CN111704955A - 一种抗冻水基切削液及其制备方法 - Google Patents
一种抗冻水基切削液及其制备方法 Download PDFInfo
- Publication number
- CN111704955A CN111704955A CN202010629157.6A CN202010629157A CN111704955A CN 111704955 A CN111704955 A CN 111704955A CN 202010629157 A CN202010629157 A CN 202010629157A CN 111704955 A CN111704955 A CN 111704955A
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- Prior art keywords
- parts
- cutting fluid
- water
- based cutting
- bactericide
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Classifications
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Abstract
本发明公开了一种抗冻水基切削液,包含以下质量份数的组分:润滑剂:15‑40份;润湿剂:33‑56份;消泡剂:3‑12份;杀菌剂:0.1‑5份;PH调节剂:0.01‑0.3份;亲水性纳米二氧化硅颗粒:0.001‑0.01份;水:7.5‑30份;所述杀菌剂包含超亲水高分子抗菌剂。本发明所述的抗冻水基切削液能够有效降低切削液的凝固点,提高切削液的抗冻性能,使得切削液在‑20°的温度条件下稳定储存和运输,同时具有良好的冷却、清洗、润滑等作用,使用寿命长,适用于单晶或多晶硅等非金属脆硬材料的加工。
Description
【技术领域】
本发明涉及一种切削液,特别涉及一种抗冻水基切削液及其制备 方法。
【背景技术】
切削液(cutting fluid,coolant)是一种用在切削、磨加工过程 中,用来冷却和润滑刀具和加工件的工业用液体。切削液由多种超强 功能助剂经科学复合配合而成,同时具备良好的冷却性能、润滑性能、 防锈性能、清洗功能、防腐功能、易稀释特点。
近年来随着光伏产业的迅速发展,硅片的大直径、超薄化己成为 发展的趋势,为了进一步提高切割效率和切割良率,降低生产成本,固 结磨料线切割技术应运而生,而水基切削液成为其必不可少的辅助原 料。随着固结磨料切割技术的发展,水基切削液性能也得到了极大的 提升,但是由于切削液中大量水的存在,会导致冬季储存和运输时在 低温环境中出现切削液结冻的问题,影响切削液的正常使用。
【发明内容】
本发明要解决的技术问题在于提供一种抗冻水基切削液,以解决 现有技术中存在的,水基切削液在低温环境中储存及运输时出现的冻 结的问题。
根据本发明的一个方面,本发明提供一种抗冻水基切削液,所述 抗冻水基切削液包含以下质量份数的组分:
润滑剂:15-40份;
润湿剂:33-56份;
消泡剂:3-12份;
杀菌剂:0.1-5份;
PH调节剂:0.01-0.3份;
亲水性纳米二氧化硅颗粒:0.001-0.01份;
水:7.5-30份;
所述杀菌剂包含超亲水高分子抗菌剂。
进一步地,所述抗冻水基切削液包含以下质量份数的组分:
润滑剂:18-30份;
润湿剂:42-50份;
消泡剂:6-12份;
杀菌剂:0.1-3份;
PH调节剂:0.05-0.25份;
亲水性纳米二氧化硅颗粒:0.003-0.008份;
水:14-27份;
所述超亲水高分子抗菌剂为有机硅甜菜碱型抗菌化合物。
进一步地,所述抗冻水基切削液包含以下质量份数的组分:
润滑剂:26份;
润湿剂:45份;
消泡剂:9.5份;
杀菌剂:1.8份;
PH调节剂:0.1份;
亲水性纳米二氧化硅颗粒:0.006份;
水:22份。
进一步地,所述有机硅甜菜碱型抗菌化合物的通式为
其中,R1是选自-CH3,或-CH2CH3;
