CN115121141A - Buffer device for use in nanomaterial preparation systems - Google Patents

Abstract

The invention discloses a buffer device used in a nanomaterial preparation system, comprising a buffer module; the buffer module comprises a syringe, a control unit, a total liquid pipe and a valve of the total liquid pipe; the syringe is used for containing the buffer; The control unit is used to control the syringe to inject the buffer into the main liquid pipe; the main liquid pipe valve is arranged on the main liquid pipe to control the flow of flushing liquid in the main liquid pipe. The buffer device of the present invention can automatically inject the buffer into the customizable nanomaterial batch preparation system based on the liquid-phase laser ablation method, and the device can include a plurality of buffer modules cascaded together, and can Enables uninterrupted injection of large volumes of buffer. In addition, multiple cascaded buffer modules can hold different buffers, and different buffers can be diluted and mixed in the total liquid pipeline. The buffer device of the present invention has simple structure, convenient operation, can be mass-produced, and is suitable for industrial application.

Description

Buffer devices used in nanomaterial preparation systems

technical field

The application relates to a buffer device used in a nanomaterial preparation system, and belongs to the technical field of nanomaterial preparation.

Background technique

Nanomaterials are widely used, and the scale of the Chinese market continues to expand. According to the forecast of Mordor Intelligence: in 2020-2025, China will become one of the fastest growing countries in the nanomaterials industry. The preparation of nanomaterials and nanostructures is the core issue of nanoscience and technology research. Conventional nanoparticle preparation methods can be divided into chemical method and physical method, chemical method can be divided into gas phase method and liquid phase method, and physical method can be divided into pulverization method and construction method. The chemical method has the characteristics of easy pollution, low yield, higher temperature requirements and stricter gas requirements; the physical method has the characteristics of high technical equipment requirements, low product purity and uneven particle size distribution. The preparation of nanomaterials by liquid-phase laser ablation has attracted the attention of many scholars as a green, low-cost and easy-to-operate method. This method mainly utilizes the interaction of laser, solution and medium to generate a localized high temperature and high pressure non-equilibrium process, and synthesize various new nanomaterials efficiently and rapidly through the process of reflux energy accumulation and differentiation.

The large-scale and customized preparation of nanomaterials has always been a key technical problem to be solved in this field. At present, the problem of low yield has seriously hindered the development of this technology in the industrial field. In addition, the particle size and shape of the prepared nanomaterials are not controllable, and the poor uniformity directly affects its performance. For example, the size of magnetic nanomaterials has a great influence on various physical parameters, including Curie temperature, coercive force, and saturation magnetization, which in turn affects their magnetization behavior. Therefore, realizing the customized and large-scale preparation of nanomaterials will be a major goal of future development in this field.

SUMMARY OF THE INVENTION

The purpose of this application is to provide a buffer device used in a nanomaterial preparation system, which can realize the automatic injection of buffer into the nanomaterial preparation system, so that the nanomaterial preparation system can be customized, automated, Modular and continuous mass production of complex and diverse nanostructured materials.

The embodiment of the present invention discloses a buffer device used in a nanomaterial preparation system, comprising a buffer module;

The buffer module includes a syringe, a control unit, a total liquid pipe and a total liquid pipe valve;

The syringe is used to hold the buffer;

The control unit is used to control the syringe to inject the buffer into the total liquid pipeline;

The main liquid pipeline valve is arranged on the main liquid pipeline, and is used for controlling the flow of the buffer solution in the main liquid pipeline.

Preferably, the device further comprises an adapter;

The adapter is used to connect the syringe and the total liquid pipeline.

Preferably, the device further comprises a syringe valve;

The syringe valve is disposed on the syringe for controlling the flow of the buffer in the syringe.

Preferably, the control unit includes a displacement controller and a displacement rod;

A communication line is provided on the displacement controller;

The displacement rod is connected with the syringe, and the displacement rod is displaced according to the control signal of the displacement controller.

Preferably, the syringe comprises a cavity, a piston and a piston push rod;

One end of the piston push rod is connected with the piston, and the other end is connected with the displacement rod;

The piston is arranged in the cavity and matched with the cavity.

Preferably, there are multiple buffer modules, and adjacent buffer modules are connected through the nozzle of the total liquid pipeline.

Preferably, it also includes an end cap;

The end cap is arranged on the orifice of the total liquid pipe.

