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JP4133489B2 - Substrate standby device and substrate processing apparatus having the same - Google Patents

Substrate standby device and substrate processing apparatus having the same Download PDF

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Publication number
JP4133489B2
JP4133489B2 JP2003081032A JP2003081032A JP4133489B2 JP 4133489 B2 JP4133489 B2 JP 4133489B2 JP 2003081032 A JP2003081032 A JP 2003081032A JP 2003081032 A JP2003081032 A JP 2003081032A JP 4133489 B2 JP4133489 B2 JP 4133489B2
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substrate
standby
transport
standby position
support
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JP2004288991A (en
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直之 長田
尚久 岡田
茂樹 南
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Screen Holdings Co Ltd
Dainippon Screen Manufacturing Co Ltd
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Screen Holdings Co Ltd
Dainippon Screen Manufacturing Co Ltd
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Priority to TW093106960A priority patent/TWI245738B/en
Priority to KR1020040018646A priority patent/KR100591567B1/en
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67745—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber characterized by movements or sequence of movements of transfer devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G2249/00—Aspects relating to conveying systems for the manufacture of fragile sheets

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  • Condensed Matter Physics & Semiconductors (AREA)
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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Description

【０００１】
【発明の属する技術分野】
本発明は、基板を一時的に待機させる基板待機装置およびそれを備えた基板処理装置に関する。
【０００２】
【従来の技術】
半導体ウエハ、液晶表示装置用ガラス基板、フォトマスク用ガラス基板、光ディスク用ガラス基板等の基板に種々の処理を行うために基板処理装置が用いられている。例えば、生産効率を高めるために、一連の処理の各々をユニット化し、複数の処理ユニットを統合した基板処理装置が用いられている。
【０００３】
この基板処理装置においては、各処理ユニット間の基板の受け渡しに一時的に基板を待機させる基板待機装置が設けられる（例えば、特許文献１および２参照）。
【０００４】
基板は、基板搬送装置によって基板処理装置内に供給される。この場合、基板処理装置内の基板待機装置は、基板を受け取り一時的に基板を待機させた後、基板を所定の処理工程へと移行させる。
【０００５】
【特許文献１】
特開平１０−１５４６５２号公報
【特許文献２】
特開平９−１９９４６０号公報
【０００６】
【発明が解決しようとする課題】
上記の場合、基板待機装置において基板を一時的に待機させる際に基板のたわみを低減することが望ましい。
【０００７】
本発明の目的は、基板を待機させる際に基板のたわみを低減することが可能な基板待機装置およびそれを備えた基板処理装置を提供することである。
【０００８】
【課題を解決するための手段および発明の効果】
第１の発明に係る基板待機装置は、基板を支持した状態で待機位置に進退可能でかつ進退方向に沿って並列に延びる棒状の複数の搬送用支持部を有する基板搬送手段と、基板を待機位置で待機させるための基板待機手段と、待機位置の下方に設けられ、基板を搬送する複数の搬送ローラと、複数の搬送ローラの下方に設けられ、基板を支持した状態で昇降させる基板昇降手段と、基板待機手段および基板昇降手段を制御する制御部とを備え、基板待機手段は、複数の搬送用支持部の進退経路の両側方にそれぞれ配置された第１の部材と、各第１の部材に対して待機位置に向かう方向に進退可能にそれぞれ設けられた第２の部材と、各第２の部材上にそれぞれ設けられ、基板の下面を支持可能な複数の待機用支持部とを含み、基板昇降手段は、複数の搬送ローラ間を貫通して上下に移動可能に設けられた複数の当接部材を含み、複数の待機用支持部は、複数の搬送用支持部の厚さよりも大きな高さを有し、第２の部材が待機位置に前進した状態で搬送用支持部が待機位置に進入した場合に、複数の待機用支持部のうち進行方向において最も内側の待機用支持部が複数の搬送用支持部のうち最も外側の搬送用支持部よりも内側に位置するように、複数の待機用支持部が各第２の部材上に設けられ、制御部は、第２の部材が待機位置に前進した状態で基板搬送手段の複数の搬送用支持部が基板の下面を支持して待機位置に進入し、基板を複数の待機用支持部上に載置して退出した後、複数の当接部材が複数の搬送ローラ間を貫通して上昇し、複数の当接部材の先端で基板の下面を支持し、第２の部材が待機位置から後退した後、複数の当接部材が基板の下面を支持した状態で複数の当接部材の先端が複数の搬送ローラよりも下方の位置まで下降することにより基板が複数の搬送ローラ上に載置されるように、基板待機手段および基板昇降手段を制御するものである。
【０００９】
本発明に係る基板待機装置においては、第２の部材が待機位置に前進した状態で基板搬送手段の複数の搬送用支持部が基板の下面を支持して待機位置に進入し、基板を複数の待機用支持部上に載置して退出した後、複数の当接部材が複数の搬送ローラ間を貫通して上昇し、複数の当接部材の先端で基板の下面を支持し、第２の部材が待機位置から後退した後、複数の当接部材が基板の下面を支持した状態で複数の当接部材の先端が複数の搬送ローラよりも下方の位置まで下降することにより基板が複数の搬送ローラ上に載置される。
【００１０】
この場合、複数の待機用支持部は、複数の搬送用支持部の厚さよりも大きな高さを有する。また、第２の部材が待機位置に前進した状態で搬送用支持部が待機位置に進入した場合に、複数の待機用支持部のうち進行方向において最も内側の待機用支持部が複数の搬送用支持部のうち最も外側の搬送用支持部よりも内側に位置するように、複数の待機用支持部が各第２の部材上に設けられる。したがって、基板を待機させる際に基板のたわみを低減することが可能となる。
【００１１】
第２の発明に係る基板待機装置は、基板を支持した状態で待機位置に進退可能でかつ進退方向に沿って並列に延びる棒状の複数の搬送用支持部を有する基板搬送手段と、基板を待機位置で待機させるための基板待機手段と、待機位置の下方に設けられ、基板を搬送する複数の搬送ローラと、複数の搬送ローラの下方に設けられ、基板を支持した状態で昇降させる基板昇降手段と、基板待機手段および基板昇降手段を制御する制御部とを備え、基板待機手段は、複数の搬送用支持部の進退経路の両側方にそれぞれ配置された第１の部材と、各第１の部材に対して待機位置に向かう方向に進退可能にそれぞれ設けられた第２の部材と、各第２の部材上にそれぞれ設けられ、基板の下面を支持可能な複数の待機用支持部とを含み、基板昇降手段は、複数の搬送ローラ間を貫通して上下に移動可能に設けられた複数の当接部材を含み、複数の待機用支持部は、複数の搬送用支持部の厚さよりも大きな高さを有し、第２の部材が待機位置に前進した状態で搬送用支持部が待機位置に進入した場合に、複数の待機用支持部のうち最も進行方向において最も内側の待機用支持部が複数の搬送用支持部のうち最も外側の搬送用支持部よりも内側に位置するように、複数の待機用支持部が各第２の部材上に設けられ、制御部は、基板が複数の搬送ローラ上に載置された状態で複数の当接部材が上昇して基板の下面に当接し、第２の部材が待機位置から後退した状態で、基板の下面を支持した複数の当接部材の先端が複数の待機用支持部よりも上昇した後、第２の部材が待機位置に前進し、複数の当接部材が下降することにより基板が待機用支持部上に支持されるように、基板待機手段および基板昇降手段を制御するものである。
【００１２】
本発明に係る基板待機装置においては、基板が複数の搬送ローラ上に載置された状態で複数の当接部材が上昇して基板の下面に当接し、第２の部材が待機位置から後退した状態で、基板の下面を支持した複数の当接部材の先端が複数の待機用支持部よりも上昇した後、第２の部材が待機位置に前進し、複数の当接部材が下降することにより基板が待機用支持部上に支持される。
【００１３】
この場合、複数の待機用支持部は、複数の搬送用支持部の厚さよりも大きな高さを有する。また、第２の部材が待機位置に前進した状態で搬送用支持部が待機位置に進入した場合に、複数の待機用支持部のうち最も進行方向において最も内側の待機用支持部が複数の搬送用支持部のうち最も外側の搬送用支持部よりも内側に位置するように、複数の待機用支持部が各第２の部材上に設けられる。したがって、基板を待機させる際に基板のたわみを低減することが可能となる。
【００１４】
第３の発明に係る基板待機装置は、基板を支持した状態で待機位置に進退可能な搬送用支持部を有する基板搬送手段と、基板を待機位置で待機させるための基板待機手段と、待機位置の下方に設けられ、基板を搬送する複数の搬送ローラと、複数の搬送ローラの下方に設けられ、基板を支持した状態で昇降させる基板昇降手段と、基板待機手段および基板昇降手段を制御する制御部とを備え、基板待機手段は、複数の搬送用支持部の進退経路の両側方にそれぞれ配置された第１の部材と、各第１の部材に対して待機位置に向かう方向に進退可能にそれぞれ設けられた第２の部材と、各第２の部材上にそれぞれ設けられ、基板の下面を支持可能な複数の待機用支持部とを含み、基板昇降手段は、複数の搬送ローラ間を貫通して上下に移動可能に設けられた複数の当接部材を含み、第２の部材が待機位置に前進した状態で搬送用支持部が待機位置にある場合に、搬送用支持部において第２の部材に対向する側辺の一部が複数の待機用支持部のうち進行方向において最も内側の待機用支持部よりも外側に位置するように、搬送用支持部が形成され、制御部は、第２の部材が待機位置に前進した状態で基板搬送手段の複数の搬送用支持部が基板の下面を支持して待機位置に進入し、基板を複数の待機用支持部上に載置して退出した後、複数の当接部材が複数の搬送ローラ間を貫通して上昇し、複数の当接部材の先端で基板の下面を支持し、第２の部材が待機位置から後退した後、複数の当接部材が基板の下面を支持した状態で複数の当接部材の先端が複数の搬送ローラよりも下方の位置まで下降することにより基板が複数の搬送ローラ上に載置されるように、基板待機手段および基板昇降手段を制御するものである。
【００１５】
本発明に係る基板待機装置においては、第２の部材が待機位置に前進した状態で基板搬送手段の複数の搬送用支持部が基板の下面を支持して待機位置に進入し、基板を複数の待機用支持部上に載置して退出した後、複数の当接部材が複数の搬送ローラ間を貫通して上昇し、複数の当接部材の先端で基板の下面を支持し、第２の部材が待機位置から後退した後、複数の当接部材が基板の下面を支持した状態で複数の当接部材の先端が複数の搬送ローラよりも下方の位置まで下降することにより基板が複数の搬送ローラ上に載置される。
【００１６】
この場合、第２の部材が待機位置に前進した状態で搬送用支持部が待機位置にある場合に、搬送用支持部において第２の部材に対向する側辺の一部が複数の待機用支持部のうち進行方向において最も内側の待機用支持部よりも外側に位置するように、搬送用支持部が形成される。したがって、基板を待機させる際に基板のたわみを低減することが可能となる。
【００１７】
