CN111373553A - A light-emitting device, preparation method thereof, and display device - Google Patents
A light-emitting device, preparation method thereof, and display device Download PDFInfo
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- CN111373553A CN111373553A CN201980003344.9A CN201980003344A CN111373553A CN 111373553 A CN111373553 A CN 111373553A CN 201980003344 A CN201980003344 A CN 201980003344A CN 111373553 A CN111373553 A CN 111373553A
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- 238000002360 preparation method Methods 0.000 title abstract description 12
- 229910000679 solder Inorganic materials 0.000 claims abstract description 212
- 230000003064 anti-oxidating effect Effects 0.000 claims abstract description 42
- 238000010438 heat treatment Methods 0.000 claims abstract description 18
- 230000003647 oxidation Effects 0.000 claims abstract description 11
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 11
- 238000000034 method Methods 0.000 claims abstract description 9
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 8
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 8
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 5
- 229910052738 indium Inorganic materials 0.000 claims description 5
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims description 5
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 4
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 4
- 229910052737 gold Inorganic materials 0.000 claims description 4
- 239000010931 gold Substances 0.000 claims description 4
- 229910052741 iridium Inorganic materials 0.000 claims description 4
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims description 4
- 229910052750 molybdenum Inorganic materials 0.000 claims description 4
- 239000011733 molybdenum Substances 0.000 claims description 4
- 229910052763 palladium Inorganic materials 0.000 claims description 4
- 238000007747 plating Methods 0.000 claims description 4
- 229910052697 platinum Inorganic materials 0.000 claims description 4
- 229910052703 rhodium Inorganic materials 0.000 claims description 4
- 239000010948 rhodium Substances 0.000 claims description 4
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 claims description 4
- 229910052707 ruthenium Inorganic materials 0.000 claims description 4
- 229910052709 silver Inorganic materials 0.000 claims description 4
- 239000004332 silver Substances 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000003825 pressing Methods 0.000 abstract description 5
- 230000008020 evaporation Effects 0.000 description 6
- 238000001704 evaporation Methods 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 230000009466 transformation Effects 0.000 description 2
- 238000000844 transformation Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- RHZWSUVWRRXEJF-UHFFFAOYSA-N indium tin Chemical compound [In].[Sn] RHZWSUVWRRXEJF-UHFFFAOYSA-N 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000005272 metallurgy Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/83—Electrodes
-
- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09F—DISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
- G09F9/00—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
- G09F9/30—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
- G09F9/33—Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements being semiconductor devices, e.g. diodes
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/83—Electrodes
- H10H20/832—Electrodes characterised by their material
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Abstract
本发明公开了一种发光器件及其制备方法、显示装置,所述发光器件包括:电极、设置在所述电极上的焊料层、设置在所述焊料层上的抗氧化层、设置在所述抗氧化层上的发光元件;所述焊料层可受热膨胀后与位于所述焊料层上方的发光元件连接;所述抗氧化层用于保护所述焊料层以免氧化。在焊料层上设置抗氧化层,焊料在加热处理时不会被氧化,则焊料层会膨胀并与发光元件连接。也就是说,省去了现用技术中的施加压力的过程,从而避免因压力施加导致的发光元件的损伤的问题。
The invention discloses a light-emitting device, a preparation method thereof, and a display device. The light-emitting device comprises: an electrode, a solder layer arranged on the electrode, an anti-oxidation layer arranged on the solder layer, and an anti-oxidation layer arranged on the solder layer. The light-emitting element on the anti-oxidation layer; the solder layer can be thermally expanded and connected to the light-emitting element located above the solder layer; the anti-oxidation layer is used to protect the solder layer from oxidation. An anti-oxidation layer is provided on the solder layer, so that the solder will not be oxidized during heat treatment, and the solder layer will expand and connect to the light-emitting element. That is, the process of applying pressure in the prior art is omitted, thereby avoiding the problem of damage to the light-emitting element caused by the application of pressure.
Description
技术领域technical field
本发明涉及发光器件技术领域,尤其涉及的是一种发光器件及其制备方法、显示装置。The present invention relates to the technical field of light-emitting devices, in particular to a light-emitting device, a preparation method thereof, and a display device.
