CN114582840A - MOM capacitor - Google Patents
MOM capacitor Download PDFInfo
- Publication number
- CN114582840A CN114582840A CN202210152084.5A CN202210152084A CN114582840A CN 114582840 A CN114582840 A CN 114582840A CN 202210152084 A CN202210152084 A CN 202210152084A CN 114582840 A CN114582840 A CN 114582840A
- Authority
- CN
- China
- Prior art keywords
- electrode
- conductive layer
- layer
- strips
- electrode strips
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000003990 capacitor Substances 0.000 title claims abstract description 59
- 239000000758 substrate Substances 0.000 claims abstract description 20
- 239000002184 metal Substances 0.000 claims description 8
- 229910052751 metal Inorganic materials 0.000 claims description 8
- 230000001788 irregular Effects 0.000 claims description 3
- 230000003071 parasitic effect Effects 0.000 description 11
- 238000010586 diagram Methods 0.000 description 9
- 239000004020 conductor Substances 0.000 description 8
- 239000004065 semiconductor Substances 0.000 description 8
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000000034 method Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/58—Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
- H01L23/64—Impedance arrangements
- H01L23/642—Capacitive arrangements
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D1/00—Resistors, capacitors or inductors
- H10D1/60—Capacitors
- H10D1/68—Capacitors having no potential barriers
- H10D1/692—Electrodes
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Semiconductor Integrated Circuits (AREA)
Abstract
公开了一种MOM电容器,包括:衬底;位于衬底上的第一导电层,第一导电层为导电极板;位于第一导电层上的第二导电层,第二导电层包括多个彼此隔开的第一电极条和第二电极条;位于第二导电层上的第三导电层,第三导电层为导电极板;以及多个通孔,用于将第一电极条电连接到第一导电层和所述第三导电层,以形成第一电极,多个第二电极条之间电连接,形成第二电极,所述第二电极与所述第一电极的极性相反;其中,第一电极条和第二电极条在所述第二导电层所处的平面上呈包围状交替排列;位于第二导电层所处平面的中心的为多个第二电极条中的一个,位于第二导电层所处平面的边缘的为多个第一电极条中的一个。
A MOM capacitor is disclosed, comprising: a substrate; a first conductive layer on the substrate, the first conductive layer is a conductive electrode plate; a second conductive layer on the first conductive layer, the second conductive layer includes a plurality of a first electrode strip and a second electrode strip separated from each other; a third conductive layer located on the second conductive layer, the third conductive layer being a conductive electrode plate; and a plurality of through holes for electrically connecting the first electrode strips to the first conductive layer and the third conductive layer to form a first electrode, a plurality of second electrode strips are electrically connected to form a second electrode, and the second electrode is opposite in polarity to the first electrode ; wherein, the first electrode strips and the second electrode strips are alternately arranged in a surrounding shape on the plane where the second conductive layer is located; the center of the plane where the second conductive layer is located is a plurality of second electrode strips. One, located at the edge of the plane where the second conductive layer is located is one of the plurality of first electrode strips.
Description
技术领域technical field
本发明涉及半导体技术领域,特别涉及一种MOM电容器。The present invention relates to the technical field of semiconductors, in particular to a MOM capacitor.
背景技术Background technique
电容阵列结构领域中,电容器是相当重要的基本元件。金属-氧化物-金属(Metal-Oxide-Metal,MOM)电容器和金属-绝缘体-金属(Metal-Insulator-Metal,MIM)电容器是其中两种常见的电容结构。MIM电容器采用位于同一层或者位于不同层的金属图案形成同一电极,其电容值主要为不同导体层形成的电容构成。MOM电容器采用将同一层的金属图案同时形成极性相反的两个电极,因而其电容值可包括同一导体层形成的电容。In the field of capacitor array structure, capacitor is a very important basic element. Metal-Oxide-Metal (MOM) capacitors and Metal-Insulator-Metal (MIM) capacitors are two common capacitor structures. MIM capacitors use metal patterns on the same layer or on different layers to form the same electrode, and the capacitance value is mainly composed of capacitors formed by different conductor layers. The MOM capacitor adopts the metal pattern of the same layer to form two electrodes with opposite polarities at the same time, so its capacitance value can include the capacitance formed by the same conductor layer.
