CN119511458A - Large-bandwidth integrated optical beam splitter based on sub-wavelength grating and preparation method thereof - Google Patents
Large-bandwidth integrated optical beam splitter based on sub-wavelength grating and preparation method thereof Download PDFInfo
- Publication number
- CN119511458A CN119511458A CN202411915060.6A CN202411915060A CN119511458A CN 119511458 A CN119511458 A CN 119511458A CN 202411915060 A CN202411915060 A CN 202411915060A CN 119511458 A CN119511458 A CN 119511458A
- Authority
- CN
- China
- Prior art keywords
- sub
- layer
- waveguide
- beam splitter
- wavelength
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 59
- 238000002360 preparation method Methods 0.000 title abstract description 6
- 239000011521 glass Substances 0.000 claims abstract description 36
- 238000004519 manufacturing process Methods 0.000 claims abstract description 9
- 238000004528 spin coating Methods 0.000 claims abstract description 9
- 239000003153 chemical reaction reagent Substances 0.000 claims abstract description 8
- 238000005253 cladding Methods 0.000 claims description 49
- 238000006243 chemical reaction Methods 0.000 claims description 34
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 27
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 13
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical group N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 13
- 239000000758 substrate Substances 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 11
- 229920002120 photoresistant polymer Polymers 0.000 claims description 9
- 239000000377 silicon dioxide Substances 0.000 claims description 9
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 9
- 238000005229 chemical vapour deposition Methods 0.000 claims description 8
- 235000012239 silicon dioxide Nutrition 0.000 claims description 8
- 230000005540 biological transmission Effects 0.000 claims description 6
- 238000000151 deposition Methods 0.000 claims description 6
- 238000005530 etching Methods 0.000 claims description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 3
- 238000000609 electron-beam lithography Methods 0.000 claims description 3
- 229910052760 oxygen Inorganic materials 0.000 claims description 3
- 239000001301 oxygen Substances 0.000 claims description 3
- 239000012466 permeate Substances 0.000 claims description 3
- 238000001020 plasma etching Methods 0.000 claims description 3
- 229910052710 silicon Inorganic materials 0.000 claims description 3
- 239000010703 silicon Substances 0.000 claims description 3
- 238000003780 insertion Methods 0.000 abstract description 4
- 230000037431 insertion Effects 0.000 abstract description 4
- 238000004364 calculation method Methods 0.000 abstract description 3
- 230000000694 effects Effects 0.000 abstract description 3
- 239000004065 semiconductor Substances 0.000 abstract description 3
- 238000004891 communication Methods 0.000 description 5
- 238000013461 design Methods 0.000 description 3
- 230000005684 electric field Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000011161 development Methods 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Landscapes
- Optical Integrated Circuits (AREA)
Abstract
The invention relates to a large-bandwidth integrated optical beam splitter based on a sub-wavelength grating and a preparation method thereof, belonging to the technical field of integrated photon devices and semiconductors. The optical beam splitter provided by the invention can obtain the effects of low insertion loss, uniform light splitting and low phase error in a large bandwidth range, and the glass layer formed by spin coating the glass reagent can stably fill gaps in a grating structure of the waveguide layer, avoid air gaps when filling the gaps in the grating structure, improve the reliability of manufacturing the beam splitter, and enable the optical beam splitter to be suitable for large-scale optical calculation and optical interconnection scenes.
Description
Technical Field
The invention relates to the technical field of integrated photonic devices and semiconductor manufacturing, in particular to a large-bandwidth integrated optical beam splitter based on a sub-wavelength grating and a preparation method thereof.
Background
With the development of optical communication and optical computing technologies, the demand for high-performance integrated photonic chips is growing. As a linear optical element, an integrated optical beam splitter plays a vital role in optical communication and optical computing systems. Currently common integrated optical splitters include directional couplers and multimode interference couplers that can split the light beam into different channels, or combine light beams from different channels. The 2x 2 integrated optical beam splitter is used as a basic unit to be combined into a linear optical system, the optical switching and optical routing functions can be realized in an optical communication network, and the matrix-vector operation can be realized in optical computing application. Among the two types of integrated optical splitters, multimode interference couplers have lower wavelength sensitive characteristics. However, as the scale of the linear integrated optical circuit increases, the transmittance difference of different wavelengths can be accumulated step by step, so that the problem of bandwidth limitation is highlighted.
