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CN112490360A - Semiconductor device with a plurality of semiconductor chips - Google Patents

Semiconductor device with a plurality of semiconductor chips Download PDF

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Publication number
CN112490360A
CN112490360A CN202010748865.1A CN202010748865A CN112490360A CN 112490360 A CN112490360 A CN 112490360A CN 202010748865 A CN202010748865 A CN 202010748865A CN 112490360 A CN112490360 A CN 112490360A
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coil
trace
semiconductor device
wiring
present disclosure
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CN202010748865.1A
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Chinese (zh)
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CN112490360B (en
Inventor
颜孝璁
陈家源
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Realtek Semiconductor Corp
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Realtek Semiconductor Corp
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D1/00Resistors, capacitors or inductors
    • H10D1/20Inductors

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Abstract

A semiconductor device includes a first coil, a second coil, and a third coil. The second coil is disposed opposite the first coil. The third coil is used for inducing the signal of the first coil. The first overlapping area of the third coil and the first coil on a projection plane is larger than the second overlapping area of the third coil and the second coil on the projection plane.

Description

Semiconductor device with a plurality of semiconductor chips
Technical Field
Embodiments described in this disclosure relate to semiconductor technology, and more particularly, to a semiconductor device.
Background
With the development of semiconductor technology, inductors/transformers have been applied to many electronic devices. In the case of a transformer, the number of turns of the two coils may be different. And the number of turns of the coil will affect the coupling of the signal.
Disclosure of Invention
Some embodiments of the present disclosure relate to a semiconductor device. The semiconductor device includes a first coil, a second coil and a third coil. The second coil is disposed opposite the first coil. The third coil is used for inducing the signal of the first coil. The first overlapping area of the third coil and the first coil on a projection plane is larger than the second overlapping area of the third coil and the second coil on the projection plane.
Some embodiments of the present disclosure relate to a semiconductor device. The semiconductor device includes a first coil, a second coil and a third coil. The third coil is used for sensing the signal of the first coil. A first capacitance value between the third coil and the first coil is larger than a second capacitance value between the third coil and the second coil.
In summary, in the semiconductor device of the present disclosure, the overlapping area between the induction coil (e.g., the third coil) and one of the coils (e.g., the first coil) is larger. Therefore, the coupling between the induction coil and the one coil (for example, the first coil) can be strengthened without influencing other coils (for example, the second coil).
Drawings
In order to make the above and other objects, features, advantages and embodiments of the present disclosure more comprehensible, the following description is given:
FIG. 1 is a schematic diagram of a semiconductor device according to some embodiments of the present disclosure;
FIG. 2 is a schematic diagram of two coils of FIG. 1, shown in accordance with some embodiments of the present disclosure;
FIG. 3 is a schematic diagram of a coil of FIG. 1, according to some embodiments of the present disclosure;
FIG. 4 is an exploded view of the coil of FIG. 3 shown in accordance with some embodiments of the present disclosure;
FIG. 5 is a schematic diagram of a semiconductor device according to some embodiments of the present disclosure;
FIG. 6 is a schematic diagram of a semiconductor device according to some embodiments of the present disclosure;
FIG. 7 is a schematic diagram of a semiconductor device according to some embodiments of the present disclosure;
FIG. 8A is a graph of signal strength versus frequency for some related art techniques; and
fig. 8B is a graph of signal strength versus frequency, in accordance with some embodiments of the present disclosure.
Description of the symbols
100: semiconductor structure
120: first coil
121: first wire
1211: first end
1212: second end
122: second routing
1221: first end
1222: second end
123: third routing
1231: first end
1232: second end
140: second coil
141: first wire
1411: first end
1412: second end
142: second routing
1421: first end
1422: second end