Compared with the prior art, the buffer device used in the nanomaterial preparation system of the present invention has the following beneficial effects:

The buffer device of the present invention can realize the automatic injection of the buffer into the customizable nanomaterial batch preparation system based on the liquid-phase laser ablation method, and the buffer device of the present invention can include a plurality of interconnected The buffer module can realize the uninterrupted injection of a large amount of buffer. In addition, multiple interconnected buffer modules can hold different buffers, and different buffers can be diluted and mixed in the main fluid line of the buffer module directly connected to the laser ablation cell in the nanomaterial batch preparation system and so on. The buffer device of the invention has simple structure, convenient operation, can be mass-produced, and is suitable for industrial application.

The present invention also uses an adapter to connect the syringe and the total liquid pipeline in the buffer module. Use an adapter to connect the two, which is convenient for changing the syringe and changing the buffer, which is more practical.

In the present invention, a valve is also set on the syringe to control the flow of the buffer solution in the syringe, so as to avoid the situation of adding the buffer solution at the wrong time caused by the error of the control unit.

The invention uses the displacement controller to control the movement of the displacement rod, so that the displacement rod drives the piston push rod to move, and automatically injects the buffer in the syringe cavity into the total liquid pipe. The device has a simple structure and strong stability.

The invention is also provided with an end cap, which is used to block one side orifice of the general liquid pipeline.

Description of drawings

FIG. 1 is a schematic structural diagram of the buffer device used in the nanomaterial preparation system of the present invention.

Figures 2(a) to 2(f) are schematic diagrams of embodiments of the dilution, liquid flow process and cleaning process of the three buffer module block cascade structure PVP (polyvinylpyrrolidone) solutions of the present invention.

Detailed ways

In the following description, for the purpose of illustration rather than limitation, specific details such as specific system structures and technologies are set forth in order to provide a thorough understanding of the embodiments of the present invention. However, it will be apparent to those skilled in the art that the present invention may be practiced in other embodiments without these specific details. In other instances, detailed descriptions of well-known systems, devices, circuits, and methods are omitted so as not to obscure the description of the present invention with unnecessary detail.

The present invention will be described in detail below with reference to the examples, but the present invention is not limited to these examples.

The buffer device used in the nanomaterial preparation system of the present invention includes a buffer module; wherein, the buffer module includes a syringe, a control unit, a general liquid pipe and a general liquid pipe valve; the syringe is used for holding the buffer; the control The unit is used to control the syringe to inject buffer into the total liquid pipe; the valve of the total liquid pipe is arranged on the total liquid pipe to control the flow of the buffer in the total liquid pipe.

Further, the buffer device of the present application further includes an adapter; the adapter is used to connect the syringe and the total liquid pipeline.

Furthermore, the buffer device of the present application also includes a syringe valve; the syringe valve is arranged on the syringe and is used to control the flow of the buffer in the syringe.

The control unit in this application includes a displacement controller and a displacement rod; the displacement controller is provided with a communication line; the displacement rod is connected with the syringe, and the displacement rod is displaced according to the control signal of the displacement controller.

The syringe of the present application includes a cavity, a piston and a piston push rod; one end of the piston push rod is connected with the piston, and the other end is connected with the displacement rod; the piston is arranged in and matched with the cavity, and the buffer is contained in the cavity.

There may be multiple buffer modules in the present application, and adjacent buffer modules are connected through the nozzle of the total liquid pipeline.

In order to block the nozzle on one side of the general liquid pipe and avoid leakage of the unused nozzle on this side, the present application also provides an end cap; the end cover is arranged on the nozzle of the general liquid pipe.

The present invention will be described in detail below by way of detailed examples.

The structure of the buffer device used in the nanomaterial preparation system of this embodiment is shown in Figure 1 . The device includes a control unit, a syringe and a liquid circuit structure.

The control unit of this embodiment includes a displacement controller 1-1, a communication line 2-1 at the computer control end and a displacement rod 3-1; the syringe includes a piston push rod 4-1, a piston 5-1 and a cavity 6-1; The circuit structure includes an adapter 7-1, a syringe valve 8-1, a total liquid pipe valve 9-1, a total liquid pipe 10-1, and the total liquid pipe 10-1 has a first interface 11-1 and a second interface 12 -1, the adapter 7-1 in this embodiment is used to connect the syringe and the liquid pipeline.

