CN115732165A - Multi-coil structure, manufacturing method thereof, and electronic device having same - Google Patents
Multi-coil structure, manufacturing method thereof, and electronic device having same Download PDFInfo
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Abstract
Description
技术领域technical field
本发明涉及电子产品制造技术领域,尤其涉及一种多线圈结构、其制造方法及具有其的电子设备。The invention relates to the technical field of electronic product manufacturing, in particular to a multi-coil structure, a manufacturing method thereof and an electronic device having the same.
背景技术Background technique
目前,大多数单个线圈的绝缘方式是以自身线材的PU绝缘层或外被来实现的。随着消费电子产品功能多元化及尺寸超薄化的高速发展,现已出现多种或多个线圈混合搭配使用,如手机里的近场通讯功能线圈和无线充电线圈。At present, the insulation method of most individual coils is realized by the PU insulation layer or outer cover of the wire itself. With the rapid development of diversified functions and ultra-thin dimensions of consumer electronics products, there are now multiple or multiple coils mixed and matched, such as near-field communication function coils and wireless charging coils in mobile phones.
相关技术中,如图1所示,传统的多个线圈搭配使用时,伴随而来的有线圈相互之间因线圈局部绝缘的针孔破损或绝缘漆涂覆不均等,从而会导致的线圈短路及产品功能受损等问题。为避免多个线圈之间的短路问题,常见的做法是在短路风险区域600的单个线圈区域做表面处理,如喷UV胶水等。但是,表面处理步骤复杂,短路风险区域600处理后的厚度增加,易出现磨损,进而同样具有短路的风险;另外,厚度增加还不利于产品的进一步超薄化进程。In the related art, as shown in Fig. 1, when a plurality of traditional coils are used in combination, the coils may be short-circuited due to pinhole damage or uneven coating of insulating varnish between the coils. and damage to product functions. In order to avoid the problem of short circuit between multiple coils, it is common practice to perform surface treatment on the single coil area of the short
所以,亟需一种多线圈结构、其制造方法及具有其的电子设备,以解决上述问题。Therefore, there is an urgent need for a multi-coil structure, a manufacturing method thereof, and an electronic device having the same to solve the above problems.
发明内容Contents of the invention
基于以上所述,本发明的目的在于提供一种多线圈结构、其制造方法及具有其的电子设备,短路风险低,使用更加可靠,同时具有超薄的特点。Based on the above, the purpose of the present invention is to provide a multi-coil structure, its manufacturing method and electronic equipment with it, which has low risk of short circuit, more reliable use, and has the characteristics of ultra-thin.
为达上述目的,本发明采用以下技术方案:For reaching above-mentioned purpose, the present invention adopts following technical scheme:
多线圈结构,包括:Multi-coil structure, including:
至少包括相邻设置的第一线圈和第二线圈,所述第一线圈和所述第二线圈至少具有重叠部;At least including a first coil and a second coil arranged adjacently, the first coil and the second coil have at least an overlapping portion;
绝缘层,设置于所述重叠部,且位于所述第一线圈和所述第二线圈之间。The insulating layer is arranged on the overlapping portion and is located between the first coil and the second coil.
