3. contact panel as claimed in claim 1 is characterized in that: this insulation course comprises:
One first insulating regions, local this transparent bridging line that covers; And
One second insulating regions, local this metal wire that covers.
4. contact panel as claimed in claim 3 is characterized in that: this transparency conducting layer is arranged on this second insulating regions on this metal wire.
5. contact panel as claimed in claim 1 is characterized in that: respectively this bridging line is to be connected the shortest path between two adjacent these first modules.
6. contact panel as claimed in claim 1 is characterized in that: this bridging line is conductive oxide line or metal wire.
7. contact panel as claimed in claim 1 is characterized in that: this transparency conducting layer is a metal compound layer.
8. contact panel as claimed in claim 1 is characterized in that: this transparency carrier is glass plate or transparent polymer sheet material.
9. a contact panel is characterized in that, this contact panel comprises:
One transparency carrier comprises a sensing region and an outer peripheral areas;
One metal level comprises a plurality of local first metal wire and a plurality of local second metal wires that cover this outer peripheral areas that cover this sensing region;
One insulation course, local this first metal wire that covers; And
One transparency conducting layer, local this first metal wire and this second metal wire of covering, this transparency conducting layer comprises a plurality of first modules, a plurality of Unit second and a plurality of connecting line, described a plurality of first module and described a plurality of second unit alternative arrangement, this connecting line connects two these adjacent Unit second, this first metal wire connects two these adjacent first modules, and described a plurality of second metal wires are connected in this first module or this Unit second of contiguous this outer peripheral areas.
10. contact panel as claimed in claim 9 is characterized in that: this transparency conducting layer directly covers this second metal wire.
11. contact panel as claimed in claim 9 is characterized in that: this insulation course comprises:
One first insulating regions, local this first metal wire that covers; And
One second insulating regions, local this second metal wire that covers.
12. contact panel as claimed in claim 11 is characterized in that: this transparency conducting layer is arranged on this second insulating regions on this second metal wire.
13. contact panel as claimed in claim 9 is characterized in that: respectively this connecting line is to be connected the shortest path between two adjacent these Unit second.
14. contact panel as claimed in claim 9 is characterized in that: this connecting line is conductive oxide line or metal wire.
15. contact panel as claimed in claim 9 is characterized in that: this transparency conducting layer is a metal compound layer.
16. contact panel as claimed in claim 9 is characterized in that: this transparency carrier is glass plate or transparent polymer sheet material.
CN2011201473305U 2011-04-22 2011-05-11 touch panel Expired - Fee Related CN202084018U (en)

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WO2013097628A1 (en) * 2011-12-29 2013-07-04 宸鸿科技(厦门)有限公司 Touch panel and manufacturing method thereof
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CN102646000B (en) * 2012-03-02 2015-09-09 华映光电股份有限公司 The manufacture method of contact panel
CN102799311A (en) * 2012-07-13 2012-11-28 北京京东方光电科技有限公司 Touch screen, electronic equipment including same and method for manufacturing same
CN102799311B (en) * 2012-07-13 2015-03-04 北京京东方光电科技有限公司 Touch screen, electronic equipment including same and method for manufacturing same
US9385710B2 (en) 2012-07-13 2016-07-05 Beijing Boe Optoelectronics Technology Co., Ltd. Touch screen, electronic device comprising same and method for manufacturing same
US10705657B2 (en) * 2013-12-02 2020-07-07 Samsung Display Co., Ltd. Touch panel having sense patterns of mesh type metal grids, display apparatus, and method of manufacturing the touch panel
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US12236049B2 (en) 2019-12-04 2025-02-25 Samsung Display Co., Ltd. Input sensing unit and display device having the same

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