CN1825184A - Method for making color filter substrate - Google Patents
Method for making color filter substrate Download PDFInfo
- Publication number
- CN1825184A CN1825184A CN 200610074043 CN200610074043A CN1825184A CN 1825184 A CN1825184 A CN 1825184A CN 200610074043 CN200610074043 CN 200610074043 CN 200610074043 A CN200610074043 A CN 200610074043A CN 1825184 A CN1825184 A CN 1825184A
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- Prior art keywords
- dry film
- upper strata
- optical filtering
- double
- bilayer
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 239000000758 substrate Substances 0.000 title claims abstract description 63
- 238000000034 method Methods 0.000 title claims abstract description 50
- 239000000463 material Substances 0.000 claims abstract description 30
- 230000003287 optical effect Effects 0.000 claims description 57
- 238000001914 filtration Methods 0.000 claims description 53
- 238000000059 patterning Methods 0.000 claims description 25
- 238000005516 engineering process Methods 0.000 claims description 23
- 230000002209 hydrophobic effect Effects 0.000 claims description 13
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 238000004381 surface treatment Methods 0.000 claims description 5
- 238000003384 imaging method Methods 0.000 claims description 4
- 150000002500 ions Chemical class 0.000 claims description 2
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 claims description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 1
- 239000004568 cement Substances 0.000 claims 1
- 239000002131 composite material Substances 0.000 claims 1
- 239000007789 gas Substances 0.000 claims 1
- 229910052760 oxygen Inorganic materials 0.000 claims 1
- 239000001301 oxygen Substances 0.000 claims 1
- 230000000903 blocking effect Effects 0.000 abstract 1
- 239000010408 film Substances 0.000 description 56
- 239000002002 slurry Substances 0.000 description 9
- 239000010409 thin film Substances 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 238000005507 spraying Methods 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- 239000011521 glass Substances 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- 239000011651 chromium Substances 0.000 description 2
- 238000007641 inkjet printing Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000001259 photo etching Methods 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- YVTHLONGBIQYBO-UHFFFAOYSA-N zinc indium(3+) oxygen(2-) Chemical compound [O--].[Zn++].[In+3] YVTHLONGBIQYBO-UHFFFAOYSA-N 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- MRNHPUHPBOKKQT-UHFFFAOYSA-N indium;tin;hydrate Chemical compound O.[In].[Sn] MRNHPUHPBOKKQT-UHFFFAOYSA-N 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
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- Optical Filters (AREA)
Abstract
A method for fabricating a color filter substrate. Firstly, providing a substrate, then forming a double-layer dry film on one surface of the substrate, wherein the double-layer dry film is provided with an upper layer and a lower layer, then carrying out a pattern transfer process on the double-layer dry film to define a plurality of blocking walls and a plurality of grooves, then arranging at least one color filter material in each groove, and then removing the upper layer of the double-layer dry film.
Description
Technical field
The present invention relates to a kind of method of making colored optical filtering substrates.
Background technology
Thin Film Transistor-LCD (hereinafter to be referred as TFT-LCD) mainly is the thin film transistor (TFT) that utilizes into rectangular arrangement, and cooperates electronic components such as suitable electric capacity, switching pad to drive liquid crystal pixel, enriches beautiful figure with generation.Because TFT-LCD has that external form is frivolous, power consumption is few and characteristic such as radiationless pollution, therefore be widely used on the portable type information products such as mobile computer (notebook), PDA(Personal Digital Assistant), even the existing CRT monitor of traditional desktop PC and the trend of domestic TV of replacing gradually.
Generally speaking, TFT-LCD comprises a thin film transistor base plate, the sweep trace (scan or gate line) and the signal wire (data or signal line) that have many thin film transistor (TFT)s that are arranged in array, pixel electrode (pixel electrode), many orthogonal staggered (orthogonal) on it, one has the colored optical filtering substrates of the colored filter (color filter) of a plurality of arrayed, and is filled in the liquid crystal material between thin film transistor base plate and the colored optical filtering substrates.Wherein, thin-film transistor element utilizes multiple tracks deposition, photoetching and etching (PEP) technology to be made in the thin film transistor base plate surface, colored filter then is to utilize photoetching process or directly printing technology is made in the colored optical filtering substrates surface, each pixel of LCD is presented enrich beautiful color.
