CN1197290A - 半导体器件 - Google Patents
半导体器件 Download PDFInfo
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- CN1197290A CN1197290A CN98106684A CN98106684A CN1197290A CN 1197290 A CN1197290 A CN 1197290A CN 98106684 A CN98106684 A CN 98106684A CN 98106684 A CN98106684 A CN 98106684A CN 1197290 A CN1197290 A CN 1197290A
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Abstract
本发明的半导体器件这样构成,即把用于封装的焊球固定在从封装中凸出的引线上,可避免在常规引线框架型半导体器件中出现的下列缺陷,即因出现引线弯曲而导致的管脚数增加时的铺设困难,和引出线端子从封装树脂凸出对小型化不利的缺陷。
Description
本发明涉及用合成树脂封装半导体器件的树脂封装型半导体器件。
一般来说,树脂封装型半导体器件分为众所周知的BGA(球栅阵列,BallGrid Array)封装型,其中把半导体器件安装在玻璃环氧树脂等构成的基片上,用树脂封装;和封装型,其中把半导体器件安装在引线框架上,用树脂封装。
图11是表示公知的BGA型半导体器件的剖面结构图。
在BGA型的半导体器件中,把半导体器件31安装在由玻璃环氧树脂等构成的基片30上,与内引线对应的预定图形32形成在基片的表面上(图11中的上表面),在其上装配元件。此外,在半导体器件31上形成多个电极33,通过金属导线34与相应的图形32连接。此外,在包括金属导线34的半导体器件31的周边区用封装树脂35整体地封装。
另一方面,把与外引线对应的图形36形成在与元件安装表面相对的表面上(图11中下表面),通过穿过基片30的通孔37与上述图形32电连接。此外,使用粘接材料37,把焊球38固定在相应图形36的焊接区。当把封装的半导体器件安装在未图示的电路板等上时,这些焊球38就作为用于外部连接的电极部件,在基片30的封装表面(图11中下表面)上呈栅形地排布。
顺便说明一下,在这种BGA类型半导体器件中,当为了在高工作频率下进行高速处理安装半导体器件31时,为了避免因信号线上噪声辐射导致的电信号传播滞后,采用例如用多层结构构成基片30将地与电源分开的方法。
与此对应,使用引线框架的半导体器件采用如图12所示的剖面结构。
在图示引线框架型半导体器件中,把半导体器件41装配在引线框架的管芯焊盘40上。在半导体器件41上形成多个电极42,通过金属导线44与与其相应的内引线43连接。然后,包含金属导线44的周边区用封装树脂45整体地封装。再有,外引线46与内引线43成为一体地从封装树脂45的侧边部分延伸。模制该外引线46,使其相应于电路板上封装的封装模式等弯曲成预定形状(图示例中为鸥翼)。
可是,在上述两种类型的半导体器件中存在固有的下列问题。
也就是说,在BGA型半导体器件的情况下,焊球38是两维配置的,在增加管脚数的铺设上有优点。可是,以由较昂贵的玻璃环氧树脂构成的组件作为基片30的基底,因此,与具有简单结构的引线框架型半导体器件相比,存在增加成本的问题。此外,基片30在其保存期间吸收空气中的水分,因此,如果封装树脂35与基片30的粘接较差,那么会出现因低抗湿性以及缓慢焊接的耐热性导致的问题,其中,有因在基片封装处理期间的焊接可引起表面之间的剥离,以及由于与基片30的热膨胀系数不匹配可在封装树脂35中出现裂缝的问题。
另一方面,引线框架型半导体器件采用这样的结构,使外引线46向封装树脂45的外部凸出较多,因而不利于器件整体缩小尺寸。此外,由于外引线46被拉长,因而很容易弯折,就管脚数增加的布图来说,考虑到基片封装处理时引线连接部分的配合(平坦性),因而半导体器件的这种类型有局限性。