背景技术Background technique
现有技术中,如图1所示,在Micro-LED制备过程中,将数以百万计微米等级的micro-LED芯片同时转移到基板,使芯片3的金属电极与背板金属线路1上的焊料2相接触,在精确的对位后,经过加热处理,并施加适当的压力使芯片3的金属电极通过焊料2与背板金属线路1连接,倘若施加压力稍微过大,会导致芯片3结构损伤,损伤的芯片3则无法点亮。In the prior art, as shown in FIG. 1 , during the preparation of Micro-LED, millions of micro-LED chips of micron level are transferred to the substrate at the same time, so that the metal electrodes of the
因此,现有技术还有待于改进和发展。Therefore, the existing technology still needs to be improved and developed.
发明内容SUMMARY OF THE INVENTION
本发明要解决的技术问题在于,针对现有技术的上述缺陷,提供一种发光器件及其制备方法、显示装置,旨在解决现有技术中压力施加导致芯片结构损伤的问题。The technical problem to be solved by the present invention is to provide a light-emitting device, a preparation method thereof, and a display device in view of the above-mentioned defects of the prior art, aiming to solve the problem of damage to the chip structure caused by pressure application in the prior art.
本发明解决技术问题所采用的技术方案如下:The technical scheme adopted by the present invention to solve the technical problem is as follows:
一种发光器件,其中,包括:电极、设置在所述电极上的焊料层、设置在所述焊料层上的抗氧化层、设置在所述抗氧化层上的发光元件;所述焊料层可受热膨胀后与位于所述焊料层上方的发光元件连接;所述抗氧化层用于保护所述焊料层以免氧化。A light-emitting device, comprising: an electrode, a solder layer arranged on the electrode, an anti-oxidation layer arranged on the solder layer, and a light-emitting element arranged on the oxidation-resistant layer; the solder layer can be After thermal expansion, it is connected to the light-emitting element located above the solder layer; the anti-oxidation layer is used to protect the solder layer from oxidation.
所述的发光器件,其中,所述电极上设置有焊料槽,所述焊料层位于所述焊料槽内,所述抗氧化层低于所述焊料槽的开口。In the light-emitting device, a solder groove is provided on the electrode, the solder layer is located in the solder groove, and the anti-oxidation layer is lower than the opening of the solder groove.
所述的发光器件,其中,所述电极上设置有UBM层,所述焊料层位于所述UBM层的凹槽内;所述抗氧化层低于所述凹槽的开口。In the light-emitting device, a UBM layer is disposed on the electrode, the solder layer is located in the groove of the UBM layer, and the anti-oxidation layer is lower than the opening of the groove.
所述的发光器件,其中,所述焊料层为铟焊料层、锡焊料层中的一种或多种。In the light-emitting device, the solder layer is one or more of an indium solder layer and a tin solder layer.
所述的发光器件,其中,所述抗氧化层为银层、钼层、铂层、金层、钯层、钌层、铑层、铱层中第一种或多种。In the light-emitting device, the anti-oxidation layer is one or more of a silver layer, a molybdenum layer, a platinum layer, a gold layer, a palladium layer, a ruthenium layer, a rhodium layer, and an iridium layer.
所述的发光器件,其中,所述抗氧化层的厚度为20-200nm。In the light-emitting device, the thickness of the anti-oxidation layer is 20-200 nm.
一种显示装置,其中,包括如上述任意一项所述的发光器件。A display device, comprising the light-emitting device according to any one of the above.
一种发光器件的制备方法,其中,包括以下步骤:A preparation method of a light-emitting device, comprising the following steps:
提供一电极,在所述电极上点焊料层;providing an electrode on which a solder layer is dotted;
在所述焊料层上镀抗氧化层;plating an anti-oxidation layer on the solder layer;
将发光元件置于所述焊料层上方并与所述焊料层对准;placing a light-emitting element over and aligned with the solder layer;
对所述焊料层加热处理使所述焊料层膨胀并与所述发光元件连接。The heat treatment of the solder layer expands the solder layer and connects with the light-emitting element.