Please refer to Fig. 1 to Fig. 6, Fig. 1 to Fig. 6 is the existing method synoptic diagram of making a colored optical filtering substrates.As shown in Figure 1, one substrate 12 at first is provided, a transparent glass substrate for example forms a photosensitive film 16 that is made of pi (polyimide) the chromium inorganic layers that material constituted (inorganic film) 14 and such as (Cr) then in regular turn in substrate 12 surfaces.Afterwards as shown in Figure 2, carry out a pattern transfering process, utilize a photomask to come photosensitive film 16 is carried out an exposure imaging technology,, and define the position of each grade wall (bank) 18 and groove 20 with patterning photosensitive film 16.
As shown in Figure 3, then utilize the photosensitive film 16 of patterning inorganic layer 14 to be carried out an etch process as a hard shielding, the zone that the photosensitive film 16 that is not patterned with removal covers, and on substrate 12, form a plurality of grades of walls 18 and a plurality of groove 20 structures once more.Again substrate 12 surfaces, each groove 20 are carried out a surface treatment with shelves wall 18 subsequently.Wherein, has higher chemical affinity (chemical affinity) between shelves wall 18 and the follow-up colorized optical filtering material, belong to hydrophobicity, then have lower chemical affinity between substrate 12 surfaces in each groove 20 and the colorized optical filtering material, belong to water wettability.
As shown in Figure 4, utilize an ink gun 22 to carry out at least one ink-jetting process then, be sprayed in each groove 20 with the colorized optical filtering material 24 that will have red slurry, green slurry and blue slurry respectively.Then as shown in Figure 5, be coated with a covering layer 26 on colorized optical filtering material 24 and shelves wall 18, so that have substrate 12 flattening surfaces of colorized optical filtering material 24.At last as shown in Figure 6, form again in covering layer 26 surfaces one by tin indium oxide (indium tin oxide, ITO) or indium zinc oxide (indium zincoxide, the transparency conducting layer 28 that IZO) is constituted, and then finish the structure of a colored optical filtering substrates.
Yet have now when making colored optical filtering substrates, because the difference of characteristics such as each storeroom chemical affinity, the colorized optical filtering material that is sprayed at substrate 12 surfaces can produce surface smoothness and the not good shortcoming of shape.In order to improve this problem, prior art covers a covering layer again in the colorized optical filtering material surface behind spraying colorized optical filtering material, make the flattening surface of colorized optical filtering material, and then form structure shown in Figure 5.Yet,, cause the problems such as reduction of light utilization efficiency and penetrance simultaneously though this structure can solve the irregular shortcoming of colorized optical filtering material surface.
Summary of the invention
Therefore fundamental purpose of the present invention is to provide a kind of method of making colored optical filtering substrates, produces problems such as light utilization efficiency and penetrance reduction to solve the above-mentioned existing colored optical filtering substrates back that completes.
According to claim of the present invention, it discloses a kind of method of making colored optical filtering substrates, one substrate at first is provided, form pair of lamina dry film (dry film) then in a surface of this substrate, and should have a upper strata and a lower floor by the bilayer dry film, then this bilayer dry film be carried out a pattern transfering process, to define a plurality of grades of walls and a plurality of groove, subsequently at least one colorized optical filtering material is arranged at respectively in this groove, removes this upper strata of this bilayer dry film then.
