CN114574816B - Film forming apparatus and scaffold unit - Google Patents

Abstract

The present invention provides a film forming device and a scaffolding unit that improve work efficiency during maintenance. An in-line film forming apparatus for forming a film on a substrate while transporting the substrate includes: a transport unit that transports the substrate; It moves between the second position displaced in the lateral direction from the first position. The film forming apparatus includes a scaffold unit that deploys the scaffold below the transport unit as the film forming source unit moves from the first position to the second position.

Description

Film forming device and scaffolding unit

technical field

The invention relates to a film forming device and a scaffold unit.

Background technique

Conventionally, there is known an in-line device that processes a substrate while conveying the substrate. Patent Document 1 discloses that, in an in-line substrate processing apparatus, a plurality of processing units are arranged in a row in the vertical direction.

prior art literature

patent documents

Patent Document 1: Japanese Patent Laid-Open No. 2018-93087

Contents of the invention

The problem to be solved by the invention

In the prior art described above, it is necessary to prepare steps and the like for maintenance of the processing units other than the processing unit on the lowest floor. Therefore, it takes time to prepare and remove the steps, and the work efficiency at the time of maintenance may decrease.

The present invention provides a technique for improving work efficiency during maintenance.

means to solve the problem

According to an aspect of the present invention, a kind of film-forming device is provided, and described film-forming device has:

a conveying unit, which conveys the substrate; and

a film-forming source unit comprising a film-forming source capable of moving between a first position below the transport unit and a second position displaced laterally relative to the first position,

The film forming apparatus is an in-line film forming apparatus that forms a film on the substrate while transporting the substrate,

It is characterized in that,

The film forming apparatus includes a scaffold unit that deploys a scaffold below the transport unit as the film forming source unit moves from the first position to the second position.

In addition, according to an aspect of the present invention, a scaffold unit is provided, the scaffold unit is used for a film forming device, and the film forming device has:

a conveying unit, which conveys the substrate; and

a film-forming source unit, which includes a film-forming source that emits a film-forming substance, and is movable between a first position below the conveying unit and a second position displaced laterally relative to the first position,

The film forming apparatus is an in-line film forming apparatus that forms a film on the substrate while transporting the substrate,

It is characterized in that,

As the film formation source unit moves from the first position to the second position, a scaffold is deployed below the transport unit.

The effect of the invention

According to the present invention, work efficiency at the time of maintenance can be improved.

Description of drawings

FIG. 1 is a front view schematically showing a film forming apparatus according to one embodiment.

FIG. 2 is a side view of the film forming apparatus of FIG. 1 .

FIG. 3 is a diagram schematically showing the internal structure of the film forming apparatus of FIG. 1 .

Fig. 4 is a perspective view showing the structure of a scaffold unit.

FIG. 5 is a view of the scaffold unit viewed from the front of the film forming apparatus.

Fig. 6 is a diagram illustrating movement of a deposition source unit and deployment operation of a scaffold unit.

FIG. 7(A) is a view of the scaffold unit before the unfolding operation viewed from the front of the film forming apparatus. FIG. 7(B) is a view of the scaffold unit in the unfolding operation viewed from the front of the film forming apparatus.

Fig. 8 is a plan view schematically showing the positional relationship between the transport unit and the scaffold unit.

FIG. 9 is a view of the scaffold unit viewed from the front of the film forming apparatus.

FIG. 10 is a side view of a film forming apparatus according to one embodiment.

FIG. 11 is a front view schematically showing a film forming apparatus according to one embodiment.

FIG. 12 is a plan view of the film forming apparatus of FIG. 11 .

FIG. 13 is a front view schematically showing a film forming apparatus according to one embodiment.

Fig. 14 is a perspective view schematically showing a scaffold unit.

Fig. 15 is a diagram showing the structure of the scaffold unit, and is a diagram showing a plurality of mounting parts, elevating parts, and their peripheral structures.

FIG. 16 is a diagram showing the structure of the floor member, and is a perspective view of the floor member 81 viewed from the back side.

Fig. 17 is a perspective view showing the structure of a rail member.

Fig. 18 is an operation explanatory diagram for explaining the transfer operation of the floor member from the mounting section to the rail member.

Detailed ways

Embodiments will be described in detail below with reference to the drawings. In addition, the following embodiments do not limit the invention according to the claims, and not all combinations of features described in the embodiments are essential to the invention. Two or more of the features described in the embodiments may be combined arbitrarily. In addition, the same reference numerals are assigned to the same or similar configurations, and overlapping descriptions are omitted.

In addition, in each figure, the X direction shows the conveyance direction of a board|substrate, the Y direction shows the width direction intersecting with the conveyance direction of a board|substrate, and the Z direction shows an up-down direction.

<First Embodiment>

＜Overview of Film Formation Equipment＞

FIG. 1 is a front view schematically showing a film forming apparatus 1 according to one embodiment. FIG. 2 is a side view of the film forming apparatus 1 of FIG. 1 . FIG. 3 is a diagram schematically showing the internal structure of the film forming apparatus 1 of FIG. 1 .

The film forming apparatus 1 is an in-line film forming apparatus that forms a film on a substrate while conveying the substrate. The film forming apparatus 1 is used, for example, in the manufacture of a display panel of an organic EL display device for a smartphone, and can be arranged in a row to form a production line thereof.