第４の発明に係る基板待機装置は、基板を支持した状態で待機位置に進退可能な搬送用支持部を有する基板搬送手段と、基板を待機位置で待機させるための基板待機手段と、待機位置の下方に設けられ、基板を搬送する複数の搬送ローラと、複数の搬送ローラの下方に設けられ、基板を支持した状態で昇降させる基板昇降手段と、基板待機手段および基板昇降手段を制御する制御部とを備え、基板待機手段は、複数の搬送用支持部の進退経路の両側方にそれぞれ配置された第１の部材と、各第１の部材に対して待機位置に向かう方向に進退可能にそれぞれ設けられた第２の部材と、各第２の部材上にそれぞれ設けられ、基板の下面を支持可能な複数の待機用支持部とを含み、基板昇降手段は、複数の搬送ローラ間を貫通して上下に移動可能に設けられた複数の当接部材を含み、第２の部材が待機位置に前進した状態で搬送用支持部が待機位置にある場合に、搬送用支持部において第２の部材に対向する側辺の一部が複数の待機用支持部のうち進行方向において最も内側の待機用支持部よりも外側に位置するように、搬送用支持部が形成され、制御部は、基板が複数の搬送ローラ上に載置された状態で複数の当接部材が上昇して基板の下面に当接し、第２の部材が待機位置から後退した状態で、基板の下面を支持した複数の当接部材の先端が複数の待機用支持部よりも上昇した後、第２の部材が待機位置に前進し、複数の当接部材が下降することにより基板が待機用支持部上に支持されるように、基板待機手段および基板昇降手段を制御するものである。
【００１８】
本発明に係る基板待機装置においては、基板が複数の搬送ローラ上に載置された状態で複数の当接部材が上昇して基板の下面に当接し、第２の部材が待機位置から後退した状態で、基板の下面を支持した複数の当接部材の先端が複数の待機用支持部よりも上昇した後、第２の部材が待機位置に前進し、複数の当接部材が下降することにより基板が待機用支持部上に支持される。
【００１９】
この場合、第２の部材が待機位置に前進した状態で搬送用支持部が待機位置にある場合に、搬送用支持部において第２の部材に対向する側辺の一部が複数の待機用支持部のうち進行方向において最も内側の待機用支持部よりも外側に位置するように、搬送用支持部が形成される。したがって、基板を待機させる際に基板のたわみを低減することが可能となる。
【００２０】
第２の部材は、進行方向に並列に延びる複数のアームを有し、複数の当接部材は、複数のアーム間を昇降可能に設けられてもよい。
【００２１】
第５の発明に係る基板処理装置は、基板に処理を行うための処理ユニットと、第１〜第４のいずれかの発明に係る基板待機装置とを備え、基板待機装置の基板搬送手段により処理ユニットと基板待機装置との間で基板が搬送されるものである。
本発明に係る基板処理装置においては、第１〜第４のいずれかの発明に係る基板待機装置が用いられる。したがって、基板を待機させる際に基板のたわみを低減することが可能となる。
【００２２】
【発明の実施の形態】
（第１の実施の形態）
図１は本発明の一実施の形態に係る基板待機装置１００の概略的平面図であり、図２は図１の基板待機装置１００の概略的正面図である。以下、図１および図２を参照して基板待機装置１００の説明を行う。
【００２３】
ここで、互いに直交する３方向を第１の方向Ｘ、第２の方向Ｙおよび第３の方向Ｚとする。第３の方向Ｚは鉛直上向きを指示している。第１の方向Ｘおよび第２の方向Ｙは水平面を形成する。
【００２４】
また、基板とは、液晶表示用ガラス基板、ＰＤＰ（プラズマディスプレイパネル）用ガラス基板、フォトマスク用ガラス基板、光ディスク用基板、半導体ウエハ等をいう。
【００２５】
図１および図２に示すように、基板待機装置１００は、一対のアーム支持板１０１、一対のローラ支持板１０２、複数の搬送ローラ１０３、一対の基板待機アーム１１０、複数の基板支持部１２０および搬送ローラ駆動部１３０（図１０参照）を含む。
【００２６】
一対のアーム支持板１０１は、図２の底面部材１０５の両側に第２の方向Ｙに沿って垂直に取り付けられている。ローラ支持板１０２は、アーム支持板１０１の内側において第２の方向Ｙに沿って底面部材１０５に垂直に取り付けられている。
【００２７】
一対の基板待機アーム１１０は一対のアーム支持板１０１の上端部にそれぞれ取り付けられている。
【００２８】
一対の基板待機アーム１１０は、内方へ多段的に進退する複数の部材から構成される。また、各基板待機アーム１１０の上面には複数の基板支持ピン１１１が設けられている。それにより、複数の基板支持ピン１１１上に基板Ｗを載置することが可能である。基板待機アーム１１０の構造および動作の詳細は後述する。
【００２９】
複数の搬送ローラ１０３は、基板待機アーム１１０よりも下方に第１の方向Ｘからやや傾斜した方向に延びるように設けられており、両端部が一対のローラ支持板１０２のそれぞれに回転自在に取り付けられている。後述する搬送ローラ駆動部１３０の駆動により、各搬送ローラ１０３は一斉に同一方向に回転する。それにより、基板Ｗを搬送ローラ１０３上に支持しつつ第２の方向Ｙに搬送することができる。
【００３０】
各基板支持部１２０は、プッシャピン駆動部１２１、ピストンロッド１２２、プッシャピン支持部１２３および複数のプッシャピン１２４を備える。
【００３１】
ピストンロッド１２２は、プッシャピン駆動部１２１に第３の方向Ｚに伸縮可能に設けられている。プッシャピン支持部１２３は、第１の方向Ｘに延びるようにピストンロッド１２２の上端部に設けられている。各プッシャピン１２４は、プッシャピン支持部１２３上に第３の方向Ｚに延びるように取り付けられている。
【００３２】
各基板支持部１２０は、ピストンロッド１２２が上昇した状態でピストンロッド１２２、プッシャピン支持部１２３およびプッシャピン１２４が基板待機アーム１１０および搬送ローラ１０３に当たらないように配置されている。
【００３３】
ピストンロッド１２２が最も上昇した状態では、各プッシャピン１２４の先端は基板待機アーム１１０よりも上方に位置し、ピストンロッド１２２が最も下降した状態では、各プッシャピン１２４の先端は複数の搬送ローラ１０３よりも下方に位置する。
【００３４】
図１の搬送アーム２００は、基板待機装置１００に進退可能、上下動可能および第３の方向Ｚの周りで回転可能に設けられている。搬送アーム２００により、基板待機装置１００に基板Ｗが搬入される。搬送アーム２００は、保持部２０１および複数の棒状の支持部２０２により構成される。複数の支持部２０２は、互いに平行に保持部２０１に設けられている。搬送アーム２００は、支持部２０２上に基板Ｗを支持した状態で基板待機装置１００に進入し、図２に示す状態から下降することにより基板支持ピン１１１上に基板Ｗを搬入する。
【００３５】
図３は、図１の基板待機アーム１１０の模式的平面図であり、図４は、図３の基板待機アーム１１０の模式的正面図である。以下、図３および図４を参照して基板待機アーム１１０の構造および動作を説明する。
【００３６】
図３および図４に示すように、基板待機アーム１１０は、複数の基板支持ピン１１１、アーム部１１２，１１３，１１４およびアーム用シリンダ１１５，１１６を含む。
【００３７】
アーム用シリンダ１１５は、ピストン部１１５ａおよびシリンダ部１１５ｂを含む。アーム用シリンダ１１６は、ピストン部１１６ａおよびシリンダ部１１６ｂを含む。ピストン部１１５ａは、シリンダ部１１５ｂに第１の方向Ｘに沿って進退自在に設けられている。ピストン部１１６ａは、シリンダ部１１６ｂに第１の方向Ｘに沿って進退自在に設けられている。
【００３８】
アーム部１１４の上面には、アーム用シリンダ１１６が第１の方向Ｘに延びるように取り付けられている。アーム用シリンダ１１６のピストン部１１６ａの先端部は、アーム部１１３の下面に取り付けられている。それにより、ピストン部１１６ａとアーム部１１３とが一体となってアーム部１１４に対して相対的に進退する。
【００３９】
アーム部１１３の上面には、アーム用シリンダ１１５が第１の方向Ｘに延びるように取り付けられている。アーム用シリンダ１１５のピストン部１１５ａの先端部は、アーム部１１４の下面に取り付けられている。それにより、ピストン部１１５ａとアーム部１１２とが一体となってアーム部１１３に対して相対的に進退する。
【００４０】
アーム部１１２は、第２の方向Ｙに延びるフレーム１１７と第１の方向Ｘに延びる複数のアーム１１８とから構成される。アーム部１１２のアーム１１８の両端部の上面には、基板支持ピン１１１が第３の方向Ｚに延びるように設けられている。
【００４１】
次に、基板待機アーム１１０の動作について説明する。
図３（ａ）および図４（ａ）は、基板待機アーム１１０の動作前の状態を示す。
【００４２】
前進動作の場合には、制御部からの信号を受信することにより、図３（ｂ）および図４（ｂ）に示すように、ピストン部１１６ａが前進する。それに伴い、アーム部１１２，１１３がピストン部１１６ａと一体となってアーム部１１４に対して前進する。続いて、図３（ｃ）および図４（ｃ）に示すように、ピストン部１１５ａが前進する。それに伴い、アーム部１１２がピストン部１１５ａと一体となってアーム部１１３に対して前進する。
【００４３】
後退動作の場合には、制御部からの信号を受信することにより、ピストン部１１５ａが後退した後、ピストン部１１６ａが後退する。それにより、基板待機アーム１１０は図３（ａ）および図４（ａ）に示すように動作前の状態に戻る。
【００４４】
なお、本実施の形態においては、前進動作の場合にはピストン部１１６ａが前進してからピストン部１１５ａが前進し、後退動作の場合にはピストン部１１５ａが後退してからピストン部１１６ａが後退しているが、それに限られない。
【００４５】
例えば、前進動作の場合にはピストン部１１５ａが前進してからピストン部１１６ａが前進し、後退動作の場合にはピストン部１１６ａが後退してからピストン部１１５ａが後退してもよい。また、ピストン部１１５ａ，１１６ａが同時に前進退してもよい。
【００４６】
図５は、図１の基板待機装置１００の制御系の構成を示すブロック図である。制御部３００は、ＣＰＵ（中央演算処理装置）、半導体メモリ等からなる。図５に示すように、制御部３００は、アーム用シリンダ１１５，１１６、プッシャピン駆動部１２１、搬送ローラ駆動部１３０および搬送アーム駆動部２０３を制御する。搬送ローラ駆動部１３０は図１および図２の搬送ローラ１０３を回転駆動する。また、搬送アーム駆動部２０３は図１および図２の搬送アーム２００を駆動する。制御部３００は、以下に示す搬送アーム２００による基板Ｗの搬入から搬送ローラ１０３による基板Ｗの搬出までの動作を制御する。
【００４７】
図６〜図１０は、基板待機装置１００の動作を示す模式図である。以下、図１および図６〜図１０を参照して基板待機装置１００の基板受け入れ動作を説明する。
【００４８】
なお、図６〜図１０においては、図１の搬送ローラ１０３および基板支持部１２０は図示を省略している。
【００４９】
まず、図１に示すように、基板待機アーム１１０が前進する（図３（ｃ）および図４（ｃ）の状態）。次に、図６に示すように、基板Ｗを支持する搬送アーム２００が第２の方向Ｙに移動して基板待機装置１００に進入して停止する。
【００５０】
次いで、搬送アーム２００が、下降する。基板支持ピン１１１の高さは、支持部２０２の厚みよりも大きい。それにより、図７に示すように、複数の基板支持ピン１１１によって基板Ｗが支持されれば、基板Ｗは支持部２０２から離れる。このとき、複数の基板支持ピン１１１は、支持部２０２が基板を支える支点のうち最外方の支点の外方および内方を支持する。それにより、基板Ｗのたわみを防止することができる。
【００５１】
基板支持ピン１１１に基板Ｗが支持されると、搬送アーム２００の下降動作が停止する。その後、搬送アーム２００は、第２の方向Ｙと逆向きに後退する。この状態で基板Ｗは基板支持ピン１１１上で待機する。
【００５２】
その後、図８に示すように、ピストンロッド１２２が上昇し、基板Ｗが複数のプッシャピン１２４により支持される。それにより、基板Ｗは、基板支持ピン１１１から離れる。
【００５３】
次いで、図９に示すように、基板待機アーム１１０が後退する（図３（ａ）および図４（ａ）の状態）。この状態では、ピストンロッド１２２が下降しても基板Ｗと基板待機アーム１１０とが接触することはない。
【００５４】
次に、図１０に示すように、ピストンロッド１２２が下降し、基板Ｗが複数の搬送ローラ１０３によって支持される。それにより、基板Ｗは、ピストンロッド１２２から離れる。その後、基板Ｗは、搬送ローラ１０３により搬送される。
【００５５】
なお、複数の基板Ｗが順々に搬送アーム２００から基板待機装置１００に供給される場合には、一の基板Ｗが搬送ローラ１０３に渡された後に次の基板Ｗが搬送アーム２００から供給され、図６〜図１０の動作が繰り返される。
【００５６】
以上、図６〜図１０で説明したように、本実施の形態に係る基板待機装置１００は、搬送アーム２００により供給された基板を所定の処理工程に移行させることができる。
【００５７】
また、本実施の形態に係る基板待機装置１００は、基板待機アーム１１０が搬送アーム２００の進退経路の側方に進退可能に設けられているので、任意の形状の支持部２０２を有する搬送アーム２００に対して基板の受け渡しが可能である。
【００５８】
なお、本実施の形態においては、基板待機装置１００は、搬送アーム２００により供給された基板を所定の処理工程に移行させたが、それに限られない。例えば、搬送ローラ１０３により搬送された基板を基板支持部１２０が受け取り、基板支持部１２０の上昇後に基板待機アーム１１０が基板を受け取り、搬送アーム２００がその基板を受け取ってもよい。
【００５９】
本実施の形態においては、搬送アーム２００が基板搬送手段に相当し、支持部２０２が搬送用支持部に相当し、基板待機アーム１１０が基板待機手段に相当し、基板支持部１２０が基板昇降手段に相当し、制御部３００が制御手段に相当し、アーム部１１４が第１の部材に相当し、アーム部１１２，１１３が第２の部材に相当し、基板支持ピン１１１が待機用支持部に相当し、プッシャピン１２４が当接部材に相当し、プッシャピン駆動部１２１が駆動手段に相当し、搬送ローラ１０３が搬送ローラに相当する。
【００６０】
（第２の実施の形態）
図１１および図１２は、本発明の第２の実施の形態に係る基板待機装置１００ａの概略的平面図である。以下、図１１および図１２を参照して基板待機装置１００ａの説明を行う。
【００６１】
なお、図１１および図１２においては、図１の搬送ローラ１０３および基板支持部１２０の図示を省略している。
【００６２】
図１１および図１２の基板待機装置１００ａが図１の基板待機装置１００と異なる点は、基板待機アーム１１０ａのアーム部１１２ａの形状である。図１１および図１２に示すように、アーム部１１２ａは、第２の方向Ｙに延びるフレーム１１７ａと第１の方向Ｘに延びる２本のアーム１１８ａとから構成される。各アーム１１８ａは、フレーム１１７ａの両端部から第１の方向Ｘに延びるように設けられている。各アーム１１８ａの両端部の上面には、基板支持ピン１１１が第３の方向Ｚに延びるように設けられている。