多线圈结构的制造方法,用于组装以上任一方案所述的多线圈结构,所述制造方法包括:The manufacturing method of multi-coil structure is used for assembling the multi-coil structure described in any of the above schemes, the manufacturing method comprising:
裁切制程膜,所述制程膜包括本体和设置于所述本体上的辅助区,所述本体与所述第一线圈或所述第二线圈适配,所述辅助区与所述重叠部对应设置;cutting the process film, the process film includes a main body and an auxiliary area arranged on the main body, the main body is adapted to the first coil or the second coil, and the auxiliary area corresponds to the overlapping portion set up;
设置粘接层,所述粘接层粘接于所述制程膜,包括与所述第一线圈或所述第二线圈适配的主粘接层,以及与所述辅助区适配的辅助粘接层;An adhesive layer is provided, and the adhesive layer is bonded to the process film, including a main adhesive layer adapted to the first coil or the second coil, and an auxiliary adhesive adapted to the auxiliary area. layer;
设置绝缘层,将所述绝缘层设置于所述辅助粘接层远离所述辅助区的一侧;disposing an insulating layer, and disposing the insulating layer on the side of the auxiliary adhesive layer away from the auxiliary region;
将所述制程膜设置有所述粘接层和所述绝缘层的一侧压接于所述第一线圈;crimping the side of the process film provided with the adhesive layer and the insulating layer to the first coil;
将所述第一线圈远离所述制程膜的一侧压接于产品,撕下所述制程膜,将所述第二线圈压接于所述第一线圈远离所述产品的一侧;或,将所述第二线圈远离所述制程膜的一侧压接于所述产品,撕下所述制程膜,将所述第一线圈压接于所述第二线圈远离所述产品的一侧。crimping the side of the first coil away from the process film to the product, tearing off the process film, and crimping the second coil on the side of the first coil away from the product; or, The side of the second coil away from the process film is crimped on the product, the process film is torn off, and the first coil is crimped on the side of the second coil away from the product.
作为一种多线圈结构的制造方法的优选方案,所述辅助区和所述本体之间设置虚断线。As a preferred solution of the manufacturing method of the multi-coil structure, a broken line is provided between the auxiliary region and the main body.
作为一种多线圈结构的制造方法的优选方案,所述辅助粘接层设置有高粘力面和低粘力面,所述低粘力面的粘接力小于所述高粘力面的粘接力,所述高粘力面与所述辅助区粘接,所述低粘力面与所述绝缘层粘接。As a preferred solution of the manufacturing method of a multi-coil structure, the auxiliary adhesive layer is provided with a high-viscosity surface and a low-viscosity surface, and the adhesion of the low-viscosity surface is smaller than that of the high-viscosity surface. Relay, the high-viscosity surface is bonded to the auxiliary area, and the low-viscosity surface is bonded to the insulating layer.
作为一种多线圈结构的制造方法的优选方案,所述绝缘层远离所述制程膜的一侧设置有粘接面。As a preferred solution of the manufacturing method of the multi-coil structure, the side of the insulating layer away from the process film is provided with an adhesive surface.
作为一种多线圈结构的制造方法的优选方案,所述第一线圈或所述第二线圈设置有线圈本体、进线头和出线头,所述主粘接层设置有与所述线圈本体对应的线圈粘接层,以及与所述进线头和所述出线头对应的线头粘接层。As a preferred solution of the manufacturing method of a multi-coil structure, the first coil or the second coil is provided with a coil body, a wire inlet and a wire outlet, and the main adhesive layer is provided with a wire corresponding to the coil body. A coil adhesive layer, and a wire end adhesive layer corresponding to the wire inlet head and the wire outlet head.
作为一种多线圈结构的制造方法的优选方案,通过保压头压接,所述保压头设置有与所述辅助区对应的辅助压接区。As a preferred solution of the manufacturing method of the multi-coil structure, the pressure-holding head is crimped, and the pressure-holding head is provided with an auxiliary crimping area corresponding to the auxiliary area.
作为一种多线圈结构的制造方法的优选方案,所述绝缘层覆盖所述重叠部,或所述绝缘层至少部分置于所述重叠部的外部。As a preferred solution of the manufacturing method of the multi-coil structure, the insulating layer covers the overlapping portion, or the insulating layer is at least partially placed outside the overlapping portion.
作为一种多线圈结构的制造方法的优选方案,所述绝缘层为聚酰亚胺层。As a preferred solution of the manufacturing method of the multi-coil structure, the insulating layer is a polyimide layer.
具有多线圈结构的电子设备,包括以上任一方案所述的多线圈结构。An electronic device with a multi-coil structure includes the multi-coil structure described in any of the solutions above.