In the present embodiment, the substrates held on the substrate holding tray 100 are sequentially transported to the film forming apparatus 1 , and the film forming apparatus 1 vapor-deposits organic EL on the transported substrates. For example, the substrate is held on the substrate holding tray 100 in a state overlapping with the mask in a step upstream of the transport to the film forming apparatus 1 , and is transported to the film forming apparatus 1 . Therefore, in the film forming apparatus 1 , a thin film of the vapor-deposited substance is formed in a predetermined pattern on the substrate through the mask. As a material of the substrate to be vapor-deposited in the film forming apparatus 1 , glass, resin, metal, etc. can be appropriately selected, and a substrate in which a resin layer such as polyimide is formed on glass is preferably used. As the vapor deposition substance, there are substances such as organic materials and inorganic materials (metals, metal oxides, etc.). The film-forming apparatus 1 can be applied, for example, to a manufacturing apparatus for manufacturing electronic devices such as display devices (flat panel displays, etc.), thin-film solar cells, organic photoelectric conversion elements (organic thin-film imaging elements), optical elements, etc., and especially can be applied to manufacturing organic EL Panel manufacturing device. In the following description, an example in which the film forming apparatus 1 forms a film on a substrate by vacuum evaporation is described, but the form of the film forming method is not limited thereto, and various film forming methods such as sputtering and CVD can be applied.

The film forming apparatus 1 includes a transport unit 2 , a vapor deposition source unit 3 , an landing prevention plate 6 , a moving unit 7 , and a frame unit 101 .

The frame portion 101 is provided so as to be able to support constituent elements such as the transport unit 2 of the film forming apparatus 1 . In the example of FIG. 1 , the frame portion 101 includes columns and beams, and supports the transport unit 2 and the vacuum pump 102 . In addition, a crane for work, a passageway for an operator to perform maintenance, and the like may be provided on the frame portion 101 .

The transport unit 2 transports the substrate. In the present embodiment, the transport unit 2 transports the substrate holding tray 100 holding the substrate to transport the substrate. The conveying unit 2 includes a conveying chamber 21 and conveying rollers 22 .

The transfer chamber 21 is a box-shaped chamber capable of maintaining a vacuum inside. The internal space 210 of the transport chamber 21 is maintained in a vacuum environment or an inert gas environment such as nitrogen. In this embodiment, the delivery chamber 21 is connected to a vacuum pump 102 . In addition, in this specification, "vacuum" means the state filled with the gas of pressure lower than atmospheric pressure, in other words, means the depressurized state.

A carry-in opening 211 through which the substrate holding tray 100 is carried in and a carry-out opening 212 through which the substrate holding tray 100 is carried out are formed in the transfer chamber 21 . In addition, a communication opening 213 for communicating the internal space 210 with the internal space 310 of the evaporation source chamber 31 is formed in the lower portion of the transport chamber 21 . In addition, in order to maintain the internal space 210 in a vacuum, gate valves (not shown) or the like may be provided in the delivery opening 211 and the delivery opening 212 .

The transport rollers 22 transport the substrate holding tray 100 holding the substrate. The conveying roller 22 is disposed in the inner space 210 of the conveying chamber 21 . The transport roller 22 is, for example, a cylindrical member formed of a metal material and supported in a rotatable cylindrical shape. The transport roller 22 is driven by, for example, an electric motor (not shown) provided outside the transport chamber 21 .

Moreover, in this embodiment, the rib 23 for reinforcement is provided in the lower part of the conveyance unit 2. As shown in FIG.

The vapor deposition source unit 3 is a unit (film formation source unit) having a vapor deposition source 32 (film formation source) that emits a vapor deposition substance to a substrate. In this embodiment, three vapor deposition source units 3 are arranged side by side in the conveyance direction (X direction) of the substrate with respect to one conveyance unit 2 . However, the number of vapor deposition source units 3 can be appropriately set, and may be two or less or four or more. In addition, the vapor deposition source unit 3 is located below the conveyance unit 2 and is connected to the lower portion of the conveyance unit 2 when the vapor deposition process is performed. The evaporation source unit 3 includes an evaporation source chamber 31 and an evaporation source 32 .

The deposition source chamber 31 is a box-shaped chamber capable of keeping the inside in a vacuum. The internal space 310 of the evaporation source chamber 31 can communicate with the internal space 210 of the transport chamber 21 through the communication opening 311 provided on the upper portion of the evaporation source chamber 31 . The internal space 310 is maintained in a vacuum atmosphere or an inert gas atmosphere such as nitrogen gas during operation, similarly to the internal space 210 .

The vapor deposition source 32 discharges a vapor deposition substance to form a film on the substrate conveyed by the conveyance unit 2 . For example, the vapor deposition source 32 includes a plurality of nozzles (not shown) arranged in line in the Y direction, and a vapor deposition substance is discharged from each nozzle. In addition, for example, the vapor deposition source 32 includes a storage part for storing the vapor deposition substance and a heater (both not shown) for heating the vapor deposition substance stored in the storage part. The vapor deposition substance stored in the storage unit is heated by the heater to vaporize, and the vapor deposition substance is released from the vapor deposition source 32 .

In addition, the evaporation source unit 3 may also include a baffle for shielding the evaporation source 32 when the evaporation source 32 is not in use or an evaporation rate monitor for monitoring the evaporation amount of the evaporation material of the evaporation source 32 (both not shown in the figure). ).

The anti-adhesion plate 6 prevents the vapor deposition substance discharged from the vapor deposition source 32 from adhering to the inner wall of the vapor deposition source chamber 31 or the transport chamber 21 , and the like. For example, the landing prevention plate 6 is supported by the deposition source chamber 31 . In this embodiment, the landing prevention plate 6 is arranged from the internal space 310 to the internal space 210 so as to cover the vapor deposition source 32 , and an opening is formed in the upper part. With such a structure, a part of the vapor deposition substance adheres to the substrate through the opening, while the remaining vapor deposition substance adheres to the deposition prevention plate 6 . In this way, the deposition prevention plate 6 prevents the deposition substance from adhering to the inner wall of the deposition source chamber 31 or the transfer chamber 21 , etc., while allowing the deposition substance to adhere to the substrate.

In addition, in the present embodiment, the landing prevention plate 6 is provided so as to be relatively movable up and down with respect to the vapor deposition source chamber 31 . More specifically, the anti-strike plate 6 includes an upper portion 61 and a lower portion 62 , and the upper portion 61 is configured such that the upper portion 61 can move up and down relative to the evaporation source chamber 31 . Thereby, when the vapor deposition source unit 3 is moved in the lateral direction by the moving unit 7 , the amount of lowering of the vapor deposition source unit 3 required to avoid interference between the transport unit 2 and the landing prevention plate 6 can be reduced.