【００６３】
ここで、搬送アーム２００ａの支持部２０２ａの形状が第２の方向Ｙに一対角線を有する略菱形である場合を考える。この場合、まず搬送アーム２００ａが第２の方向Ｙに移動して基板待機装置１００ａに進入して停止する。その後、図１２に示すように、基板待機アーム１１０ａが前進する。
【００６４】
続いて、搬送アーム２００ａが下降すると、基板Ｗは基板支持ピン１１１に支持され、支持部２０２ａから基板Ｗが離れる。基板支持ピン１１１と支持部２０２ａとが同一水平面内に位置するときには搬送アーム２００ａが進退すると支持部２０２ａの一部と基板支持ピン１１１とが接触するため、搬送アーム２００ａは基板待機アーム１００ａよりも下方に下降する。その後、搬送アーム２００ａは第２の方向Ｙと逆向きに後退する。それにより、搬送アーム２００ａから基板待機装置１００ａへの基板Ｗの受け渡しが完了する。
【００６５】
このとき、基板支持ピン１１１は、支持部２０２ａが基板を支える支点のうち最外方の支点の外方および内方を支持する。それにより、基板Ｗのたわみを防止することができる。
【００６６】
以上、図１１および図１２で説明したように、本実施の形態に係る基板待機装置１００ａは、基板待機アーム１１０ａが搬送アーム２００ａの進退経路の側方に進退可能に設けられているので、任意の形状の支持部２０２ａを有する搬送アーム２００ａに対して基板の受け渡しが可能である。
【００６７】
本実施の形態においては、基板待機アーム１１０ａが基板待機手段に相当し、アーム部１１２ａ，１１３が第２の部材に相当する。
【００６８】
（第３の実施の形態）
図１３および図１４は、本発明の第３の実施の形態に係る基板待機装置１００ｂの概略的平面図である。以下、図１３および図１４を参照して基板待機装置１００ｂの説明を行う。
【００６９】
なお、図１３および図１４においては、図１の搬送ローラ１０３および基板支持部１２０の図示を省略いる。
【００７０】
図１３および図１４の基板待機装置１００ｂが図１の基板待機装置１００と異なる点は、基板待機アーム１１０ｂのアーム部１１２ｂの形状である。図１３および図１４に示すように、アーム部１１２ｂは、第２の方向Ｙに延びるフレーム１１７ｂと第１の方向Ｘに延びる３本のアーム１１８ｂとから構成される。各アーム１１８ｂは、フレーム１１７ｂの両端部および中央部から第１の方向Ｘに延びるように設けられている。各アーム１１８ｂの両端部の上面には、基板支持ピン１１１が第３の方向Ｚに延びるように設けられている。
【００７１】
ここで、搬送アーム２００ｂの支持部２０２ｂの形状が略８字状である場合を考える。この場合、まず搬送アーム２００ｂが第２の方向Ｙに移動して基板待機装置１００ｂに進入する。その後、図１４に示すように、基板待機アーム１１０ｂが前進する。
【００７２】
続いて、搬送アーム２００ｂが下降すると、基板Ｗは基板支持ピン１１１に支持され、支持部２０２ｂから基板Ｗが離れる。基板支持ピン１１１と支持部２０２ｂとが同一水平面内に位置するときには搬送アーム２００ｂが進退すると支持部２０２ｂの一部と基板支持ピン１１１とが接触するため、搬送アーム２００ｂは基板待機アーム１００ｂよりも下方に下降する。その後、搬送アーム２００ｂは第２の方向Ｙと逆向きに後退する。それにより、搬送アーム２００ｂから基板待機装置１００ｂへの基板Ｗの受け渡しが完了する。
【００７３】
このとき、基板支持ピン１１１は、支持部２０２ａが基板を支える支点のうち最外方の支点の外方および内方を支持する。それにより、基板Ｗのたわみを防止することができる。
【００７４】
以上、図１３および図１４で説明したように、本実施の形態に係る基板待機装置１００ｂは、基板待機アーム１１０ｂが搬送アーム２００ｂの進退経路の側方に進退可能に設けられているので、任意の形状の支持部２０２ｂを有する搬送アーム２００ｂに対して基板の受け渡しが可能である。
【００７５】
本実施の形態においては、搬送アーム２００ａが基板搬送手段に相当し、支持部２０２ａが搬送用支持部に相当し、基板待機アーム１１０ｂが基板待機手段に相当し、アーム部１１２ｂ，１１３が第２の部材に相当する。
【図面の簡単な説明】
【図１】本発明の一実施の形態に係る基板待機装置の概略的平面図である。
【図２】図１の基板待機装置の概略的正面図である。
【図３】図１の基板待機アームの模式的平面図である。
【図４】図３の基板待機アームの模式的正面図である。
【図５】図１の基板待機装置の制御系の構成を示すブロック図である。
【図６】基板待機装置の動作を示す模式図である。
【図７】基板待機装置の動作を示す模式図である。
【図８】基板待機装置の動作を示す模式図である。
【図９】基板待機装置の動作を示す模式図である。
【図１０】基板待機装置の動作を示す模式図である。
【図１１】本発明の第２の実施の形態に係る基板待機装置の概略的平面図である。
【図１２】本発明の第２の実施の形態に係る基板待機装置の概略的平面図である。
【図１３】本発明の第３の実施の形態に係る基板待機装置の概略的平面図である。
【図１４】本発明の第３の実施の形態に係る基板待機装置の概略的平面図である。
【符号の説明】
１００ 基板待機装置
１０１ アーム支持板
１０２ ローラ支持板
１０３ 搬送ローラ
１１０ 基板待機アーム
１１１ 基板支持ピン
１１２，１１３，１１４ アーム部
１１５，１１６ アーム用シリンダ
１２０ 基板支持部
１２１ プッシャピン駆動部
１２２ ピストンロッド
１２３ プッシャピン支持部
１２４ プッシャピン
１３０ 搬送ローラ駆動部
２００ 搬送アーム
２０１ 保持部
２０２ 支持部
２０３ 搬送アーム駆動部
３００ 制御部
Ｗ 基板[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a substrate standby device for temporarily waiting a substrate and a substrate processing apparatus including the same.
[0002]
[Prior art]
Substrate processing apparatuses are used to perform various processes on substrates such as semiconductor wafers, glass substrates for liquid crystal display devices, glass substrates for photomasks, and glass substrates for optical disks. For example, in order to increase production efficiency, a substrate processing apparatus is used in which each of a series of processes is unitized and a plurality of processing units are integrated.
[0003]
In this substrate processing apparatus, there is provided a substrate standby apparatus that temporarily waits for a substrate to be transferred between the processing units (see, for example, Patent Documents 1 and 2).
[0004]
The substrate is supplied into the substrate processing apparatus by the substrate transfer apparatus. In this case, the substrate standby device in the substrate processing apparatus receives the substrate, temporarily waits for the substrate, and then shifts the substrate to a predetermined processing step.
[0005]
[Patent Document 1]
Japanese Patent Laid-Open No. 10-154652
[Patent Document 2]
JP-A-9-199460
[0006]
[Problems to be solved by the invention]
In the above case, it is desirable to reduce the deflection of the substrate when the substrate is temporarily waiting in the substrate standby apparatus.
[0007]
  The purpose of the present invention is toReduces board deflection when placing the board on standbyIt is an object of the present invention to provide a possible substrate standby apparatus and a substrate processing apparatus including the same.
[0008]
[Means for Solving the Problems and Effects of the Invention]
  FirstThe substrate standby apparatus according to the inventionSubstrate transport means having a plurality of rod-shaped support portions that can be moved back and forth to the standby position in a supported state and extend in parallel along the forward and backward direction, substrate standby means for waiting the substrate at the standby position, and standby position And a plurality of transport rollers for transporting the substrate, a substrate lifting and lowering means provided below the plurality of transport rollers and supporting the substrate, and a control for controlling the substrate standby means and the substrate lifting and lowering means. The board standby means is capable of advancing and retreating in a direction toward the standby position with respect to each first member, and a first member disposed on each side of the advancing / retreating path of the plurality of transport support parts. A second member provided on each second member, and a plurality of standby support portions provided on each second member and capable of supporting the lower surface of the substrate, wherein the substrate lifting means penetrates between the plurality of transport rollers. Then move up and down A plurality of standby support portions having a height greater than the thickness of the plurality of transport support portions, and the second member is advanced to the standby position. When the transport support portion enters the standby position, the innermost standby support portion in the advancing direction among the plurality of standby support portions is inside the outermost transport support portion among the plurality of transport support portions. A plurality of standby support portions are provided on each second member so that the plurality of transfer support portions of the substrate transfer means are in a state where the second member has advanced to the standby position. After supporting the lower surface of the substrate and entering the standby position, placing the substrate on the plurality of standby support portions and then exiting, the plurality of contact members ascend between the plurality of transport rollers, and The lower surface of the substrate is supported by the tip of the abutting member, and after the second member retracts from the standby position, With the contact member supporting the lower surface of the substrate, the tips of the plurality of contact members descend to a position below the plurality of transport rollers so that the substrate is placed on the plurality of transport rollers. Control the substrate standby means and the substrate lifting meansIs.