参考图1所示,MOM电容器100包括衬底101和导体层M1,导体层M1包括两个梳形结构的第一电极102和第二电极103,第一电极和第二电极极性相反,两个梳形结构各自包含的电极条交错排布从而不同电极的电极条之间形成电容,电容器100的电容值等于这些电极条形成的电容之和。MOM电容器的这种设计方式有助于提高每单位面积上的电容,从而有助于降低MOM电容器所占面积,进而有助于提高半导体电路的集成度。为了增加电容值,图1所示的MOM电容器还可以采用叠层设计,使得总电容主要等于同层电容、不同层之间的电容、各个电极条与通孔之间的电容之和。Referring to FIG. 1, the
但是对于大量电容器的电容阵列而言,其电容阵列的体积庞大,因此对如图1所示的MOM电容器还需要进一步改进,以进一步缩小电容器的体积。However, for a capacitor array with a large number of capacitors, the volume of the capacitor array is huge, so the MOM capacitor shown in FIG. 1 needs to be further improved to further reduce the volume of the capacitor.
发明内容SUMMARY OF THE INVENTION
鉴于上述问题,本发明的目的在于提供一种MOM电容器,以提高电容面积的利用率。In view of the above problems, the purpose of the present invention is to provide a MOM capacitor to improve the utilization rate of the capacitor area.
本发明提供一种MOM电容器,包括:The present invention provides a MOM capacitor, comprising:
衬底;substrate;
位于所述衬底上的第一导电层,所述第一导电层为导电极板;a first conductive layer located on the substrate, the first conductive layer is a conductive electrode plate;
位于所述第一导电层上的第二导电层,所述第二导电层包括多个彼此隔开的第一电极条和第二电极条;a second conductive layer on the first conductive layer, the second conductive layer including a plurality of first electrode strips and second electrode strips spaced apart from each other;
位于所述第二导电层上的第三导电层,所述第三导电层为导电极板;以及a third conductive layer on the second conductive layer, the third conductive layer is a conductive electrode plate; and
多个通孔,用于将所述第一电极条电连接到所述第一导电层和所述第三导电层,以形成第一电极,多个所述第二电极条之间电连接,形成第二电极,所述第二电极与所述第一电极的极性相反;以及a plurality of through holes for electrically connecting the first electrode strips to the first conductive layer and the third conductive layer to form a first electrode, and the plurality of second electrode strips are electrically connected, forming a second electrode opposite in polarity to the first electrode; and
其中,第一电极条和第二电极条在所述第二导电层所处的平面上呈包围状交替排列;位于所述第二导电层所处平面的中心的为多个第二电极条中的一个,位于所述第二导电层所处平面的边缘的为多个第一电极条中的一个。Wherein, the first electrode strips and the second electrode strips are alternately arranged in a surrounding shape on the plane where the second conductive layer is located; the center of the plane where the second conductive layer is located is among the plurality of second electrode strips One of the plurality of first electrode strips is located at the edge of the plane where the second conductive layer is located.
优选地,所述第一电极条和第二电极条的形状为矩形、圆形、多边形或者不规则图形中的一种或者几种,以在所述第二导电层所处平面上形成包围状且间隔交替分布的第一电极条和第二电极条。Preferably, the shapes of the first electrode strips and the second electrode strips are one or more of rectangles, circles, polygons or irregular shapes, so as to form a surrounding shape on the plane where the second conductive layer is located And the first electrode strips and the second electrode strips are alternately distributed.
优选地,所述第二导电层还包括第三电极条,用于将彼此隔开的第二电极条连接在一起;Preferably, the second conductive layer further comprises third electrode strips for connecting the second electrode strips spaced apart from each other together;
所述第三电极条与所述第一电极条隔离;the third electrode strip is isolated from the first electrode strip;
所述第二电极条以及连接所述第二电极条的第三电极条形成第二电极。The second electrode strip and the third electrode strip connected to the second electrode strip form a second electrode.
优选地,所述第三电极条为直线条,一端连接于最内层的第二电极条;另一端穿过第一电极条的开口,一直延伸至最外层的第二电极条。Preferably, the third electrode strip is a straight strip, one end is connected to the innermost second electrode strip; the other end passes through the opening of the first electrode strip and extends to the outermost second electrode strip.
优选地,所述第一导电层、第二导电层以及第三导电层采用金属制成。Preferably, the first conductive layer, the second conductive layer and the third conductive layer are made of metal.
优选地,所述MOM电容器包括多层层叠设置的所述第二导电层,所述多个通孔还用于将相邻层的所述第二导电层的第一电极条电连接到一起,以及用于将相邻层的所述第二导电层的第二电极条电连接到一起。Preferably, the MOM capacitor comprises the second conductive layer arranged in multiple layers, and the plurality of through holes are also used to electrically connect the first electrode strips of the second conductive layers of the adjacent layers together, and second electrode strips for electrically connecting together the second conductive layers of adjacent layers.