In addition, an anti-impact plate may be provided in the transfer chamber 21 or the deposition source chamber 31 in addition to the anti-impact plate 6 . For example, an anti-collision plate may be provided on the top surface or the side surface of the interior of the transfer chamber 21 .

The moving unit 7 is a unit that moves the vapor deposition source unit 3 . In this embodiment, moving unit 7 is provided below vapor deposition source unit 3 , and moves vapor deposition source unit 3 vertically (Z direction) or laterally (Y direction) while supporting vapor deposition source unit 3 . The moving unit 7 includes a lateral moving part 71 and a lifting part 72 .

The lateral movement unit 71 moves the vapor deposition source unit 3 in the lateral direction (Y direction). In the present embodiment, the lateral movement unit 71 moves the vapor deposition source unit 3 in the width direction (Y direction) of the substrate intersecting with the conveyance direction (X direction) of the substrate. The lateral movement part 71 includes a guide part 711 provided on the ground and a driving part 712 for moving the evaporation source unit 3 along the guide part 711 . As the drive unit 712 , well-known techniques can be appropriately adopted, and for example, a drive wheel movable on a rail as the guide unit 711 may be rotated by a motor or the like.

The lift unit 72 lifts the vapor deposition source unit 3 up and down. In the present embodiment, the raising and lowering unit 72 raises and lowers the vapor deposition source unit 3 in the vertical direction (Z direction). The lift unit 72 includes a vapor deposition source unit support unit 721 that supports the vapor deposition source unit 3 , and a driving unit 722 that lifts the vapor deposition source unit support unit 721 up and down. A well-known technique can be used as the drive part 722, For example, you may raise and lower the vapor deposition source unit support part 721 by an electric cylinder etc. FIG.

In this embodiment, when performing maintenance on the transport unit 2, the moving unit 7 moves the vapor deposition source unit 3 laterally from a position below the transport unit 2 so that the operator can perform maintenance from the lower part of the transport chamber 21. The interior of the delivery chamber 21 is operated. At this time, the moving unit 7 moves the vapor deposition source unit 3 downward through the lifting portion 72 and then moves the vapor deposition source unit 3 laterally through the lateral movement portion 71 . This operation will be described later together with the description of the operation of the scaffold unit 4 described later ( FIG. 6 ).

In addition, in this embodiment, the moving unit 7 is respectively provided with respect to the some vapor deposition source unit 3. Therefore, the film forming apparatus 1 of the present embodiment can move the plurality of vapor deposition source units 3 independently. In addition, a plurality of moving units 7 may be synchronized to collectively move a plurality of vapor deposition source units 3 . In addition, it is also possible to provide moving units 7 with a smaller number than vapor deposition source units 3 , and to move a plurality of vapor deposition source units 3 with one moving unit 7 .

In addition, although description is omitted, the film forming apparatus 1 may include a control device or the like that controls the operations of the transport unit 2 , the vapor deposition source unit 3 , the moving unit 7 , and the like.

＜Structure of Scaffolding Unit＞

FIG. 4 is a perspective view showing the structure of the scaffold unit 4, showing a state in which the scaffold 41 is unfolded. In addition, FIG. 5 is a view of the scaffold unit 4 viewed from the front of the film forming apparatus 1, and shows a state in which the scaffold 41 is unfolded. The scaffolding unit 4 includes a scaffolding 41 , a lifting part 42 , a handrail part 43 , a connecting part 44 and a fixing part 45 . In addition, in FIG. 5 , the elevating portion 42 and the armrest portion 43 are omitted.

The scaffolding 41 is used for the maintenance of the conveyance unit 2, etc., and may also be called a step or a step. The scaffolding 41 includes a column portion 411 , a beam portion 412 and a floor portion 413 .

The column portion 411 supports the beam portion 412 . One column portion 411 includes two column members 4111 and a connecting portion 4112 that rotatably connects the two column members 4111 and contacts the ground. In this embodiment, a total of four column parts 411 are provided. In addition, the column member 4111 is rotatably connected to the beam member 4121 or the beam member 4122 of the beam part 412 at the end opposite to the end connected to the connection part 4112 .

The beam portion 412 supports the floor portion 413 . The beam portion 412 includes a beam member 4121 and a beam member 4122 having different lengths, and a connecting member 4123 connecting the beam members to each other. The beam portion 412 is composed of two parts separated in the X direction, and each part is provided so as to extend in the Y direction by being connected to each other by two beam members 4121 , two beam members 4122 , and three connection members 4123 . In addition, the connection member 4123 supports the beam members 4121 and 4122 in a rotatable manner. In this way, the beam portion 412 is provided so that a plurality of beam members can turn and, therefore, can be folded.

The floor portion 413 forms an area where an operator can move during maintenance of the transport unit 2 . The floor portion 413 is arranged at a predetermined height from the plane on which the film forming apparatus 1 is installed in order to facilitate the operator's handling of the transport unit 2 . The floor portion 413 includes a plurality of plate-shaped members 4131 to 4135 arranged side by side in the Y direction. Both ends of the plate-shaped members 4131 to 4135 in the X direction are supported by the beam member 4121, the beam member 4122, or the connection member 4123, respectively. Accordingly, the floor portion 413 is folded as the beam portion 412 is folded.

The elevating portion 42 is used for an operator to elevate relative to the floor portion 413 of the deployed scaffold 41 . In this embodiment, the ascending and descending unit 42 is a ladder. However, the ascending and descending part 42 may be a step, a step, or the like. In addition, the elevating unit 42 is supported by the beam unit 412 so as to be rotatable, for example.