再有,作为组件基底的引线框架由金属材料构成,除此之外,采用组装成简单结构的平板结构。因此,尽管在成本上低于上述BGA型半导体器件,但由于单层结构的焊球,所以此后的半导体器件在信号之间存在产生噪声的趋势,而且不适于装配需要高速处理的半导体器件41。因此,在那种情况下,没有选择,只有采用上述BGA型的结构,结果,存在增加成本的缺点。
鉴于这种情况,本发明的主要目的在于提供能够增加相应的管脚数且减小器件尺寸的半导体器件。
为了实现上述目的,按照本发明的一个方案,本发明的半导体器件包括:引线框架,包括用于装配元器件的管芯焊盘和排列在管芯焊盘周边区的引出线端子;金属导线,其一端与半导体器件的电极部分连接,另一端与引出线端子的一端连接;封装半导体器件的封装树脂;和呈凸状地设置在引出线端子另一边上的电极部件。
因此,由于把电极部件凸状地设置在引出线端子的另一端部,所以当在电路板上进行封装等时,在不导致如上所述的引出线端子从封装树脂中较大凸出的情况下,通过上述电极部件很容易与电路板进行电连接。
此外,按照本发明的半导体器件,采用这样的结构,即采用封装树脂的封装在其周边区直至配置电极部件的外部区域都有效,并且封装树脂形成对应于电极部件配置位置的凹槽部分。
因此,可以把电极部件放在封装树脂形成凹槽部分的位置,从而能够提高电极部件的位置精度。
此外,按照本发明的半导体器件,采用这样的结构,即把用于调整信号传输通路阻抗成分的阻抗元件另外设置在从金属导线延伸至电极部件的信号传输通路的中间。
按照上述结构,电阻元件调整从金属导线延伸至电极部件的信号传输通路的阻抗成分,从而不会接收来自邻近信号传输通路的噪声干扰。
在下面结合附图的说明中,本发明的其它目的和优点会变得更明确,其中:
图1是表示本发明第一实施例的半导体器件的侧剖视图;
图2是表示本发明第一实施例的半导体器件的透视平面图;
图3(a)和3(b)是展示在第一实施例中(部分1)制造半导体器件的方法的说明图;
图4(a)和3(b)是展示在第一实施例中(部分2)制造半导体器件的方法的说明图;
图5是表示本发明第二实施例的半导体器件的侧剖视图;
图6是表示本发明第二实施例的半导体器件的透视平面图;
图7是展示在第二实施例中制造半导体器件的方法的说明图;
图8是表示本发明第三实施例的半导体器件的透视平面图;
图9是表示本发明第三实施例的半导体器件的透视平面图;
图10是展示在第三实施例中制造半导体器件的方法的说明图;
图11是表示常规例的侧剖视图(BGA型);和
图12是表示另一常规例的侧剖视图(引线框架型)。
下面,参照附图,更详细地说明本发明的实施例。
图1是表示本发明第一实施例的半导体器件的侧剖视图。图2是其平面透视图。
在图示的半导体器件中,在引线框架的管芯焊盘1、内引线2和外引线3的表面上形成由金或银构成的镀敷层4。形成在包括管芯焊盘1、内引线2和外引线3的引线框架表面上的该镀敷层4的厚度例如约为5μm。管芯焊盘1在平面上形成为与后面提到的半导体器件的结构相应的矩形形状,而且其四个角部由悬置引线5支撑。此外,通过降低引线框架的压力使管芯焊盘1比内引线2凹陷得低。设置内引线2,以便其一端接近管芯焊盘1的周边,外引线3一体地从该内引线2延伸。再有,在从其一端至其它端的整个区域内,内引线2与外引线3互相齐平。
另一方面,把从平面上观察为类似矩形形状的片状半导体器件6装配在引线框架的管芯焊盘1上。使用焊接材料(未示出),比如银焊膏、钎焊焊膏等把该半导体器件6固定在管芯焊盘1上。把多个电极(铝电极)7按照预定的节距设置在半导体器件6的上表面,并通过金属导线8,例如金制导线等与其对应的内引线2连接。此外,用封装树脂9整体地树脂封装包括内引线2和金属导线8的半导体6的周边区。该封装树脂9由热固性树脂构成,例如还氧系树脂等,并起到防止半导体器件6和其周边部分(例如金属细丝8等)与外界接触。应该指出,封装树脂9可包括使用热塑性树脂。
另一方面,通过连接材料10,比如导电树脂和焊膏,可把焊球11固定在向外延伸的封装树脂9的外引线3上。当在电路板上等封装半导体器件时,该焊球11作为与外部连接的电极部件,通过在其表面上形成的镀敷层4与外引线3连接。再有,把焊球11设置成这样的状态,即对于上述电路板,从封装树脂9的封装表面按预定量凸出(比如,0.2-0.3mm数量级)。