优选地,所述第一导电层和所述第三导电层至少遮挡所述第二电极条。Preferably, the first conductive layer and the third conductive layer at least shield the second electrode strips.
优选地,还包括位于所述衬底和所述第一导电层之间的虚拟层,所述虚拟层由下至上依次包括阱层、有源层、虚拟有源层以及虚拟栅极层,其中,阱层和有源层之间通过接触孔连接。Preferably, it also includes a dummy layer located between the substrate and the first conductive layer, the dummy layer sequentially includes a well layer, an active layer, a dummy active layer and a dummy gate layer from bottom to top, wherein , the well layer and the active layer are connected through contact holes.
优选地,第一导电层以及第二导电层在所述衬底上的投影落入所述阱层所在的区域。Preferably, the projections of the first conductive layer and the second conductive layer on the substrate fall into the region where the well layer is located.
本发明提供的MOM电容器,第二导电层中作为第一电极的电极条以及作为第二电极的电极条呈包围状间隔且交替排列,且最内层为第二电极,最外层为第一电极;第二导电层中作为第一电极的电极条以及作为第二电极的电极条从该层的中心以一圈包一圈的方式向外辐射分布,使得电极条之间的排列紧凑,和现有技术中的电极分布相比,本发明实施例得到相同的容值,所需的第一电极和第二电极的线宽和间距值更小,进一步所需要的面积更小,即相同面积内,本实施例的密度更大,利用率更高,成本更低。In the MOM capacitor provided by the present invention, the electrode strips serving as the first electrodes and the electrode strips serving as the second electrodes in the second conductive layer are spaced around and alternately arranged, and the innermost layer is the second electrode, and the outermost layer is the first electrode. electrodes; the electrode strips serving as the first electrodes in the second conductive layer and the electrode strips serving as the second electrodes radiate outward from the center of the layer in a circle-in-a-circle manner, so that the arrangement between the electrode strips is compact, and Compared with the electrode distribution in the prior art, the embodiment of the present invention obtains the same capacitance value, the required line width and spacing value of the first electrode and the second electrode are smaller, and further the required area is smaller, that is, the same area In this embodiment, the density is higher, the utilization rate is higher, and the cost is lower.
进一步地,由于每个第二电极条均有第一电极条围绕,第二电极条不面向电源地,可以实现面积和对地电容不变的情况下,灵活调节MOM电容容值的大小(例如直接删除中间的一圈第二电极条),且方便版图工作。Further, since each second electrode strip is surrounded by the first electrode strip, and the second electrode strip does not face the power ground, it is possible to flexibly adjust the size of the MOM capacitance value (for example, under the condition that the area and the capacitance to the ground remain unchanged) Directly delete the second electrode strip in the middle), and it is convenient for layout work.
进一步地,由于每个第二电极条均有第一电极条围绕,第二电极条不面向电源地,可以实现面积和对地电容不变的情况下,可以通过调节第一电极的线宽以及与第二电极之间的间距来轻松的调整容值的大小,使得版图设计工作更加简便。Further, since each second electrode strip is surrounded by the first electrode strip, and the second electrode strip does not face the power ground, it can be achieved that the area and the capacitance to the ground remain unchanged, by adjusting the line width of the first electrode and the The size of the capacitance can be easily adjusted by the distance between the second electrode and the second electrode, which makes the layout design work easier.
进一步地,本发明实施例提供的MOM电容器,采用第一电极的电极条保护第二电极的电极条,从而只在电源地和第一电极之间引入寄生电容,第二电极与电源地之间的寄生电容基本上可以忽略不计。Further, in the MOM capacitor provided by the embodiment of the present invention, the electrode strip of the first electrode is used to protect the electrode strip of the second electrode, thereby only introducing parasitic capacitance between the power supply ground and the first electrode, and between the second electrode and the power supply ground. The parasitic capacitance is basically negligible.
在优选地实施例中,通过叠层设计的第四导电层和第二导电层增加MOM电容器的整体电容值。In a preferred embodiment, the overall capacitance value of the MOM capacitor is increased by the stacked design of the fourth conductive layer and the second conductive layer.