[0009]
  In the substrate standby apparatus according to the present invention,With the second member moving forward to the standby position, the plurality of transfer support portions of the substrate transfer means support the lower surface of the substrate and enter the standby position, and place the substrate on the plurality of standby support portions. After retreating, the plurality of contact members pass through the plurality of transport rollers and rise, support the lower surface of the substrate with the tips of the plurality of contact members, and the second member retracts from the standby position, With the abutting members supporting the lower surface of the substrate, the tips of the abutting members descend to positions below the plurality of conveying rollers, whereby the substrate is placed on the plurality of conveying rollers.
[0010]
  In this case, the plurality of standby support portions have a height greater than the thickness of the plurality of transport support portions. In addition, when the transport support portion enters the standby position while the second member is advanced to the standby position, the innermost standby support portion in the traveling direction is the plurality of transport support portions among the plurality of standby support portions. A plurality of standby support portions are provided on each second member so as to be located inside the outermost conveyance support portion of the support portions. Therefore, it is possible to reduce the deflection of the substrate when the substrate is put on standby.
[0011]
  According to a second aspect of the present invention, there is provided a substrate standby apparatus, comprising: a substrate transfer means having a plurality of rod-shaped transfer support portions that are capable of advancing and retreating to a standby position in a state of supporting a substrate and extending in parallel along the advance and retreat direction; Substrate standby means for waiting at a position, a plurality of transport rollers provided below the standby position for transporting the substrate, and a substrate lift means provided below the plurality of transport rollers for moving up and down while supporting the substrate And a control unit for controlling the substrate standby means and the substrate lifting / lowering means, wherein the substrate standby means includes a first member disposed on each side of the advancing / retreating path of the plurality of transfer support portions, and each first A second member provided so as to be able to advance and retreat in a direction toward the standby position with respect to the member, and a plurality of standby support portions provided on each second member and capable of supporting the lower surface of the substrate. The substrate lifting / lowering means Including a plurality of abutting members provided so as to be movable vertically through the plurality of conveying rollers, and the plurality of standby support portions have a height greater than the thickness of the plurality of conveyance support portions, When the transport support portion enters the standby position while the second member is advanced to the standby position, the innermost standby support portion in the advancing direction among the plurality of standby support portions is the plurality of transport supports. The plurality of standby support portions are provided on each second member so as to be located inside the outermost transport support portion of the sections, and the control unit places the substrate on the plurality of transport rollers. In this state, the plurality of contact members rise and contact the lower surface of the substrate, and the second member retracts from the standby position, and the tips of the plurality of contact members that support the lower surface of the substrate are in the standby state. The second member moves forward to the standby position after rising from the supporting portion, and a plurality of contact portions So it substrate is supported on a stand supporting portion by descending, and controls the substrate standby unit and the substrate elevating means.
[0012]
  In the substrate standby apparatus according to the present invention, the plurality of contact members are lifted and contact the lower surface of the substrate while the substrate is placed on the plurality of transport rollers, and the second member is retracted from the standby position. In this state, after the tips of the plurality of contact members supporting the lower surface of the substrate rise above the plurality of standby support portions, the second member advances to the standby position, and the plurality of contact members descend. The substrate is supported on the standby support.
[0013]
  In this case, the plurality of standby support portions have a height greater than the thickness of the plurality of transport support portions. In addition, when the transport support portion enters the standby position while the second member has advanced to the standby position, the innermost standby support portion in the advancing direction among the plurality of standby support portions has a plurality of transports. A plurality of standby support portions are provided on each second member so as to be located inside the outermost transport support portion of the support portions. Therefore, it is possible to reduce the deflection of the substrate when the substrate is put on standby.