Because forming earlier, the present invention has the double-deck dry film of a upper strata and a lower floor in a substrate surface, carry out a pattern transfering process then, in double-deck dry film, to define a plurality of grades of walls and a plurality of groove, then behind each groove, remove the upper strata of double-deck dry film, therefore can effectively improve the problem of directly on black-matrix layer and photosensitive film, carrying out smooth technology when making colored optical filtering substrates and causing light utilization efficiency and penetrance to reduce that has now in spraying colorized optical filtering material.
Description of drawings
Fig. 1 to Fig. 6 is the existing method synoptic diagram of making a colored optical filtering substrates.
Fig. 7 to Figure 14 makes the synoptic diagram of a colored optical filtering substrates for the preferred embodiment of the present invention.
Figure 15 to Figure 21 makes the synoptic diagram of a colored optical filtering substrates for another embodiment of the present invention.
The simple symbol explanation
12 substrates, 14 inorganic layers
18 grades of walls of 16 photosensitive films
20 grooves, 22 ink guns
24 colorized optical filtering materials, 26 covering layers
28 transparency conducting layers, 32 substrates
34 double-deck dry films, 36 upper stratas
38 lower floors, 40 patterning photomasks
42 grades of wall 44 grooves
46 surface treatments, 48 colorized optical filtering materials
52 substrates, 54 double-deck dry films
56 hydrophilic layers, 58 hydrophobic layers
62 grades of walls of 60 patterning photomasks
64 grooves, 68 colorized optical filtering materials
Embodiment
Please refer to Fig. 7 to Figure 14, Fig. 7 to Figure 14 makes the synoptic diagram of a colored optical filtering substrates for the preferred embodiment of the present invention.As shown in Figure 7, one substrate 32 at first is provided, a transparent glass substrate for example, carry out a thin slice roller (lamination roller) technology then and be about 2 microns to 6 microns double-deck dry film 34 on a surface of substrate 32, and double-deck dry film 34 has a upper strata 36 and a lower floor 38 to form a thickness.Wherein, double-deck dry film 34 can be organic material or generally feels the photo anti-corrosion agent material that revolves optical activity and constitutes.
As shown in Figure 8, then double-deck dry film 34 is carried out a pattern transfering process, for example provide a patterning photomask 40 to be arranged at double-deck dry film 34 tops earlier, utilize patterning photomask 40 to carry out an exposure imaging technology then, in double-deck dry film 34, to define a plurality of grades of walls 42 and a plurality of grooves 44, as shown in Figure 9.Wherein, each groove 44 constitutes a pixel region of display panel, and the area of this pixel region is about 2 * 10
5Square micron to 7 * 10
5Square micron.
In addition, be not limited to said method, pattern transfering process can form patterning shielding (figure does not show) again earlier on double-deck dry film 34, utilize this patterning shielding (figure does not show) to be used as hard shielding then double-deck dry film 34 is carried out an etch process, in double-deck dry film 34, to define a plurality of grades of walls 42 and a plurality of grooves 44, then remove the patterning shielding.
As shown in figure 10, after forming shelves wall 42 and groove 44, the double-deck dry film 34 to patterning carries out a surface treatment 46 again, and for example a plasma is handled, and the oxygenous (O of those gas ions pack processing
2) and carbon tetrafluoride (CF
2) potpourri, be processed into a hydrophilic layer and lower floor 38 be processed into a hydrophobic layer in order to upper strata 36, or upper strata 36 is processed into a hydrophobic layer and lower floor 38 is processed into a hydrophilic layer double-deck dry film 34.
As shown in figure 11, carry out an ink-jet (ink jet) technology then, at least one colorized optical filtering material 48 is arranged in each groove 44.Wherein, what colorized optical filtering material 48 can be according to product specification and design is different, and comprises the colorized optical filtering material of red slurry, green slurry and blue slurry etc.
As shown in figure 12, the double-deck dry film of following patterning 34 carries out curing (curing) technology, for example a ultraviolet light polymerization technology.Through curing process thus, the present invention can effectively control the shape of three color look filters such as redness, green and blueness, and then improves the optical characteristics and the homogeneity of colored optical filtering substrates.Then as shown in figure 13, utilize patterning photomask 40 to carry out a developing process or utilize roller to carry out the upper strata 36 that a dyestripping technology removes double-deck dry film 34.