The sub-wavelength grating structure has unique optical properties that when used to construct integrated optical waveguides provide the ability to adjust the mode dispersion to achieve large bandwidth integrated optical elements. In order to obtain an integrated optical beam splitter with a large bandwidth, in addition to careful design of parameters such as period, duty cycle, etc. to obtain excellent theoretical performance, compatibility with existing semiconductor manufacturing processes and stability of manufacturing methods are also required to be considered. The challenges in the practical manufacturing process are mainly that the size of the sub-wavelength grating is smaller, high-precision photoetching and etching technology is required, and on the other hand, voids are easy to form in the grating when the cladding is manufactured by a conventional chemical vapor deposition method.
Therefore, from the aspects of comprehensive performance and reliability, a large-bandwidth integrated optical beam splitter based on a sub-wavelength grating design is researched, and the optical beam splitter has important significance for promoting the development of optical communication and optical computing technology.
Disclosure of Invention
The invention aims to overcome the defects of the prior art and provide a large-bandwidth integrated optical beam splitter based on a sub-wavelength grating and a preparation method thereof.
In order to achieve the above purpose, the technical scheme adopted by the invention is as follows:
In a first aspect, the present invention provides a large bandwidth integrated optical beam splitter based on a sub-wavelength grating, including a substrate, a first cladding layer, a waveguide layer, a glass layer and a second cladding layer, where the substrate, the first cladding layer, the waveguide layer, the glass layer and the second cladding layer are sequentially disposed from bottom to top, the waveguide layer is connected to an upper surface of the first cladding layer, the glass layer wraps a side surface and an upper surface of the waveguide layer, the waveguide layer includes two input waveguides, two input mode conversion regions, a multimode interference region, two output mode conversion regions and two output waveguides, the two input waveguides are connected to the two input mode conversion regions in a one-to-one correspondence manner, and the two output waveguides are connected to the two output mode conversion regions in a one-to-one correspondence manner, and the multimode interference region is located between the input mode conversion region and the output mode conversion region.
Preferably, the input end mode conversion region comprises a first tapered waveguide and first sub-wavelength gratings arranged at two sides of the first tapered waveguide, the tip of the first tapered waveguide faces the multimode interference region, and the width of the first sub-wavelength gratings increases linearly along the light transmission direction;
And/or the output end mode conversion region comprises a second conical waveguide and second sub-wavelength gratings arranged at two sides of the second conical waveguide, the tip of the second conical waveguide faces the multimode interference region, and the width of the second sub-wavelength gratings increases gradually linearly along the light transmission direction;
and/or the multimode interference zone is provided with a third sub-wavelength grating.
Preferably, the period lambada 1 of the first sub-wavelength grating is 300-400 nm, and the duty cycle eta 1 is 0.4-0.6;
And/or the period lambada 2 of the second sub-wavelength grating is 300-400 nm, and the duty ratio eta 2 is 0.4-0.6;
And/or, the period lambada 3 of the third sub-wavelength grating is 300-400 nm, and the duty ratio eta 3 is 0.4-0.6.
Preferably, the length L 1 of the input side mode conversion region is equal to the length L 2 of the output side mode conversion region.
Preferably, the material of the waveguide layer is silicon nitride, the thickness of the waveguide layer is 300-600 nm, and the refractive index of the waveguide layer is 1.95-2.15.
Preferably, the first cladding layer is made of silicon dioxide, the thickness of the first cladding layer is 3000-4000 nm, and the refractive index of the first cladding layer is 1.44-1.46.
Preferably, the second cladding layer is made of silicon dioxide, the thickness of the second cladding layer is 1500-3000 nm, and the refractive index of the second cladding layer is 1.44-1.46.
Preferably, the substrate is made of silicon.
Preferably, the thickness of the glass layer is 600-800 nm, and the refractive index of the glass layer is 1.37-1.39.
In a second aspect, the present invention provides a method for preparing a large bandwidth integrated optical beam splitter based on a sub-wavelength grating according to the first aspect, including the following steps:
S1, providing a thermal silicon oxide wafer, wherein the thermal silicon oxide wafer comprises a substrate and a first cladding layer which are sequentially arranged from bottom to top;
S2, depositing a silicon nitride film on the upper surface of the first cladding layer by a chemical vapor deposition method;
S3, spin-coating photoresist on the upper surface of the silicon nitride film, curing to form a photoresist layer, exposing the required structural pattern by using electron beam lithography, etching the silicon nitride film by using reactive ion etching to form a waveguide layer, and removing the photoresist by using oxygen plasma;
S4, spin-coating a spin-on glass reagent on the upper surface of the first cladding layer, enabling the spin-on glass reagent to permeate through the waveguide layer, and curing to form a glass layer;
S5, depositing silicon oxide on the upper surface of the glass layer by a chemical vapor deposition method to form a second cladding.