本发明的有益效果为:The beneficial effects of the present invention are:
本发明的多线圈结构通过至少设置第一线圈和第二线圈,用于实现多线圈结构的多元化功能。第一线圈和第二线圈相邻设置,且第一线圈和第二线圈之间至少具有重叠部,有利于减小多线圈结构的尺寸。通过在重叠部设置绝缘层,且将绝缘层设置于第一线圈和第二线圈之间,可以有效地减少第一线圈和第二线圈之间接触短路的风险,保证多线圈结构性能的可靠以及使用的安全;同时,具有绝缘层的多线圈结构还具有厚度小的特点,有利于产品的超薄化发展。The multi-coil structure of the present invention is used to realize the multiple functions of the multi-coil structure by setting at least the first coil and the second coil. The first coil and the second coil are arranged adjacent to each other, and there is at least an overlapping portion between the first coil and the second coil, which is beneficial to reducing the size of the multi-coil structure. By arranging an insulating layer on the overlapping portion, and arranging the insulating layer between the first coil and the second coil, the risk of contact short circuit between the first coil and the second coil can be effectively reduced, and the reliability and performance of the multi-coil structure can be ensured. It is safe to use; at the same time, the multi-coil structure with insulating layers also has the characteristics of small thickness, which is conducive to the development of ultra-thin products.
附图说明Description of drawings
为了更清楚地说明本发明实施例中的技术方案,下面将对本发明实施例描述中所需要使用的附图作简单的介绍,显而易见地,下面描述中的附图仅仅是本发明的一些实施例,对于本领域普通技术人员来讲,在不付出创造性劳动的前提下,还可以根据本发明实施例的内容和这些附图获得其他的附图。In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the following will briefly introduce the accompanying drawings that need to be used in the description of the embodiments of the present invention. Obviously, the accompanying drawings in the following description are only some embodiments of the present invention , for those skilled in the art, other drawings can also be obtained according to the content of the embodiment of the present invention and these drawings without any creative effort.
图1是现有技术中多线圈结构的立体图;1 is a perspective view of a multi-coil structure in the prior art;
图2是本发明具体实施方式提供的多线圈结构的示意图;Fig. 2 is a schematic diagram of a multi-coil structure provided by a specific embodiment of the present invention;
图3是本发明具体实施方式提供的多线圈结构的制造方法的制程膜和粘接层的示意图;3 is a schematic diagram of the process film and the adhesive layer of the manufacturing method of the multi-coil structure provided by the specific embodiment of the present invention;
图4是本发明具体实施方式提供的多线圈结构的制造方法的制程膜的局部示意图;Fig. 4 is a partial schematic diagram of the process film of the manufacturing method of the multi-coil structure provided by the specific embodiment of the present invention;
图5是本发明具体实施方式提供的多线圈结构的制造方法的制程膜和第一线圈配合的示意图;5 is a schematic diagram of the cooperation between the process film and the first coil of the manufacturing method of the multi-coil structure provided by the specific embodiment of the present invention;
图6是本发明具体实施方式提供的多线圈结构的制造方法的制程膜和第一线圈压接的示意图;6 is a schematic diagram of crimping the process film and the first coil in the manufacturing method of the multi-coil structure provided by the specific embodiment of the present invention;
图7是本发明具体实施方式提供的多线圈结构的制造方法的第一线圈和产品配合的示意图;Fig. 7 is a schematic diagram of the cooperation between the first coil and the product in the manufacturing method of the multi-coil structure provided by the specific embodiment of the present invention;
图8是本发明具体实施方式提供的多线圈结构的制造方法的半成品的示意图;Fig. 8 is a schematic diagram of a semi-finished product of a method for manufacturing a multi-coil structure provided by a specific embodiment of the present invention;
图9是本发明具体实施方式提供的多线圈结构的制造方法的成品的示意图;Fig. 9 is a schematic diagram of the finished product of the manufacturing method of the multi-coil structure provided by the specific embodiment of the present invention;
图10是本发明具体实施方式提供的多线圈结构的制造方法的制程膜与第二线圈配合的示意图。Fig. 10 is a schematic diagram of the cooperation between the process film and the second coil in the manufacturing method of the multi-coil structure provided by the specific embodiment of the present invention.