[0014]
  According to a third aspect of the present invention, there is provided a substrate standby apparatus including a substrate transfer means having a transfer support portion capable of advancing and retracting to a standby position while supporting a substrate, a substrate standby means for waiting the substrate at the standby position, and a standby position And a plurality of transport rollers for transporting the substrate, a substrate lifting and lowering means provided below the plurality of transport rollers and supporting the substrate, and a control for controlling the substrate standby means and the substrate lifting and lowering means. The board standby means is capable of advancing and retreating in a direction toward the standby position with respect to each first member, and a first member disposed on each side of the advancing / retreating path of the plurality of transport support parts. A second member provided on each second member, and a plurality of standby support portions provided on each second member and capable of supporting the lower surface of the substrate, wherein the substrate lifting means penetrates between the plurality of transport rollers. And move up and down Including a plurality of contact members, and when the transport support is in the standby position with the second member advanced to the standby position, the side of the transport support that faces the second member The transport support portion is formed such that a part of the plurality of standby support portions is positioned outside the innermost standby support portion in the advancing direction, and the control unit has the second member at the standby position. The plurality of transfer support portions of the substrate transfer means support the lower surface of the substrate in the advanced state, enter the standby position, place the substrate on the plurality of standby support portions, exit, and then contact the plurality of contacts. The member ascends between the plurality of transport rollers, supports the lower surface of the substrate with the tips of the plurality of contact members, and after the second member retracts from the standby position, the plurality of contact members move to the lower surface of the substrate. The tips of the multiple contact members are in a position below the multiple transport rollers while supporting As the substrate is placed on a plurality of conveying rollers by later, and controls the substrate standby unit and the substrate elevating means.
[0015]
  In the substrate standby apparatus according to the present invention, the plurality of transfer support portions of the substrate transfer means enter the standby position while supporting the lower surface of the substrate in a state where the second member has advanced to the standby position. After placing on the standby support portion and withdrawing, the plurality of contact members pass through the plurality of transport rollers and rise, support the lower surface of the substrate with the tips of the plurality of contact members, and the second After the members are retracted from the standby position, the plurality of contact members support the lower surface of the substrate, and the tips of the plurality of contact members descend to a position below the plurality of transfer rollers, whereby the substrate is transferred to the plurality of positions. It is mounted on a roller.
[0016]
  In this case, when the transport support unit is in the standby position with the second member advanced to the standby position, a part of the side facing the second member in the transport support unit has a plurality of standby supports. The conveyance support portion is formed so as to be located outside the innermost standby support portion in the traveling direction among the portions. Therefore, it is possible to reduce the deflection of the substrate when the substrate is put on standby.
[0017]
  According to a fourth aspect of the present invention, there is provided a substrate standby apparatus including a substrate transfer unit having a transfer support portion capable of moving back and forth to a standby position while supporting a substrate, a substrate standby unit for waiting the substrate at the standby position, and a standby position. And a plurality of transport rollers for transporting the substrate, a substrate lifting and lowering means provided below the plurality of transport rollers and supporting the substrate, and a control for controlling the substrate standby means and the substrate lifting and lowering means. The board standby means is capable of advancing and retreating in a direction toward the standby position with respect to each first member, and a first member disposed on each side of the advancing / retreating path of the plurality of transport support parts. A second member provided on each second member, and a plurality of standby support portions provided on each second member and capable of supporting the lower surface of the substrate, wherein the substrate lifting means penetrates between the plurality of transport rollers. And move up and down Including a plurality of contact members, and when the transport support is in the standby position with the second member advanced to the standby position, the side of the transport support that faces the second member A transport support portion is formed such that a part of the plurality of standby support portions is positioned outside the innermost standby support portion in the advancing direction, and the control unit is configured such that the substrate is placed on the plurality of transport rollers. The plurality of contact members rise and contact the lower surface of the substrate while being placed, and the tips of the plurality of contact members that support the lower surface of the substrate are in a state where the second member is retracted from the standby position. The substrate standby means and the second member are advanced to the standby position and the plurality of contact members are lowered so that the substrate is supported on the standby support portion. The substrate lifting / lowering means is controlled.
[0018]
  In the substrate standby apparatus according to the present invention, the plurality of contact members are lifted and contact the lower surface of the substrate while the substrate is placed on the plurality of transport rollers, and the second member is retracted from the standby position. In this state, after the tips of the plurality of contact members supporting the lower surface of the substrate rise above the plurality of standby support portions, the second member advances to the standby position, and the plurality of contact members descend. The substrate is supported on the standby support.
[0019]
In this case, when the transport support unit is in the standby position with the second member advanced to the standby position, a part of the side facing the second member in the transport support unit has a plurality of standby supports. The conveyance support portion is formed so as to be located outside the innermost standby support portion in the traveling direction among the portions. Therefore, it is possible to reduce the deflection of the substrate when the substrate is put on standby.
[0020]
  The second member may include a plurality of arms extending in parallel in the traveling direction, and the plurality of contact members may be provided so as to be movable up and down between the plurality of arms.
[0021]
  A substrate processing apparatus according to a fifth aspect of the present invention includes a processing unit for processing a substrate and the substrate standby apparatus according to any one of the first to fourth aspects of the invention, and is processed by the substrate transfer means of the substrate standby apparatus. A board | substrate is conveyed between a unit and a board | substrate standby apparatus.
In the substrate processing apparatus according to the present invention, the substrate standby apparatus according to any one of the first to fourth inventions is used. Therefore, it is possible to reduce the deflection of the substrate when the substrate is put on standby.
[0022]
DETAILED DESCRIPTION OF THE INVENTION
(First embodiment)
FIG. 1 is a schematic plan view of a substrate standby apparatus 100 according to an embodiment of the present invention, and FIG. 2 is a schematic front view of the substrate standby apparatus 100 of FIG. Hereinafter, the substrate standby apparatus 100 will be described with reference to FIGS. 1 and 2.
[0023]
Here, the three directions orthogonal to each other are defined as a first direction X, a second direction Y, and a third direction Z. The third direction Z indicates a vertically upward direction. The first direction X and the second direction Y form a horizontal plane.
[0024]
The substrate refers to a glass substrate for liquid crystal display, a glass substrate for PDP (plasma display panel), a glass substrate for photomask, a substrate for optical disk, a semiconductor wafer, and the like.
[0025]
As shown in FIGS. 1 and 2, the substrate standby device 100 includes a pair of arm support plates 101, a pair of roller support plates 102, a plurality of transport rollers 103, a pair of substrate standby arms 110, a plurality of substrate support portions 120, and A conveyance roller driving unit 130 (see FIG. 10) is included.
[0026]
The pair of arm support plates 101 are vertically attached along the second direction Y on both sides of the bottom member 105 of FIG. The roller support plate 102 is vertically attached to the bottom surface member 105 along the second direction Y inside the arm support plate 101.
[0027]
The pair of substrate standby arms 110 are respectively attached to the upper ends of the pair of arm support plates 101.
[0028]
The pair of substrate standby arms 110 is composed of a plurality of members that advance and retract in a multistage manner. A plurality of substrate support pins 111 are provided on the upper surface of each substrate standby arm 110. As a result, the substrate W can be placed on the plurality of substrate support pins 111. Details of the structure and operation of the substrate standby arm 110 will be described later.
[0029]
The plurality of transport rollers 103 are provided below the substrate standby arm 110 so as to extend in a direction slightly inclined from the first direction X, and both ends thereof are rotatably attached to the pair of roller support plates 102, respectively. It has been. The conveyance rollers 103 rotate in the same direction all at once by driving a conveyance roller driving unit 130 described later. Thus, the substrate W can be transported in the second direction Y while being supported on the transport roller 103.
[0030]
Each substrate support unit 120 includes a pusher pin drive unit 121, a piston rod 122, a pusher pin support unit 123, and a plurality of pusher pins 124.
[0031]
The piston rod 122 is provided in the pusher pin drive unit 121 so as to be extendable and contractible in the third direction Z. The pusher pin support portion 123 is provided at the upper end portion of the piston rod 122 so as to extend in the first direction X. Each pusher pin 124 is attached on the pusher pin support portion 123 so as to extend in the third direction Z.
[0032]
Each substrate support 120 is arranged so that the piston rod 122, pusher pin support 123, and pusher pin 124 do not hit the substrate standby arm 110 and the transport roller 103 in a state where the piston rod 122 is raised.
[0033]
When the piston rod 122 is in the highest position, the tip of each pusher pin 124 is positioned above the substrate standby arm 110, and when the piston rod 122 is in the lowest position, the tip of each pusher pin 124 is higher than the plurality of transport rollers 103. Located below.
[0034]
The transfer arm 200 of FIG. 1 is provided so as to be able to advance and retreat, to move up and down, and to rotate around the third direction Z with respect to the substrate standby device 100. The substrate W is carried into the substrate standby device 100 by the transfer arm 200. The transfer arm 200 includes a holding unit 201 and a plurality of rod-shaped support units 202. The plurality of support portions 202 are provided in the holding portion 201 in parallel with each other. The transfer arm 200 enters the substrate standby device 100 while supporting the substrate W on the support unit 202, and carries the substrate W onto the substrate support pins 111 by descending from the state shown in FIG.
[0035]
FIG. 3 is a schematic plan view of the substrate standby arm 110 of FIG. 1, and FIG. 4 is a schematic front view of the substrate standby arm 110 of FIG. Hereinafter, the structure and operation of the substrate standby arm 110 will be described with reference to FIGS.
[0036]
As shown in FIGS. 3 and 4, the substrate standby arm 110 includes a plurality of substrate support pins 111, arm portions 112, 113, 114, and arm cylinders 115, 116.
[0037]
Arm cylinder 115 includes a piston portion 115a and a cylinder portion 115b. The arm cylinder 116 includes a piston portion 116a and a cylinder portion 116b. The piston part 115a is provided in the cylinder part 115b so as to be able to advance and retract along the first direction X. The piston part 116a is provided in the cylinder part 116b so that it can advance and retreat along the first direction X.
[0038]
An arm cylinder 116 is attached to the upper surface of the arm portion 114 so as to extend in the first direction X. The tip of the piston portion 116 a of the arm cylinder 116 is attached to the lower surface of the arm portion 113. As a result, the piston part 116a and the arm part 113 are integrally moved forward and backward relative to the arm part 114.