所述的发光器件的制备方法,其中,所述提供一电极,在所述电极上点焊料层包括:The preparation method of the light-emitting device, wherein the providing an electrode, and the spot solder layer on the electrode comprises:
提供一电极;其中,所述电极上设置有焊料槽;An electrode is provided; wherein, a solder groove is provided on the electrode;
在所述焊料槽内点焊料层。A solder layer is spotted in the solder bath.
所述的发光器件的制备方法,其中,所述提供一电极,在所述电极上点焊料层包括:The preparation method of the light-emitting device, wherein the providing an electrode, and the spot solder layer on the electrode comprises:
提供一电极,在所述电极上设置UBM层;providing an electrode on which a UBM layer is disposed;
在所述UBM层的凹槽内点焊料层。A solder layer is dotted within the grooves of the UBM layer.
有益效果:在焊料层上设置抗氧化层,焊料在加热处理时不会被氧化,则焊料层会膨胀并与发光元件连接。也就是说,省去了现用技术中的施加压力的过程,从而避免因压力施加导致的发光元件的损伤的问题。Beneficial effects: an anti-oxidation layer is arranged on the solder layer, the solder will not be oxidized during heating treatment, and the solder layer will expand and be connected with the light-emitting element. That is, the process of applying pressure in the prior art is omitted, thereby avoiding the problem of damage to the light-emitting element due to the application of pressure.
附图说明Description of drawings
图1是现有技术中Micro-LED的制备过程的示意图。FIG. 1 is a schematic diagram of the preparation process of Micro-LED in the prior art.
图2是本发明中发光器件的制备流程图。FIG. 2 is a flow chart of the preparation of the light-emitting device in the present invention.
图3是本发明中电极、焊料层、氧化层的结构示意图。FIG. 3 is a schematic structural diagram of electrodes, solder layers and oxide layers in the present invention.
图4是本发明中电极、焊料层、氧化层、Micro-LED的结构示意图。FIG. 4 is a schematic structural diagram of electrodes, solder layers, oxide layers, and Micro-LEDs in the present invention.
图5是本发明中发光元件的结构示意图。FIG. 5 is a schematic structural diagram of a light-emitting element in the present invention.
具体实施方式Detailed ways
为使本发明的目的、技术方案及优点更加清楚、明确,以下参照附图并举实施例对本发明进一步详细说明。应当理解,此处所描述的具体实施例仅仅用以解释本发明,并不用于限定本发明。In order to make the objectives, technical solutions and advantages of the present invention clearer and clearer, the present invention will be further described in detail below with reference to the accompanying drawings and examples. It should be understood that the specific embodiments described herein are only used to explain the present invention, but not to limit the present invention.
请同时参阅图3-图5,本发明提供了一种发光器件的一些实施例。Please refer to FIGS. 3-5 at the same time, the present invention provides some embodiments of a light-emitting device.