After removing upper strata 36, as shown in figure 14, then substrate 12 is inserted and carry out baking (baking) technology in the oven, utilize about 200 ℃ to 250 ℃ temperature to carry out 30 to 60 minutes baking, with the endurance and the physical strength of increase product, and then form colored optical filtering substrates structure of the present invention.
It should be noted that, the present invention forms earlier has the double-deck dry film of a upper strata and a lower floor in a substrate surface, and then carry out a pattern transfering process, in double-deck dry film, to define a plurality of grades of walls and a plurality of groove, then behind each groove, remove the upper strata of double-deck dry film, therefore can effectively improve the problem of directly on black-matrix layer and photosensitive film, carrying out smooth technology when making colored optical filtering substrates and causing light utilization efficiency and penetrance to reduce that has now in spraying colorized optical filtering material.
Please refer to Figure 15 to Figure 21, Figure 15 to Figure 21 makes the synoptic diagram of a colored optical filtering substrates for another embodiment of the present invention.As shown in figure 15, at first provide a substrate 52, a transparent glass substrate for example carries out a thin slice roller technology then and is about 2 microns to 6 microns double-deck dry film 54 on a surface of substrate to form a thickness.Wherein, double-deck dry film 54 has a hydrophilic layer 56 and a hydrophobic layer 58, and hydrophilic layer 56 is positioned on the hydrophobic layer 56, as shown in FIG..Yet, being not limited to this storehouse mode, the present invention can form a double-deck dry film with hydrophilic layer and hydrophobic layer again in substrate surface after substrate is provided, and hydrophobic layer is arranged on the hydrophilic layer.Therefore, be different from previous described embodiment, present embodiment directly forms a double-deck dry film that has had hydrophilic layer and hydrophobic layer in a substrate surface, and therefore can omit the foregoing description needs the double-deck dry film of patterning is carried out the surface-treated step after forming shelves wall and groove.
As shown in figure 16, then double-deck dry film 54 is carried out a pattern transfering process, for example provide a patterning photomask 60 to be arranged at double-deck dry film 54 tops earlier, utilize patterning photomask 60 to carry out an exposure imaging technology then, in double-deck dry film 54, to define a plurality of grades of walls 62 and a plurality of grooves 64, as shown in figure 17.Wherein, each groove 64 constitutes a pixel region of display panel, and the area of this pixel region is about 2 * 10
5Square micron to 7 * 10
5Square micron.
In addition, as before described, pattern transfering process can form patterning shielding (figure does not show) again earlier on double-deck dry film 54, utilize this patterning shielding (figure does not show) to be used as hard shielding then double-deck dry film 54 is carried out an etch process, in double-deck dry film 54, to define a plurality of grades of walls 62 and a plurality of grooves 64, then remove the patterning shielding.
As shown in figure 18, after forming shelves wall 62 and groove 64, carry out an ink-jetting process, at least one colorized optical filtering material 68 is arranged in each groove 64.Wherein, colorized optical filtering material 68 can comprise the colorized optical filtering material of red slurry, green slurry and blue slurry etc.
As shown in figure 19, then the double-deck dry film 54 to patterning carries out a curing process, for example a ultraviolet light polymerization technology.Through curing process thus, the present invention can effectively control the shape of three color look filters such as redness, green and blueness, and then improves the optical characteristics and the homogeneity of colored optical filtering substrates.
As shown in figure 20, after the colorized optical filtering material cured, utilize patterning photomask 60 to carry out a developing process then or utilize roller to carry out the hydrophilic layer 56 that a dyestripping technology removes double-deck dry film 54.
After removing hydrophilic layer 56, as shown in figure 21, then substrate 52 is inserted and carry out baking (baking) technology in the oven, utilize about 200 ℃ to 250 ℃ temperature to carry out 30 to 60 minutes baking, with the endurance and the physical strength of increase product, and then form colored optical filtering substrates structure of the present invention.