Compared with the prior art, the invention has the beneficial effects that:
according to the invention, the input end mode conversion area is arranged between the input waveguide and the multimode interference area, and the output end mode conversion area is arranged between the output waveguide and the multimode interference area, so that the effects of low insertion loss, uniform light splitting and low phase error can be obtained in a large bandwidth range;
Compared with the conventional sub-wavelength grating waveguide device, the optical beam splitter can be suitable for large-scale optical calculation and optical interconnection scenes by arranging the waveguide layer in the glass layer, gaps in the grating structure of the waveguide layer can be stably filled by the glass layer formed by spin-coating glass reagent, gaps are avoided when gaps in the grating structure are filled, and the manufacturing reliability of the beam splitter is improved.
Drawings
FIG. 1 is a partial cross-sectional view of a large bandwidth integrated optical splitter based on a sub-wavelength grating provided by the present invention;
fig. 2 is a schematic plan view of a waveguide layer according to the present invention.
In the figure, 1-substrate, 2-first cladding layer, 3-waveguide layer, 4-glass layer, 5-second cladding layer, 31-input waveguide, 32-first tapered waveguide, 33-first sub-wavelength grating, 34-second tapered waveguide, 35-second sub-wavelength grating, 36-third sub-wavelength grating, 37-output waveguide.
Detailed Description
For a better description of the objects, technical solutions and advantages of the present invention, the present invention will be further described with reference to the following specific examples.
In a first aspect, the present invention provides a large bandwidth integrated optical beam splitter based on a sub-wavelength grating, which includes a substrate 1, a first cladding layer 2, a glass layer 4 and a second cladding layer 5 that are sequentially disposed, a waveguide layer 3 is disposed in the glass layer 4, the waveguide layer 3 is connected to an upper surface of the first cladding layer 2, the glass layer 4 wraps a side surface and an upper surface of the waveguide layer 3, the waveguide layer 3 includes two input waveguides 31, two input mode conversion regions, a multimode interference region, two output mode conversion regions and two output waveguides 37, the two input waveguides 31 are connected to the two input mode conversion regions in a one-to-one correspondence manner, the two output waveguides 37 are connected to the two output mode conversion regions in a one-to-one correspondence manner, and the multimode interference region is located between the input mode conversion regions and the output mode conversion regions.
The invention can obtain the effects of low insertion loss, uniform light splitting and low phase error in a wide bandwidth range by arranging the input end mode conversion region between the input waveguide 31 and the multimode interference region and arranging the output end mode conversion region between the output waveguide 37 and the multimode interference region.
Compared with a silicon dioxide cladding layer, the optical beam splitter has the advantages that the glass layer 4 is used for cladding the waveguide layer 3, the glass layer 4 can be used for filling gaps in the grating structure of the waveguide layer 3 more stably, the occurrence of air gaps in the process of filling the gaps in the grating structure is avoided, the reliability of manufacturing the beam splitter is improved, and the optical beam splitter can be suitable for large-scale optical calculation and optical interconnection scenes.
In an embodiment, the input end mode conversion region is composed of a first tapered waveguide 32 and first sub-wavelength gratings 33 disposed on two sides of the first tapered waveguide 32, wherein the tip of the first tapered waveguide 32 faces the multimode interference region, the width of the other end of the first tapered waveguide 32 is the same as the width W 1 of the input waveguide 31, the width of the first sub-wavelength gratings 33 increases linearly from W 1 to W 2,W1 to 800-1200 nm along the light transmission direction, W 2 is 1500-2500 nm, the period lambda 1 of the first sub-wavelength gratings 33 is 300-400 nm, and the duty ratio eta 1 is 0.4-0.6 nm.
The output end mode conversion region is composed of a second conical waveguide 34 and second sub-wavelength gratings 35 arranged on two sides of the second conical waveguide 34, the tip of the second conical waveguide 34 faces the multimode interference region, the width of the other end of the second conical waveguide 34 is the same as the width W 4 of the input waveguide 31, the width of the second sub-wavelength gratings 35 linearly decreases from W 4 to W 3,W3 to 800-1200 nm along the light transmission direction, W 4 is 1500-2500 nm, the period lambda 2 of the second sub-wavelength gratings 35 is 300-400 nm, and the duty ratio eta 2 is 0.4-0.6 nm.