如图5所示,本发明的一种发光器件,包括:电极10、设置在所述电极10上的焊料层20、设置在所述焊料层20上的抗氧化层30、设置在所述抗氧化层30上的发光元件;所述焊料层20可受热膨胀后与位于所述焊料层20上方的发光元件连接;所述抗氧化层30用于保护所述焊料层20以免氧化。As shown in FIG. 5 , a light-emitting device of the present invention includes: an
本发明中的发光器件采用如下步骤进行制备:The light-emitting device in the present invention is prepared by the following steps:
S100、提供一电极10,在所述电极10上点焊料层20。S100 , an
S200、在所述焊料层20上镀抗氧化层30。S200 , plating an
S300、将发光元件置于所述焊料层20上方并与所述焊料层20对准。S300 , placing the light-emitting element above the
S400、对所述焊料层20加热处理使所述焊料层20膨胀并与所述发光元件连接。S400 , heating the
值得说明的是,在焊料层20上设置抗氧化层30,焊料在加热处理时不会被氧化(如果不设置抗氧化层30,则焊料会被氧化,而不会出现膨胀,也就不会连接发光元件),则焊料层20会膨胀并与发光元件连接。也就是说,省去了现用技术中的施加压力的过程,从而避免因压力施加导致的发光元件的损伤的问题,从而提高了成品率。It is worth noting that, if the
在本发明的一个较佳实施例中,如图3-图4所示,所述电极10上设置有焊料槽,所述焊料层20位于所述焊料槽内,所述抗氧化层30低于所述焊料槽的开口。In a preferred embodiment of the present invention, as shown in FIG. 3 to FIG. 4 , the
具体地,为了防止焊料在加热处理膨胀时出现向水平面内扩展的问题,在电极10上设置焊料槽,焊料层20设置在焊料槽内,焊料槽的高度根据需要设置,则不会出现焊料溢出的问题,从而有足够的焊料与发光元件连接。Specifically, in order to prevent the expansion of the solder in the horizontal plane during the heat treatment expansion, a solder groove is provided on the
所述电极10上设置有UBM(Under bump Metallurgy,凸块下金属结构)层11,所述焊料层20位于所述UBM层11的凹槽12内;所述抗氧化层30低于所述凹槽12的开口。由于UBM层11上自带有凹槽12,也可以防止出现焊料溢出的问题,而且UBM层11可以增加焊料与电极10的附着力,防止焊料层20从电极10上脱落。若UBM层11的凹槽12不够深,则可以通过垫高凹槽12,以防止焊料溢出。The
焊料槽和凹槽12的形状可以根据需要进行设置,例如,设置成矩形、圆形等形状。可以根据发光元件的形状进行设置,使焊料呈现出发光元件的形状,从而可以充分粘连发光元件。The shapes of the solder grooves and
焊料槽和凹槽12的数量可以根据需要进行设置,例如,每个发光元件对应有若干个焊料槽或凹槽12,这样可以减少焊料层20被氧化的可能性,而且即使焊料层20出现少量的溢流,则会溢流到相邻两个焊料槽(或凹槽12)之间的位置上,从而增加了焊料层20与发光元件接触的面积。各焊料槽或凹槽12可以设置成矩阵排列,或者是根据发光元件的形状进行排列。当然也可以根据需要,为了减少焊料的用量,采用特定排布的焊料槽或凹槽12,如,呈矩形分布,各焊料槽或凹槽12分布在矩形的各边上。The number of solder grooves and
在本发明的一个较佳实施例中,所述焊料层20为铟(In)焊料层、锡(Sn)焊料层中的一种或多种。具体地,还可以采用其它焊料形成焊料层20,当然该焊料层20需要在加热处理(加热处理的温度为100-300℃)时有较好的膨胀性能。在多种焊料组合使用时,可以增加热膨胀系数高的焊料的组成,例如,当采用铟锡焊料时,可以提高铟的含量,减少锡的含量,从而提高焊料的膨胀系数。综合考虑个组分的含量,确保膨胀性能和粘连性能,即确保膨胀到足够高度与发光元件粘连,又确保粘连得足够稳定,不会导致发光元件松动或脱落。In a preferred embodiment of the present invention, the
当采用多种组分的焊料时,所述焊料层20包括:在竖直方向依次设置的若干个子焊料层。各子焊料层的膨胀系数从上至下依次增加。采用分层设置各焊料形成各子焊料层,例如,依次在焊料槽或凹槽12内点上各子焊料。将膨胀系数小的焊料设置在上方,避免焊料降温收缩时,影响发光元件与焊料层20之间的粘连性能。需要说明的是,当发光元件和焊料层20粘连之后,即使温度下降,焊料层20会出现一定的氧化,而不会出现很大程度上的收缩。但是,由于焊料槽和凹槽12内(或者说下层)的焊料比膨胀出来(或者说上层)的焊料较难接触氧气,也较难以氧化,因此其降温时收缩程度更高。When using solder with multiple components, the
焊料槽和凹槽12的深度需要根据焊料层20的膨胀系数和加热处理的温度确定,在加热处理过程中焊料层20不会因膨胀过高而溢流出焊料槽或凹槽12。焊料槽和凹槽12也不能设置过高,加大焊料层20的膨胀难度,防止焊料层20无法与发光元件粘连的问题。The depths of the solder grooves and