In sum, be different from existing method of making colored optical filtering substrates, the present invention forms earlier has the double-deck dry film of a upper strata and a lower floor in a substrate surface, carry out a pattern transfering process then, in double-deck dry film, to define a plurality of grades of walls and a plurality of groove, then behind each groove, remove the upper strata of double-deck dry film in spraying colorized optical filtering material.In addition, the present invention can after a substrate is provided, directly form again have a hydrophilic layer and a hydrophobic layer double-deck dry film in substrate surface, and then double-deck dry film carried out a pattern transfering process, in double-deck dry film, defining a plurality of grades of walls and a plurality of groove, and then omit above-mentioned double-deck dry film and carry out the surface-treated step patterning.Therefore, the present invention is except simplifying the processing step of making colored optical filtering substrates, can provide one to have the colored optical filtering substrates structure of high optical characteristics again, and then effectively improve the problem of directly on black-matrix layer and photosensitive film, carrying out smooth technology when making colored optical filtering substrates and causing light utilization efficiency and penetrance to reduce that has now.
The above only is the preferred embodiments of the present invention, and all equalizations of doing according to claim of the present invention change and modify, and all should belong to covering scope of the present invention.
Claims (15)
1. a method of making colored optical filtering substrates comprises the following steps:
Substrate is provided;
Form the surface of double-deck dry film, and should have upper strata and lower floor by the bilayer dry film in this substrate;
This bilayer dry film is carried out pattern transfering process, and to define a plurality of grades of walls and a plurality of groove, each this groove is between those two adjacent grades of walls;
At least one colorized optical filtering material is arranged at respectively in this groove; And
Remove this upper strata of this bilayer dry film.
2. the method for claim 1, wherein this upper strata is a hydrophilic layer, and this lower floor is a hydrophobic layer.
3. the method for claim 1, wherein this upper strata is a hydrophobic layer, and this lower floor is a hydrophilic layer.
4. the method for claim 1, wherein this pattern transfering process comprises:
The top of photomask in this bilayer dry film is provided; And
Utilize this photomask to carry out exposure imaging technology, in this bilayer dry film, to define those grades wall and those grooves.
5. the method for claim 1, wherein this pattern transfering process comprises:
Forming patterning is shielded from this bilayer dry film;
Carry out etch process, in this bilayer dry film, to define those grades wall and those grooves; And
Remove this patterning shielding.
6. the method for claim 1 wherein after forming those grades wall and those grooves, also comprises the step of this bilayer dry film of patterning being carried out Cement Composite Treated by Plasma, and those gas ions are handled and comprised the potpourri that oxygen and carbon tetrafluoride are provided.
7. method as claimed in claim 6, wherein this surface treatment is for to be processed into this upper strata hydrophilic layer and this lower floor is processed into hydrophobic layer.
8. method as claimed in claim 6, wherein this surface treatment is for to be processed into this upper strata hydrophobic layer and this lower floor is processed into hydrophilic layer.
9. the method for claim 1, wherein will this at least one colorized optical filtering material be arranged at the step in this groove respectively after, comprise that also this bilayer dry film to patterning is cured technology.
10. the method for claim 1 wherein after removing this upper strata, also comprises and carries out baking process.
11. method as claimed in claim 10, wherein the temperature of this baking process is about 200 ℃ to 250 ℃.
12. method as claimed in claim 11, wherein the time of this baking process is about 30 to 60 minutes.
13. the method for claim 1, the step that wherein removes this upper strata utilizes developing process or dyestripping technology to reach.
14. the method for claim 1, thickness that wherein should the bilayer dry film is about 2 microns to 6 microns.