The multimode interference region is provided with a third sub-wavelength grating 36, the period lambada 3 of the third sub-wavelength grating 36 is 300-400 nm, and the duty ratio eta 3 is 0.4-0.6.
Specifically, Λ 1＝Λ2＝Λ3,η1＝η2＝η3, when the beam splitter satisfies this condition, the refractive index of the waveguide layer 3 is continuous, avoiding abrupt changes in the refractive index of the waveguide layer 3 to affect the performance of the beam splitter.
In one embodiment, the length L 1 of the input mode conversion region is equal to the length L 2 of the output mode conversion region.
The inventor finds that according to the theory of equivalent medium, the equivalent refractive index is written asAndWhere n 1 and n 2 represent the refractive indices (n 1＞n2) of the two materials that make up the sub-wavelength grating, η is the duty cycle of the material of the two materials that has the greater refractive index. In the embodiment of the invention, the material 1 is silicon nitride as a material of the waveguide layer 3, the material 2 is a glass layer 4 formed by spin coating, lambda is wavelength, lambda is grating period, and eta takes a value range of 0.4-0.6. And under the condition of sub-wavelength, lambda is far smaller than lambda, n || is the equivalent refractive index of the electric field in the direction parallel to the periodic interface, and n ⊥ is the equivalent refractive index of the electric field in the direction perpendicular to the periodic interface.
The large bandwidth integrated optical splitter supports TE0 mode operation in the input strip waveguide and outputs in TE0 mode in the output strip waveguide.
The length of the multimode interference region, L 3, is preferably 3L π/2, where L π is the beat length between the two lowest order TE modes, L π＝π/(β1-β2). The TE mode refers to transverse electric mode (TRANSVERSE ELECTRIC, TE), and refers to electromagnetic wave with electric field polarization direction and propagation direction perpendicular, wherein TE0 and TE1 are the two modes with the lowest order.
According to the invention, parameters such as period and duty ratio of each sub-wavelength grating are adjusted, so that sub-wavelength grating waveguide design with insensitive beat length about wavelength change can be obtained, and effective refractive indexes and beat lengths of different modes of a multimode interference region are changed, thereby adjusting parameter indexes such as device size, additional loss, light splitting uniformity, phase error and the like. The working wavelength of the large-bandwidth integrated optical beam splitter can cover O, E, S, C and L wave bands commonly used in optical communication, the insertion loss of the large-bandwidth integrated optical beam splitter is lower than 0.25dB, the beam splitting unbalance is lower than 0.15dB, and the phase error is lower than 0.16rad in the working wavelength range of 1250-1625 nm. In one embodiment, the substrate 1 is made of silicon.
In one embodiment, the material of the first cladding layer 2 is silica, the thickness h 1 of the first cladding layer 2 is 3000-4000 nm, and the refractive index of the first cladding layer 2 is 1.44-1.46.
In one embodiment, the material of the waveguide layer 3 is silicon nitride, the thickness h 2 of the waveguide layer 3 is 300-600 nm, and the refractive index of the waveguide layer 3 is 1.95-2.15.
In one embodiment, the thickness h 3 of the glass layer 4 is 600 to 800nm, and the refractive index of the glass layer 4 is 1.37 to 1.39.
Specifically, h 3＞h2.
In one embodiment, the material of the second cladding layer 5 is silicon dioxide, the thickness h 4 of the second cladding layer 5 is 1500-3000 nm, and the refractive index of the second cladding layer 5 is 1.44-1.46.
In a second aspect, the present invention provides a method for preparing a large bandwidth integrated optical beam splitter based on a sub-wavelength grating according to the first aspect, including the following steps:
s1, providing a thermal silicon oxide wafer, wherein the thermal silicon oxide wafer comprises a substrate 1 and a first cladding layer 2 which are sequentially arranged from bottom to top;
s2, depositing a silicon nitride film on the upper surface of the first cladding layer 2 by a chemical vapor deposition method;
S3, spin-coating photoresist on the upper surface of the silicon nitride film, forming a photoresist layer through pre-baking, exposing a required structural pattern by utilizing electron beam lithography, etching the silicon nitride film by utilizing reactive ion etching to form a waveguide layer 3, and removing the photoresist by utilizing oxygen plasma;
S4, spin-coating a spin-on glass reagent on the upper surface of the first cladding layer 2, enabling the spin-on glass reagent to permeate the waveguide layer 3, and curing to form a glass layer 4;
S5, silicon oxide is deposited on the upper surface of the glass layer 4 through a chemical vapor deposition method, so that a second cladding layer 5 is formed.