在本发明的一个较佳实施例中,所述抗氧化层30为银层、钼层、铂层、金层、钯层、钌层、铑层、铱层中第一种或多种。具体地,抗氧化层30层采用蒸镀(包括物理蒸镀和化学蒸镀)或溅镀的方式镀在焊料层20上,当然还可以采用其它抗氧化材料制成抗氧化层30,比如在加热处理时,不会与空气中的氧气发生反应的材料。抗氧化层30的厚度为20-200nm。抗氧化层30的厚度可以根据实际情况进行设置,不限于20-200nm的范围,抗氧化层30的厚度不宜过厚,过厚则焊料层20中的焊料不能撑破焊料层20,无法实现与发光元件的连接;抗氧化层30的厚度也不宜过薄,过薄则无法起到抗氧化的作用,焊料被氧化后,无法膨胀,也就无法实现与发光元件的连接。In a preferred embodiment of the present invention, the
在本发明的一个较佳实施例中,如图4-图5所示,所述发光元件为Micro-LED 40。所述Micro-LED 40包括:与所述抗氧化层30连接的pad点41、与所述pad点41连接的LED芯片42。In a preferred embodiment of the present invention, as shown in FIGS. 4-5 , the light-emitting element is a Micro-LED 40 . The Micro-LED 40 includes: a
具体地,在焊料层20膨胀时,焊料层20中的焊料突破抗氧化层30,从而与pad点41焊接,实现发光元件与电极10的连接。Specifically, when the
基于上述发光器件,本发明还提供了一种显示装置的较佳实施例:Based on the above-mentioned light-emitting device, the present invention also provides a preferred embodiment of a display device:
本发明实施例所述一种显示装置,包括如上述任意一实施例所述的发光器件。A display device according to an embodiment of the present invention includes the light-emitting device according to any one of the above embodiments.
基于上述发光器件,本发明还提供了一种发光器件的制备方法的较佳实施例:Based on the above light-emitting device, the present invention also provides a preferred embodiment of a method for preparing a light-emitting device:
如图2所示,本发明实施例所述的发光器件的制备方法,包括以下步骤:As shown in FIG. 2, the preparation method of the light-emitting device according to the embodiment of the present invention includes the following steps:
步骤S100、提供一电极10,在所述电极10上点焊料层20。In step S100 , an
具体地,本发明中的焊料层20为铟焊料层、锡焊料层中的一种或多种,具体如上所述。Specifically, the
具体地,步骤S100有两种实施方式,第一种实施方式中,步骤S100包括:Specifically, there are two implementations of step S100. In the first implementation, step S100 includes:
步骤S110a、提供一电极10;其中,所述电极10上设置有焊料槽。In step S110a, an
步骤S120a、在所述焊料槽内点焊料层20。Step S120a, spot the
焊料槽可以避免加热时焊料层20中的焊料外溢的问题,具体如上所述。The solder bath can avoid the problem of overflow of the solder in the
第二种实施方式中,步骤S100包括:In the second embodiment, step S100 includes:
步骤S110b、提供一电极10,在所述电极10上设置UBM层。In step S110b, an
需要指出的是,UBM层11可以在第一种实施方式中焊料槽的基础上设置,进一步提高焊料层20与电极10之间的附着力。It should be pointed out that the
步骤S120b、在所述UBM层11的凹槽12内点焊料层20。Step S120b , spot the
UBM层11上有凹槽12,焊料层20点在凹槽12内,也可以起到防止加热时焊料层20中的焊料外溢的问题。The
具体地,设置焊料槽和UBM层11得到既定的焊料槽和凹槽12的形状、数量以及深度。根据焊料槽或凹槽12的形状、数量以及深度,点上焊料层20。在点焊料层20时,确定焊料层20的组成和量。例如,当焊料层20采用若干个子焊料层时,依次在焊料槽或凹槽12内点上各子焊料得到子焊料层,从而形成焊料层20。在点各子焊料时,先点膨胀系数大的子焊料,后点膨胀系数小的子焊料层。Specifically, the solder grooves and
步骤S200、在所述焊料层20上镀抗氧化层30。Step S200 , plating an
本发明中采用银层、钼层、铂层、金层、钯层、钌层、铑层、铱层中第一种或多种作为抗氧化层30,采用蒸镀(包括物理蒸镀和化学蒸镀)或溅镀的方式镀在焊料层20上,当然还可以采用其它抗氧化材料制成抗氧化层30。In the present invention, the first one or more of silver layer, molybdenum layer, platinum layer, gold layer, palladium layer, ruthenium layer, rhodium layer and iridium layer are used as