其中,假设引线框架由例如铁系合金比如42合金材料等构成,那么框架基底材料表面的焊接特性等就显著地劣化,因此,如果要保持原样,那么与连接金属导线8和固定焊球11就变得极其困难。在这种情况下,在第一实施例中,把由金或银构成的镀敷层4形成在至少包括内引线2和外引线3的引线框架的表面上,从而通过镀敷层4的插入增强金属导线8与内引线2的连接特性和焊球11与外引线3的连接特性。因此,可以使用其它与金属导线8和焊球11具有同样高的连接特性的导电性材料,例如,除上述金和银之外,以钯作为镀敷层4的材料。
应该指出,根据图1所示的半导体器件的结构,除了在引出线(2,3)上之外,还把镀敷层4形成在管芯焊盘1上,可是,也可用镀敷层4形成该管芯焊盘1的必需部分。
在电路板上封装这样构成的半导体器件时,以作为电极部件的焊球11朝向下的方式在电路板上装配半导体器件。在这种情况下,在电路板上存在分别对应焊球11位置的焊接区,也使这些焊接区处于与焊球11连接的状态。在该状态下,通过回流处理等加热,熔化焊球11,从而使电路板与半导体器件电连接。
这时,可能出现因焊球11熔化导致的封装树脂9与电路板的接触。假设通过改变主要构成焊球11的铅和锡的比例,使焊球11的核心部分在高于回流温度时熔化,围绕核心的球外部在低于回流温度时熔化,那么在电路板封装处理时封装树脂9和电路板之间的间隙可通过适当设定焊球11核心部分的尺寸调整到期望的尺寸。
因此,在把半导体器件封装在电路板上的情况下,当处于实际工作时,半导体器件6的电信号从电极7通过金属线8传输到引出线(2、3)上,并通过在引出线上(外引线2)的焊球11再传输给电路板。
下面,说明第一实施例中制造半导体器件的方法。
首先,如图3(a)所示,加工成形由金属材料例如铁系合金材料或铜系合金材料构成的类似平板的引线框架12。这种情况中成形加工方法分为:化学方法,即用依据预定的设计尺寸制成的掩模覆盖必要的部分,利用腐蚀去除未掩模的不需要的部分;机械方法,根据预定的设计尺寸制成的金属模具冲切不需要的部分。当然,其中两种方法都是有效的。
利用上述成形处理,引线框架12形成用作元件安装部件的管芯焊盘1和用于支撑该管芯焊盘的悬置引线5。再有,在相对管芯焊盘的周边区形成多个内引线2,与这些内引线2整体地形成外引线3。此外,把阻挡带(dam bars)13设置在相应的引线之间,形成由这些阻挡带13互相连接引线的状态。
接着,对于成形处理的引线框架12,在至少包括引出线(2,3)的引线框架的表面上进行金和银的镀敷处理,从而形成上述镀敷层4(参见图1)。在这种情况下,还在管芯焊盘1上与引出线(2,3)一起进行镀敷处理,由此,如图1所示,在管芯焊盘1和引出线(2,3)的表面上形成镀敷层4。
在此阶段,完成了作为个体的引线框架12的制造过程。
随后,把引线框架12移至进行管芯连接处理,其中,如图3(b)所示,利用说明的连接材料(例如,银焊膏、焊膏等),把半导体器件6固定安装在引线框架的管芯焊盘1上。
接着,把在其上已安装有元件的引线框架移至进行导线连接处理,其中,如图3(b)所示,把在半导体器件6上的电极通过金属导线8比如金导线与相应的内引线2连接。在这种情况下,在内引线2的表面上存在与金属导线8有高连接特性的镀敷层4,因此金属导线8的一端通过这些镀敷层4能够与内引线2牢固地连接。
随后,把引线框架移至进行树脂封装处理,其中,如图4(a)所示,把半导体器件6的周边区用封装树脂9整体地封装。在该树脂封装处理中,用公知的模压方法比如传送(transfer)模压方法等封装半导体器件6。在这种情况下,阻挡带13起到防止树脂从引线之间流动的作用,从而用多余的树脂9a填充内部。
随后,如图4(b)所示,去除沿封装树脂9的外缘的无用的树脂(毛边),并切断连接引线的阻挡带13,制成独立的各引出线(内引线2和外引线3)。再有,把外引线3切割成预定的长度,把悬置引线5沿封装树脂9的外缘切断,从而使引出线相互电分离。此外,封装件从引线框架的外框分开。