[0039]
An arm cylinder 115 is attached to the upper surface of the arm portion 113 so as to extend in the first direction X. The tip of the piston portion 115 a of the arm cylinder 115 is attached to the lower surface of the arm portion 114. As a result, the piston portion 115a and the arm portion 112 are integrally moved forward and backward relative to the arm portion 113.
[0040]
The arm portion 112 includes a frame 117 extending in the second direction Y and a plurality of arms 118 extending in the first direction X. Substrate support pins 111 are provided on the upper surfaces of both ends of the arm 118 of the arm portion 112 so as to extend in the third direction Z.
[0041]
Next, the operation of the substrate standby arm 110 will be described.
3A and 4A show a state before the operation of the substrate standby arm 110. FIG.
[0042]
In the case of the forward movement, as shown in FIGS. 3B and 4B, the piston part 116a moves forward by receiving a signal from the control unit. Accordingly, the arm portions 112 and 113 are moved forward with respect to the arm portion 114 together with the piston portion 116a. Subsequently, as shown in FIGS. 3C and 4C, the piston portion 115a moves forward. Accordingly, the arm part 112 moves forward relative to the arm part 113 together with the piston part 115a.
[0043]
In the case of the backward movement, the piston part 116a moves backward after the piston part 115a moves backward by receiving a signal from the control unit. Thereby, the substrate standby arm 110 returns to the state before the operation as shown in FIGS. 3 (a) and 4 (a).
[0044]
In the present embodiment, in the forward operation, the piston portion 116a moves forward after the piston portion 116a moves forward, and in the reverse operation, the piston portion 116a moves backward after the piston portion 115a moves backward. It is not limited to that.
[0045]
For example, in the case of forward movement, the piston part 115a may move forward and then the piston part 116a may move forward. In the case of backward movement, the piston part 116a may move backward and then the piston part 115a may move backward. Moreover, piston part 115a, 116a may advance and retreat simultaneously.
[0046]
FIG. 5 is a block diagram showing a configuration of a control system of the substrate standby apparatus 100 of FIG. The control unit 300 includes a CPU (Central Processing Unit), a semiconductor memory, and the like. As shown in FIG. 5, the control unit 300 controls the arm cylinders 115 and 116, the pusher pin driving unit 121, the conveying roller driving unit 130, and the conveying arm driving unit 203. The conveyance roller driving unit 130 rotationally drives the conveyance roller 103 shown in FIGS. The transport arm driving unit 203 drives the transport arm 200 shown in FIGS. The control unit 300 controls the operation from the loading of the substrate W by the transport arm 200 to the unloading of the substrate W by the transport roller 103 described below.
[0047]
6 to 10 are schematic diagrams illustrating the operation of the substrate standby apparatus 100. FIG. Hereinafter, the substrate receiving operation of the substrate standby apparatus 100 will be described with reference to FIGS. 1 and 6 to 10.
[0048]
6 to 10, the conveyance roller 103 and the substrate support unit 120 in FIG. 1 are not shown.
[0049]
First, as shown in FIG. 1, the substrate standby arm 110 moves forward (the state shown in FIGS. 3C and 4C). Next, as shown in FIG. 6, the transfer arm 200 that supports the substrate W moves in the second direction Y, enters the substrate standby apparatus 100, and stops.
[0050]
Next, the transfer arm 200 is lowered. The height of the substrate support pins 111 is larger than the thickness of the support portion 202. Accordingly, as shown in FIG. 7, if the substrate W is supported by the plurality of substrate support pins 111, the substrate W is separated from the support portion 202. At this time, the plurality of substrate support pins 111 support the outer side and the inner side of the outermost fulcrum among the fulcrums on which the support unit 202 supports the substrate. Thereby, the bending of the substrate W can be prevented.
[0051]
When the substrate W is supported by the substrate support pins 111, the lowering operation of the transfer arm 200 stops. Thereafter, the transfer arm 200 moves backward in the direction opposite to the second direction Y. In this state, the substrate W stands by on the substrate support pins 111.
[0052]
Thereafter, as shown in FIG. 8, the piston rod 122 rises and the substrate W is supported by a plurality of pusher pins 124. As a result, the substrate W is separated from the substrate support pins 111.
[0053]
Next, as shown in FIG. 9, the substrate standby arm 110 moves backward (the state shown in FIGS. 3A and 4A). In this state, even if the piston rod 122 is lowered, the substrate W and the substrate standby arm 110 do not contact each other.
[0054]
Next, as shown in FIG. 10, the piston rod 122 is lowered and the substrate W is supported by the plurality of transport rollers 103. Thereby, the substrate W is separated from the piston rod 122. Thereafter, the substrate W is transported by the transport roller 103.
[0055]
When a plurality of substrates W are sequentially supplied from the transfer arm 200 to the substrate standby device 100, the next substrate W is supplied from the transfer arm 200 after the first substrate W is transferred to the transfer roller 103. 6 to 10 are repeated.
[0056]
As described above with reference to FIGS. 6 to 10, the substrate standby apparatus 100 according to the present embodiment can shift the substrate supplied by the transfer arm 200 to a predetermined processing step.
[0057]
Further, in the substrate standby apparatus 100 according to the present embodiment, since the substrate standby arm 110 is provided so as to be able to advance and retreat to the side of the advance / retreat path of the transfer arm 200, the transfer arm 200 having a support portion 202 having an arbitrary shape. It is possible to deliver the substrate.
[0058]
In the present embodiment, the substrate standby apparatus 100 shifts the substrate supplied by the transfer arm 200 to a predetermined processing step, but is not limited thereto. For example, the substrate support unit 120 may receive the substrate transported by the transport roller 103, the substrate standby arm 110 may receive the substrate after the substrate support unit 120 is lifted, and the transport arm 200 may receive the substrate.
[0059]
  In this embodiment,The transfer arm 200 corresponds to the substrate transfer means, the support unit 202 corresponds to the transfer support unit,The substrate standby arm 110 corresponds to a substrate standby means, and the substrate support unit 120 is a substrate.ElevatingThe control unit 300 corresponds to the control means, the arm portion 114 corresponds to the first member, the arm portions 112 and 113 correspond to the second member, and the substrate support pin 111 corresponds to the first member.Standby supportThe pusher pin 124 corresponds to the contact member, the pusher pin drive unit 121 corresponds to the driving means, and the transport roller 103 transports the pusher pin 124.rollerIt corresponds to.
[0060]
(Second Embodiment)
11 and 12 are schematic plan views of the substrate standby device 100a according to the second embodiment of the present invention. Hereinafter, the substrate standby apparatus 100a will be described with reference to FIGS.
[0061]
11 and 12, the illustration of the conveyance roller 103 and the substrate support 120 in FIG. 1 is omitted.
[0062]
11 and 12 is different from the substrate standby apparatus 100 of FIG. 1 in the shape of the arm portion 112a of the substrate standby arm 110a. As shown in FIGS. 11 and 12, the arm portion 112 a includes a frame 117 a extending in the second direction Y and two arms 118 a extending in the first direction X. Each arm 118a is provided so as to extend in the first direction X from both ends of the frame 117a. Substrate support pins 111 are provided on the upper surfaces of both ends of each arm 118a so as to extend in the third direction Z.
[0063]
Here, a case where the shape of the support portion 202a of the transfer arm 200a is a substantially rhombus having a single diagonal line in the second direction Y is considered. In this case, first, the transfer arm 200a moves in the second direction Y, enters the substrate standby apparatus 100a, and stops. Thereafter, as shown in FIG. 12, the substrate standby arm 110a moves forward.
[0064]
Subsequently, when the transport arm 200a is lowered, the substrate W is supported by the substrate support pins 111, and the substrate W is separated from the support portion 202a. When the substrate support pin 111 and the support portion 202a are located in the same horizontal plane, when the transfer arm 200a advances and retreats, a part of the support portion 202a comes into contact with the substrate support pin 111, so the transfer arm 200a is more than the substrate standby arm 100a. Go down. Thereafter, the transfer arm 200a moves backward in the direction opposite to the second direction Y. Thereby, the delivery of the substrate W from the transfer arm 200a to the substrate standby device 100a is completed.
[0065]
At this time, the substrate support pins 111 support the outer side and the inner side of the outermost fulcrum among the fulcrums that the support portion 202a supports the substrate. Thereby, the bending of the substrate W can be prevented.
[0066]
As described above with reference to FIGS. 11 and 12, the substrate standby apparatus 100a according to the present embodiment is provided with the substrate standby arm 110a so as to be able to advance and retract to the side of the advance / retreat path of the transfer arm 200a. It is possible to transfer the substrate to the transfer arm 200a having the support portion 202a having the following shape.
[0067]
In the present embodiment, the substrate standby arm 110a corresponds to the substrate standby means, and the arm portions 112a and 113 correspond to the second member.
[0068]
(Third embodiment)
13 and 14 are schematic plan views of a substrate standby device 100b according to the third embodiment of the present invention. Hereinafter, the substrate standby apparatus 100b will be described with reference to FIGS.
[0069]
13 and 14, the illustration of the conveyance roller 103 and the substrate support 120 in FIG. 1 is omitted.
[0070]
The substrate standby apparatus 100b of FIGS. 13 and 14 differs from the substrate standby apparatus 100 of FIG. 1 in the shape of the arm portion 112b of the substrate standby arm 110b. As shown in FIGS. 13 and 14, the arm portion 112 b includes a frame 117 b extending in the second direction Y and three arms 118 b extending in the first direction X. Each arm 118b is provided to extend in the first direction X from both ends and the center of the frame 117b. Substrate support pins 111 are provided on the upper surfaces of both ends of each arm 118b so as to extend in the third direction Z.
[0071]
Here, consider a case where the shape of the support portion 202b of the transfer arm 200b is approximately eight. In this case, first, the transfer arm 200b moves in the second direction Y and enters the substrate standby device 100b. Thereafter, as shown in FIG. 14, the substrate standby arm 110b moves forward.