The displacement controller 1-1 of this embodiment controls the displacement of the displacement rod 3-1 through the signal of the communication line 2-1 of the computer control terminal; the piston push rod 4-1 of the syringe is connected with the displacement rod 3-1 to realize the The piston push rod 4-1 is displaced; the front end of the syringe piston push rod 4-1 is installed with the syringe piston 5-1 to realize the displacement of the syringe piston 5-1; the syringe piston 5-1 matches the syringe cavity 6-1 , the displacement of the piston 5-1 of the syringe realizes the injection of the buffer into the main liquid pipe 10-1; the adapter 7-1 is used for the replacement of the syringe and the exchange of the buffer; the syringe valve 8-1 realizes the on-off control of the buffer; The total liquid pipe valve 9-1 is used for directional mixing of cascaded buffers in multi-buffer modules; the first interface 11-1 of the total liquid pipe 10-1 is connected to the customizable nanomaterials based on the liquid phase laser ablation method For the laser ablation cell in the batch preparation device, the second interface 12-1 is connected to the first interface of the second buffer module to realize module cascade combination; if the second buffer module is not required, the second interface 12-1 1 Cover with the end cap.

The working process of the buffer device of this embodiment is as follows: the cavity 6-1 of the syringe is filled with buffer, and is assembled into a complete buffer module through the adapter 7-1; the syringe valve 8-1 is opened to allow the buffer from The cavity 6-1 of the syringe is injected into the main liquid pipe 10-1; the communication line 2-1 of the computer control terminal receives the control signal from the computer terminal, and the control signal can control the displacement control through the positive and negative voltages given by the computer terminal or the control terminal. controller 1-1 to realize the forward and reverse movement of the control displacement rod 3-1; the voltage of the signal transmitted by the communication line 2-1 of the computer control terminal controls the displacement controller 1-1 to control the movement of the displacement rod 3-1. The size of the displacement; the movement of the displacement rod 3-1 pushes the plunger rod 4-1 and the piston 5-1 of the syringe to inject the buffer into the total liquid pipe 10-1.

The number of buffer modules in this embodiment may also be multiple. Next, the device of this embodiment will be described by using three buffer modules to dilute PVP (polyvinylpyrrolidone) solution, the liquid flow process and the cleaning process.

Referring to Figure 2, the buffer unit consists of three identical buffer modules cascaded. Among them, in the initial state of this assembly module, the syringe cavity of module A is used for buffer mixing, the syringe cavity of module B is filled with 1L of 0.5mM PVP aqueous solution, the syringe cavity of module C is filled with 1L of Mili-Q ultrapure water, Syringe valves 20, 21 and 22 are in a closed state, and main liquid pipeline valves 23, 24 and 25 are in a closed state. The initial state of the assembled module is shown in Figure 2(a).

The specific implementation steps of the buffer module are as follows:

Step 1: This step is the preparatory work before mixing the buffer, including loading the buffer into the cavity of the syringe and the installation of the syringe, as well as the preparatory work of the valve. Specific steps are as follows:

Step 1.1: The cavity of the module B syringe is filled with 1L of 0.5mM PVP solution, and the cavity of the module C syringe is filled with 1L of Mili-Q ultrapure water.

Step 1.2: The injector cavities of modules B and C are connected to the corresponding total liquid pipelines through adapters 18 and 19 respectively. The syringe cavity of module A is a cavity and is connected to the corresponding total liquid pipelines through the adapter 17, as shown in Figure 2 (a).

Step 1.3: Open the syringe valves 20, 21, 22, and the total liquid path valves 24, 25, and close the total liquid path valve 23, as shown in Figure 2(b).

Step 2: After the previous module filling and valve preparation, this step will perform buffer dilution and mixing. Specific steps are as follows:

Step 2.1: The displacement controller 1, displacement controller 2, and displacement controller 3 of modules A, B, and C control the displacement of the displacement rod 5, the displacement rod 6, and the displacement rod 7 through the signal of the communication line 4 of the computer control terminal.

Step 2.2: Control the displacement of displacement rod 5, displacement rod 6, and displacement rod 7 to push the displacement of piston push rod 8, piston push rod 9, and piston push rod 10 of the syringe to realize the displacement of piston 11, piston 12, and piston 13 of the syringe , and the movement direction of the syringe piston 11 is opposite to the movement direction of 12 and 13 .

Step 2.3: The piston 12 of the syringe and the displacement of the piston 13 squeeze the cavity 15 of the syringe, and the PVP solution and Mili-Q pure water in the cavity 16 flow into the general liquid pipe 33 .