143: third routing
1431: first end
1432: second end
144: fourth wire
1441: first end
1442: second end
160: third coil
161: first wire
1611: first routing
1612: second routing
162: second routing
163: third routing
164: fourth wire
1641: first routing
1642: second routing
165: fifth wire
166: sixth wire
167: seventh wire
500: semiconductor structure
560: third coil
561: first wire
562: second routing
600: semiconductor structure
660: third coil
661: first wire
662: second routing
700: semiconductor structure
720: first coil
740: second coil
760: third coil
761: main wiring
762: projection part
C1: connecting piece
C2: connecting piece
C3: connecting piece
C4: connecting piece
V1: connecting through hole
V2: connecting through hole
V3: connecting through hole
V4: connecting through hole
V5: connecting through hole
W1: line width
X: direction of rotation
Y: direction of rotation
Detailed Description
The following embodiments are described in detail with reference to the accompanying drawings, but the embodiments are not provided to limit the scope of the disclosure, and the description of the structure operation is not intended to limit the execution sequence thereof, and any structure resulting from the rearrangement of elements to produce an apparatus with equivalent technical effect is included in the scope of the disclosure. In addition, the drawings are for illustrative purposes only and are not drawn to scale. For ease of understanding, the same or similar elements will be described with the same reference numerals in the following description.
Refer to fig. 1. Fig. 1 is a schematic diagram of a semiconductor structure 100 shown in accordance with some embodiments of the present disclosure. For the example of fig. 1, the semiconductor structure 100 includes a first coil 120, a second coil 140, and a third coil 160. The second coil 140 is disposed opposite to the first coil 120. The third coil 160 is disposed below the first coil 120 and the second coil 140.
In some embodiments, the first coil 120 may operate as a transformer in conjunction with the second coil 140. In some embodiments, the first coil 120 and the second coil 140 may each operate as two inductors.
In some embodiments, the number of turns of the first coil 120 is different from the number of turns of the second coil 140. For example, the number of turns of the first coil 120 is smaller than that of the second coil 140. For the example of fig. 1, the first coil 120 includes a first trace 121, a second trace 122 and a third trace 123. The second coil 140 includes a first trace 141, a second trace 142, a third trace 143, and a fourth trace 144.
Refer to fig. 2. Fig. 2 is a schematic diagram of the first coil 120 and the second coil 140 of fig. 1, shown in accordance with some embodiments of the present disclosure.
For the example of fig. 2, the first end 1211 of the first trace 121 can be used as a signal input/output end. The second end 1212 of the first trace 121 is coupled to the first end 1221 of the second trace 122 through a connector C1 and a plurality of via (via) V1. The second end 1222 of the second trace 1222 is coupled to the first end 1231 of the third trace 123 through the connecting via V2. The second end 1232 of the third trace 123 can be used as a signal input/output end.
The first end 1411 of the first trace 141 can be used as a signal input/output end. The second end 1412 of the first trace 141 is coupled to the first end 1421 of the second trace 142 through a connector C2 and a plurality of connecting vias V3. The second end 1422 of the second trace 142 is coupled to the first end 1431 of the third trace 143 by a connector C3 and a plurality of connecting vias V4. The second end 1432 of the third trace 143 is coupled to the first end 1441 of the fourth trace 144 by the connector C4 and the plurality of connecting vias V5. The second end 1442 of the fourth trace 144 can serve as a signal input/output end.
The above-described arrangement of the first coil 120 and the second coil 140 is merely an example, and various applicable arrangements are within the scope of the present disclosure.
Refer to fig. 3 and 4. Fig. 3 is a schematic diagram of the third coil 160 of fig. 1, shown in accordance with some embodiments of the present disclosure. Fig. 4 is an exploded view of the third coil 160 of fig. 3, shown in accordance with some embodiments of the present disclosure. Third coil 160 may operate as an induction coil to induce (couple) a signal on first coil 120 or second coil 140.
For the example of fig. 3, the third coil 160 includes a first trace 161, a second trace 162, a third trace 163, a fourth trace 164, a fifth trace 165, a sixth trace 166, and a seventh trace 167. The third trace 163 is coupled between the first trace 161 and the second trace 162. The sixth trace 166 is coupled between the fourth trace 164 and the fifth trace 165. The seventh trace 167 is coupled to the first trace 161 and the fourth trace 164.