R2是选自-OR1、-CH3;
R3是选自-(CH2)mNH(CH2)n,其中m=3,n=2;
R4是-(CH2)qCH3,其中q=1~17;或R4=-H
R5是-(CH2)qCH3,其中q=1~17;R5=-H
R6是选自-(CH2)rNH(CH2)t,其中r,t=1~10,或-(CH2)u,其中u
=1~6;
Y是选自-COO、-SO3。
进一步地,所述润滑剂为丙二醇或乙二醇或甘油或异丙醇的一种 或任意组合。能快速润滑切割界面,降低摩擦力,提高切割效率,同 时能起到降低切割液冰点的作用。
进一步地,所述润湿剂为非离子表面活性剂或聚氧乙烯、聚氧丙 烯嵌段聚合物或聚氧乙烯聚合物或聚氧丙烯聚合物或脂肪酸甘油酯 或聚甘油酯或山梨醇或聚氧乙烯醚山梨醇酯或炔二醇醚或炔二醇类 的一种或任意组合,所述非离子表面活性剂为聚氧乙烯醚烷基酚醚。 润湿剂能够降低表面张力,使切割液更好的渗透、浸润切割线和硅片 的表面,降低摩擦力,降低切割损伤,提高硅棒切割良率。
进一步地,所述消泡剂为聚硅氧烷类消泡剂或炔二醇类消泡剂或 含氟消类泡剂中的一种或任意组合。消泡剂起到抑制或消除泡沫的作 用。
进一步地,所述杀菌剂还包括三嗪或山梨酸钾。能够进一步抑制 细菌的产生,维持切割液的性能,防止变质。
进一步地,所述PH调节剂为醋酸或乳酸或盐酸或草酸或柠檬酸 或新癸酸或异壬酸的一种或任意组合。PH调节剂的添加能够调节PH 值,使切割液更稳定,同时抑制硅片切割中氢气的产生。
根据本发明的另一个方面,本发明还提供一种抗冻水基切削液的 制备方法,包括以下步骤:
(1)杀菌剂的制备:将含氨基硅氧烷 NH2(CH2)2NH(CH2)3SiCH3(OCH3)2与反应物B在搅拌下、在温 度10~80℃的环境中持续反应2d得到有机硅甜菜碱型抗菌 化合物,反应物B为丙磺酸内酯、丁磺酸内酯、丙烯酸、 β-丙酸内酯中的一种;
(2)上述杀菌剂中加入水,并加入亲水性纳米二氧化硅颗粒, 开启搅拌器进行搅拌;
(3)将步骤(2)中的水溶液加热到30-50℃然后加入润滑剂、 润湿剂、消泡剂、PH调节剂,混合搅拌均匀即得抗冻水基 切削液。
与现有技术相比,本发明具有能够提供一种含有亲水性纳米二氧 化硅颗粒及超亲水高分子抗菌剂的切削液,其与水以及其他水性添加 剂均具有良好的相容性,起到协同增效作用,能够有效降低切削液的 凝固点,提高切削液的抗冻性能,使得切削液在-20°的温度条件下 稳定储存和运输,同时具有良好的冷却、清洗、润滑等作用,使用寿 命长,适用于单晶或多晶硅等非金属脆硬材料的加工。
【具体实施方式】
为使本发明的上述目的、特征和优点能够更加明显易懂,下面结 合具体实施方式对本发明作进一步详细的说明。
此处所称的“一个实施例”或“实施例”是指与所述实施例相 关的特定特征、结构或特性至少可包含于本发明至少一个实现方式 中。在本说明书中不同地方出现的“在一个实施例中”并非必须都指 同一个实施例,也不必须是与其他实施例互相排斥的单独或选择实施 例。本发明中的“多个”、“若干”表示两个或两个以上。本发明中 的“和/或”表示“和”或者“或”。
本发明的实施例提供一种抗冻水基切削液,包含以下质量份数的 组分:
润滑剂:15-40份;
润湿剂:33-56份;
消泡剂:3-12份;
杀菌剂:0.1-5份;
PH调节剂:0.01-0.3份;
亲水性纳米二氧化硅颗粒:0.001-0.01份;
水:7.5-30份;
杀菌剂包含超亲水高分子抗菌剂有机硅甜菜碱型抗菌化合物。
本实施例中,所述润滑剂为丙二醇或乙二醇或甘油或异丙醇的一 种或任意组合。加入的醇类物质可以与水及多种有机溶剂混溶,且可 以有效的提高成品的抗冻性,在低温环境中保持良好的流动性,同时 提高切削液在切削处理中的润滑性,能快速润滑切割界面,降低摩擦 力,提高切割效率。
杀菌剂含有有机硅甜菜碱型抗菌化合物,有机硅甜菜碱型抗菌化 合物具有接触角均低于10度的超亲水表面,与水以及其他水性添加 剂均具有良好的相容性,同时作为一种广谱性工业杀菌防腐剂,对常 见的微生物有很的抑制和杀灭作用,对真菌、细菌、酵母菌及硫酸盐 还原菌均有很好的抑杀作用。且其毒性低,属环境友好型杀生剂、缓 释型杀菌剂,作为杀菌剂应用于切削液,可以长效保护产品的稳定性, 防止质变,延长切削液的使用寿命,符合水性加工液的要求。