图中:In the picture:
100、第一线圈;110、线圈本体;120、进线头;130、出线头;100, the first coil; 110, the coil body; 120, the inlet head; 130, the outlet head;
200、第二线圈;300、绝缘层;400、产品;200, the second coil; 300, the insulating layer; 400, the product;
500、保压头;510、辅助压接区;500, holding pressure head; 510, auxiliary crimping area;
600、短路风险区域;600. Short circuit risk area;
1、制程膜;11、本体;12、辅助区;13、虚断线;1. Process film; 11. Body; 12. Auxiliary area; 13. Dotted line;
2、粘接层;21、主粘接层;211、线圈粘接层;212、线头粘接层;22、辅助粘接层。2. Adhesive layer; 21. Main adhesive layer; 211. Coil adhesive layer; 212. Thread end adhesive layer; 22. Auxiliary adhesive layer.
具体实施方式Detailed ways
下面详细描述本发明的实施例,实施例的示例在附图中示出,其中自始至终相同或类似的标号表示相同或类似的元件或具有相同或类似功能的元件。下面通过参考附图描述的实施例是示例性的,旨在用于解释本发明,而不能理解为对本发明的限制。Embodiments of the present invention are described in detail below, and examples of the embodiments are shown in the drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below by referring to the figures are exemplary and are intended to explain the present invention and should not be construed as limiting the present invention.
在本发明的描述中,需要说明的是,术语“中心”、“上”、“下”、“左”、“右”、“竖直”、“水平”、“内”、“外”等指示的方位或位置关系为基于附图所示的方位或位置关系,仅是为了便于描述本发明和简化描述,而不是指示或暗示所指的装置或元件必须具有特定的方位、以特定的方位构造和操作,因此不能理解为对本发明的限制。此外,术语“第一”、“第二”仅用于描述目的,而不能理解为指示或暗示相对重要性。其中,术语“第一位置”和“第二位置”为两个不同的位置。In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer" etc. The indicated orientation or positional relationship is based on the orientation or positional relationship shown in the drawings, and is only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the referred device or element must have a specific orientation, or in a specific orientation. construction and operation, therefore, should not be construed as limiting the invention. In addition, the terms "first" and "second" are used for descriptive purposes only, and should not be understood as indicating or implying relative importance. Wherein, the terms "first position" and "second position" are two different positions.
除非另有明确的规定和限定,术语“安装”、“相连”、“连接”、“固定”应做广义理解,例如,可以是固定连接,也可以是可拆卸连接;可以是机械连接,也可以是电连接;可以是直接相连,也可以通过中间媒介间接相连,可以是两个元件内部的连通或两个元件的相互作用关系。对于本领域的普通技术人员而言,可以根据具体情况理解上述术语在本发明中的具体含义。Unless otherwise clearly specified and limited, the terms "mounted", "connected", "connected" and "fixed" should be interpreted in a broad sense, for example, it may be a fixed connection or a detachable connection; it may be a mechanical connection, or It can be an electrical connection; it can be a direct connection, or an indirect connection through an intermediary, and it can be an internal communication between two elements or an interaction relationship between two elements. Those of ordinary skill in the art can understand the specific meanings of the above terms in the present invention according to specific situations.
在本发明中,除非另有明确的规定和限定,第一特征在第二特征之“上”或之“下”可以包括第一和第二特征直接接触,也可以包括第一和第二特征不是直接接触而是通过它们之间的另外的特征接触。而且,第一特征在第二特征“之上”、“上方”和“上面”包括第一特征在第二特征正上方和斜上方,或仅仅表示第一特征水平高度高于第二特征。第一特征在第二特征“之下”、“下方”和“下面”包括第一特征在第二特征正下方和斜下方,或仅仅表示第一特征水平高度小于第二特征。In the present invention, unless otherwise clearly specified and limited, a first feature being "on" or "under" a second feature may include direct contact between the first and second features, and may also include the first and second features Not in direct contact but through another characteristic contact between them. Moreover, "above", "above" and "above" the first feature on the second feature include that the first feature is directly above and obliquely above the second feature, or simply means that the first feature is horizontally higher than the second feature. "Below", "beneath" and "under" the first feature to the second feature include that the first feature is directly below and obliquely below the second feature, or simply means that the first feature has a lower level than the second feature.