The armrest portion 43 includes a plurality of armrests 431 to 433 erected with respect to the floor portion 413 of the deployed scaffold 41 . The armrest 431 is rotatably provided on the plate-shaped member 4131 , the armrest 432 is rotatably provided on the plate-shaped member 4133 , and the armrest 433 is rotatably provided on the plate-shaped member 4135 . When the scaffold 41 is folded, the armrests 431 to 433 are folded together with the floor portion 413 in a state of being laid down on the floor portion 413 .

In the present embodiment, the connecting portion 44 connects the beam portion 412 to the moving unit 7 , thereby connecting the scaffold 41 to the vapor deposition source unit 3 via the moving unit 7 . In addition, the connection part 44 may directly connect the scaffold 41 and the vapor deposition source unit 3 .

The fixing part 45 fixedly supports the scaffold 41 at a predetermined position. In this embodiment, the fixing part 45 supports the end part of the beam member 4121 provided farthest from the vapor deposition source unit 3 in the Y direction on the side away from the vapor deposition source unit 3 . The fixed portion 45 can be supported by a component that does not follow the movement of the vapor deposition source unit 3 , such as the frame portion 101 and the transport unit 2 . In addition, here, the fixed portion 45 itself is fixedly provided, but the fixed portion 45 may support the beam member 4121 so as to be rotatable or slidable.

In the present embodiment, the scaffold unit 4 is provided for each of the three vapor deposition source units 3 . That is, the film forming apparatus 1 includes three scaffold units 4 .

In addition, in the present embodiment, when performing maintenance in the transport chamber 21 of the transport unit 2 , the operator can move the vapor deposition source unit 3 in the lateral direction, and perform maintenance on the internal space 210 through the exposed communication opening 213 . operate. On the other hand, since the conveyance unit 2 is installed above the vapor deposition source unit 3 , an operator may not be able to maintain the conveyance unit 2 while standing on the ground. In such a case, if it takes time for the operator to prepare and remove the steps, etc., the work efficiency at the time of maintenance may decrease. Therefore, in this embodiment, as described below, as the vapor deposition source unit 3 moves in the lateral direction, a scaffold is deployed below the transport unit 2 .

＜Explanation of the operation of the scaffolding unit＞

FIG. 6 is a diagram illustrating the operation of the deposition source unit 3 and the scaffold unit 4 . In addition, FIG. 7(A) is a front view of the scaffold unit 4 before the deployment operation is viewed from the front of the film forming apparatus 1 , and shows the scaffold unit 4 in the state ST1 and the state ST2 of FIG. 6 . In addition, FIG. 7(B) is a view of the scaffold unit 4 in the unfolding operation viewed from the front of the film forming apparatus 1 , and shows the scaffold unit 4 in the state ST3 of FIG. 6 . In addition, in FIG.7(A) and FIG.7(B), the lifting part 42 and the armrest part 43 are abbreviate|omitted.

The state ST1 is a state in which the vapor deposition source unit 3 is located at the connection position POS1 connected to the transport unit 2 . The state ST1 is the state when the film formation apparatus 1 vapor-deposits the substrate. In the state ST1 , the vapor deposition source unit 3 is located below the transport unit 2 , and the lower part of the transport unit 2 is connected to the upper part of the vapor deposition source unit 3 .

State ST2 is a state in which vapor deposition source unit 3 has moved from connected position POS1 to disconnected position POS2 below it. The vapor deposition source unit 3 is moved from the connection position POS1 to the connection release position POS2 in the −Z direction by the lift unit 72 of the moving unit 7 .

In addition, in state ST1 or state ST2, the scaffold unit 4 is a folded state. In these states, the column member 4111, the beam member 4121, and the beam member 4122 are arranged to extend in the Z direction, and the connecting member 4123 is arranged to extend in the Y direction. In addition, the floor portion 413 is folded along the beam portion 412 . As a result, the scaffolding unit 4 is configured compactly in the Y direction as a whole.

State ST3 is a state in the middle of moving vapor deposition source unit 3 to the maintenance position. The scaffolding 41 of scaffolding unit 4 is by the state that one end is supported in the prescribed position by fixing part 45, and the other end part that is connected with connecting part 44 moves laterally along with the movement of vapor deposition source unit 3 (Fig. Center-right direction, -Y direction) to gradually unfold from the folded state.

The state ST4 is a state in which the lateral movement of the vapor deposition source unit 3 is completed. In state ST4 , vapor deposition source unit 3 is located at maintenance position POS3 where maintenance of transport unit 2 or vapor deposition source unit 3 is performed. In the state where the vapor deposition source unit 3 is located at the maintenance position POS3 , the scaffold 41 is in a state unfolded below the transport unit 2 .

FIG. 8 is a plan view schematically showing the positional relationship between the transport unit 2 and the scaffold unit 4 . In this embodiment, when the vapor deposition source unit 3 is located at the maintenance position POS3 (see the vapor deposition source unit 3 in the center of FIG. In other words, the deployed scaffolding 41 is disposed below the transport unit 2 and faces the communication opening 213 . Furthermore, when the deposition source unit 3 is located at the maintenance position POS3, the scaffolding 41 is disposed so as to overlap the communication opening 213 of the transport unit 2 in the vertical direction (Z direction) in plan view. The scaffolding 41 is disposed below the communicating opening 213, so that the operator can more easily operate the internal space 210 while stepping on the scaffolding. Alternatively, when vapor deposition source unit 3 is located at maintenance position POS3 , scaffolding 41 overlaps communication opening 213 in a plan view over the entire area of communication opening 213 in the Y direction. Accordingly, the operator can more easily operate substantially the entire interior space 210 .

As described above, according to the present embodiment, the scaffold unit 4 deploys the scaffold 41 below the transport unit 2 as the vapor deposition source unit 3 moves from the disconnection position POS2 to the maintenance position POS3 . Thereby, when carrying out the maintenance of the conveyance unit 2, it becomes easy to handle the conveyance unit 2, and since preparation and removal of a step etc. are unnecessary, the working efficiency at the time of maintenance can be improved.