对二氧化硅进行化学改性,使二氧化硅表面带有长碳链官能团及 水溶性官能团,水性官能团可以提高二氧化硅在水性体系中的分散稳 定性,而这些长碳链的官能团可防止二氧化硅的聚集,使得纳米二氧 化硅颗粒能稳定的分散于体系中。亲水性纳米二氧化硅颗粒作为稳定 剂添加在切削液中,能够与其他组分起到协同增效作用,有效降低切 削液的凝固点,提高切削液的抗冻性能,使得切削液在-20°的温度 条件下稳定储存和运输,进一步起到抗磨减磨、润滑的作用。
本发明的实施例通过使用不同质量分数的润滑剂、润湿剂、消泡 剂、杀菌剂、PH调节剂、亲水性纳米二氧化硅颗粒、水配制成水性 切削液,应用于单晶或多晶硅等非金属脆硬材料的切削,既可以调节 水性切削液的凝固点并使其凝固点达到较低值,也可以防止切削工具 被腐蚀,延长切削工具的使用寿命,也可以提高产品的表面光洁度。
实施例1
一种抗冻水基切削液,包含以下质量份数的组分:
润滑剂:20份,其中包括丙二醇10份,乙二醇10份;
润湿剂:50份,其中包括聚氧乙烯聚合物5份,聚氧乙烯醚山 梨醇酯5份,炔二醇醚40份;
消泡剂:7份;其中包括聚硅氧烷类消泡剂3份,炔二醇类消泡 剂4份;
杀菌剂:2份,其中包括有机硅甜菜碱型抗菌化合物1.6份,三 嗪0.4份;
PH调节剂:0.1份,PH调节剂为柠檬酸;
亲水性纳米二氧化硅颗粒:0.005份;
水:20.9份。
搅拌均匀后形成具有冷却、清洗、润滑等效果,且抗冻性能良好 的抗冻水基切削液。
实施例2
一种抗冻水基切削液,包含以下质量份数的组分:
润滑剂:35份,其中包括乙二醇15份,甘油10份,异丙醇10 份;
润湿剂:48份,其中包括聚氧乙烯、聚氧丙烯嵌段聚合物3份, 聚氧乙烯醚烷基酚醚10份,炔二醇醚35份;
消泡剂:5份;消泡剂为炔二醇类消泡剂;
杀菌剂:2份,其中包括有机硅甜菜碱型抗菌化合物1份,三嗪 1份;
PH调节剂:0.1份,PH调节剂为异壬酸;
亲水性纳米二氧化硅颗粒:0.01份
水:9.9份。
搅拌均匀后形成具有冷却、清洗、润滑等效果,且抗冻性能良好 的抗冻水基切削液。
实施例3
一种抗冻水基切削液,包含以下质量份数的组分:
润滑剂:20份,其中包括乙二醇10份,丙二醇5份,异丙醇5 份;
润湿剂:40份,其中包括聚甘油酯10份,聚氧乙烯醚山梨醇酯5份,炔二醇醚25份;
消泡剂:10份;其中包括聚硅氧烷类消泡剂2份,炔二醇类消 泡剂8份;
杀菌剂:2份,杀菌剂为有机硅甜菜碱型抗菌化合物;
PH调节剂:0.1份,PH调节剂为异壬酸;
亲水性纳米二氧化硅颗粒:0.001份
水:27.9份。
搅拌均匀后形成具有冷却、清洗、润滑等效果,且抗冻性能良好 的抗冻水基切削液。
实施例4
一种抗冻水基切削液,包含以下质量份数的组分:
润滑剂:15份,其中包括丙二醇10份,异丙醇5份;
润湿剂:55份,其中包括聚氧乙烯聚合物20份,山梨醇35份;
消泡剂:3份,消泡剂为含氟消类泡剂;
杀菌剂:5份,其中包括超亲水高分子抗菌剂有机硅甜菜碱型抗 菌化合物4.5份,山梨酸钾0.5份;
PH调节剂:0.01份,PH调节剂为柠檬酸;
亲水性纳米二氧化硅颗粒:0.003份;
水:22份;
搅拌均匀后形成具有冷却、清洗、润滑等效果,且抗冻性能良好 的抗冻水基切削液。
实施例5
一种抗冻水基切削液,包含以下质量份数的组分:
润滑剂:39份,其中包括乙二醇28份,异丙醇11份;
润湿剂:35份,其中包括聚氧乙烯醚山梨醇酯20份,炔二醇醚 15份;
消泡剂:5.5份,其中包括聚硅氧烷类消泡剂4.5份,炔二醇类 消泡剂1份;
杀菌剂:0.1份,其中包括超亲水高分子抗菌剂有机硅甜菜碱型 抗菌化合物0.1份;
PH调节剂:2.5份,其中包括草酸2份,异壬酸0.5份;
亲水性纳米二氧化硅颗粒:0.007份;
水:17.5份;
搅拌均匀后形成具有冷却、清洗、润滑等效果,且抗冻性能良好 的抗冻水基切削液。
比较例1
比较例1选用新乡市德聚惠源科技有限公司的微乳化切削液 H859-W进行测试。