下面结合附图并通过具体实施方式来进一步说明本发明的技术方案。The technical solutions of the present invention will be further described below in conjunction with the accompanying drawings and through specific implementation methods.
如图2所示,本实施方式提供一种多线圈结构,该多线圈结构包括绝缘层 300以及至少相邻设置的第一线圈100和第二线圈200,第一线圈100和第二线圈200至少具有重叠部;绝缘层300设置于重叠部,且位于第一线圈100和第二线圈200之间。As shown in FIG. 2 , this embodiment provides a multi-coil structure, the multi-coil structure includes an insulating
通过至少设置第一线圈100和第二线圈200,用于实现多线圈结构的多元化功能。第一线圈100和第二线圈200相邻设置,且第一线圈100和第二线圈200 之间至少具有重叠部,有利于减小多线圈结构的尺寸。通过在重叠部设置绝缘层300,且将绝缘层300设置于第一线圈100和第二线圈200之间,可以有效地减少第一线圈100和第二线圈200之间接触短路的风险,保证多线圈结构性能的可靠以及使用的安全;同时,具有绝缘层300的多线圈结构还具有厚度小的特点,有利于产品400的超薄化发展。By setting at least the
示例性地,第一线圈100为圆形线圈,第二线圈200为方形线圈。作为一种多线圈结构的可选方案,绝缘层300覆盖重叠部,使得重叠部处的第一线圈 100和第二线圈200之间均处于绝缘层300的范围内,进而保证绝缘的可靠。或绝缘层300至少部分置于重叠部的外部,即将绝缘层300的面积设置为大于重叠部的面积,以进一步提高绝缘的可靠性。Exemplarily, the
本实施例中,绝缘层300为聚酰亚胺层。聚酰亚胺的密度高,热稳定性好,机械性能好,具有良好的绝缘性,既可以保证多线圈结构具有较小的厚度,又可以保证更加可靠的绝缘。In this embodiment, the insulating
如图3-图8本实施方式还公开一种多线圈结构的制造方法,用于组装如上所述的多线圈结构,制造方法包括:As shown in Figures 3 to 8, this embodiment also discloses a method for manufacturing a multi-coil structure, which is used to assemble the above-mentioned multi-coil structure. The manufacturing method includes:
裁切制程膜1,制程膜1用于在组装多线圈结构时对线圈起到一定的定位和保护作用。如图3所示,制程膜1包括本体11和设置于本体11上的辅助区12,本体11与第一线圈100适配,辅助区12与重叠部对应设置。通过设置辅助区 12,用于适配后续绝缘层300的安装。The
优选地,如图4所述,辅助区12和本体11之间设置虚断线13,通过设置虚断线13,可以有效地降低制程膜1的应力反弹,保证后续压接及保压过程中制程膜1的平整性。Preferably, as shown in FIG. 4 , a dotted
模切粘接膜,并在制程膜1上设置粘接层2,通过粘接层2用于实现制程膜 1与第一线圈100和绝缘层300的安装。具体地,粘接层2粘接于制程膜1,粘接层2包括用于粘接制程膜1与第一线圈100,且与第一线圈100适配的主粘接层21,以及用于粘接制程膜1与绝缘层300,且与辅助区12适配的辅助粘接层 22。粘接层2的设置保证第一线圈100和绝缘层300与制程膜1之间安装的可靠,避免组装过程中第一线圈100和绝缘层300的脱落。The adhesive film is die-cut, and the
设置绝缘层300,将绝缘层300设置于辅助粘接层22远离辅助区12的一侧;可选地,将辅助粘接层22的面积设置为与绝缘层300面积一致,且均大于重叠部的面积,以保证对重叠部绝缘的可靠性。An insulating
具体地,第一线圈100设置有线圈本体110、进线头120和出线头130,为保证主粘接层21对第一线圈100粘接的可靠,主粘接层21设置有与线圈本体110对应的线圈粘接层211,以及与进线头120和出线头130对应的线头粘接层 212。Specifically, the
如图5所示,将制程膜1设置有粘接层2和绝缘层300的一侧压接于第一线圈100;使得粘接层2与第一线圈100稳定的连接,同时保证绝缘层300连接于第一线圈100对应重叠部的位置。同时,压接和保压过程可以有效地激活粘接层2的粘接力,保证连接的可靠。As shown in Figure 5, the side of the