步骤S300、将发光元件置于所述焊料层20上方并与所述焊料层20对准。Step S300 , placing the light-emitting element on the
具体地,发光元件位于焊料层20上方时,发光元件与焊料层20之间可以有间隙,例如,根据焊料层20可以膨胀的程度,或者说膨胀的高度,确定发光元件与焊料层20之间的间隙;在一个发光元件对应多个焊料槽或凹槽12时,可以将发光元件直接放在焊料槽或凹槽12上,相邻两个焊料槽(或凹槽12)之间的平面可以支撑发光元件,当焊料层20膨胀后,焊料可以溢流到相邻两个焊料槽(或凹槽12)之间的平面上从而与发光元件粘连。发光元件与焊料层20之间也可以是没有间隙,就是说,发光元件与焊料层20接触。当然此时发光元件与焊料层20是对准设置的。Specifically, when the light-emitting element is located above the
本发明中的发光元件采用Micro-LED,采用尺寸较小的Micro-LED时,通过巨量转移的方式将Micro-LED转移至焊料层20上方。The light-emitting element in the present invention adopts Micro-LED. When a Micro-LED with a smaller size is used, the Micro-LED is transferred to the top of the
步骤S400、对所述焊料层20加热处理使所述焊料层20膨胀并与所述发光元件连接。Step S400 , heating the
具体地,对焊料层20进行加热处理,可以从电极10背面(没有设置焊料层20的一面)进行加热,使焊料层20膨胀从而实现与发光元件的连接。Specifically, the
具体地,根据凹槽12或焊料槽的深度,以及焊料层20的膨胀系数确定加热处理的温度。也就是说,焊料层20可以膨胀,并接触到发光元件并粘连发光元件。当然焊料层20也不能过度膨胀,而导致焊料溢流过多而导致短路。Specifically, the temperature of the heat treatment is determined according to the depth of the
综上所述,本发明所提供的一种发光器件及其制备方法、显示装置,所述发光器件包括:电极、设置在所述电极上的焊料层、设置在所述焊料层上的抗氧化层、设置在所述抗氧化层上的发光元件;所述焊料层可受热膨胀后与位于所述焊料层上方的发光元件连接;所述抗氧化层用于保护所述焊料层以免氧化。在焊料层上设置抗氧化层,焊料在加热处理时不会被氧化,则焊料层会膨胀并与发光元件连接。也就是说,省去了现用技术中的施加压力的过程,从而避免因压力施加导致的发光元件的损伤的问题。To sum up, the present invention provides a light-emitting device, a preparation method thereof, and a display device, wherein the light-emitting device comprises: an electrode, a solder layer arranged on the electrode, and an anti-oxidation device arranged on the solder layer. The anti-oxidation layer is used to protect the solder layer from oxidation. An anti-oxidation layer is provided on the solder layer, so that the solder will not be oxidized during heat treatment, and the solder layer will expand and connect to the light-emitting element. That is, the process of applying pressure in the prior art is omitted, thereby avoiding the problem of damage to the light-emitting element due to the application of pressure.
应当理解的是,本发明的应用不限于上述的举例,对本领域普通技术人员来说,可以根据上述说明加以改进或变换,所有这些改进和变换都应属于本发明所附权利要求的保护范围。It should be understood that the application of the present invention is not limited to the above examples. For those of ordinary skill in the art, improvements or transformations can be made according to the above descriptions, and all these improvements and transformations should belong to the protection scope of the appended claims of the present invention.
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