在优选地实施例中,通过在所述半导体衬底内设置阱层、有源层、虚拟有源层以及虚拟栅极层,以对来自半导体衬底的噪声起到阻挡作用,从而防止噪声进入MOM电容。In a preferred embodiment, a well layer, an active layer, a dummy active layer and a dummy gate layer are provided in the semiconductor substrate to block noise from the semiconductor substrate, thereby preventing noise from entering MOM capacitors.
附图说明Description of drawings
通过以下参照附图对本发明实施例的描述,本发明的上述以及其他目的、特征和优点将更为清楚,在附图中:The above and other objects, features and advantages of the present invention will become more apparent from the following description of embodiments of the present invention with reference to the accompanying drawings, in which:
图1示出了现有技术中MOM电容器的结构示意图;Fig. 1 shows the structure schematic diagram of MOM capacitor in the prior art;
图2示出了本发明第一实施例的MOM电容器的立体结构示意图;Fig. 2 shows the three-dimensional schematic diagram of the MOM capacitor of the first embodiment of the present invention;
图3示出了本发明第一实施例的第二导电层的俯视结构示意图;FIG. 3 shows a schematic top view of the structure of the second conductive layer according to the first embodiment of the present invention;
图4示出了本发明第二实施例的MOM电容器的立体结构示意图;FIG. 4 shows a schematic three-dimensional structure diagram of the MOM capacitor according to the second embodiment of the present invention;
图5示出了本发明第二实施例的导体层的俯视图;Fig. 5 shows the top view of the conductor layer of the second embodiment of the present invention;
图6示出了本发明第二实施例的导体层和第一导电层之间的第二通孔在所述第一导电层上投影示意图;6 is a schematic diagram showing the projection of the second through hole between the conductor layer and the first conductive layer on the first conductive layer according to the second embodiment of the present invention;
图7示出了本发明第二实施例的第二导电层和第三导电层之间的第一通孔在所述第三导电层上的投影示意图;7 shows a schematic diagram of the projection of the first through hole between the second conductive layer and the third conductive layer on the third conductive layer according to the second embodiment of the present invention;
图8示出了本发明第二实施例的第三通孔和第四通孔在所述导体层上的投影结构示意图;FIG. 8 shows a schematic diagram of the projection structure of the third through hole and the fourth through hole on the conductor layer according to the second embodiment of the present invention;
图9示出了本发明第三实施例的MOM电容器的截面图。9 shows a cross-sectional view of a MOM capacitor of a third embodiment of the present invention.
具体实施方式Detailed ways
以下将参照附图更详细地描述本发明。在各个附图中,相同的元件采用类似的附图标记来表示。为了清楚起见,附图中的各个部分没有按比例绘制。此外,可能未示出某些公知的部分。The present invention will be described in more detail below with reference to the accompanying drawings. In the various figures, like elements are designated by like reference numerals. For the sake of clarity, various parts in the figures have not been drawn to scale. Additionally, some well-known parts may not be shown.
本发明可以各种形式呈现,以下将描述其中一些示例。The invention may be embodied in various forms, some examples of which will be described below.
图2示出了本发明第一实施例的MOM电容器200的立体结构示意图;如图2所示,MOM电容器200包括衬底201、位于所述衬底201上的多层导电层202以及填充于各层导电层202之间以及同一导电层202的电极条之间的绝缘层(图中未示出)。其中,所述导电层202包括第一导电层21、第二导电层22以及第三导电层23。FIG. 2 shows a schematic three-dimensional structure of the
所述第一导电层21至第三导电层23的每一层可以各种金属制成。第一导电层21位于衬底201的上方。第一导电层21和第三导电层23为一个金属极板,其上没有形成任何开口或者镂空。在第一导电层21的上方形成第二导电层22。第二导电层22的上方形成第三导电层23。第二导电层22包括多个电极条。第二导电层22的一部分电极条经由通孔203与第一导电层21和第三导电层23电连接,以形成第一电极,第二导电层22剩余的一部分电极条形成第二电极,所述第一电极和所述第二电极极性相反。Each of the first
图3示出了本发明第一实施例的第二导电层的俯视结构示意图,如图3所示,所述第二导电层22包括多个彼此隔开的第一电极条221和第二电极条222,多个彼此隔开的第一电极条221和第二电极条222在所述第二导电层22所处的平面上呈包围状间隔且交替排列,且位于所述第二导电层22所处平面的中心的为多个第二电极条222中的一个,位于所述第二导电层22所处平面的边缘的为多个第一电极条221中的一个,以保证每个所述第二电极条222均被一个第一电极条221围绕。多个第二电极条222之间通过第三电极条223电连接。FIG. 3 shows a schematic top view of the second conductive layer according to the first embodiment of the present invention. As shown in FIG. 3 , the second