具体地,辅助粘接层22设置有高粘力面和低粘力面,低粘力面的粘接力小于高粘力面的粘接力,高粘力面与辅助区12粘接,低粘力面与绝缘层300粘接。通过将辅助粘接层22的两面的粘接力设置的不同,且靠近绝缘层300的一侧设置为粘接力更小,使得在保证对绝缘层300可靠固定的同时,在后续撕下制程膜1时不会将绝缘层300一同撕下,使得绝缘层300可以可靠地粘接于第一线圈100。Specifically, the
优选地,绝缘层300远离制程膜1的一侧设置有粘接面,以进一步保证绝缘层300与第一线圈100之间的粘接的可靠性。Preferably, the side of the insulating
本实施例中,上述过程均通过保压头500压接,为保证对辅助区12和绝缘层300之间更有针对性的压接,保压头500设置有与辅助区12对应的辅助压接区510。In this embodiment, the above-mentioned processes are all crimped through the pressure-holding
如图7所示,将第一线圈100远离制程膜1的一侧压接于产品400;如图8 所示,撕下制程膜1,形成半成品;如图9所示,将第二线圈200压接于第一线圈100远离产品400的一侧,至此完成成品的组装。As shown in Figure 7, the side of the
值得说明的是,为在第一线圈100和第二线圈200之间设置绝缘层300,不仅可以将制程膜1和粘接层2设置于与第一线圈100适配,还可以如图10所示,将制程膜1和粘接层2设置于与第二线圈200适配。即先裁切与第二线圈200 适配的制程膜1和粘接层2,再设置绝缘层300,最后将第二线圈200远离制程膜1的一侧压接于产品400,撕下制程膜1,将第一线圈100压接于第二线圈200 远离产品400的一侧,同样可以组装成如上所述的多线圈结构。关于设置于第二线圈200适配的制程膜1和粘接层2,本领域技术人员可以根据第二线圈200的具体形式进行设置,在此不做具体限定。It is worth noting that, in order to arrange the insulating
本实施方式还公开一种具有多线圈结构的电子设备,包括如上所述的多线圈结构。多线圈结构可以通过多线圈结构的制造方法进行组装。具有多线圈结构的电子设备具有功能多,超薄化,以及使用可靠等优点。This embodiment also discloses an electronic device with a multi-coil structure, including the above-mentioned multi-coil structure. The multi-coil structure can be assembled by the manufacturing method of the multi-coil structure. Electronic equipment with a multi-coil structure has the advantages of multi-function, ultra-thin, and reliable use.
以上内容仅为本发明的较佳实施例,对于本领域的普通技术人员,依据本发明的思想,在具体实施方式及应用范围上均会有改变之处,本说明书内容不应理解为对本发明的限制。The above content is only a preferred embodiment of the present invention. For those of ordinary skill in the art, according to the idea of the present invention, there will be changes in the specific implementation and application scope. limits.
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JP2004221331A (en) * | 2003-01-15 | 2004-08-05 | Sony Corp | Coil and its manufacturing method |
CN201348924Y (en) * | 2009-02-10 | 2009-11-18 | 田先平 | Planar transformer winding |
CN102360685A (en) * | 2011-08-03 | 2012-02-22 | 安徽大学 | Micro spiral coil and manufacturing method thereof |
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