In some embodiments, the first trace 161, the second trace 162, the third trace 163, the fourth trace 164, the fifth trace 165, and the sixth trace 166 are disposed on a metal layer (e.g., M6 metal layer). The seventh trace 167 is disposed on another metal layer (e.g., the M5 metal layer).
In some embodiments, each of the first trace 161, the second trace 162, the third trace 163, the fourth trace 164, the fifth trace 165, and the sixth trace 166 may be a multi-layer structure. In other words, each of the first trace 161, the second trace 162, the third trace 163, the fourth trace 164, the fifth trace 165, and the sixth trace 166 may be formed by stacking a plurality of metal layers. In some embodiments, each of the first trace 161, the second trace 162, the third trace 163, the fourth trace 164, the fifth trace 165, and the sixth trace 166 may be a single-layer structure.
In some embodiments, the second trace 162, the third trace 163, the fifth trace 165, and the sixth trace 166 have a line width W1. In some embodiments, the first trace 161 includes a first sub-trace 1611 and a second sub-trace 1612. The fourth trace 164 includes a first trace 1641 and a second trace 1642. In some embodiments, the first trace 1611, the second trace 1612, the first trace 1641 and the second trace 1642 also have a line width W1.
In some embodiments, the first trace 1611, the second trace 1612, the first trace 1641 and the second trace 1642 of the third coil 160 are disposed corresponding to the first coil 120. For example, referring to fig. 1 again, the first trace 1611 and the second trace 1612 of the first trace 161 of the third coil 160 are disposed on the lower side of the first trace 121 or the third trace 123 of the first coil 120. The first trace 1641 and the second trace 1642 of the fourth trace 164 of the third coil 160 are disposed on the lower side of the first trace 121 or the third trace 123 of the first coil 120. In this case, an overlapping area of the third coil 160 and the first coil 120 on a projection plane (a plane formed by the direction X and the direction Y) is larger than an overlapping area of the third coil 160 and the second coil 140 on the projection plane. Equivalently, the capacitance value between the third coil 160 and the first coil 120 is larger than the capacitance value between the third coil 160 and the second coil 140.
As previously described, the third coil 160 may be used to induce (couple) a signal on the first coil 120 or the second coil 140. In some related arts, if a general induction coil is used, the coupling between the induction coil and the coil having a larger number of turns is larger, and the coupling between the induction coil and the coil having a smaller number of turns is smaller.
Compared to the related arts, in the present disclosure, the overlapping area of the third coil 160 and the first coil 120 (with fewer turns) is larger, so that the coupling between the third coil 160 and the first coil 120 (with fewer turns) can be strengthened without affecting the second coil 140. Accordingly, the semiconductor device 100 of the present disclosure may be applied to some specific applications.
Taking the example of fig. 1, the overlapping area between the third coil 160 and the first coil 120 includes a plurality of overlapping areas. In some embodiments, the ratio of the overlapping area between third coil 160 and first coil 120 to the overlapping area between third coil 160 and second coil 140 is greater than or equal to 1.5, although the disclosure is not so limited. In some embodiments, when the third coil 160 does not overlap the second coil 140, the overlapping area between the third coil 160 and the first coil 120 is greater than a predetermined area. The predetermined area is, for example, substantially 10 square microns, but the disclosure is not limited thereto.
In some embodiments, there may be no gap between the first sub-trace 1611 and the second sub-trace 1612 of the first trace 161. That is, the first trace 1611 and the second trace 1612 can be integrated into a single component. Similarly, in some embodiments, there may be no gap between the first trace 1641 and the second trace 1642 of the fourth trace 164. That is, the first trace 1641 and the second trace 1642 can be integrated into a single component.