本实施例中,所述第一电极条221和第二电极条222在所述第二导电层22所处的平面上呈“回”字型间隔且交替排列,具体地,所述第二导电层22包括两个第一电极条221和两个第二电极条222,分别为第一电极条2211、第一电极条2212、第二电极条2221和第二电极条2222,其中,在整个第二导电层22所处平面上,第二电极条2221、第一电极条2211、第二电极条2222、第一电极条2212呈“回”字型,由内向外依次排列。In this embodiment, the first electrode strips 221 and the second electrode strips 222 are spaced and alternately arranged in a "back" shape on the plane where the second
具体地,第二电极条2221为矩形,位于整个第二导电层22所处平面的中心位置,第一电极条2211为围绕所述第二电极条2221的矩形框,且与所述第二电极条2221隔离,所述第一电极条2211具有开口,以供所述第三电极条223穿过;所述第二电极条2222为围绕所述第一电极条2211的矩形框,且与所述第一电极条2211隔离;所述第一电极条2212为围绕所述第二电极条2222的矩形框,且与所述第二电极条2222隔离,所述第一电极条2212具有开口,以供所述第三电极条223穿过。所述第三电极条223为直线条,一端与所述第二电极条2221连接,另一端穿过所述第一电极条2211和第一电极条2212的开口向外延伸,以实现所述第二电极条2221与第二电极条2222的连接以及相邻MOM电容器之间的电连接。Specifically, the
MOM电容器200中,第一导电层21、第三导电层23以及第二导电层22与第一导电层21和第三电极层23电连接的一部分电极条(第一电极条)作为第一电极,第二导电层22剩余的另一部分电极条(第二电极条以及第三电极条)作为第二电极。第一电极和第二电极极性相反,由此在第一电极和第二电极之间形成电容。In the
在本实施例中,第二导电层中作为第一电极的电极条以及作为第二电极的电极条呈“回”字型间隔且交替排列,且最内层为第二电极,最外层为第一电极;第二导电层中作为第一电极的电极条以及作为第二电极的电极条从该层的中心以一圈包一圈的方式向外辐射分布,使得电极条之间的排列紧凑,和现有技术(如图1所示)中的电极之间的分布相比,本实施例在相同面积内,第一电极和第二电极之间的间距(space)总和更大,从而第一电极和第二电极之间的电容值更大,相同的面积可以得到更大的电容值。换言之,本实施例得到与现有技术(如图1所示)相同的容值,所需的第一电极和第二电极的线宽和间距值更小,进一步所需要的面积越小,即相同面积内,本实施例的密度更大,利用率更高,成本更低。In this embodiment, the electrode strips serving as the first electrodes and the electrode strips serving as the second electrodes in the second conductive layer are spaced and alternately arranged in a "back" shape, and the innermost layer is the second electrode, and the outermost layer is The first electrode; the electrode strips as the first electrode and the electrode strips as the second electrode in the second conductive layer radiate outwards from the center of the layer in a circle-in-a-circle manner, so that the arrangement between the electrode strips is compact , compared with the distribution between electrodes in the prior art (as shown in FIG. 1 ), in this embodiment, within the same area, the total space between the first electrode and the second electrode is larger, so the first The capacitance value between the first electrode and the second electrode is larger, and a larger capacitance value can be obtained with the same area. In other words, this embodiment obtains the same capacitance value as the prior art (as shown in FIG. 1 ), the required line width and spacing value of the first electrode and the second electrode are smaller, and the further required area is smaller, that is, Within the same area, the density of this embodiment is higher, the utilization rate is higher, and the cost is lower.
进一步地,在本实施例中,由于第一导电层和第三导电层具有平面形状,且被用作第一电极,因此只有第一电极面向电源地,从而只有电源地与电源地相对的第一电极之间会引入寄生电容,而用作第二电极的电极条被用作第一电极的电极条围绕,因此第二电极与电源地之间的寄生电容基本上可以忽略不计。因此在本实施例中,可以显著地减小第二电极和电源地之间的寄生电容。而且,通过增加第一导电层的表面积,虽然使得第一电极与电源地之前的寄生电容也会增加,但是能够进一步降低第二电极与电源地之间的寄生电容。Further, in this embodiment, since the first conductive layer and the third conductive layer have a planar shape and are used as the first electrode, only the first electrode faces the power ground, so only the power ground is opposite to the power ground. Parasitic capacitance is introduced between one electrode, and the electrode strip used as the second electrode is surrounded by the electrode strip used as the first electrode, so the parasitic capacitance between the second electrode and the power ground can be basically ignored. Therefore, in this embodiment, the parasitic capacitance between the second electrode and the power supply ground can be significantly reduced. Furthermore, by increasing the surface area of the first conductive layer, although the parasitic capacitance between the first electrode and the power supply ground is also increased, the parasitic capacitance between the second electrode and the power supply ground can be further reduced.