<Second Embodiment>

FIG. 9 is a view of the scaffold unit 9 according to the second embodiment viewed from the front of the film forming apparatus 1 , and shows a state in which the scaffold 91 is unfolded. In 2nd Embodiment, the form of a beam part and a floor part differs from 1st Embodiment. Hereinafter, the same reference numerals are attached to the same structures as those of the first embodiment in some cases, and explanations thereof are omitted.

In this embodiment, the scaffold 91 includes a column portion 411 , a beam portion 912 , and a floor portion 913 . The beam portion 912 supporting the floor portion 913 includes a beam member 9121 , a beam member 9122 , and a connection member 9123 . Here, the beam member 9121 and the beam member 9122 are installed obliquely with respect to the Y direction which is the moving direction of the vapor deposition source unit 3 in the state where the scaffold 91 is deployed. More specifically, the extending direction of the beam member 9121 and the beam member 9122 includes a Y-direction component and a Z-direction component when viewed from the X direction.

With such a structure, at the maintenance position POS3, the axial directions of the beam member 9121 and the beam member 9122 are inclined relative to the moving direction of the evaporation source unit 3, and therefore, when the evaporation source unit 3 moves laterally, the beam member 9121 and the beam member 9121 Member 9122 is easy to rotate. Thus, according to the present embodiment, the deployed scaffold 91 can be easily folded.

In addition, in the present embodiment, the plate-shaped members 9131 to 9135 have a shape in which the floor surface of the floor portion 913 is substantially horizontal. Furthermore, the plate-shaped member 9131, the plate-shaped member 9133, and the plate-shaped member 9135 supported by the beam member 9121 or the beam member 9122 extended obliquely with respect to the Y direction are formed so that the surface of the floor which comprises the floor part 913 becomes a horizontal surface. At the same time, the plate-shaped member 9131 , the plate-shaped member 9133 , and the plate-shaped member 9135 are formed such that the surfaces supported by the beam member 9121 or the beam member 9122 are inclined surfaces corresponding to the extending direction of the beam member 9121 or the beam member 9122 . Thereby, the scaffold 91 can be easily folded, maintaining the ground of the scaffold 91 horizontally.

＜Other Embodiments＞

In the first embodiment, the handrail portion 43 is provided on the scaffold unit 4 , but a handrail may be provided on the lower portion of the transport unit 2 . FIG. 10 is a side view of a film forming apparatus 1 according to one embodiment. In this example, the armrest 931 is provided so that it extends downward from the rib 23 of the transport unit 2 . Such handrails 931 may also be provided in the lower part of the transport unit 2 over the Y direction.

In addition, the position, number of objects, etc. which provide an armrest can be changed suitably. For example, in the example of FIG. 4 , the armrest portion 43 is provided only on one side in the X direction with respect to the floor portion 413 , but may be provided on both sides in the X direction with respect to the floor portion 413 . Alternatively, when a plurality of scaffolds 41 are arranged side by side in the X direction, the armrests 43 may be provided only at both outer ends of the scaffolds 41 on the two outer sides in the X direction.

In addition, the connection part 44 may be provided so that the connection between the scaffolding 41 and the evaporation source unit 3 can be released. Accordingly, the scaffold 41 can be deployed only when the scaffold 41 is required.

In addition, the structure of the scaffold 41 is changed suitably. In the above-described embodiment, the two column members 4111 are connected by the connecting portion 4112 , but the column members 4111 may be independently grounded to the ground and support the beam portion 412 .

In addition, the film forming apparatus 1 may include a sensor for detecting a value related to the inclination of the vapor deposition source unit 3 . Furthermore, the film forming apparatus 1 may stop the lifting operation of the vapor deposition source unit 3 when the value related to the inclination of the vapor deposition source unit 3 detected by the sensor does not satisfy a predetermined condition, that is, stop the connection position POS1- Movement action between disconnected positions POS2.

For example, the sensor may be a sensor that directly detects the inclination of the deposition source unit 3 such as a pendulum type or a float type inclination sensor, or may be a sensor that indirectly detects the inclination such as an acceleration sensor. In addition, for example, the sensor may also detect a value (for example, a drive current value) related to the driving load of the driving parts 722 on both sides or the load of the evaporation source unit 3 applied to the evaporation source unit supporting parts 721 on both sides, etc. The value that the vapor deposition source unit 3 is tilted can be grasped.

Also, for example, the film forming apparatus 1 may stop the raising and lowering operation of the vapor deposition source unit 3 when the inclination of the vapor deposition source unit 3 detected by the sensor is equal to or greater than a threshold value. Alternatively, the film forming apparatus 1 may stop the vapor deposition source when the difference between the drive current values of the drive units 722 on both sides and the load applied to the vapor deposition source unit 3 on the vapor deposition source unit support portion 721 is equal to or greater than a threshold value. Lifting action of unit 3.

<Third Embodiment>

FIG. 11 is a front view schematically showing a film formation apparatus 13 according to a third embodiment. In addition, FIG. 12 is a plan view of the film forming apparatus 13 in FIG. 11 , showing a state where the central vapor deposition source unit 3 is located at the maintenance position POS3 . This embodiment differs from the first embodiment in that the film forming apparatus 13 includes the take-out unit 5 . Hereinafter, the same reference numerals are attached to the same structures as those of the first embodiment in some cases, and explanations thereof are omitted.

The take-out unit 5 takes out predetermined components from above the vapor deposition source unit 3 located at the maintenance position POS3. As a predetermined member, the vapor deposition source chamber 31 accommodated in the vapor deposition source chamber 31 of the vapor deposition source unit 3, the landing prevention plate 6, etc. are mentioned, for example. The take-out unit 5 is supported by the frame portion 101 so as to be movable above the deposition source unit 3 . The take-out unit 5 includes a holding unit 51 , a vertical movement unit 52 , and a horizontal movement unit 53 .