最后,如图1和图2所示,把连接材料10比如导电性树脂或焊膏施加在从封装树脂9伸出的在其上形成镀敷层4的外引线3的侧边,通过该连接材料10,把焊球11固定在外引线3上。更具体地说,通过连接材料10,焊球11暂时地固定在外引线3,依据这种状态,通过加热处理熔化连接材料10来固定焊球11。
这时,在外引线3的表面上形成对焊球11有高焊接特性的镀敷层4,因此,通过这些镀敷层4,能够把焊球11与外引线3牢固地连接。可是,在暂时固定后进行加热处理时,选择具有低于在焊球11的表面上的焊料熔点的材料作为用于固定焊球11的连接材料10是很重要的,以便在连接材料10被熔化前在焊球11表面上的焊料不被熔化。应该指出,形成焊球11的方法可包括在外引线3上涂敷较厚的焊膏,用回流处理形成球状焊膏,从而获得期望的焊球11。
通过上述处理制成第一实施例的半导体器件。
在第一实施例的半导体器件中,设置作为电极部件的焊球11,使其在伸出封装树脂9外部的外引线3上凸出。因此,当在电路板上等封装时,可以实现通过焊球11与电路板的电连接,而没有如现有技术中所看到的引出线较大地凸出封装树脂的情况。因此,外引线3的长度与常规的引线框架型的半导体器件相比可以更短。利用长度上的减小,使引线从封装树脂9中的凸出最小,使焊球能够更接近封装树脂9(向内)。
此外,由于采用引线框架型,所以能够设置便宜的半导体器件,再有,当制造这种器件时,不需要外引线的较困难的外部处理(焊料镀敷等),由此使其易于进一步降低成本。还有,能够直接使用对应于引线框架型的现有的组装设备,因此,成本因设备费用的增加不大。
顺便说明一下,如果要安装的半导体器件6的电信号处于50MHz或更低的数量级,即使引线框架型的半导体器件也能够几乎不受因辐射噪声等导致的传播延迟的影响。
此外,用封装树脂9封装的部分采用与常规引线框架型相等的截面结构,因此,当在电路板上封装时,还能够确保根据焊料耐热特性的相同容量。再有,就由封装件、焊球11、外引线3和封装树脂确定的电路板热膨胀系数之间的匹配而言,由于外引线3具有缓解应力的作用,所以能够确保高可靠性。
图5是表示本发明第二实施例的半导体器件的侧剖视图。图6是表示其平面透视图。
图5和图6所示的半导体器件包括:引线框架的管芯焊盘1、内引线2、外引线3;在框架表面上形成的镀敷层4;和支撑管芯焊盘1的悬置引线5。再有,半导体器件6固定安装在管芯焊盘1上,电极7设置在半导体器件6上。金属导线8把在半导体器件6上的电极7与内引线2连接。封装树脂9封装半导体器件6的周边区。焊球11通过连接材料10固定在外引线3上。
其中,第二实施例与上述第一实施例的不同在于在封装树脂8和其封装区的特殊结构。
简单地说,在上述第一实施例的情况下,用封装树脂9封装除外引线3以外的部分。可是,在第二实施例中,用封装树脂9封装的区域还包括外引线3。
再有,相应于封装树脂9的结构和相应于焊球11的设置位置,在一个表面成对地形成方形框状凹槽12a、12b(图中的上表面)。把这些凹槽12a、12b这样设置,即位于外引线3的镀敷处理表面的侧边上,从而处于使外引线3的某些部分露出的状态。再有,把各凹槽12a、12b的宽度设置得稍大于焊球11的直径,以便把焊球11刚好嵌入其中。此外,焊球11通过内凹槽12a固定在与相互邻近的外引线3的一个外引线3上,同时焊球11通过外凹槽12b固定在与另一个外引线3上。也就是说,在外引线3的排列方向上(在封装周边方向上)按交错图形装配单独的焊球11。
应该指出,在电路板上封装半导体器件的处理和在电路板上进行封装后半导体器件6的信号传输通路与上述第一实施例中的情况相同,这里不再对其解释。
下面,说明制造第二实施例的半导体器件的方法。
首先,按照上述第一实施例所采用的相同方式,把由金属材料例如铁系合金材料或铜系合金材料构成的引线框架进行成形处理,随后在包括引出线(内引线和外引线)的引线框架的表面上进行镀敷处理,从而制成引线框架。
接着,如图7所示,当把半导体器件6牢固地安装在引线框架的管芯焊盘1上后,半导体器件6的电极7通过金属导线8与相应的内引线2连接。随后,对半导体器件6的周边区用模压方法例如传送模压方法等进行树脂封装。在这种情况下,外引线3的端部或其临近位置用封装树脂9封装,凹槽12a、12b完整地形成在封装树脂9的一个表面中。因而露出外引线3的某些部分。之后,沿封装树脂9的外缘切断外引线3和未示出的阻挡带,从而进入图7所示的状态。