当然,第一导电层的表面积也可以适当地减小以进一步地减少成本。例如,可以将第一导电层的表面积减小到恰好能够遮挡第二导电层中的用作第二电极的电极条的各个端部,如此虽然第二电极和电源地之间的寄生电容可能增加,但是增加的幅度在可以容忍的范围之内。一般情况下,寄生电容应小于第一电极和第二电极之间的电容值的5%。综上所述,本实施例提供的MOM电容器虽然存在第一电极和电源地之间的寄生电容,但是由于第二电极被第一电极几乎完全保护着,使得第二电极与电源地之间的寄生电容很小,甚至会接近为0。Of course, the surface area of the first conductive layer can also be appropriately reduced to further reduce the cost. For example, the surface area of the first conductive layer can be reduced to just enough to shield each end of the electrode strip in the second conductive layer serving as the second electrode, so although the parasitic capacitance between the second electrode and power ground may increase , but the increase is within a tolerable range. In general, the parasitic capacitance should be less than 5% of the capacitance value between the first electrode and the second electrode. To sum up, although the MOM capacitor provided in this embodiment has a parasitic capacitance between the first electrode and the power supply ground, since the second electrode is almost completely protected by the first electrode, the connection between the second electrode and the power supply ground is reduced. The parasitic capacitance is very small, even close to zero.
为了方便说明,图3示出了一个具体的版图设计,但是本发明的实施不局限于该版图设计。例如采用如图3所示的版图设计,是为了说明“第二导电层中作为第一电极的电极条以及作为第二电极的电极条呈“回”字型间隔且交替排列,且最内层为第二电极,最外层为第一电极”这一核心思想。在其他的版图设计中,可以设置任意圈数的第一电极条和第二电极条;在其他的版图设计中,多个彼此隔开的第一电极条221和第二电极条222的形状还可以为圆形、多边形或者不规则图形等,圆形、多边形或者不规则图形的第一电极条221和第二电极条222在所述第二导电层22所处的平面上间隔且交替排列。只要满足上述核心思想,都能够产生相同或者相似的效果。For the convenience of description, FIG. 3 shows a specific layout design, but the implementation of the present invention is not limited to this layout design. For example, the layout design shown in Figure 3 is used to illustrate that "the electrode strips serving as the first electrodes and the electrode strips serving as the second electrodes in the second conductive layer are spaced and alternately arranged in a "back" shape, and the innermost layer The core idea is the second electrode, and the outermost layer is the first electrode. In other layout designs, the first electrode strips and the second electrode strips with any number of turns can be provided; in other layout designs, the shapes of the plurality of first electrode strips 221 and the second electrode strips 222 spaced apart from each other are also The first electrode strips 221 and the second electrode strips 222 with circular, polygonal or irregular shapes are spaced and alternately arranged on the plane where the second
本发明实施例中,由于每个第二电极条均有第一电极条围绕,第二电极条不面向电源地,可以实现面积和对地电容不变的情况下,灵活调节MOM电容容值的大小,特别是在已经完成电容阵列的版图工作时,可以直接删除中间的一圈第二电极条来调节MOM电容值的大小,方便版图工作。In the embodiment of the present invention, since each second electrode strip is surrounded by the first electrode strip, and the second electrode strip does not face the power supply ground, it is possible to flexibly adjust the capacitance value of the MOM capacitor under the condition that the area and the capacitance to the ground remain unchanged. Especially when the layout work of the capacitor array has been completed, the second electrode strip in the middle can be directly deleted to adjust the size of the MOM capacitance value, which is convenient for the layout work.
进一步地,由于每个第二电极条均有第一电极条围绕,第二电极条不面向电源地,可以实现面积和对地电容不变的情况下,可以通过调节第一电极的线宽以及与第二电极之间的间距来轻松的调整容值的大小,使得版图设计工作更加简便。Further, since each second electrode strip is surrounded by the first electrode strip, and the second electrode strip does not face the power ground, it can be achieved that the area and the capacitance to the ground remain unchanged, by adjusting the line width of the first electrode and the The size of the capacitance can be easily adjusted by the distance between the second electrode and the second electrode, which makes the layout design work easier.