The holding unit 51 holds a predetermined member. For example, the holder 51 can hold a predetermined component by moving its front end portion in a predetermined direction such as the horizontal direction. Alternatively, a hook for hooking a steel wire for a sling may be provided on the holding portion 51, and a predetermined member may be held by hanging with the wire. In addition, the holding part 51 may be configured so as to be foldable so as to be able to cope with components having different sizes.

The vertical moving part 52 moves the holding part 51 in the vertical direction. A well-known technique can be suitably used as the vertical movement part 52, For example, the electric cylinder which has a ball screw mechanism, a pneumatic balance cylinder, etc. can also be used.

The horizontal moving part 53 moves the holding part 51 in the horizontal direction. Specifically, the horizontal moving part 53 moves the holding part 51 in the horizontal direction by moving the vertical moving part 52 in the horizontal direction. For example, the horizontal moving part 53 includes the X direction moving part 531 which moves the vertical moving part 52 in the X direction, and the Y direction moving part 532 which moves the vertical moving part 52 in the Y direction. In this embodiment, the Y direction moving part 532 moves the vertical moving part 52 in the Y direction, and the X direction moving part 531 moves the Y direction moving part 532 in the X direction. As the X-direction moving part 531 and the Y-direction moving part 532 , well-known techniques can be appropriately adopted, and for example, they may be configured to include a rack-and-pinion mechanism and an electric motor that rotates the gears. In addition, a pulley-type mechanism may be used, and at least one of the X direction and the Y direction may be moved by an operator using human power without a drive source.

For example, the take-out unit 5 takes out a predetermined component from the vapor deposition source unit 3 located at the maintenance position POS3, and then places the taken-out component on an unillustrated maintenance stand or the like. Thereby, compared with the case where the component which is a maintenance target is located in the vapor deposition source chamber 31, it becomes easy for an operator to perform maintenance.

In addition, a configuration in which a plurality of take-out units 5 are provided can also be adopted. In this case, when the vapor deposition source units 3 on both outer sides are pulled out to the maintenance position POS3, components can be taken out from the respective vapor deposition source units 3 at the same time. In addition, when a plurality of take-out units 5 are provided, for example, the rail portion of the X-direction moving unit 531 and the like may be shared.

<Fourth embodiment>

FIG. 13 is a front view schematically showing a film formation apparatus 14 according to a fourth embodiment. In this embodiment, the structure of a scaffold unit differs from 1st Embodiment. Hereinafter, the same reference numerals are attached to the same structures as those of the first embodiment in some cases, and explanations thereof are omitted. In addition, when a plurality of the same constituent elements are provided, the reference numerals of some constituent elements may be omitted in consideration of ease of viewing of the drawings.

FIG. 14 is a perspective view schematically showing the scaffold unit 8 . In addition, FIG. 15 is a figure which shows the structure of the scaffold unit 8, and is a figure which shows the several mounting part 82, the elevating part 84, and the surrounding structure. The scaffolding unit 8 includes a plurality of floor members 81 as a scaffold, a plurality of mounting parts 82 , a pair of rail members 83 , an elevating part 84 , and a connecting part 85 .

A plurality of floor members 81a to 81h (hereinafter collectively referred to as floor member 81) are arranged vertically in a state where deposition source unit 3 is located at connection position POS1 or connection release position POS2 (see FIGS. 13 and 15 ). In addition, the plurality of floor members 81 are arranged side by side in a state where the vapor deposition source unit 3 is located at the maintenance position POS3 (see FIG. 14 ).

Fig. 16 is a diagram showing the structure of the floor member 81, and is a perspective view of the floor member 81 viewed from the back side. The plurality of floor members 81 respectively include a top wall 811 , a side wall 812 , a positioning portion 813 , a positioning portion 814 and an extension portion 815 . The top wall 811 is a part that forms a scaffold for workers. The side wall 812 forms the X-direction side surface of the floor member 81 . The side wall 812 includes a wall portion 812a disposed inside in the X direction with respect to other portions. The positioning unit 813 performs positioning with respect to the plurality of loading units 82 . The positioning portion 814 performs positioning with respect to the pair of rail members 83 . In the present embodiment, the positioning portion 813 is a protrusion protruding inward in the X direction from the wall portion 812a, and the positioning portion 814 is a protrusion protruding outward in the X direction from the wall portion 812a.

The several mounting parts 82a-82h (hereinafter collectively referred to as the mounting part 82) are comprised so that several floor members 81a-81h can be respectively mounted. The plurality of placement portions 82 includes a plate member 821 on which the floor member 81 is placed, and a positioning portion 822 provided at a position corresponding to the positioning portion 813 of the floor member 81 (see FIG. 18 ). In the present embodiment, the positioning portion 822 is formed by forming a recess for accommodating the positioning portion 813 in a block provided on the plate member 821 . In the present embodiment, two positioning portions 822 are separately provided for each mounting portion 82 in the X direction so as to correspond to the position of the positioning portion 813 when the floor member 81 is mounted. In addition, a plurality of plate members 821 may be separately provided in the X direction for each mounting portion 82 , or may be constituted by one plate member 821 .

The pair of rail members 83 supports the plurality of floor members 81 arranged side by side. In the present embodiment, the pair of rail members 83 are supported by the rib 23 of the film forming apparatus 14 , the frame portion 101 , and the like via the connection portion 831 . Alternatively, the pair of rail members 83 may be directly supported by the rib 23 and the frame portion 101 , or may be supported by a support portion arranged on the ground, or the like. FIG. 17 is a perspective view showing the structure of the rail member 83 . The pair of rail members 83 is provided with a positioning portion 833 for positioning the floor member 81 . The positioning portion 833 is provided on each of the pair of rail members 83 at a predetermined interval. The positioning portion 833 is formed by forming a recess for accommodating the positioning portion 814 of the floor member 81 in a block provided on the rail member 83 . In addition, a rail-side rack 845 to be described later is provided on the lower side of the pair of rail members 83 .