Step 2.4: The closed state of the total liquid circuit valve 23 makes the PVP solution and Mili-Q solution in the total liquid circuit pipe flow into the module A syringe cavity 14 to realize the mixing of the PVP solution and the Mili-Q solution, as shown in Figure 2 ( c) shown.

Step 2.5: Precisely control the displacement of the plunger 11, plunger 12, and plunger 13 of the syringe, and obtain 10 ml of 0.5 mM PVP solution and 90 ml of Mili-Q pure water in the module A syringe cavity to achieve a 10-fold dilution of the 0.5 mM PVP solution.

Step 3: The diluent is injected into the laser ablation cell in the customizable nanomaterial mass production system based on the liquid-phase laser ablation method. Specific steps are as follows:

Step 3.1: Close the syringe valves 21 and 22, close the main liquid path valve 24, and open the main liquid path valve 23.

Step 3.2: The communication line 4 of the computer control terminal gives a positive signal to the displacement controller 1, so that the PVP diluent in the syringe cavity 14 of the module A is injected into the general liquid pipeline, and flows into the customizable nanomaterial based on the liquid phase laser ablation method The laser ablation cell in the mass production system is shown in Fig. 2(d).

Step 4: Clean the syringe cavity and the total liquid pipe. Specific steps are as follows:

Step 4.1: Close the syringe valves 21, 23, open the total liquid valve 24, the communication line 4 of the computer control terminal gives the reverse signal to the displacement controller 1 and the forward signal to the displacement controller 3, so that the Pure water flows into the syringe cavity 14 through the total liquid pipe 33, as shown in FIG. 2(e).

Step 4.2: The communication line 4 of the computer control terminal gives the forward signal to the displacement controller 1 and the reverse signal to the displacement controller 3, as shown in Figure 2(f).

Step 4.3: Repeat the above steps (e) and (f) for 5 times or more to complete the cleaning of the total liquid pipe 33 and the syringe cavity 14 .

The buffer device of the present invention can realize the automatic injection of the buffer into the customizable nanomaterial batch preparation system based on the liquid-phase laser ablation method, and the buffer device of the present invention can include a plurality of interconnected The buffer module can realize the uninterrupted injection of a large amount of buffer. In addition, multiple interconnected buffer modules can hold different buffers, and different buffers can be diluted and mixed in the main fluid line of the buffer module directly connected to the laser ablation cell in the nanomaterial batch preparation system and so on. The buffer device of the present invention has simple structure, convenient operation, can be mass-produced, and is suitable for industrial application.

The above are only a few embodiments of the present application, and are not intended to limit the present application in any form. Although the present application is disclosed as above with preferred embodiments, it is not intended to limit the present application. Without departing from the scope of the technical solution of the present application, any changes or modifications made by using the technical content disclosed above are equivalent to equivalent implementation cases and fall within the scope of the technical solution.

Claims (7)

1. a buffer device for nanomaterial preparation system, is characterized in that, comprises buffer module; The buffer module includes a syringe, a control unit, a total liquid pipe and a total liquid pipe valve; The syringe is used to hold the buffer; The control unit is used to control the syringe to inject the buffer into the total liquid pipeline; The main liquid pipeline valve is arranged on the main liquid pipeline, and is used for controlling the flow of the buffer solution in the main liquid pipeline. 2. The buffer device for use in the nanomaterial preparation system according to claim 1, wherein the device further comprises an adapter; The adapter is used to connect the syringe and the total liquid pipeline. 3. the buffer device for nanomaterial preparation system according to claim 1, is characterized in that, described device also comprises syringe valve; The syringe valve is disposed on the syringe for controlling the flow of the buffer in the syringe. 4. The buffer device according to claim 1, wherein the control unit comprises a displacement controller and a displacement rod; A communication line is provided on the displacement controller; The displacement rod is connected with the syringe, and the displacement rod is displaced according to the control signal of the displacement controller. 5. The buffer device according to claim 4, wherein the syringe comprises a cavity, a piston and a piston push rod; One end of the piston push rod is connected with the piston, and the other end is connected with the displacement rod; The piston is arranged in the cavity and matched with the cavity. 6. The buffer device used in the nanomaterial preparation system according to claim 1, wherein the buffer modules are multiple, and the adjacent buffer modules pass through the pipes of the total liquid pipeline port connection. 7. The buffer device for use in the nanomaterial preparation system according to claim 1, further comprising an end cap; The end cap is arranged on the orifice of the general liquid pipe.

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