图4示出了本发明第二实施例的MOM电容器的立体结构示意图;如图4所示,与第一实施例相比,本实施例的MOM电容器增加了第四导电层301。FIG. 4 shows a schematic three-dimensional structure of the MOM capacitor according to the second embodiment of the present invention; as shown in FIG. 4 , compared with the first embodiment, a fourth
图5示出了本发明第二实施例的第四导电层301的俯视图,如图5所示,第四导电层301的版图设计和第二导电层22的版图设计大体相同。FIG. 5 shows a top view of the fourth
具体地,所述第四导电层301包括多个彼此隔开的第四电极条321和第五电极条322,多个彼此隔开的第四电极条321和第五电极条322在所述第四导电层301所处的平面上呈“回”字型间隔且交替排列,且位于所述第四导电层301所处平面的中心的为多个第五电极条322中的一个,位于所述第四导电层301所处平面的边缘的为多个第四电极条321中的一个,以保证每个所述第五电极条322均被一个第四电极条321围绕。多个第五电极条322之间通过第六电极条623电连接。Specifically, the fourth
其中,所述第四导电层301上的第四电极条321的数量与第二导电层22上的第一电极条221的数量相同,且第四电极条321在第二导电层22上的投影与所述第二导电层22上的第一电极条221在第二导电层22上的投影基本重合。所述第三导电层23上的第五电极条322的数量与第二导电层22上的第二电极条222的数量相同,且第五电极条322在第二导电层22上的投影与所述第二导电层22上的第二电极条222在第二导电层22上的投影基本重合。The number of the fourth electrode strips 321 on the fourth
所述第四导电层301分别包括第四电极条3211、第四电极条3212、第五电极条3221和第五电极条3222,其中,在整个第四导电层301所处平面上,第五电极条3221、第四电极条3211、第五电极条3222、第四电极条3212呈“回”字型,由内向外依次排列。多个第五电极条322之间通过第六电极条323连接,所述第六电极条323与所述第四电极条321隔离设置。The fourth
第五电极条3221位于整个第四导电层301所处平面的中心位置,第四电极条3211围绕所述第五电极条3221排列,且与所述第五电极条3221隔离;所述第五电极条3222围绕所述第四电极条3211排列,且与所述第四电极条3211隔离;所述第四电极条3212围绕所述第五电极条3222排列,且与所述第五电极条3222隔离。The
与第二导电层22不同的是,只有第四电极条3212具有开口,最外层的第四电极条3212没有开口,所述第六电极条323只穿过内层的第四电极条3212,停止于第五电极层3222。Different from the second
本实施例中,第二导电层22的第一电极条221经由第一通孔331与第三导电层23电连接;第四导电层301的第四电极条321经由第二通孔332与第一导电层21连接;图6示出了本发明第二实施例的第四导电层301和第一导电层21之间的第二通孔332在所述第一导电层21上投影示意图;图7示出了本发明第二实施例的第二导电层22和第三导电层23之间的第一通孔331在所述第三导电层23上的投影示意图。In this embodiment, the first electrode strips 221 of the second
第二导电层22中的第一电极条221与第四导电层301中对应的第四电极条321,以及第二导电层22中的第二电极条222与第四导电层301中对应的第五电极条322分别经由第三通孔333和第四通孔334连接。图8示出了本发明第二实施例的第三通孔和第四通孔在所述第四导电层301上的投影结构示意图。The first electrode strips 221 in the second
在本实施例中,通过叠层设计的第四导电层301和第二导电层22增加MOM电容器的整体电容值。In this embodiment, the overall capacitance value of the MOM capacitor is increased through the stacked design of the fourth
在其他实施例中,还可以采用三层以及以上的叠层结构增加电容器的整体电容值,例如增加导体层的数量。但是本质上这样的版图设计的核心思想和前述版图设计相同。In other embodiments, a three-layer or more stacked structure can also be used to increase the overall capacitance value of the capacitor, for example, to increase the number of conductor layers. But in essence, the core idea of such a layout design is the same as the previous layout design.