Referring again to FIG. 15 . The raising and lowering unit 84 raises and lowers the plurality of loading units 82 . The lift unit 84 includes a support unit 841 , a gear 842 , a gear 843 , a gear 844 , a track side rack 845 , and a support unit side rack 846 . The support portion 841 extends in the vertical direction (vertical direction in this embodiment) and supports the plurality of mounting portions 82 .

The gear 842 rotates when the gear 842 a of the gear 842 meshes with the gear 845 a (see FIG. 18 ) of the track-side rack 845 when the deposition source unit 3 moves between the disconnection position POS2 and the maintenance position POS3 . That is, when the vapor deposition source unit 3 moves laterally, the gear 842 moves laterally relative to the rail-side rack 845 , so the gear 842 rotates.

Gear 843 transmits the rotation of gear 842 to gear 844 . In this embodiment, the gear 842 and the gear 843 constitute a sheave mechanism (Japanese: ゼネバ mechanism). That is, the rotation of the gear 842 is transmitted to the gear 843 when the protrusion 842 b provided on the gear 842 enters the groove 843 a of the gear 843 , otherwise, the rotation is not transmitted. Accordingly, the rotation of the gear 842 is intermittently transmitted to the gear 843 . In addition, the rotation of the gear 843 is transmitted to the gear 844 by meshing the teeth 843 b of the gear 844 with the teeth 844 a of the gear 844 . In other words, the rotation of the gear 842 is transmitted to the gear 844 via the gear 843 .

In addition, the gear 844 transmits the rotational driving force to the support portion side rack 846 by meshing the tooth portion 844 a thereof with the tooth portion 846 a of the support portion side rack 846 . The support portion side rack 846 converts the rotation of the gear 844 into linear motion. The support portion side rack 846 is moved in the lifting direction (vertical direction) by the rotation of the gear 844 , and the support portion 841 on which the support portion side rack 846 is provided moves up and down. Then, the plurality of mounting parts 82 supported by the support part 841 is raised and lowered.

The connection portion 85 is a connection portion of the scaffold unit 8 that is connected to the moving unit 7 . The scaffolding unit 8 is connected to the moving unit 7 through the connecting portion 85 , so that as the evaporation source unit 3 moves laterally, the plurality of mounting portions 82 and the like of the scaffolding unit 8 move laterally.

FIG. 18 is an operation explanatory diagram for explaining the transfer operation of the floor member 81 from the mounting portion 82 to the rail member 83 . In addition, the rail member 83 and the rail-side rack 845 arranged on the front side of the drawing in the X direction are indicated by dotted lines in consideration of easy viewing of the drawing.

In the present embodiment, the plurality of floor members 81 are arranged side by side in the vertical direction in a state where the vapor deposition source unit 3 is located at the connection position POS1 or the connection release position POS2. Moreover, the some floor member 81 is spread|deployed and arranged in the horizontal direction as the vapor deposition source unit 3 moves from connection release position POS2 to maintenance position POS3. Specifically, as the vapor deposition source unit 3 moves from the connection release position POS2 to the maintenance position POS3, the plurality of floor members 81 are sequentially handed over from the plurality of placement parts 82 to the pair of rail members 83, so that the plurality of floor members 81 Arranged horizontally. FIG. 18 is a diagram illustrating an operation when the floor member 81 a placed on the uppermost mounting portion 82 a among the plurality of mounting portions 82 is handed over to the pair of rail members 83 . However, the operation|movement when other loading parts 82b-82h hand over floor members 81b-81h to a pair of rail member 83 is also the same.

The state ST101 is a state in which the vapor deposition source unit 3 has moved a predetermined distance in the lateral direction after the floor member 81b has been handed over from the second mounting portion 82b from the top to the pair of rail members 83 . In the state ST101 , the plurality of mounting parts 82 move in the lateral direction with the movement of the vapor deposition source unit 3 due to the meshing of the tooth portion 842 a of the gear 842 and the tooth portion 845 a of the track side rack 845 . On the other hand, in the state ST101, the convex portion 842b has not entered the groove portion 843a, and therefore, the elevating portion 84 does not perform the elevating operation. That is, the loading unit 82 moves in the horizontal direction.

State ST102 is a state in which vapor deposition source unit 3 has moved a predetermined distance in the lateral direction relative to rail member 83 from state ST101 . In state ST102 , the plurality of mounting parts 82 move downward by the elevating part 84 while moving laterally with the movement of the vapor deposition source unit 3 . That is, since the convex part 842b enters the groove part 843a, the rotation of the gear 842 is transmitted to the support part side rack 846 via the gear 843 and the gear 844, and the mounting part 82 moves downward. For example, transmission of rotation of the gear 842 is performed intermittently so that the mounting portion 82 starts moving downward when the mounting portion 82 moves in the horizontal direction to the extent that the contact between the floor member 81b and the floor member 81a can be avoided.

The state ST103 is a state after the floor member 81a is delivered from the mounting part 82a to the pair of rail members 83 . In state ST103 , the plurality of mounting parts 82 moves in the lateral direction along with the movement of the vapor deposition source unit 3 . While transitioning from the state ST102 to the state ST103, the mounting portion 82a moves laterally and downward. Then, when the mounting surface of the mounting portion 82a on which the floor member 81a is placed moves downward from the upper side of the support surface of the floor member 81a of the pair of rail members 83, the floor member 81a is handed over to the rail member 83. That is, the mounting part 82a delivers the mounted floor member 81a to the rail member 83 when it moves from the upper side of the pair of rail member 83 to the lower side.

As described above, in the present embodiment, as the vapor deposition source unit 3 moves from the disconnection position POS2 to the maintenance position POS3 , the scaffolding is deployed below the transport unit 2 .

In addition, the scaffold unit 8 may have a lifter, such as a ladder, a step, and a step, which can be raised and lowered with respect to the floor member 81 which is a scaffold in an unfolded state.

The invention is not limited to the above-described embodiments, and various modifications and changes can be made within the scope of the gist of the invention.