比较例2
比较例2选用烟台恒鑫化工科技有限公司的THI F-111水基切削 液进行测试。
表1为实施例1-5及对比例1、2的抗冻性能测试结果
表1中可以看出,本发明提供的一种抗冻水基切削液具有较低的 凝固点。综上,本发明所述的抗冻水基切削液能够有效降低切削液的 凝固点,提高切削液的抗冻性能,使得切削液在-20°的温度条件下 稳定储存和运输,同时具有良好的冷却、清洗、润滑等作用,使用寿 命长,适用于单晶或多晶硅等非金属脆硬材料的加工。
上述说明已经充分揭露了本发明的具体实施方式。需要指出的 是,熟悉该领域的技术人员对本发明的具体实施方式所做的任何改动 均不脱离本发明的权利要求书的范围。相应地,本发明的权利要求的 范围也并不仅仅局限于前述具体实施方式。
Claims (10)
1.一种抗冻水基切削液,其特征在于,所述抗冻水基切削液包含以下质量份数的组分:
润滑剂:15-40份;
润湿剂:33-56份;
消泡剂:3-12份;
杀菌剂:0.1-5份;
PH调节剂:0.01-0.3份;
亲水性纳米二氧化硅颗粒:0.001-0.01份;
水:7.5-30份;
所述杀菌剂包含超亲水高分子抗菌剂。
2.根据权利要求1所述的抗冻水基切削液,其特征在于,所述抗冻水基切削液包含以下质量份数的组分:
润滑剂:18-30份;
润湿剂:42-50份;
消泡剂:6-12份;
杀菌剂:0.1-3份;
PH调节剂:0.05-0.25份;
亲水性纳米二氧化硅颗粒:0.003-0.008份;
水:14-27份;
所述超亲水高分子抗菌剂为有机硅甜菜碱型抗菌化合物。
3.根据权利要求2所述的抗冻水基切削液,其特征在于,所述抗冻水基切削液包含以下质量份数的组分:
润滑剂:26份;
润湿剂:45份;
消泡剂:9.5份;
杀菌剂:1.8份;
PH调节剂:0.1份;
亲水性纳米二氧化硅颗粒:0.006份;
水:22份。
5.根据权利要求1所述的抗冻水基切削液,其特征在于,所述润滑剂为丙二醇或乙二醇或甘油或异丙醇的一种或任意组合。
6.根据权利要求1所述的抗冻水基切削液,其特征在于,所述润湿剂为非离子表面活性剂或聚氧乙烯、聚氧丙烯嵌段聚合物或聚氧乙烯聚合物或聚氧丙烯聚合物或脂肪酸甘油酯或聚甘油酯或山梨醇或聚氧乙烯醚山梨醇酯或炔二醇醚或炔二醇类的一种或任意组合,所述非离子表面活性剂为聚氧乙烯醚烷基酚醚。
7.根据权利要求1所述的抗冻水基切削液,其特征在于,所述消泡剂为聚硅氧烷类消泡剂或炔二醇类消泡剂或含氟消类泡剂中的一种或任意组合。
8.根据权利要求1所述的折弯机,其特征在于,所述杀菌剂还包括三嗪或山梨酸钾。
9.根据权利要求1所述的抗冻水基切削液,其特征在于,所述PH调节剂为醋酸或乳酸或盐酸或草酸或柠檬酸或新癸酸或异壬酸的一种或任意组合。
10.一种如权利要求1所述的抗冻水基切削液的制备方法,其特征在于,包括以下步骤:
(1)杀菌剂的制备:将含氨基硅氧烷NH2(CH2)2NH(CH2)3SiCH3(OCH3)2与反应物B在搅拌下、在温度10~80℃的环境中持续反应2d得到有机硅甜菜碱型抗菌化合物,反应物B为丙磺酸内酯、丁磺酸内酯、丙烯酸、β-丙酸内酯中的一种;
(2)上述杀菌剂中加入水,并加入亲水性纳米二氧化硅颗粒,开启搅拌器进行搅拌;
(3)将步骤(2)中的水溶液加热到30-50℃然后加入润滑剂、润湿剂、消泡剂、PH调节剂,混合搅拌均匀即得抗冻水基切削液。
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115820332A (zh) * | 2022-11-25 | 2023-03-21 | 潍坊奥润德新材料科技有限公司 | 一种水基全合成切削液及其制备方法和应用 |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6228816B1 (en) * | 1998-01-09 | 2001-05-08 | Nof Corporation | Aqueous cutting fluid, aqueous cutting agent, and process for cutting hard brittle materials with the same |
