CN112992740A - 一种切割晶圆用的清洗设备 - Google Patents
一种切割晶圆用的清洗设备 Download PDFInfo
- Publication number
- CN112992740A CN112992740A CN202110226106.3A CN202110226106A CN112992740A CN 112992740 A CN112992740 A CN 112992740A CN 202110226106 A CN202110226106 A CN 202110226106A CN 112992740 A CN112992740 A CN 112992740A
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- CN
- China
- Prior art keywords
- block
- inlayed
- rubber
- wafer
- embedded
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Links
- 238000004140 cleaning Methods 0.000 title claims abstract description 43
- 238000005520 cutting process Methods 0.000 title claims abstract description 9
- 235000012431 wafers Nutrition 0.000 claims abstract description 63
- 230000017525 heat dissipation Effects 0.000 claims abstract description 13
- 230000008093 supporting effect Effects 0.000 claims description 43
- 238000010030 laminating Methods 0.000 claims description 11
- 238000005406 washing Methods 0.000 claims description 9
- 239000004033 plastic Substances 0.000 claims description 8
- 229920003023 plastic Polymers 0.000 claims description 8
- 239000007787 solid Substances 0.000 claims description 7
- 238000000034 method Methods 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 9
- 238000010586 diagram Methods 0.000 description 6
- 238000009434 installation Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000011435 rock Substances 0.000 description 4
- 230000001413 cellular effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 101100314150 Caenorhabditis elegans tank-1 gene Proteins 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000001259 photo etching Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
- B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning By Liquid Or Steam (AREA)
Abstract
Description
Claims (8)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202110226106.3A CN112992740A (zh) | 2021-03-01 | 2021-03-01 | 一种切割晶圆用的清洗设备 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202110226106.3A CN112992740A (zh) | 2021-03-01 | 2021-03-01 | 一种切割晶圆用的清洗设备 |
Publications (1)
Publication Number | Publication Date |
---|---|
CN112992740A true CN112992740A (zh) | 2021-06-18 |
Family
ID=76351612
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202110226106.3A Pending CN112992740A (zh) | 2021-03-01 | 2021-03-01 | 一种切割晶圆用的清洗设备 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN112992740A (zh) |
Citations (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4736759A (en) * | 1986-02-21 | 1988-04-12 | Robert A. Coberly | Apparatus for cleaning rinsing and drying substrates |
US4902350A (en) * | 1987-09-09 | 1990-02-20 | Robert F. Orr | Method for rinsing, cleaning and drying silicon wafers |
JPH09237770A (ja) * | 1995-12-25 | 1997-09-09 | Nippei Toyama Corp | ウエハの処理システム |
JPH09285958A (ja) * | 1996-04-23 | 1997-11-04 | Fujikoshi Mach Corp | ウェーハの研磨装置システム |
JPH10135176A (ja) * | 1996-09-04 | 1998-05-22 | Tokyo Electron Ltd | 超音波洗浄装置 |
JPH11176779A (ja) * | 1997-12-09 | 1999-07-02 | Tdk Corp | 洗浄方法および装置 |
JPH11192461A (ja) * | 1997-10-30 | 1999-07-21 | Speedfam Clean System Kk | 流液式ワークカセット洗浄装置 |
US6026832A (en) * | 1997-05-26 | 2000-02-22 | Sony Corporation | Ultrasonic cleaning apparatus |
EP1025409A1 (en) * | 1997-09-23 | 2000-08-09 | Gary W. Ferrell | Improved chemical drying and cleaning system |
JP2002203831A (ja) * | 2000-12-27 | 2002-07-19 | Kaijo Corp | 洗浄物の乾燥方法及び乾燥装置及び並びに洗浄乾燥装置 |
JP2003037093A (ja) * | 2001-07-06 | 2003-02-07 | Pacific Internatl Stg Inc | 超音波振動装置及びそれを備えた超音波洗浄装置 |
KR20060035092A (ko) * | 2004-10-21 | 2006-04-26 | 주식회사 하이닉스반도체 | 반도체 장치의 초음파 세정 장치 |
US20070215172A1 (en) * | 2006-03-15 | 2007-09-20 | Tsukasa Watanabe | Substrate cleaning method, substrate cleaning system and program storage medium |
KR20090064871A (ko) * | 2007-12-17 | 2009-06-22 | 주식회사 실트론 | 웨이퍼 세정장치 |
US20110079240A1 (en) * | 2009-10-05 | 2011-04-07 | Tokyo Electron Limited | Ultrasonic cleaning apparatus, ultrasonic cleaning method, and storage medium storing computer program for executing ultrasonic cleaning method |