图9示出了本发明第三实施例的MOM电容器的截面图。如图9所示,与第二实施例相比,本实施例所示的MOM电容器中,还包括位于所述衬底201和所述第一导电层21之间的虚拟层,所述虚拟层由下至上依次包括阱层401、有源层402、虚拟有源层403以及虚拟栅极层404,其中,阱层401和有源层402之间通过接触孔405连接。9 shows a cross-sectional view of a MOM capacitor of a third embodiment of the present invention. As shown in FIG. 9, compared with the second embodiment, the MOM capacitor shown in this embodiment further includes a dummy layer located between the
对于本发明实施例的半导体器件,阱层401与有源层402可以对来自半导体衬底201的噪声起到阻挡作用,从而防止噪声进入MOM电容。For the semiconductor device of the embodiment of the present invention, the
其中,可以通过调整设计方案使MOM电容在半导体衬底201的上表面的投影完全落入有阱层401所在的区域。这一设计可以更好地防止来自半导体衬底201的噪声进入MOM电容。Wherein, the projection of the MOM capacitor on the upper surface of the
依照本发明的实施例如上文所述,这些实施例并没有详尽叙述所有的细节,也不限制该发明仅为所述的具体实施例。显然,根据以上描述,可作很多的修改和变化。本说明书选取并具体描述这些实施例,是为了更好地解释本发明的原理和实际应用,从而使所属技术领域技术人员能很好地利用本发明以及在本发明基础上的修改使用。本发明仅受权利要求书及其全部范围和等效物的限制。Embodiments in accordance with the present invention are described above, but these embodiments do not exhaust all the details and do not limit the invention to only the specific embodiments described. Obviously, many modifications and variations are possible in light of the above description. These embodiments are selected and described in this specification to better explain the principle and practical application of the present invention, so that those skilled in the art can make good use of the present invention and modifications based on the present invention. The present invention is to be limited only by the claims and their full scope and equivalents.
Claims (9)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202210152084.5A CN114582840A (en) | 2022-02-18 | 2022-02-18 | MOM capacitor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202210152084.5A CN114582840A (en) | 2022-02-18 | 2022-02-18 | MOM capacitor |
Publications (1)
Publication Number | Publication Date |
---|---|
CN114582840A true CN114582840A (en) | 2022-06-03 |
Family
ID=81773121
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202210152084.5A Pending CN114582840A (en) | 2022-02-18 | 2022-02-18 | MOM capacitor |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN114582840A (en) |
-
2022
- 2022-02-18 CN CN202210152084.5A patent/CN114582840A/en active Pending
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP5369192B2 (en) | Integrated capacitors having interconnected lateral fins | |
JP4805600B2 (en) | Semiconductor device | |
US7754606B2 (en) | Shielded capacitor structure | |
US7327551B2 (en) | Capacitor structure | |
CN108428702A (en) | The manufacturing method of dynamic random access memory | |
US10249705B2 (en) | Capacitor array structure | |
JP2012509595A (en) | Integrated capacitor with grid plate | |
US20250113504A1 (en) | High density metal insulator metal capacitor | |
CN102903717B (en) | Semiconductor integrated circuit with capacitor for stable power supply and manufacturing method thereof | |
CN114582840A (en) | MOM capacitor | |
CN100578785C (en) | Integrated circuit with multi-terminal capacitor | |
CN114582860B (en) | A multi-capacitance matching MOM capacitor | |
KR101037009B1 (en) | Capacitor structure | |
CN114582841A (en) | MOM capacitor | |
KR101046275B1 (en) | Semiconductor Memory Device with Power Mesh Structure | |
CN111129304B (en) | MOM capacitor, capacitor array structure and layout design method thereof | |
CN116264208A (en) | Semiconductor structure | |
TW202245279A (en) | Semiconductor capacitor array layout with dummy capacitor structure | |
TWI239631B (en) | Vertical integrated capacitor | |
TWI819776B (en) | Metal-oxide-metal capacitor structure and semiconductor device thereof | |
CN111900251B (en) | MOM capacitor and semiconductor device | |
CN115377089A (en) | Semiconductor capacitor array layout | |
CN118280965A (en) | Capacitor device and forming method thereof | |
CN207852646U (en) | semiconductor memory | |
WO2023245834A1 (en) | Semiconductor structure |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
CB02 | Change of applicant information | ||
CB02 | Change of applicant information |
Address after: 310051 room c1-604, building C, No. 459, Qianmo Road, Xixing street, Binjiang District, Hangzhou, Zhejiang Province Applicant after: Lianyun Technology (Hangzhou) Co.,Ltd. Address before: 6 / F, block C1, spotlight center, 459 Qianmo Road, Binjiang District, Hangzhou City, Zhejiang Province, 310051 Applicant before: MAXIO TECHNOLOGY (HANGZHOU) Ltd. |