[0072]
Subsequently, when the transport arm 200b is lowered, the substrate W is supported by the substrate support pins 111, and the substrate W is separated from the support portion 202b. When the substrate support pin 111 and the support portion 202b are located in the same horizontal plane, when the transfer arm 200b advances and retreats, a part of the support portion 202b and the substrate support pin 111 come into contact with each other, so the transfer arm 200b is more than the substrate standby arm 100b. Go down. Thereafter, the transfer arm 200b moves backward in the direction opposite to the second direction Y. Thereby, the delivery of the substrate W from the transfer arm 200b to the substrate standby device 100b is completed.
[0073]
At this time, the substrate support pins 111 support the outer side and the inner side of the outermost fulcrum among the fulcrums that the support portion 202a supports the substrate. Thereby, the bending of the substrate W can be prevented.
[0074]
As described above with reference to FIGS. 13 and 14, the substrate standby apparatus 100b according to the present embodiment is provided with the substrate standby arm 110b so that the substrate standby arm 110b can be advanced and retracted to the side of the advance / retreat path of the transfer arm 200b. It is possible to transfer the substrate to the transfer arm 200b having the support portion 202b having the following shape.
[0075]
  In this embodiment,The transfer arm 200a corresponds to the substrate transfer means, the support portion 202a corresponds to the transfer support portion,The substrate standby arm 110b corresponds to the substrate standby means, and the arm portions 112b and 113 correspond to the second member.
[Brief description of the drawings]
FIG. 1 is a schematic plan view of a substrate standby device according to an embodiment of the present invention.
FIG. 2 is a schematic front view of the substrate standby device of FIG. 1;
3 is a schematic plan view of the substrate standby arm of FIG. 1. FIG.
4 is a schematic front view of the substrate standby arm of FIG. 3. FIG.
5 is a block diagram showing a configuration of a control system of the substrate standby device of FIG. 1. FIG.
FIG. 6 is a schematic diagram showing the operation of the substrate standby apparatus.
FIG. 7 is a schematic diagram showing the operation of the substrate standby apparatus.
FIG. 8 is a schematic diagram showing the operation of the substrate standby device.
FIG. 9 is a schematic diagram showing the operation of the substrate standby device.
FIG. 10 is a schematic diagram showing the operation of the substrate standby device.
FIG. 11 is a schematic plan view of a substrate standby device according to a second embodiment of the present invention.
FIG. 12 is a schematic plan view of a substrate standby device according to a second embodiment of the present invention.
FIG. 13 is a schematic plan view of a substrate standby device according to a third embodiment of the present invention.
FIG. 14 is a schematic plan view of a substrate standby device according to a third embodiment of the present invention.
[Explanation of symbols]
100 Substrate standby device
101 Arm support plate
102 Roller support plate
103 Conveying roller
110 Substrate standby arm
111 Substrate support pin
112, 113, 114 Arm
115,116 Arm cylinder
120 Substrate support
121 Pusher pin drive
122 piston rod
123 Pusher pin support
124 Pusher pin
130 Transport roller drive
200 Transfer arm
201 Holding part
202 Supporting part
203 Transfer arm drive unit
300 Control unit
W substrate

Claims (6)

基板を支持した状態で待機位置に進退可能でかつ進退方向に沿って並列に延びる棒状の複数の搬送用支持部を有する基板搬送手段と、
基板を前記待機位置で待機させるための基板待機手段と、
前記待機位置の下方に設けられ、基板を搬送する複数の搬送ローラと、
前記複数の搬送ローラの下方に設けられ、基板を支持した状態で昇降させる基板昇降手段と、
前記基板待機手段および前記基板昇降手段を制御する制御部とを備え、
前記基板待機手段は、
前記複数の搬送用支持部の進退経路の両側方にそれぞれ配置された第１の部材と、
各第１の部材に対して前記待機位置に向かう方向に進退可能にそれぞれ設けられた第２の部材と、
各第２の部材上にそれぞれ設けられ、基板の下面を支持可能な複数の待機用支持部とを含み、
前記基板昇降手段は、前記複数の搬送ローラ間を貫通して上下に移動可能に設けられた複数の当接部材を含み、
前記複数の待機用支持部は、前記複数の搬送用支持部の厚さよりも大きな高さを有し、
前記第２の部材が前記待機位置に前進した状態で前記搬送用支持部が前記待機位置に進入した場合に、前記複数の待機用支持部のうち進行方向において最も内側の待機用支持部が前記複数の搬送用支持部のうち最も外側の搬送用支持部よりも内側に位置するように、前記複数の待機用支持部が各第２の部材上に設けられ、
前記制御部は、前記第２の部材が前記待機位置に前進した状態で前記基板搬送手段の前記複数の搬送用支持部が基板の下面を支持して前記待機位置に進入し、基板を前記複数の待機用支持部上に載置して退出した後、前記複数の当接部材が前記複数の搬送ローラ間を貫通して上昇し、前記複数の当接部材の先端で基板の下面を支持し、前記第２の部材が前記待機位置から後退した後、前記複数の当接部材が基板の下面を支持した状態で前記複数の当接部材の先端が前記複数の搬送ローラよりも下方の位置まで下降することにより基板が前記複数の搬送ローラ上に載置されるように、前記基板待機手段および前記基板昇降手段を制御することを特徴する基板待機装置。 A substrate transfer means having a plurality of rod-shaped support portions that can be moved back and forth to a standby position in a state where the substrate is supported and that extends in parallel along the advance / retreat direction;
Substrate standby means for waiting the substrate at the standby position;
A plurality of transport rollers provided below the standby position for transporting the substrate;
A substrate elevating means provided below the plurality of transport rollers and elevating while supporting the substrate;
A control unit for controlling the substrate standby means and the substrate lifting means,
The substrate standby means is
A first member disposed on each side of the advancing / retreating path of the plurality of transport support parts;
A second member provided so as to be capable of moving back and forth in the direction toward the standby position with respect to each first member;
A plurality of standby supports provided on each second member and capable of supporting the lower surface of the substrate;
The substrate elevating means includes a plurality of contact members provided so as to be vertically movable through the plurality of transport rollers,
The plurality of standby support portions have a height greater than the thickness of the plurality of transport support portions,
When the transport support portion enters the standby position in a state where the second member has advanced to the standby position, the innermost standby support portion in the advancing direction among the plurality of standby support portions is the The plurality of standby support portions are provided on each second member so as to be located inside the outermost transport support portion among the plurality of transport support portions,
The controller is configured such that the plurality of transfer support portions of the substrate transfer means enter the standby position while supporting the lower surface of the substrate in a state where the second member has advanced to the standby position. The plurality of abutting members rise through the plurality of transport rollers and support the lower surface of the substrate with the tips of the plurality of abutting members. After the second member retracts from the standby position, the plurality of contact members support the lower surface of the substrate, and the tips of the plurality of contact members are positioned below the plurality of transport rollers. A substrate standby apparatus that controls the substrate standby means and the substrate lifting / lowering means so that the substrate is placed on the plurality of transport rollers by being lowered . 基板を支持した状態で待機位置に進退可能でかつ進退方向に沿って並列に延びる棒状の複数の搬送用支持部を有する基板搬送手段と、
基板を前記待機位置で待機させるための基板待機手段と、
前記待機位置の下方に設けられ、基板を搬送する複数の搬送ローラと、
前記複数の搬送ローラの下方に設けられ、基板を支持した状態で昇降させる基板昇降手段と、
前記基板待機手段および前記基板昇降手段を制御する制御部とを備え、
前記基板待機手段は、
前記複数の搬送用支持部の進退経路の両側方にそれぞれ配置された第１の部材と、
各第１の部材に対して前記待機位置に向かう方向に進退可能にそれぞれ設けられた第２の部材と、
各第２の部材上にそれぞれ設けられ、基板の下面を支持可能な複数の待機用支持部とを含み、
前記基板昇降手段は、前記複数の搬送ローラ間を貫通して上下に移動可能に設けられた複数の当接部材を含み、
前記複数の待機用支持部は、前記複数の搬送用支持部の厚さよりも大きな高さを有し、
前記第２の部材が前記待機位置に前進した状態で前記搬送用支持部が前記待機位置に進入した場合に、前記複数の待機用支持部のうち最も進行方向において最も内側の待機用支持部が前記複数の搬送用支持部のうち最も外側の搬送用支持部よりも内側に位置するように、前記複数の待機用支持部が各第２の部材上に設けられ、
前記制御部は、基板が前記複数の搬送ローラ上に載置された状態で前記複数の当接部材 が上昇して基板の下面に当接し、前記第２の部材が前記待機位置から後退した状態で、基板の下面を支持した前記複数の当接部材の先端が前記複数の待機用支持部よりも上昇した後、前記第２の部材が前記待機位置に前進し、前記複数の当接部材が下降することにより基板が前記待機用支持部上に支持されるように、前記基板待機手段および前記基板昇降手段を制御することを特徴する基板待機装置。 A substrate transfer means having a plurality of rod-shaped support portions that can be moved back and forth to a standby position in a state where the substrate is supported and that extends in parallel along the advance / retreat direction;
Substrate standby means for waiting the substrate at the standby position;
A plurality of transport rollers provided below the standby position for transporting the substrate;
A substrate elevating means provided below the plurality of transport rollers and elevating while supporting the substrate;
A control unit for controlling the substrate standby means and the substrate lifting means,
The substrate standby means is
A first member disposed on each side of the advancing / retreating path of the plurality of transport support parts;
A second member provided so as to be capable of moving back and forth in the direction toward the standby position with respect to each first member;
A plurality of standby supports provided on each second member and capable of supporting the lower surface of the substrate;
The substrate elevating means includes a plurality of contact members provided so as to be vertically movable through the plurality of transport rollers,
The plurality of standby support portions have a height greater than the thickness of the plurality of transport support portions,
When the transport support portion enters the standby position in a state where the second member has advanced to the standby position, the innermost standby support portion in the advancing direction among the plurality of standby support portions is The plurality of standby support portions are provided on each second member so as to be located inside the outermost transport support portion among the plurality of transport support portions,