WO2011089673A1 (ja) * | 2010-01-25 | 2011-07-28 | 信越半導体株式会社 | 超音波洗浄方法 |
JP2012186348A (ja) * | 2011-03-07 | 2012-09-27 | Kurita Water Ind Ltd | 電子材料用洗浄水、電子材料の洗浄方法及びガス溶解水の供給システム |
US20140209239A1 (en) * | 2013-01-31 | 2014-07-31 | Applied Materials, Inc. | Methods and apparatus for post-chemical mechanical planarization substrate cleaning |
JP2016150330A (ja) * | 2015-02-19 | 2016-08-22 | 哲男 原田 | 帯電マイクロバブルを用いた洗浄法 |
CN211637560U (zh) * | 2019-12-24 | 2020-10-09 | 和创光电(武汉)有限公司 | 生产抛光片用13槽半自动超声波清洗机 |
CN112371644A (zh) * | 2020-10-26 | 2021-02-19 | 李溪坂 | 一种五金加工用除锈设备 |
-
2021
- 2021-03-01 CN CN202110226106.3A patent/CN112992740A/zh active Pending
Patent Citations (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4736759A (en) * | 1986-02-21 | 1988-04-12 | Robert A. Coberly | Apparatus for cleaning rinsing and drying substrates |
US4902350A (en) * | 1987-09-09 | 1990-02-20 | Robert F. Orr | Method for rinsing, cleaning and drying silicon wafers |
JPH09237770A (ja) * | 1995-12-25 | 1997-09-09 | Nippei Toyama Corp | ウエハの処理システム |
JPH09285958A (ja) * | 1996-04-23 | 1997-11-04 | Fujikoshi Mach Corp | ウェーハの研磨装置システム |
JPH10135176A (ja) * | 1996-09-04 | 1998-05-22 | Tokyo Electron Ltd | 超音波洗浄装置 |
US6026832A (en) * | 1997-05-26 | 2000-02-22 | Sony Corporation | Ultrasonic cleaning apparatus |
EP1025409A1 (en) * | 1997-09-23 | 2000-08-09 | Gary W. Ferrell | Improved chemical drying and cleaning system |
JPH11192461A (ja) * | 1997-10-30 | 1999-07-21 | Speedfam Clean System Kk | 流液式ワークカセット洗浄装置 |
JPH11176779A (ja) * | 1997-12-09 | 1999-07-02 | Tdk Corp | 洗浄方法および装置 |
JP2002203831A (ja) * | 2000-12-27 | 2002-07-19 | Kaijo Corp | 洗浄物の乾燥方法及び乾燥装置及び並びに洗浄乾燥装置 |
JP2003037093A (ja) * | 2001-07-06 | 2003-02-07 | Pacific Internatl Stg Inc | 超音波振動装置及びそれを備えた超音波洗浄装置 |
KR20060035092A (ko) * | 2004-10-21 | 2006-04-26 | 주식회사 하이닉스반도체 | 반도체 장치의 초음파 세정 장치 |
US20070215172A1 (en) * | 2006-03-15 | 2007-09-20 | Tsukasa Watanabe | Substrate cleaning method, substrate cleaning system and program storage medium |
KR20090064871A (ko) * | 2007-12-17 | 2009-06-22 | 주식회사 실트론 | 웨이퍼 세정장치 |
US20110079240A1 (en) * | 2009-10-05 | 2011-04-07 | Tokyo Electron Limited | Ultrasonic cleaning apparatus, ultrasonic cleaning method, and storage medium storing computer program for executing ultrasonic cleaning method |
WO2011089673A1 (ja) * | 2010-01-25 | 2011-07-28 | 信越半導体株式会社 | 超音波洗浄方法 |
JP2012186348A (ja) * | 2011-03-07 | 2012-09-27 | Kurita Water Ind Ltd | 電子材料用洗浄水、電子材料の洗浄方法及びガス溶解水の供給システム |
US20140209239A1 (en) * | 2013-01-31 | 2014-07-31 | Applied Materials, Inc. | Methods and apparatus for post-chemical mechanical planarization substrate cleaning |
JP2016150330A (ja) * | 2015-02-19 | 2016-08-22 | 哲男 原田 | 帯電マイクロバブルを用いた洗浄法 |
CN211637560U (zh) * | 2019-12-24 | 2020-10-09 | 和创光电(武汉)有限公司 | 生产抛光片用13槽半自动超声波清洗机 |
CN112371644A (zh) * | 2020-10-26 | 2021-02-19 | 李溪坂 | 一种五金加工用除锈设备 |
Non-Patent Citations (1)
Title |
---|
林必忠: "滚筒式清洗机的设计与探讨", 《木工机床》 * |
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Date | Code | Title | Description |
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PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
TA01 | Transfer of patent application right | ||
TA01 | Transfer of patent application right |
Effective date of registration: 20221226 Address after: No.383 Hedong Road, high tech Zone, Qingdao, Shandong Province 266000 Applicant after: Qingdao huaxinjingdian Technology Co.,Ltd. Address before: 341000 Jiangxi Jinrun Hongda Industry and Trade Co., Ltd. on the west side of the third floor, building 1, standard workshop phase I, Zhenxing Avenue, Ganzhou Comprehensive Bonded Zone, Ganzhou economic and Technological Development Zone, Ganzhou City, Jiangxi Province Applicant before: Li Junping |
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AD01 | Patent right deemed abandoned | ||
AD01 | Patent right deemed abandoned |
Effective date of abandoning: 20230602 |