接着,把连接材料10(参见图5)例如导电性树脂和焊膏涂敷在外引线3的露出在封装树脂9的凹槽12a、12b外边的部分,焊球11(参见图5)通过连接材料10固定在外引线3上。此时,按其被嵌入封装树脂9的凹槽12a、12b的状态来固定独立的焊球11,从而用凹槽12a、12b调整在引线纵向方向上(图7中上下和左右方向)焊球11的位置。
利用至此进行的处理,制成第二实施例中的半导体器件。
与上述第一实施例相比,第二实施例的半导体器件可获得下列新的效果。
也就是说,由于使放置焊球11的凹槽12a、12b形成在封装树脂9中,所以当把焊球11例如作为独立的部件预先以球形模压时,通过把其嵌入在凹槽12a、12b中能够保证焊球11的放置精度。
应该指出,把凹槽12a、12b成对地形成在封装树脂9中,作为在第二实施例中如上解释的用于放置预先以球形模压的焊球11的一种安装位置。可是,除此之外,通过未示出的,例如,使封装树脂9n形成从平面上看是圆形或方形的凹槽部分,它稍大于对应各自焊球11的封装部分形状的焊球直径。使其适于在互相正交的双轴方向上放置焊球11,其排列变得更好。
再有,在第二实施例中,把各个焊球11排列成交错的图形。在相互临近的外引线3上的焊球11之间不允许接触的情况下,这种排列作为一种模式的例子,通过尽可能窄的设置引线排列的节距来实现增加管脚数的铺设。因此,可能出现不必依赖于需要的管脚数按交错图形排列焊球11的情况。由此,在这种情况下,如同在上述第一实施例中采用的相同方式,各个焊球11被排布在同一行上,从而能够实现半导体器件的尺寸减小。
图8是表示本发明第三实施例的半导体器件的透视平面图。图9是表示其透视平面图。可是,图9表示用树脂封装后的状态。
第三实施例中的半导体器件特别是在下列点上不同于上述第二实施例,即阻抗元件13额外地设有位于中间的从金属导线8延伸至焊球11的信号传输通路。
阻抗元件13是用于调整例如电感组件、电容组件和电阻组件的阻抗的元件。当调整时,例如,信号传输通路的电容组件采用薄片电容和具有与薄片电容相同功能的元件。再有,在调整电阻组件的情况下,采用薄片电阻和具有与薄片电阻相同功能的元件。
此外,由内引线2和外引线3形成从金属导线8引导至焊球11的信号传输通路,因此管芯焊盘14被单独设置在其间的边界部分。把阻抗元件13牢固地安装在该管芯焊盘14上。然后,阻抗元件13上的电极15通过金属导线16与内引线2和外引线3两者电连接。再有,包括焊球11封装部分的半导体器件6的周边区按包括阻抗元件13和金属导线16的方式用封装树脂9进行整体地树脂封装。
当在电路板等上封装这样构成的半导体器件时,按与在上述第一和第二实施例相同的方式,把作为电极部件的焊球11与电路板的焊接区部分焊接。再有,在把半导体器件封装在电路板上的状态下,当实际工作时半导体器件6的电信号通过其上的金属导线8从电极7传输至内引线2,并通过上述阻抗元件13从在外引线3上的焊球11再传输给电路板。
下面,说明制造第三实施例的半导体器件的方法。
首先,按照上述第一和第二实施例所采用的相同方式,把由金属材料例如铁系合金材料或铜系合金材料构成的引线框架进行成形处理,随后在包括引出线(内引线和外引线)的引线框架的表面上进行镀敷处理,从而制成引线框架。在这种情况下,如图10所示,引线框架形成有位于内引线2和外引线3之间的边界位置的管芯焊盘14。
接着,如图10所示,把半导体器件6牢固地安装在引线框架的管芯焊盘14上(参见图8),把阻抗元件13牢固地安装在内引线2和外引线3之间的管芯焊盘14上。再有,与其对应的半导体器件6的电极7和内引线2通过金属导线8互相连接,阻抗元件13通过金属导线16与内引线2和外引线3连接。随后,如图9所示,通过例如传送模压方法等树脂封装半导体器件6的周边区。在这种情况下,通过模压形成的封装树脂9整体地形成有用于放置如图8所示的焊球11封装位置的凹槽12a、12b。