Refer to fig. 5. Fig. 5 is a schematic diagram of a semiconductor device 500 shown in accordance with some embodiments of the present disclosure. For simplicity and ease of understanding, fig. 5 shows only the third coil 560 and omits the first and second coils, which respectively operate as two inductors or as a transformer in common. As described above, there may be no gap between the first trace 1611 and the second trace 1612 in fig. 3 to form the first trace 561 in fig. 5. There may be no gap between the first trace 1641 and the second trace 1642 in fig. 3 to form the second trace 562 in fig. 5. For example, in fig. 5, the first trace 561 and the second trace 562 in the third coil 560 are disposed outside the third coil 560. The first trace 561 and the second trace 562 have a first line width, and other traces in the third coil 560 have a second line width, and the first line width is greater than the second line width.
Refer to fig. 6. Fig. 6 is a schematic diagram of a semiconductor device 600 shown in accordance with some embodiments of the present disclosure. For simplicity and ease of understanding, fig. 6 shows only the third coil 660 and omits the first and second coils, which respectively operate as two inductors or as a transformer in common. For simplicity and ease of understanding, fig. 6 shows only the third coil 660 and omits the first and second coils, which respectively operate as two inductors or as a transformer in common. The main difference between the semiconductor device 600 of fig. 6 and the semiconductor device 500 of fig. 5 is that in the semiconductor device 600 of fig. 6, the first trace 611 and the second trace 612 having wider line widths in the third coil 660 are disposed inside the third coil 660.
Refer to fig. 7. Fig. 7 is a schematic diagram of a semiconductor device 700 shown in accordance with some embodiments of the present disclosure. In the example of fig. 7, the semiconductor device 700 includes a first coil 720, a second coil 740, and a third coil 760. In some embodiments, the first coil 720 may operate as a transformer in conjunction with the second coil 740. In some embodiments, the first coil 720 and the second coil 740 may operate as two inductors, respectively.
In the semiconductor device 700, the third coil 760 is provided around the first coil 720 and the second coil 740. In other words, the third coil 760 is disposed outside the first coil 720 and the second coil 740.
For simplicity and ease of understanding, the first coil 720/second coil 740 in fig. 7 only shows a single winding. In fact, in this example, the number of turns of the first coil 720/the second coil 740 is plural, and the number of turns of the first coil 720 is smaller than that of the second coil 740.
In some embodiments, third coil 760 includes a main trace 761 and a tab 762. The protrusion 762 may connect the main trace 761 through the connection through hole. The protruding part 762 overlaps the first coil 720 (having fewer turns) on a projection plane (a plane formed by the direction X and the direction Y) to reinforce the coupling between the third coil 760 and the first coil 720 (having fewer turns).
In the above embodiments, the third coil 760 is disposed below the first coil 720, and the main trace 761 of the third coil 760 is disposed outside the first coil 720 and the second coil 740. However, the disclosure is not so limited. In some other embodiments, the third coil 760 may be disposed on other sides of the first coil 720 and the second coil 740.
Refer to fig. 8A. Fig. 8A is a graph of signal strength versus frequency for some related art techniques. As described above, in some related art, a general induction coil is used, and the coupling (signal strength) between the induction coil and the coil having a larger number of turns is larger, and the coupling (signal strength) between the induction coil and the coil having a smaller number of turns is smaller.
Refer to fig. 8B. Fig. 8B is a graph of signal strength versus frequency, in accordance with some embodiments of the present disclosure. Compared with the related arts, in the present disclosure, the overlapping area between the induction coil (e.g., the third coil) and the coil with fewer turns is larger, so that the coupling (signal strength) between the induction coil (e.g., the third coil) and the coil with fewer turns can be strengthened without affecting the coil with more turns, and a stronger coupling result with fewer coils can be obtained.
In summary, in the semiconductor device of the present disclosure, the overlapping area between the induction coil (e.g., the third coil) and one of the coils (e.g., the first coil) is larger. Therefore, the coupling between the induction coil and the one coil (for example, the first coil) can be strengthened without influencing other coils (for example, the second coil).
Although the present disclosure has been described with reference to the above embodiments, it should be understood that various changes and modifications can be made therein by those skilled in the art without departing from the spirit and scope of the disclosure, and therefore, the scope of the disclosure should be determined by that of the appended claims.