15. the method for claim 1 wherein forms this bilayer dry film and realizes with thin slice roller technology in this surperficial step of this substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB200610074043XA CN100368892C (en) | 2006-04-04 | 2006-04-04 | Method for manufacturing color filter substrate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CNB200610074043XA CN100368892C (en) | 2006-04-04 | 2006-04-04 | Method for manufacturing color filter substrate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1825184A true CN1825184A (en) | 2006-08-30 |
| CN100368892C CN100368892C (en) | 2008-02-13 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB200610074043XA Expired - Fee Related CN100368892C (en) | 2006-04-04 | 2006-04-04 | Method for manufacturing color filter substrate |
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| Country | Link |
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| CN (1) | CN100368892C (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN107175193A (en) * | 2017-06-02 | 2017-09-19 | 信利光电股份有限公司 | The preparation method and making frock of a kind of graphical optical filter |
| CN107801316A (en) * | 2016-08-29 | 2018-03-13 | 株式会社田村制作所 | The manufacture method of printed circuit board (PCB) and printed circuit board (PCB) |
| CN107991726A (en) * | 2017-12-29 | 2018-05-04 | 深圳市华星光电技术有限公司 | A kind of method and colored filter of inkjet printing manufacture colored filter |
| CN108663854A (en) * | 2018-05-09 | 2018-10-16 | 京东方科技集团股份有限公司 | The preparation method of display base plate and the preparation method of liquid crystal apparatus |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001228634A (en) * | 2000-02-18 | 2001-08-24 | Sumitomo Metal Ind Ltd | Method for forming resist pattern, etching method, method for manufacturing microstructure, microstructure, and liquid crystal display device |
| JP2003107231A (en) * | 2001-09-27 | 2003-04-09 | Seiko Epson Corp | Method of manufacturing color filter, color filter, liquid crystal device and electronic device having the same |
| JP3942590B2 (en) * | 2003-12-25 | 2007-07-11 | シャープ株式会社 | Manufacturing method of color filter substrate |
| KR101097538B1 (en) * | 2004-06-30 | 2011-12-22 | 엘지디스플레이 주식회사 | fabrication apparatus of color filter of LCD and method thereof |
| JP4059231B2 (en) * | 2004-07-07 | 2008-03-12 | セイコーエプソン株式会社 | Color filter, method for manufacturing the same, electro-optical device, and electronic apparatus |
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2006
- 2006-04-04 CN CNB200610074043XA patent/CN100368892C/en not_active Expired - Fee Related
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| CN107801316A (en) * | 2016-08-29 | 2018-03-13 | 株式会社田村制作所 | The manufacture method of printed circuit board (PCB) and printed circuit board (PCB) |
| CN107801316B (en) * | 2016-08-29 | 2022-06-10 | 株式会社田村制作所 | Printed circuit board and method for manufacturing printed circuit board |
| CN107175193A (en) * | 2017-06-02 | 2017-09-19 | 信利光电股份有限公司 | The preparation method and making frock of a kind of graphical optical filter |
| CN107991726A (en) * | 2017-12-29 | 2018-05-04 | 深圳市华星光电技术有限公司 | A kind of method and colored filter of inkjet printing manufacture colored filter |
| CN108663854A (en) * | 2018-05-09 | 2018-10-16 | 京东方科技集团股份有限公司 | The preparation method of display base plate and the preparation method of liquid crystal apparatus |
| WO2019214387A1 (en) * | 2018-05-09 | 2019-11-14 | 京东方科技集团股份有限公司 | Preparation method for array substrate and preparation method for liquid crystal antenna |
| US10712665B2 (en) * | 2018-05-09 | 2020-07-14 | Beijing Boe Optoelectronics Technology Co., Ltd. | Method for manufacturing array substrate and method for manufacturing liquid crystal antenna |
| CN108663854B (en) * | 2018-05-09 | 2021-08-27 | 京东方科技集团股份有限公司 | Preparation method of display substrate and preparation method of liquid crystal device |
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| Publication number | Publication date |
|---|---|
| CN100368892C (en) | 2008-02-13 |
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