随后,沿封装树脂9的外边缘切断外引线3和未示出的阻挡带,然后把焊球11通过封装树脂9的凹槽12a、12b固定在外引线3上。
利用至此进行的处理,制成第三实施例中的半导体器件。
与上述第一实施例相比,第三实施例的半导体器件具有下列新的效果。
简单来说,阻抗元件13另外设有位于中间的从金属导线8延伸至焊球11的信号传输通路,由阻抗元件13来调整比如电容等阻抗分量。因此,不会接收来自邻近信号传输通路的噪声干扰。
如上所述,即使当带装配的半导体器件6的电信号达到足以超过50MHz的较高速率,引线框架型半导体器件也能够避免因噪声干扰导致的传播延迟。
应该指出,第三实施例说明了相对上述第二实施例的半导体器件附加阻抗元件13的模式。除该模式外,对于上述第一实施例的半导体器件来说,还可以采用附加阻抗元件13的模式,即在该模式中,在如图1和图2所示的封装树脂9的封装区域内,按被分隔的方式,把管芯焊盘(未示出)单独设置于内引线2中间的局部地构成信号传输通路,在管芯焊盘上装配阻抗元件13后进行布线处理。
至此根据实施例中说明的半导体器件,把电极部件设置在引出线的另一端以便凸出,因此,当在电路板上封装时,在不导致如现有技术看到的那样从封装树脂中引出线较大凸出的情况下,通过上述电极部件与电路板电连接。从而能够显著地降低引出线的长度,使引线不易弯曲,它有助于增加管脚数的铺设。再有,由于从封装树脂中引出线的凸出量较小,所以能够减小半导体器件的尺寸。此外,采用简单结构的引线框架作为基体组件部分,因而能够以很低的成本提供半导体,如上所述,该半导体易于增加管脚数的铺设并使其尺寸减小。此外,用封装树脂的封装结构与常规引线框架型的结构相同,因此,具有优于BGA型的焊接耐热特性。
再有,用与电极部件排列位置对应的凹槽形成封装树脂,从而使电极部件能够放置在凹槽部分内。当在引出线上排列电极部件时,就容易保证其放置精度。这可以防止在引出线上的电极部件的位置错位,结果,当在电路板等上封装半导体器件时,能够精确地排布在两边上的电极部件。
此外,把用于调整信号传输通路的阻抗分量的阻抗元件另外设置于从金属导线延伸至电极部件这种信号传输通路的中间,它几乎不接收来自邻近信号传输通路的噪声引起的干扰。因此,即使在采用引线框架型的情况下,也能够避免因辐射噪声引起的干扰导致的传输延迟,所以能够以低成本提供高速高性能的半导体器件。
显然,在本发明中,在不脱离本发明的精神和范围的情况下,根据本发明能够形成不同工作模式的较宽范围。除用权利要求限定外,本发明不受其特定工作模式的限定。
Claims (4)
1.一种半导体器件,包括:
引线框架具有用于安装元件的管芯焊盘和排列在所述管芯焊盘周围的引出线端子;
在所述引线框架的所述管芯焊盘上装配的半导体元件;
金属导线,其一端与所述半导体器件的电极部分连接,另一端与所述引出线端子一端连接;
用于封装所述半导体元件的封装树脂;和
呈凸状地设置在所述引出线端子另一端上的电极部件。
2.如权利要求1所述的半导体器件,其特征在于,在至少包括所述引出线端子的所述引线框架的表面上形成镀敷层。
3.如权利要求1或2所述的半导体器件,其特征在于,在所述半导体1元件周边直至所述电极部件的配置位置之外的区域用所述封装树脂封装所述半导体元件,和
所述封装树脂形成有相应于所述电极部件的配置位置的凹槽部分。
4.如权利要求1、2或3所述的半导体器件,其特征在于,还包括阻抗元件,它附加地设于从所述金属导线延伸至所述电极部件的信号传输通路的中间,用于调整信号传输通路的阻抗成分。
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JP9102871A JPH10294418A (ja) | 1997-04-21 | 1997-04-21 | 半導体装置 |
JP102871/97 | 1997-04-21 |
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CN1197290A true CN1197290A (zh) | 1998-10-28 |