CN101812086A (zh) * | 2009-11-28 | 2010-08-25 | 深圳大学 | 一种抗菌化合物及其制备方法 |
CN103242948A (zh) * | 2013-05-09 | 2013-08-14 | 上海应用技术学院 | 一种含石墨烯分散液的水基合成金属切削液及其制备方法 |
CN104327933A (zh) * | 2014-09-30 | 2015-02-04 | 巢湖广丰金属制品有限公司 | 一种环保润滑水基切削液 |
US20160303752A1 (en) * | 2013-11-05 | 2016-10-20 | Frito-Lay Trading Company Gmbh | Method of, and Apparatus for, Cutting Potatoes |
CN106675742A (zh) * | 2016-12-16 | 2017-05-17 | 长沙艾森设备维护技术有限公司 | 一种抗冻水基型金属切削液 |
CN106701291A (zh) * | 2016-12-16 | 2017-05-24 | 池州市旭豪机械有限公司 | 一种水溶性冷拔钢管润滑剂 |
CN106753733A (zh) * | 2016-12-21 | 2017-05-31 | 河南易成新能源股份有限公司 | 纳米复合金刚石线锯切割液 |
-
2020
- 2020-07-03 CN CN202010629157.6A patent/CN111704955A/zh active Pending
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6228816B1 (en) * | 1998-01-09 | 2001-05-08 | Nof Corporation | Aqueous cutting fluid, aqueous cutting agent, and process for cutting hard brittle materials with the same |
CN101812086A (zh) * | 2009-11-28 | 2010-08-25 | 深圳大学 | 一种抗菌化合物及其制备方法 |
CN103242948A (zh) * | 2013-05-09 | 2013-08-14 | 上海应用技术学院 | 一种含石墨烯分散液的水基合成金属切削液及其制备方法 |
US20160303752A1 (en) * | 2013-11-05 | 2016-10-20 | Frito-Lay Trading Company Gmbh | Method of, and Apparatus for, Cutting Potatoes |
CN104327933A (zh) * | 2014-09-30 | 2015-02-04 | 巢湖广丰金属制品有限公司 | 一种环保润滑水基切削液 |
CN106675742A (zh) * | 2016-12-16 | 2017-05-17 | 长沙艾森设备维护技术有限公司 | 一种抗冻水基型金属切削液 |
CN106701291A (zh) * | 2016-12-16 | 2017-05-24 | 池州市旭豪机械有限公司 | 一种水溶性冷拔钢管润滑剂 |
CN106753733A (zh) * | 2016-12-21 | 2017-05-31 | 河南易成新能源股份有限公司 | 纳米复合金刚石线锯切割液 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115820332A (zh) * | 2022-11-25 | 2023-03-21 | 潍坊奥润德新材料科技有限公司 | 一种水基全合成切削液及其制备方法和应用 |
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