The control unit is in a state in which the plurality of contact members are lifted and contacted to the lower surface of the substrate while the substrate is placed on the plurality of transport rollers, and the second member is retracted from the standby position. Then, after the tips of the plurality of contact members supporting the lower surface of the substrate rise above the plurality of standby support portions, the second member advances to the standby position, and the plurality of contact members are A substrate standby apparatus that controls the substrate standby means and the substrate lifting / lowering means so that the substrate is supported on the standby support portion by being lowered . 基板を支持した状態で待機位置に進退可能な搬送用支持部を有する基板搬送手段と、
基板を前記待機位置で待機させるための基板待機手段と、
前記待機位置の下方に設けられ、基板を搬送する複数の搬送ローラと、
前記複数の搬送ローラの下方に設けられ、基板を支持した状態で昇降させる基板昇降手段と、
前記基板待機手段および前記基板昇降手段を制御する制御部とを備え、
前記基板待機手段は、
前記複数の搬送用支持部の進退経路の両側方にそれぞれ配置された第１の部材と、
各第１の部材に対して前記待機位置に向かう方向に進退可能にそれぞれ設けられた第２の部材と、
各第２の部材上にそれぞれ設けられ、基板の下面を支持可能な複数の待機用支持部とを含み、
前記基板昇降手段は、前記複数の搬送ローラ間を貫通して上下に移動可能に設けられた複数の当接部材を含み、
前記第２の部材が前記待機位置に前進した状態で前記搬送用支持部が前記待機位置にある場合に、前記搬送用支持部において前記第２の部材に対向する側辺の一部が前記複数の待機用支持部のうち進行方向において最も内側の待機用支持部よりも外側に位置するように、前記搬送用支持部が形成され、
前記制御部は、前記第２の部材が前記待機位置に前進した状態で前記基板搬送手段の前記複数の搬送用支持部が基板の下面を支持して前記待機位置に進入し、基板を前記複数の待機用支持部上に載置して退出した後、前記複数の当接部材が前記複数の搬送ローラ間を貫通して上昇し、前記複数の当接部材の先端で基板の下面を支持し、前記第２の部材が前記待機位置から後退した後、前記複数の当接部材が基板の下面を支持した状態で前記複数の当接部材の先端が前記複数の搬送ローラよりも下方の位置まで下降することにより基板が前記複数の搬送ローラ上に載置されるように、前記基板待機手段および前記基板昇降手段を制御することを特徴する基板待機装置。 A substrate transport means having a transport support portion capable of moving back and forth to a standby position while supporting the substrate;
Substrate standby means for waiting the substrate at the standby position;
A plurality of transport rollers provided below the standby position for transporting the substrate;
A substrate elevating means provided below the plurality of transport rollers and elevating while supporting the substrate;
A control unit for controlling the substrate standby means and the substrate lifting means,
The substrate standby means is
A first member disposed on each side of the advancing / retreating path of the plurality of transport support parts;
A second member provided so as to be capable of moving back and forth in the direction toward the standby position with respect to each first member;
A plurality of standby supports provided on each second member and capable of supporting the lower surface of the substrate;
The substrate elevating means includes a plurality of contact members provided so as to be vertically movable through the plurality of transport rollers,
In the state where the second member is advanced to the standby position and the transport support portion is in the standby position, a part of the side facing the second member in the transport support portion is the plurality of The transport support portion is formed so as to be positioned outside the innermost standby support portion in the advancing direction among the standby support portions.
The controller is configured such that the plurality of transfer support portions of the substrate transfer means support the lower surface of the substrate and enter the standby position in a state where the second member has advanced to the standby position. The plurality of abutting members rise through the plurality of transport rollers and support the lower surface of the substrate with the tips of the plurality of abutting members. After the second member retracts from the standby position, the plurality of contact members support the lower surface of the substrate, and the tips of the plurality of contact members are positioned below the plurality of transport rollers. A substrate standby apparatus that controls the substrate standby means and the substrate lifting / lowering means so that the substrate is placed on the plurality of transport rollers by being lowered . 基板を支持した状態で待機位置に進退可能な搬送用支持部を有する基板搬送手段と、
基板を前記待機位置で待機させるための基板待機手段と、
前記待機位置の下方に設けられ、基板を搬送する複数の搬送ローラと、
前記複数の搬送ローラの下方に設けられ、基板を支持した状態で昇降させる基板昇降手段と、
前記基板待機手段および前記基板昇降手段を制御する制御部とを備え、
前記基板待機手段は、
前記複数の搬送用支持部の進退経路の両側方にそれぞれ配置された第１の部材と、
各第１の部材に対して前記待機位置に向かう方向に進退可能にそれぞれ設けられた第２の部材と、
各第２の部材上にそれぞれ設けられ、基板の下面を支持可能な複数の待機用支持部とを含み、
前記基板昇降手段は、前記複数の搬送ローラ間を貫通して上下に移動可能に設けられた複数の当接部材を含み、
前記第２の部材が前記待機位置に前進した状態で前記搬送用支持部が前記待機位置にある場合に、前記搬送用支持部において前記第２の部材に対向する側辺の一部が前記複数の待機用支持部のうち進行方向において最も内側の待機用支持部よりも外側に位置するよう に、前記搬送用支持部が形成され、
前記制御部は、基板が前記複数の搬送ローラ上に載置された状態で前記複数の当接部材が上昇して基板の下面に当接し、前記第２の部材が前記待機位置から後退した状態で、基板の下面を支持した前記複数の当接部材の先端が前記複数の待機用支持部よりも上昇した後、前記第２の部材が前記待機位置に前進し、前記複数の当接部材が下降することにより基板が前記待機用支持部上に支持されるように、前記基板待機手段および前記基板昇降手段を制御することを特徴する基板待機装置。 A substrate transport means having a transport support portion capable of moving back and forth to a standby position while supporting the substrate;
Substrate standby means for waiting the substrate at the standby position;
A plurality of transport rollers provided below the standby position for transporting the substrate;
A substrate elevating means provided below the plurality of transport rollers and elevating while supporting the substrate;
A control unit for controlling the substrate standby means and the substrate lifting means,
The substrate standby means is
A first member disposed on each side of the advancing / retreating path of the plurality of transport support parts;
A second member provided so as to be capable of moving back and forth in the direction toward the standby position with respect to each first member;
A plurality of standby supports provided on each second member and capable of supporting the lower surface of the substrate;
The substrate elevating means includes a plurality of contact members provided so as to be vertically movable through the plurality of transport rollers,
In the state where the second member is advanced to the standby position and the transport support portion is in the standby position, a part of the side facing the second member in the transport support portion is the plurality of The transport support portion is formed so as to be positioned outside the innermost standby support portion in the advancing direction among the standby support portions .
The control unit is in a state in which the plurality of contact members are lifted and contacted to the lower surface of the substrate while the substrate is placed on the plurality of transport rollers, and the second member is retracted from the standby position. Then, after the tips of the plurality of contact members supporting the lower surface of the substrate rise above the plurality of standby support portions, the second member advances to the standby position, and the plurality of contact members are A substrate standby apparatus that controls the substrate standby means and the substrate lifting / lowering means so that the substrate is supported on the standby support portion by being lowered . 前記第２の部材は、進行方向に並列に延びる複数のアームを有し、
前記複数の当接部材は、前記複数のアーム間を昇降可能に設けられたことを特徴とする請求項１〜４のいずれかに記載の基板待機装置。 The second member has a plurality of arms extending in parallel in the traveling direction,
The substrate standby device according to claim 1, wherein the plurality of contact members are provided so as to be movable up and down between the plurality of arms . 基板に処理を行うための処理ユニットと、
請求項１〜５のいずれかに記載の基板待機装置とを備え、
前記基板待機装置の前記基板搬送手段により前記処理ユニットと前記基板待機装置との間で基板が搬送されることを特徴とする基板処理装置。A processing unit for processing the substrate ;
A substrate standby device according to any one of claims 1 to 5,
The substrate processing apparatus, wherein the substrate is transferred between the processing unit and the substrate standby apparatus by the substrate transfer means of the substrate standby apparatus.
JP2003081032A 2003-03-24 2003-03-24 Substrate standby device and substrate processing apparatus having the same Expired - Fee Related JP4133489B2 (en)

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JP2003081032A JP4133489B2 (en) 2003-03-24 2003-03-24 Substrate standby device and substrate processing apparatus having the same
CNB2004100082046A CN1285099C (en) 2003-03-24 2004-03-01 Substrate stand-by device and subsbrate processor with said device
TW093106960A TWI245738B (en) 2003-03-24 2004-03-16 Substrate waiting apparatus and substrate processing apparatus using the same
KR1020040018646A KR100591567B1 (en) 2003-03-24 2004-03-19 Substrate waiting apparatus and substrate processing apparatus using the same

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Publication number Priority date Publication date Assignee Title
KR101183043B1 (en) 2008-12-12 2012-09-20 가부시키가이샤 아이에이치아이 System for keeping and supplying substrate

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CN100409424C (en) * 2005-04-26 2008-08-06 大日本网目版制造株式会社 Substrate processing device
CN101339316B (en) * 2007-07-02 2010-07-28 显示器生产服务株式会社 Substrate transport device
JP5000597B2 (en) * 2008-07-22 2012-08-15 Ｓｕｍｃｏ Ｔｅｃｈｘｉｖ株式会社 Semiconductor wafer support
CN102136407B (en) * 2009-12-31 2013-11-06 丽佳达普株式会社 Guide rack of substrate processing device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101183043B1 (en) 2008-12-12 2012-09-20 가부시키가이샤 아이에이치아이 System for keeping and supplying substrate

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KR20040084661A (en) 2004-10-06
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KR100591567B1 (en) 2006-06-19

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