Claims (10)

1.一种半导体装置,包含:1. A semiconductor device comprising: 一第一线圈;a first coil; 一第二线圈,相对于该第一线圈设置;以及a second coil disposed relative to the first coil; and 一第三线圈,用以感应该第一线圈的信号,其中该第三线圈与该第一线圈于一投影平面的一第一重叠面积大于该第三线圈与该第二线圈于该投影平面的一第二重叠面积。a third coil for sensing the signal of the first coil, wherein a first overlapping area of the third coil and the first coil on a projection plane is larger than the third coil and the second coil on the projection plane a second overlapping area. 2.如权利要求1所述的半导体装置,其中该第一线圈的圈数小于该第二线圈的圈数。2. The semiconductor device of claim 1, wherein the number of turns of the first coil is smaller than the number of turns of the second coil. 3.如权利要求2所述的半导体装置,其中该第一重叠面积与该第二重叠面积的比例大于或等于1.5。3. The semiconductor device of claim 2, wherein a ratio of the first overlapping area to the second overlapping area is greater than or equal to 1.5. 4.如权利要求1所述的半导体装置,其中该第三线圈包含:4. The semiconductor device of claim 1, wherein the third coil comprises: 一第一走线;a first line; 一第二走线;a second line; 一第三走线,耦接于该第一走线与该第二走线之间;a third wiring, coupled between the first wiring and the second wiring; 一第四走线;a fourth line; 一第五走线;a fifth line; 一第六走线,耦接于该第四走线与该第五走线之间;以及a sixth trace coupled between the fourth trace and the fifth trace; and 一第七走线,耦接该第一走线与该第四走线之间。A seventh trace is coupled between the first trace and the fourth trace. 5.如权利要求4所述的半导体装置,其中该第二走线、该第三走线、该第五走线以及该第六走线具有一线宽,该第一走线以及该第四走线的各者具有一第一次走线以及一第二次走线,该第一次走线以及该第二次走线具有该线宽,且该第一次走线以及该第二次走线与该第一线圈于该投影平面重叠。5. The semiconductor device of claim 4, wherein the second trace, the third trace, the fifth trace and the sixth trace have a one-line width, the first trace and the fourth trace Each of the lines has a first run and a second run, the first run and the second run have the line width, and the first run and the second run The line overlaps the first coil on the projection plane. 6.如权利要求4所述的半导体装置,其中该第一走线、该第二走线、该第三走线、该第四走线、该第五走线以及该第六走线设置于一第一金属层,且该第七走线设置于一第二金属层。6. The semiconductor device of claim 4, wherein the first trace, the second trace, the third trace, the fourth trace, the fifth trace and the sixth trace are disposed on A first metal layer, and the seventh wiring is disposed on a second metal layer. 7.如权利要求4所述的半导体装置,其中该第一走线、该第二走线、该第三走线、该第四走线、该第五走线以及该第六走线为多层结构。7 . The semiconductor device of claim 4 , wherein the first wiring, the second wiring, the third wiring, the fourth wiring, the fifth wiring and the sixth wiring are multiple. 8 . layer structure. 8.如权利要求1所述的半导体装置,其中该第三线圈中的第一部分走线具有一第一线宽,该第三线圈中的第二部分走线具有一第二线宽,其中该第一线宽大于该第二线宽。8 . The semiconductor device of claim 1 , wherein the first portion of the wiring in the third coil has a first line width, and the second portion of the wiring in the third coil has a second line width, wherein the first portion of the wiring has a second line width. 9 . The line width is greater than the second line width. 9.如权利要求1所述的半导体装置,其中该第三线圈围绕该第一线圈以及该第二线圈。9. The semiconductor device of claim 1, wherein the third coil surrounds the first coil and the second coil. 10.一种半导体装置,包含:10. A semiconductor device comprising: 一第一线圈;a first coil; 一第二线圈,相对于该第一线圈设置;以及a second coil disposed relative to the first coil; and 一第三线圈,用以感应该第一线圈的信号,其中该第三线圈与该第一线圈之间的一第一电容值大于该第三线圈与该第二线圈之间的一第二电容值。a third coil for sensing the signal of the first coil, wherein a first capacitance value between the third coil and the first coil is greater than a second capacitance between the third coil and the second coil value.
CN202010748865.1A 2019-09-11 2020-07-30 Semiconductor device with a semiconductor device having a plurality of semiconductor chips Active CN112490360B (en)

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