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CN98106684A Pending CN1197290A (zh) | 1997-04-21 | 1998-04-20 | 半导体器件 |
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US (1) | US6084300A (zh) |
EP (1) | EP0874400B1 (zh) |
JP (1) | JPH10294418A (zh) |
KR (1) | KR100373569B1 (zh) |
CN (1) | CN1197290A (zh) |
DE (1) | DE69737320T2 (zh) |
TW (1) | TW375816B (zh) |
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CN101777543A (zh) * | 2009-01-08 | 2010-07-14 | 恩益禧电子股份有限公司 | 半导体器件 |
CN101405863B (zh) * | 2006-03-27 | 2010-07-21 | 飞兆半导体公司 | 使用涂覆有金属的导线的半导体装置及电部件制造 |
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- 1997-12-08 US US08/986,396 patent/US6084300A/en not_active Expired - Fee Related
- 1997-12-18 EP EP97310261A patent/EP0874400B1/en not_active Expired - Lifetime
- 1997-12-18 DE DE69737320T patent/DE69737320T2/de not_active Expired - Lifetime
-
1998
- 1998-02-11 TW TW087101855A patent/TW375816B/zh not_active IP Right Cessation
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Cited By (3)
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CN1314113C (zh) * | 2002-06-28 | 2007-05-02 | 矽品精密工业股份有限公司 | 防止管脚短路的导线架及具有该导线架的半导体封装件的制法 |
CN101405863B (zh) * | 2006-03-27 | 2010-07-21 | 飞兆半导体公司 | 使用涂覆有金属的导线的半导体装置及电部件制造 |
CN101777543A (zh) * | 2009-01-08 | 2010-07-14 | 恩益禧电子股份有限公司 | 半导体器件 |
Also Published As
Publication number | Publication date |
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DE69737320T2 (de) | 2007-05-31 |
EP0874400B1 (en) | 2007-02-07 |
JPH10294418A (ja) | 1998-11-04 |
KR19980079837A (ko) | 1998-11-25 |
KR100373569B1 (ko) | 2003-06-18 |
US6084300A (en) | 2000-07-04 |
TW375816B (en) | 1999-12-01 |
EP0874400A1 (en) | 1998-10-28 |
DE69737320D1 (de) | 2007-03-22 |
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