Explanation of reference signs

1. Film forming device, 2. Delivery unit, 3. Evaporation source unit, 4. Scaffolding unit, 41. Scaffolding.

Claims (19)

1. A film forming apparatus includes:

a conveying unit that conveys a substrate; and

a film forming source unit including a film forming source movable between a 1 st position below the conveying unit and a 2 nd position displaced in a lateral direction with respect to the 1 st position,

the film forming apparatus is an in-line film forming apparatus for forming a film on a substrate while conveying the substrate, and is characterized in that,

the film forming apparatus includes a scaffold unit that expands a scaffold below the transport unit as the film forming source unit moves from the 1 st position to the 2 nd position.

2. The film forming apparatus according to claim 1, wherein,

the scaffolding unit comprises a foldable floor section as the scaffolding,

the folded floor portion expands as the film formation source unit moves from the 1 st position to the 2 nd position.

3. The film forming apparatus according to claim 2, wherein,

the scaffolding unit comprises:

a beam serving as the scaffold, which supports the floor portion; and

And a connection unit that connects the beam to the film formation source unit.

4. The film forming apparatus according to claim 3, wherein,

in a state where the scaffold is unfolded, the beam is disposed obliquely with respect to a moving direction of the film formation source unit.

5. The film forming apparatus according to any one of claims 1 to 4, wherein,

the scaffold unit includes a lifting portion for lifting an operator relative to the deployed scaffold.

6. The film forming apparatus according to any one of claims 1 to 4, wherein,

the scaffolding unit includes an armrest raised relative to the expanded scaffolding.

7. The film forming apparatus according to any one of claims 1 to 4, wherein,

and a handrail extending downward from a lower portion of the conveying unit.

8. The film forming apparatus according to any one of claims 1 to 4, wherein,

the film forming source units are arranged in a conveying direction of the substrate in a manner capable of moving independently,

the scaffold unit is provided with respect to the plurality of film formation source units, respectively.

9. The film forming apparatus according to any one of claims 1 to 4, wherein,

The transport unit includes a communication opening for communicating an inner space of the transport unit with an inner space of the film formation source unit,

the scaffold being deployed is arranged below the transport unit, opposite to the communication opening.

10. The film forming apparatus according to claim 1, wherein,

the scaffolding unit comprises a plurality of floor members,

the plurality of floor members arranged in the up-down direction at the 1 st position are arranged in a lateral direction as the film forming source unit moves from the 1 st position to the 2 nd position,

the film forming apparatus further includes a removing unit that removes a predetermined component from above the film forming source unit located at the 2 nd position.

11. The film forming apparatus according to claim 10, wherein,

the take-out unit includes:

a holding unit that holds the predetermined member;

a vertical movement unit that moves the holding unit in a vertical direction; and

and a horizontal moving section that moves the holding section in a horizontal direction.

12. The film forming apparatus according to claim 1, wherein,

the scaffolding unit comprises a plurality of floor members as the scaffolding,

The plurality of floor members may be arranged in a plurality of rows,

the film forming source units are arranged in the vertical direction in a state of being located at the 1 st position,

the film forming source units are developed to be arranged in the lateral direction as they move from the 1 st position to the 2 nd position.

13. The film forming apparatus according to claim 12, wherein,

the scaffolding unit comprises:

a plurality of placement units, which are arranged in a vertical direction and can place the plurality of floor members on each of the placement units; and

a pair of rail members for supporting the plurality of floor members arranged in a lateral direction,

the plurality of floor members are sequentially transferred from the plurality of mounting portions to the pair of rail members as the film forming source unit moves from the 1 st position to the 2 nd position, so that the plurality of floor members are arranged in a lateral direction.

14. The film forming apparatus according to claim 12, wherein,

the scaffolding unit comprises:

a plurality of placement units, which are arranged in a vertical direction and can place the plurality of floor members on each of the placement units;

a pair of rail members that support the plurality of floor members arranged in a lateral direction; and

A lifting part for lifting the plurality of carrying parts,

the plurality of mounting portions are moved downward by the lifting portion while being moved in a lateral direction together with the film forming source unit when the film forming source unit is moved from the 1 st position to the 2 nd position,

the plurality of placement portions transfer the plurality of floor members placed on the pair of rail members to the rail members, respectively, when the plurality of placement portions move from the upper side to the lower side of the pair of rail members.

15. The film forming apparatus according to claim 14, wherein,

the lifting part intermittently lowers the plurality of floor members when the film forming source unit moves from the 1 st position to the 2 nd position.

16. The film forming apparatus according to any one of claims 14 to 15, wherein,

the lifting part comprises:

a 1 st rack provided to the pair of rail members;

a 1 st gear that rotates in meshing engagement with the 1 st rack when the film formation source unit moves from the 1 st position to the 2 nd position;

a 2 nd gear to which rotation of the 1 st gear is transmitted;

a support portion extending in the lifting direction and supporting the plurality of placement portions; and

And a 2 nd rack provided to the support portion, the 2 nd rack being engaged with the support portion to move the support portion in a lifting direction.

17. The film forming apparatus according to claim 16, wherein,

the lifting part intermittently transmits the rotation of the 1 st gear to the 2 nd gear through a geneva gear.

18. The film forming apparatus according to any one of claims 13 to 15, wherein,

the plurality of floor members include a 1 st positioning portion for performing positioning with respect to the plurality of placement portions and a 2 nd positioning portion for performing positioning with respect to the pair of rail members, respectively.

19. A scaffold unit for a film forming apparatus, the film forming apparatus comprising:

a conveying unit that conveys a substrate; and

a film forming source unit including a film forming source that emits a film forming substance, movable between a 1 st position below the conveying unit and a 2 nd position displaced in a lateral direction with respect to the 1 st position,

the film forming apparatus is an in-line film forming apparatus for forming a film on a substrate while conveying the substrate,

it is characterized in that the method comprises the steps of,

and (2) expanding the scaffold below the conveying unit as the film forming source unit moves from the 1 st position to the 2 nd position.

Images