According to the invention, the gap in the grating structure can be better filled by covering the spin-on glass on the waveguide layer 3, and then the second cladding structure of the chemical vapor deposition silicon dioxide and the corresponding manufacturing method, so that the problem that an air gap is formed when the grating gap is filled by the direct deposition silicon dioxide in the prior art is solved, and the advantages of the preparation method in stability are favorable for industrialized popularization of the invention.
In the description of the present invention, it should be noted that the terms "first," "second," and "third" are used for descriptive purposes only and are not to be construed as indicating the number of technical features indicated. Thus, a feature defining "a first", "a second", and "a third" may explicitly or implicitly include at least one such feature. All directional indicators (such as up and down) in the present invention are only used to explain the relative positional relationship, movement, etc. between the pieces in a particular gesture (as shown in the drawings), and if the particular gesture is changed, the directional indicator is changed accordingly.
In the description of the present invention, it should also be noted that the terms "comprising" and "having," and any variations thereof, are intended to cover a non-exclusive inclusion.
The specific meaning of the above terms in the present invention will be understood in specific cases by those of ordinary skill in the art.
Finally, it should be noted that the above embodiments are only for illustrating the technical solution of the present invention and not for limiting the scope of the present invention, and although the present invention has been described in detail with reference to the preferred embodiments, it should be understood by those skilled in the art that the technical solution of the present invention may be modified or substituted equally without departing from the spirit and scope of the technical solution of the present invention.
Claims (10)
1. The utility model provides a big bandwidth integrated optical beam splitter based on sub wavelength grating, its characterized in that includes substrate, first cladding, waveguide layer, glass layer and second cladding, substrate, first cladding, waveguide layer, glass layer and second cladding set gradually from bottom to top, the waveguide layer with the upper surface of first cladding meets, the glass layer parcel waveguide layer's side and upper surface, the waveguide layer includes two input waveguides, two input mode conversion district, multimode interference district, two output mode conversion district and two output waveguides, and two input waveguides are connected with two input mode conversion district one-to-one, and two output waveguides are connected with two output mode conversion district one-to-one, multimode interference district is located input mode conversion district with between the output mode conversion district.
2. The large bandwidth integrated optical splitter based on sub-wavelength gratings of claim 1, wherein said input mode conversion region comprises a first tapered waveguide and first sub-wavelength gratings disposed on both sides of said first tapered waveguide, a tip of said first tapered waveguide facing said multimode interference region, a width of said first sub-wavelength gratings increasing linearly along said optical transmission direction;
And/or the output end mode conversion region comprises a second conical waveguide and second sub-wavelength gratings arranged at two sides of the second conical waveguide, the tip of the second conical waveguide faces the multimode interference region, and the width of the second sub-wavelength gratings increases gradually linearly along the light transmission direction;
and/or the multimode interference zone is provided with a third sub-wavelength grating.
3. The large bandwidth integrated optical beam splitter based on the sub-wavelength grating as claimed in claim 2, wherein the period lambada 1 of the first sub-wavelength grating is 300-400 nm, and the duty cycle η 1 is 0.4-0.6;
And/or the period lambada 2 of the second sub-wavelength grating is 300-400 nm, and the duty ratio eta 2 is 0.4-0.6;
And/or, the period lambada 3 of the third sub-wavelength grating is 300-400 nm, and the duty ratio eta 3 is 0.4-0.6.
4. The large bandwidth integrated optical splitter based on sub-wavelength gratings of claim 1 wherein the length L 1 of said input mode conversion region is equal to the length L 2 of said output mode conversion region.
5. The large bandwidth integrated optical beam splitter based on sub-wavelength grating according to claim 1, wherein the material of the waveguide layer is silicon nitride, the thickness of the waveguide layer is 300-600 nm, and the refractive index of the waveguide layer is 1.95-2.15.
6. The large bandwidth integrated optical beam splitter based on sub-wavelength grating according to claim 1, wherein the first cladding layer is made of silicon dioxide, the thickness of the first cladding layer is 3000-4000 nm, and the refractive index of the first cladding layer is 1.44-1.46.
7. The large bandwidth integrated optical beam splitter based on sub-wavelength grating according to claim 1, wherein the second cladding layer is made of silicon dioxide, the thickness of the second cladding layer is 1500-3000 nm, and the refractive index of the second cladding layer is 1.44-1.46.
8. The large bandwidth integrated optical splitter based on sub-wavelength gratings of claim 1 wherein said substrate is silicon.
9. The large bandwidth integrated optical beam splitter based on a sub-wavelength grating according to claim 1, wherein the glass layer has a thickness of 600-800 nm and a refractive index of 1.37-1.39.
10. A method for manufacturing a large bandwidth integrated optical beam splitter based on a sub-wavelength grating as claimed in any one of claims 1 to 9, comprising the steps of:
S1, providing a thermal silicon oxide wafer, wherein the thermal silicon oxide wafer comprises a substrate and a first cladding layer which are sequentially arranged from bottom to top;
S2, depositing a silicon nitride film on the upper surface of the first cladding layer by a chemical vapor deposition method;
S3, spin-coating photoresist on the upper surface of the silicon nitride film to form a photoresist layer, etching the silicon nitride film by utilizing reactive ion etching to form a waveguide layer by utilizing a structural pattern required by electron beam lithography exposure, and then removing the photoresist by utilizing oxygen plasma;
S4, spin-coating a spin-on glass reagent on the upper surface of the first cladding layer, enabling the spin-on glass reagent to permeate through the waveguide layer, and curing to form a glass layer;
S5, depositing silicon oxide on the upper surface of the glass layer by a chemical vapor deposition method to form a second cladding.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202411915060.6A CN119511458A (en) | 2024-12-24 | 2024-12-24 | Large-bandwidth integrated optical beam splitter based on sub-wavelength grating and preparation method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202411915060.6A CN119511458A (en) | 2024-12-24 | 2024-12-24 | Large-bandwidth integrated optical beam splitter based on sub-wavelength grating and preparation method thereof |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN119511458A true CN119511458A (en) | 2025-02-25 |
Family
ID=94653487
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202411915060.6A Pending CN119511458A (en) | 2024-12-24 | 2024-12-24 | Large-bandwidth integrated optical beam splitter based on sub-wavelength grating and preparation method thereof |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN119511458A (en) |
-
2024
- 2024-12-24 CN CN202411915060.6A patent/CN119511458A/en active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP3581224B2 (en) | Planar optical waveguide device | |
| CN112051641B (en) | Tilted grating type polarization beam splitter using slit waveguide structure and manufacturing method thereof | |
| CN101859001B (en) | Silicon dioxide optical waveguide device based on B-Ge-codoped upper cladding and preparation method thereof | |
| Fang et al. | Folded silicon-photonics arrayed waveguide grating integrated with loop-mirror reflectors | |
| CN113625392B (en) | A 4×4 Optical Switch Array Based on Organic-Inorganic Hybrid Integration | |
| CN109991700A (en) | A Micro-ring Integrated Arrayed Waveguide Grating Wavelength Division Multiplexer | |
| CN112305671A (en) | Tapered polarization beam splitter based on slit waveguide and preparation method | |
| CN115437062B (en) | An edge coupler based on gradient-index inverted-ridge waveguide | |
| CN114608632B (en) | Multilayer multi-wavelength multi-mode multi-parameter micro-ring sensor and preparation method thereof | |
| WO2022012434A1 (en) | High-density integrated optical waveguide | |
| CN113376743A (en) | Spot-size converter based on long-period grating | |
| Ding et al. | Broadband and high conversion efficiency mode converters based on sinusoidal tapers | |
| CN119511458A (en) | Large-bandwidth integrated optical beam splitter based on sub-wavelength grating and preparation method thereof | |
| CN112415652A (en) | A waveguide grating coupler array | |
| CN114355507B (en) | Micro-ring resonator based on inverted ridge type silicon dioxide/polymer mixed waveguide and preparation method thereof | |
| Yuan et al. | Design and fabrication of wavelength tunable AWGs based on the thermo-optic effect | |
| CN112462469B (en) | A silicon-based Mach-Zehnder interferometer based on Y-branch symmetric structure | |
| CN109655965B (en) | A true zero-order integrated optical waveguide type full-wave plate | |
| CN114924348A (en) | A three-dimensional edge coupler based on silica optical waveguide | |
| CN211348702U (en) | A Micro-ring Integrated Arrayed Waveguide Grating Wavelength Division Multiplexer | |
| Wosinski et al. | Amorphous silicon in nanophotonic technology | |
| CN116643350B (en) | End coupler and optical chip system | |
| CN115469401B (en) | A spot converter based on gradient silica optical waveguide | |
| CN109633814B (en) | A true zero-order integrated optical waveguide type half-wave plate | |
| CN109655966B (en) | True zero-order integrated optical waveguide type quarter wave plate |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination |