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CN111300261A - 具有磨料在其中的打印的化学机械抛光垫 - Google Patents

具有磨料在其中的打印的化学机械抛光垫 Download PDF

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CN111300261A
CN111300261A CN202010106777.1A CN202010106777A CN111300261A CN 111300261 A CN111300261 A CN 111300261A CN 202010106777 A CN202010106777 A CN 202010106777A CN 111300261 A CN111300261 A CN 111300261A
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polymer matrix
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K·克里希南
N·B·帕蒂班德拉
P·格帕兰
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Abstract

一种制造抛光垫的抛光层的方法包括以下步骤:确定将嵌入在所述抛光层的聚合物母体内的颗粒的期望的分布。利用3D打印机相继地沉积所述聚合物母体的多个层,所述聚合物母体的所述多个层中的每一个层通过从喷嘴喷出聚合物母体前体来沉积。根据所述期望的分布、利用所述3D打印机来相继地沉积所述颗粒的多个层。使聚合物母体前体凝固成具有以所述期望的分布嵌入的颗粒的聚合物母体。

Description

具有磨料在其中的打印的化学机械抛光垫
本申请是申请日为2014年10月22日、申请号为201480060461.6、名称为“具有磨料在其中的打印的化学机械抛光垫”的中国专利申请(PCT申请号为PCT/US2014/061838)的分案申请。
技术领域
本发明关于用于化学机械抛光中的抛光垫。
背景技术
集成电路通常通过将导体层、半导体成或绝缘层相继地沉积在硅晶片上而形成在基板上。各种制造工艺需要对基板上的层的平坦化。例如,对于某些应用(例如,对金属层的抛光以在经图案化的层的沟槽中形成通孔、插塞与线),上覆的层经平坦化直到经图案化的层的顶表面被暴露为止。在其他应用(例如,对电介质层的平坦化以进行光刻)中,上覆层经抛光直到期望的厚度保持在下置层上方为止。
化学机械抛光(CMP)是一种可接受的平坦化方法。此平坦化方法通常要求将基板装设在载具头上。基板的暴露的表面通常放置成抵靠旋转的抛光垫。载具头在基板上提供可控的负载以推挤基板抵靠抛光垫。抛光液(诸如,具有磨料颗粒的浆料)通常被供应至抛光垫的表面。
化学机械抛光工艺的一个目标是抛光均匀性。如果以不同的速率来抛光基板上的不同区域,则基板的一些区域使过多的材料被去除(“过度抛光(overpolishing)”)或过少的材料被去除(“抛光不足(underpolishing)”)是可能的。
常规的抛光垫包括“标准的”的垫与固定磨料的垫。标准的垫具有聚氨基甲酸酯(polyurethane)抛光层,并且也可包括可压缩的背托层,所述聚氨基甲酸酯抛光层具有耐久的粗糙化表面。相比之下,固定磨料的垫具有被固持在容纳介质中的磨料颗粒,并且可被支撑在总体上不可压缩的背托层上。然而,商业上可取得的固定磨料的垫通常限于特定的材料,例如,氧化铈。
通常通过模铸、浇铸或烧结聚氨基甲酸酯材料来制作抛光垫。在模铸的情况下,可(例如,通过注射模铸)一次制造一个抛光垫。在浇铸的情况下,将液体前体浇铸并固化(cure)成饼,所述饼后续被切割成单个的垫片。随后,可将这些垫片机械加工至最终的厚度。可通过机械加工使凹槽形成在抛光表面中,或者可作为注射模铸工艺的部分来形成凹槽。
除了平坦化之外,抛光垫还可用于擦光操作(finishing operations),诸如,磨光(buffing)。
发明内容
化学机械抛光设备的最终用户通常从一个或更多个销售方获得耗材(诸如,抛光垫与抛光浆料)。抛光浆料通常含有在流体中的磨料颗粒的悬浊液。流体通常包括附加的化学品以确保磨料颗粒适当地悬置在流体中且不形成不期望的磨料颗粒的结块,所述结块会造成刮伤或其他缺陷且使抛光浆料不适于抛光。
为了降低最终用户的拥有成本(cost of ownership),并且为了减少废弃物处理,可通过将磨料颗粒嵌入在垫本身中来将抛光垫与磨料颗粒组合成单个实体。然而,将颗粒嵌入到垫中引起各种问题。因此,嵌入在抛光垫中的磨料材料已经被限于诸如氧化铈之类的材料。尽管已经提议氧化铝磨料颗粒,但是具有氧化铝颗粒的抛光垫对于商业化是不实际的。在制造具有氧化铝磨料颗粒的抛光垫时的至少一个问题是使氧化铝磨料颗粒悬置在用于制造抛光垫的聚合物(例如,热固型聚合物)中的困难。例如,氧化铝磨料颗粒在聚合物溶液中的悬置不均匀地分布。此不均匀的分布导致氧化铝磨料颗粒的结块,并且此结块在抛光垫用于经抛光的基板时导致缺陷。
一种用于制造具有嵌入在其中的不同的磨料颗粒的抛光垫的技术是使用3D打印工艺。在3D打印工艺中,累进式地沉积且熔合或固化垫前体(例如,粉末或液体前体)的薄层以形成完整的三维的抛光垫。随后,在经打印的垫前体层内选择性地沉积磨料颗粒。
一方面,一种制造抛光垫的抛光层的方法包括以下步骤:确定将嵌入在所述抛光层的聚合物母体(matrix)内的颗粒的期望的分布。所述方法包括以下步骤:利用3D打印机相继地沉积所述聚合物母体的多个层,所述聚合物母体的所述多个层中的每一个层通过从喷嘴喷出聚合物母体前体来沉积。相继地沉积所述多个层的步骤包括以下步骤:根据所述期望的分布、利用所述3D打印机将所述颗粒分布在所述多个层中。所述方法包括以下步骤:使所述聚合物母体前体凝固(solidify)以形成凝固的聚合物母体,所述凝固的聚合物母体具有以所述期望的分布嵌入的所述颗粒。
实施方式可包括下述特征的中一者或更多者。所述方法可进一步包括以下步骤:根据所述期望的分布,将所述聚合物母体前体与所述颗粒预混合以形成由所述喷嘴喷出的混合物。所述聚合物母体前体可以是液体热固型聚合物。所述聚合物母体前体可以是熔融的热塑型聚合物。所述聚合物母体前体可以从第一打印头的喷嘴被喷出,并且所述颗粒可以从第二打印头的喷嘴被喷出。所述颗粒可以由选自由氧化硅、陶瓷、金属、金属氧化物以及聚合物构成的组的材料形成。氧化硅可经熏制或可以是胶状的。所述颗粒可以是氧化铝。所述颗粒可以是磨料颗粒。所述颗粒可以进一步包括当所述抛光层用于抛光时经历化学反应的反应性颗粒。所述颗粒可以具有中空核心。所述颗粒可以具有高达1mm的尺寸,例如,小于10μm,例如,小于1μm。所述颗粒可以是圆的、细长的或多面的。所述抛光层可包括由所述颗粒的中空核心形成的孔洞。使所述聚合物母体前体凝固的步骤可包括以下步骤:固化所述聚合物母体前体。固化所述聚合物母体前体的步骤可包括紫外(UV)固化步骤。固化所述聚合物母体前体的步骤可包括热固化步骤。可利用激光或IR灯来完成所述热固化。所述聚合物母体前体可包括聚氨基甲酸酯单体。所述凝固的聚合物母体可包括聚氨基甲酸酯、丙烯酸酯、环氧树脂、丙烯腈-丁二烯-苯乙烯(ABS)、聚醚酰亚胺或聚酰胺。使所述聚合物母体前体凝固的步骤包括以下步骤:冷却所述聚合物母体前体。所述期望的分布可以是所述颗粒在所述聚合物母体内的均匀分布。所述期望分布可以是所述颗粒在所述聚合物母体内的图案化分布。所述聚合物母体前体与所述颗粒可以被沉积以在所述抛光垫的表面上产生多个图案化的表面特征。所述图案化的表面特征可包括细长的凹槽。所述图案化的表面特征可包括类似钮扣的升高的特征。
另一方面,一种抛光垫包括抛光层,所述抛光层具有聚合物母体以及嵌入在所述聚合物母体内的颗粒的期望的分布。所述颗粒的期望的分布包括所述颗粒跨所述抛光层的不同的分布密度。
实施方式可包括下述特征中的一者或更多者。所述抛光垫可包括在所述抛光垫的表面上的细长的凹槽。所述颗粒可具有高达1mm的尺寸,例如,小于10μm,例如,小于1μm。所述颗粒可以是圆的、细长的或多面的。所述聚合物母体可包括聚氨基甲酸酯、丙烯酸酯、环氧树脂、丙烯腈-丁二烯-苯乙烯(ABS)、聚醚酰亚胺或聚酰胺。
又一方面,一种制造抛光垫的抛光层的方法包括以下步骤:将聚合物母体前体与颗粒预混合以形成混合物。所述聚合物母体前体用于制造所述抛光层的聚合物母体。所述方法包括以下步骤:在从3D打印机的喷嘴喷出所述混合物之前,搅拌所述混合物;以及利用所述3D打印机相继地沉积所述聚合物母体的多个层。所述聚合物母体的所述多个层中的每一个层通过从所述喷嘴喷出所述聚合物母体前体来沉积。相继地沉积所述多个层的步骤包括以下步骤:利用所述3D打印机在所述多个层中沉积所述颗粒。所述方法包括以下步骤:使所述聚合物母体前体凝固以形成凝固的聚合物母体,所述凝固的聚合物母体具有嵌入在其中的所述颗粒。
在所附附图和以下描述中陈述本发明的一个或更多个实施例的细节。通过所述描述和附图,并且通过权利要求书,本发明的其他特征、目的和优点将是明显的。
附图说明
图1A是示例抛光垫的示意性截面侧视图。
图1B是另一示例抛光垫的示意性截面侧视图。
图1C是又一示例抛光垫的示意性截面侧视图。
图2是化学机械抛光站的示意性侧视部分截面图。
图3A是示出用于制造抛光垫的示例性3D打印机的示意性截面侧视图。
图3B是示出用于制造抛光垫的示例性3D打印机的示意性截面侧视图。
在各附图中相同的元件符号指示相同的元件。
具体实施方式
参照图1A至图1C,抛光垫18包括抛光层22。如图1A中所示,抛光垫可以是由抛光层22构成的单层垫,或如图1C中所示,抛光垫可以是包括抛光层22与至少一个背托层20的多层垫。
抛光层22可以是在抛光工艺中被插入的材料。抛光层22的材料可以是塑料,例如,聚氨基甲酸酯、丙烯酸酯、环氧树脂、丙烯腈-丁二烯-苯乙烯(ABS)、聚醚酰亚胺或聚酰胺。在一些实施例中,抛光层22是相对耐久且硬的材料。例如,抛光层22可具有在肖式D尺度(Shore D scale)上的约40至80(例如,50至65)的硬度。
如图1A中所示,抛光层22可以是同质组成的层,或如图1B中所示,抛光层22可包括被固持在塑料材料(例如,聚氨基甲酸酯、丙烯酸酯、环氧树脂、丙烯腈-丁二烯-苯乙烯(ABS)、聚醚酰亚胺、或聚酰胺)的母体29中的磨料颗粒28。磨料颗粒28比母体29的材料更硬。磨料颗粒28可形成抛光层的0.05wt%至75wt%。例如,磨料颗粒28可以小于抛光层22的1wt%,例如,小于0.1wt%。或者,磨料颗粒28可以大于抛光层22的10wt%,例如,大于50wt%。磨料颗粒的材料可以是金属氧化物(诸如,氧化铈、氧化铝、氧化硅或它们的组合)、聚合物、金属间化合物或陶瓷。
在一些实施例中,抛光层包括孔洞(例如,小孔隙)。孔洞可以为50~100微米宽。
抛光层22可具有80mil(密耳)或更小(例如,50mil或更小,例如,25mil或更小)的厚度D1。由于调节工艺倾向于磨除覆盖层,因此抛光层22的厚度可经选择以提供抛光垫18使用寿命,例如,3000次抛光与调节循环。
在微观尺度上,抛光层22的抛光表面24可具有粗糙的表面纹理,例如,2~4微米rms。例如,抛光层22可经受研磨或调节工艺以生成此粗糙的表面纹理。此外,3D打印可提供小型均匀的特征,例如,低至200微米。
尽管抛光表面24在微观尺度上可能是粗糙的,但是抛光层22在抛光垫本身的宏观尺度上可具有良好的厚度均匀性(此均匀性是指抛光表面24相对于抛光层的底表面的全局高度变化,并且没有计算刻意形成在抛光层中的任何宏观凹槽或穿孔)。例如,厚度非均匀性可以小于1mil。
任选地,抛光表面24的至少部分可包括形成在其中、用于携载浆料的多个凹槽26。凹槽26可以是几乎任何图案的,诸如,同心圆、直线、交叉阴影线、螺旋形,等等。假设凹槽存在,则抛光表面24(即,凹槽26之间的高台)可以约为抛光垫22的总水平表面积,即可以是抛光垫18的总水平表面积的25~90%。因此,凹槽26可占据抛光垫18的总水平表面积的10~75%。凹槽26之间的高台可具有约0.1至2.5mm的横向宽度。
在一些实施方式中(例如,如果存在背托层20),凹槽26可完全延伸穿过抛光层22。在一些实施方式中,凹槽26可延伸穿过抛光层22的厚度的约20~80%(例如,40%)。凹槽26的深度可以是0.25至1mm。例如,在具有50mil厚的抛光层22的抛光垫18中,凹槽26可具有约20mil的深度D2。
背托层20可比抛光层22更软且更具压缩性。背托层20可具有在肖式A尺度上的80或更小的硬度,例如,约具有60肖氏A硬度的硬度。背托层20可比抛光层22更厚或更薄或可具有与抛光层22相同的厚度。
例如,背托层可以是开孔(open-cell)泡棉或闭孔(closed-cell)泡棉(诸如,具有孔隙的聚氨基甲酸酯或聚硅氧烷),使得在处于压力下时,孔(cell)会瓦解,并且背托层会压缩。适合用作背托层的材料是可从美国康涅狄格州的罗杰斯市的罗杰斯公司(RogersCorporation)获得的PORON 4701-30或是可从罗门哈斯公司(Rohm&Haas)获得的SUBA-IV。可通过选择层材料与孔隙度来调整背托层的硬度。背托层也可由天然橡胶、乙烯丙烯二烃单体(EPDM)橡胶、腈橡胶、或聚氯丁二烯(氯丁橡胶)形成。或者,背托层20可由与抛光层相同的前体形成,并且具有与抛光层相同的孔隙度,但是具有不同的固化程度以具有不同的硬度。
现在转到图2,可在CMP设备的抛光站10处抛光一个或多个基板14。适当的抛光设备的描述可在美国专利第5,738,574号中找到,此美国专利案的完整公开内容通过引用被并入到本文中。
抛光站10可包括可旋转平台16,抛光垫18被放置在此可旋转平台16上。在抛光步骤期间,可通过浆料供应端口或组合式浆料/冲洗臂32将抛光液30(例如,磨料浆料)供应至抛光垫18的表面。抛光液30可含有磨料颗粒、pH调整剂或化学活性成份。
可由载具头34将基板14固持成抵靠抛光垫18。载具头34从支撑结构(诸如,转盘)悬置,并且通过载具驱动杆36而连接到载具头旋转电机,使得载具头可绕轴38旋转。在抛光液30存在的情况下,抛光垫18与基板14的相对运动导致对基板14的抛光。
3D打印提供用于制造具有嵌入在抛光层内的特定位置中的磨料的抛光垫的方便且高度可控的工艺。参照图3A,至少抛光垫18的抛光层22是使用3D打印工艺来制造的。在此制造过程中,累进式地沉积并熔合薄材料层。例如,可从液滴喷射打印机55的喷嘴54喷出垫前体材料的液滴52以形成层50。液滴喷射打印机与喷墨打印机类似,但使用垫前体材料而非墨水。喷嘴54平移(如箭头A所示)越过支撑件51。
对于所沉积的第一层50a,喷嘴54可喷射到支撑件51上。对于后续沉积的层50b,喷嘴54可喷射到已经凝固的材料56上。在每一层50都凝固之后,随后将新的层沉积在先前沉积的层上方,直到制造了完整的三维的抛光层22为止。由喷嘴54按存储在运行于计算机60上的3D绘图程序中的图案来施加每一层。每一层50都小于抛光层22的总厚度的50%,例如,小于10%,例如,小于5%,例如,小于1%。
支撑件51可以是刚性基座,或可以是柔性膜(例如,聚四氟乙烯(PTFE)层)。如果支撑件51是膜,则支撑件51可形成抛光垫18的部分。例如,支撑件51可以是背托层20或背托层20与抛光层22之间的层。或者,可将抛光层22从支撑件51中移除。
一般而言,当逐层打印抛光层22时,磨料颗粒23被局部地分配到抛光层内。磨料颗粒的局部分配有助于避免结块。
具体而言,磨料颗粒23可与液体热固型聚合物前体预混合。热固型聚合物前体与磨料颗粒的混合物的连续搅拌可防止颗粒的结块,这与用于使用于喷墨打印机中的墨水颜料均质化的设备类似。此外,对混合物的连续的搅拌确保了磨料颗粒在前体中的非常均匀的分布。这可导致颗粒穿过抛光层的更均匀的分布,这会导致改善的抛光均匀性且也有助于避免结块。
根据特定的图案,从单个喷嘴(例如,喷嘴54)分配预混合的混合物。例如,可均匀地分配预混合的混合物以产生均质的抛光层22,所述均质的抛光层22具有均匀的嵌入的磨料颗粒遍及此抛光层22的分布。
或者,具有喷嘴58的分开的打印头57(如图3B中所示)可用于分配纯液体热固型聚合物前体(即,不具有任何磨料颗粒),而预混合的混合物仅被分配在所选择的位置处。这些所选择的位置共同地形成期望的磨料颗粒的打印图案,并且可被存储成CAD兼容的文件,所述CAD兼容的文件随后由控制打印机的电子控制器(例如,计算机60)读取。随后,电子控制信号被发送到打印机55,以便仅当喷嘴54平移到由CAD兼容的文件指定的位置时才分配预混合的混合物。
或者,磨料颗粒可与熔融的热塑型塑料预混合,而不使用液体热固型聚合物前体。在这种情况下,在分配具有磨料颗粒的混合物之前,也连续地搅拌含有磨料颗粒的混合物。当根据期望的打印图案从3D打印机中分配混合物之后,混合物的熔融的部分冷却并凝固,并且磨料颗粒凝结在适当的位置处。对混合物的连续的搅拌确保了磨料颗粒在前体中的非常均匀的分布。这可导致颗粒穿过抛光层的更均匀的分布,这会导致改善的抛光均匀性且也有助于避免结块。
与在使用液体热固型聚合物前体时的情况类似,可均匀地分配热塑型塑料混合物以产生磨料颗粒跨整个抛光层22的均匀分布。或者,根据被存储成CAD兼容的文件的且由用于驱动打印机55的电子控制器读取的磨料颗粒的期望的打印图案,含有磨料颗粒的热塑型塑料混合物可仅被分配在抛光层中的所选择的位置处。
与以悬浮方式从喷嘴54分配磨料颗粒不同,可直接地以粉末形式从喷嘴54分配磨料颗粒,同时使用不同的打印头57来分配垫聚合物前体。在将磨料颗粒分配到所沉积的聚合物材料之前首先分配聚合物前体,随后固化此混合物。
尽管3D打印对于构建使用易于结块的磨料颗粒(例如,氧化铝)的抛光垫是特别有用的,但是此方式可用于其他抛光颗粒。因此,磨料颗粒可包括氧化硅、陶瓷氧化物、金属以及硬聚合物。
打印头可打印实心颗粒或具有中空核心的颗粒。打印头也可分配不同类型的颗粒,这些类型中的一些类型可在CMP处理期间经历化学反应以在正在被抛光的基板的层上产生所期望的改变。在CMP处理中用于抛光垫的化学反应的示例包括在10~14的碱性pH范围内发生的化学过程,这些化学过程涉及氢氧化钾、氢氧化铵以及由浆料制造商使用的其他专有化学过程中的一者或更多者。在涉及有机酸(诸如,醋酸、柠檬酸)的2~5的酸性pH范围内发生的化学过程也用于CMP处理中。涉及过氧化氢的氧化反应也是用于CMP处理中的化学反应的示例。磨料颗粒也可仅用于提供机械磨蚀功能。颗粒可具有高达1mm(例如,小于10μm,例如,小于1μm)的尺寸,并且颗粒可具有不同的形态,例如,颗粒可以是圆的、细长的或多面的。
常规意义上已使用抛光垫内的孔洞来将浆料局部地保持在抛光垫内。由于由母体固持磨料颗粒,抛光垫不再需要含有孔洞。通过在期望有孔洞的位置处沉积空心球体,孔洞仍可选择性地分布在所打印的抛光垫内。
凝固可伴随有聚合。例如,垫前体材料的层50可以是单体,并且可通过紫外(UV)固化原位地聚合此单体。在沉积之后可立即高效地固化垫前体材料,或者可沉积垫前体材料的整个层50,随后,可同时固化整个层50。
然而,具有实现3D打印的替代技术。替代地,打印机通过分散包括磨料颗粒23的作为添加剂的粉末层并将粘结剂材料的液滴喷射到此粉末层上来产生抛光层22。
由于此逐层的打印方式,此3D打印方式可允许将在嵌入在抛光层中的磨料颗粒的分布中实现的的紧密的容限。同样,简单地通过改变存储在3D绘图程序中的图案,一个打印系统(具有打印机55和计算机60)可用于制造各种不同的抛光垫。
在一些实施方式中,也可通过3D打印工艺来制造背托层20。例如,可由打印机55在不中断的操作中制造背托层20与抛光层22。通过使用不同的固化量(例如,不同的UV辐射强度),提供具有与抛光层22不同硬度的背托层20。
在其他实施方式中,通过常规工艺来制造背托层20,随后,此背托层被固定至抛光层22。例如,可通过薄粘附层28(例如,作为压敏粘附剂)将抛光层22固定至背托层20。
已经描述了许多实施方式。然而,将理解的是,可进行各种修改。例如,抛光垫或载具头或这两者可移动以提供抛光表面与基板之间的相对运动。抛光垫可以是圆形或某个其他形状。粘附层可施加至抛光垫的底表面以将垫固定至平台,并且可在抛光垫被放置在平台上之前由可移除的内衬来覆盖粘附层。此外,尽管使用了竖直定位的术语,但是应当理解的是,可上下颠倒地、以竖直取向或以某个其他取向来固持抛光表面和基板。
相应地,其他实现落入所附权利要求书的范围内。

Claims (10)

1.一种制造抛光垫的抛光层的方法,包括:
接收计算机可读文件,所述计算机可读文件包含设置要嵌入所述抛光层的聚合物母体内的实心磨料颗粒的期望分布的数据;
利用3D打印机相继地沉积所述聚合物母体的多个层,所述聚合物母体的多个层中的每一个层通过从所述3D打印机的一个或多个喷嘴喷出聚合物母体前体来沉积,其中相继地沉积所述多个层包括:从第一喷嘴将没有颗粒的聚合物母体前体的液滴选择性地喷出到一些位置中,且从第二喷嘴将包含聚合物母体前体和实心磨料颗粒的混合物的液滴选择性地喷出到一些位置中,以便利用所述3D打印机来根据所述期望分布将所述实心磨料颗粒分布在所述多个层中,从而提供所述实心磨料颗粒横跨所述抛光层的不同分布密度;
使所述聚合物母体前体凝固以形成凝固的聚合物母体,所述凝固的聚合物母体具有以所述期望分布嵌入的所述实心磨料颗粒。
2.根据权利要求1所述的方法,其中所述磨料颗粒包括氧化硅、陶瓷、金属、或金属氧化物颗粒中的一种或多种。
3.根据权利要求1所述的方法,其中所述聚合物母体前体是液体热固型聚合物前体,并且使所述聚合物母体前体凝固包括:紫外(UV)固化或热固化所述聚合物母体前体。
4.根据权利要求1所述的方法,进一步包括:将所述聚合物母体前体与所述实心磨料颗粒预混合以形成由所述喷嘴喷出的所述混合物,以及在所述混合物从所述第二喷嘴喷出之前搅拌所述混合物。
5.根据权利要求1所述的方法,其中从第一打印头的喷嘴喷出所述聚合物母体前体,并且从第二打印头的喷嘴喷出所述颗粒。
6.一种用于制造抛光垫的增材制造设备,包括:
支撑件;
聚合物母体前体的源;
聚合物母体前体和实心磨料颗粒的混合物的源;
打印机,用于在所述支撑件上形成多个层以形成抛光层,所述打印机包括第一喷嘴和第二喷嘴,所述第一喷嘴耦合到所述聚合物母体前体的源,所述第二喷嘴耦合到所述混合物的源;
计算机,耦合到所述打印机且被配置用于:接收包含设置要嵌入所述抛光层的所述聚合物母体内的颗粒的期望分布的数据的计算机可读文件,并且响应于所述数据控制所述打印机从所述第一喷嘴将没有颗粒的所述聚合物母体前体的液滴选择性地喷出到一些位置中、且从所述第二喷嘴将包括聚合物母体前体和实心磨料颗粒的所述混合物的液滴选择性地喷出到一些位置中,以便根据所述期望分布将所述实心磨料颗粒分布在所述多个层中,从而提供所述中空聚合物颗粒横跨所述抛光层的不同分布密度;
辐射源,用于固化所述多个层以形成所述抛光垫的所述抛光层。
7.根据权利要求6所述的设备,其中所述辐射源包括UV辐射源。
8.根据权利要求7所述的设备,其中所述打印机包括具有所述第一喷嘴的第一打印头和具有所述第二喷嘴的第二打印头。
9.根据权利要求6所述的设备,其中所述辐射源被配置用于在沉积之后立即固化所述聚合物母体前体。
10.根据权利要求6所述的设备,其中所述辐射源被配置用于在沉积聚合物母体前体的整个层之后同时固化所述整个层。
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Families Citing this family (56)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9067299B2 (en) * 2012-04-25 2015-06-30 Applied Materials, Inc. Printed chemical mechanical polishing pad
US9421666B2 (en) 2013-11-04 2016-08-23 Applied Materials, Inc. Printed chemical mechanical polishing pad having abrasives therein
US9980474B2 (en) * 2014-01-30 2018-05-29 Sound Horse Technologies, Llc Elastomeric horseshoe and method of making same
WO2015120430A1 (en) * 2014-02-10 2015-08-13 President And Fellows Of Harvard College 3d-printed polishing pad for chemical-mechanical planarization (cmp)
US9873180B2 (en) 2014-10-17 2018-01-23 Applied Materials, Inc. CMP pad construction with composite material properties using additive manufacturing processes
US10399201B2 (en) 2014-10-17 2019-09-03 Applied Materials, Inc. Advanced polishing pads having compositional gradients by use of an additive manufacturing process
US10821573B2 (en) 2014-10-17 2020-11-03 Applied Materials, Inc. Polishing pads produced by an additive manufacturing process
JP6545261B2 (ja) 2014-10-17 2019-07-17 アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated 付加製造プロセスを使用する、複合材料特性を有するcmpパッド構造
TWI689406B (zh) * 2014-10-17 2020-04-01 美商應用材料股份有限公司 研磨墊及製造其之方法
US10875153B2 (en) 2014-10-17 2020-12-29 Applied Materials, Inc. Advanced polishing pad materials and formulations
US10875145B2 (en) 2014-10-17 2020-12-29 Applied Materials, Inc. Polishing pads produced by an additive manufacturing process
US9776361B2 (en) 2014-10-17 2017-10-03 Applied Materials, Inc. Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles
US11745302B2 (en) 2014-10-17 2023-09-05 Applied Materials, Inc. Methods and precursor formulations for forming advanced polishing pads by use of an additive manufacturing process
US10005172B2 (en) * 2015-06-26 2018-06-26 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Controlled-porosity method for forming polishing pad
KR20230145211A (ko) * 2015-10-16 2023-10-17 어플라이드 머티어리얼스, 인코포레이티드 적층 제조 프로세스를 이용하여 진보된 연마 패드를 형성하기 위한 방법 및 장치
JP6940495B2 (ja) 2015-10-30 2021-09-29 アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated 所望のゼータ電位を有する研磨用物品を形成するための装置及び方法
US10593574B2 (en) * 2015-11-06 2020-03-17 Applied Materials, Inc. Techniques for combining CMP process tracking data with 3D printed CMP consumables
CN105415216B (zh) * 2015-12-01 2018-03-09 湖南大学 一种磨粒规则排布的3d打印金刚石砂轮的制备方法
US10391605B2 (en) 2016-01-19 2019-08-27 Applied Materials, Inc. Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process
WO2017127221A1 (en) 2016-01-19 2017-07-27 Applied Materials, Inc. Porous chemical mechanical polishing pads
EP3869538A1 (en) 2016-03-09 2021-08-25 Applied Materials, Inc. Correction of fabricated shapes in additive manufacturing
JP6453797B2 (ja) * 2016-03-15 2019-01-16 株式会社東芝 積層造形装置および積層造形方法
TWI595968B (zh) * 2016-08-11 2017-08-21 宋建宏 研磨墊及其製造方法
KR102427116B1 (ko) * 2016-10-25 2022-08-01 쓰리엠 이노베이티브 프로퍼티즈 캄파니 배향된 연마 입자를 포함하는 접합된 연마 용품, 및 그의 제조 방법
CN106553137B (zh) * 2016-11-29 2019-07-30 湖南大学 一种金刚石树脂砂轮的制备方法
JP7134971B2 (ja) * 2016-12-23 2022-09-12 スリーエム イノベイティブ プロパティズ カンパニー ポリマーボンド研磨物品及びそれらの製造方法
WO2018160297A1 (en) * 2017-02-28 2018-09-07 3M Innovative Properties Company Metal bond abrasive articles and methods of making metal bond abrasive articles
US10596763B2 (en) 2017-04-21 2020-03-24 Applied Materials, Inc. Additive manufacturing with array of energy sources
US10882160B2 (en) 2017-05-25 2021-01-05 Applied Materials, Inc. Correction of fabricated shapes in additive manufacturing using sacrificial material
US10967482B2 (en) * 2017-05-25 2021-04-06 Applied Materials, Inc. Fabrication of polishing pad by additive manufacturing onto mold
TWI797130B (zh) * 2017-05-25 2023-04-01 美商應用材料股份有限公司 積層製造系統及使用其製造拋光墊的方法
US11471999B2 (en) 2017-07-26 2022-10-18 Applied Materials, Inc. Integrated abrasive polishing pads and manufacturing methods
US11072050B2 (en) 2017-08-04 2021-07-27 Applied Materials, Inc. Polishing pad with window and manufacturing methods thereof
WO2019032286A1 (en) * 2017-08-07 2019-02-14 Applied Materials, Inc. ABRASIVE DISTRIBUTION POLISHING PADS AND METHODS OF MAKING SAME
WO2019152222A1 (en) 2018-02-05 2019-08-08 Applied Materials, Inc. Piezo-electric end-pointing for 3d printed cmp pads
DE102018109528A1 (de) * 2018-04-20 2019-10-24 Rhodius Schleifwerkzeuge Gmbh & Co. Kg Abrasive Scheibe für handgeführte Werkzeugmaschinen mit unterschiedlichen Arbeitsbereichen
CN108972384B (zh) * 2018-06-11 2021-03-19 河北思瑞恩新材料科技有限公司 一种泡棉手擦块及其制备方法
CN108818337B (zh) * 2018-07-05 2020-02-14 南京航空航天大学 成型磨削用单层钎焊cbn砂轮磨粒排布设计与实现方法
CN108972388A (zh) * 2018-08-04 2018-12-11 乔斌 耐磨损研磨片及其制备方法
CN108838911A (zh) * 2018-08-04 2018-11-20 乔斌 一种耐磨损研磨片及其制备方法
JP7299970B2 (ja) 2018-09-04 2023-06-28 アプライド マテリアルズ インコーポレイテッド 改良型研磨パッドのための配合物
WO2020123203A1 (en) * 2018-12-12 2020-06-18 Corning Incorporated Grinding wheels and methods of producing the same
US11440831B2 (en) 2018-12-13 2022-09-13 Corning Incorporated Conveying apparatus and conveying ribbon
CN113226649B (zh) * 2018-12-18 2023-08-11 3M创新有限公司 研磨轮制造机和用于形成研磨轮的方法
US11851570B2 (en) 2019-04-12 2023-12-26 Applied Materials, Inc. Anionic polishing pads formed by printing processes
CN110271184A (zh) * 2019-05-04 2019-09-24 西北农林科技大学 一种复杂曲面零件专用精密研磨抛光片及其3d打印制备方法
US11965103B2 (en) 2019-08-21 2024-04-23 Applied Materials, Inc. Additive manufacturing of polishing pads
US11813712B2 (en) 2019-12-20 2023-11-14 Applied Materials, Inc. Polishing pads having selectively arranged porosity
US11806829B2 (en) 2020-06-19 2023-11-07 Applied Materials, Inc. Advanced polishing pads and related polishing pad manufacturing methods
US11878389B2 (en) 2021-02-10 2024-01-23 Applied Materials, Inc. Structures formed using an additive manufacturing process for regenerating surface texture in situ
US20220282144A1 (en) * 2021-03-05 2022-09-08 Saint-Gobain Abrasives, Inc. Abrasive articles and methods for forming same
IT202100019064A1 (it) * 2021-07-19 2023-01-19 Triulzi Cesare Special Equipments S R L Una macchina lucidatrice
CN117999150A (zh) * 2021-09-02 2024-05-07 Cmc材料有限责任公司 包含聚合物颗粒的纹理化cmp垫
US12296434B2 (en) 2021-12-30 2025-05-13 Saint-Gobain Abrasives, Inc. Abrasive articles and methods for forming same
WO2023130059A1 (en) 2021-12-30 2023-07-06 Saint-Gobain Abrasives, Inc. Abrasive articles and methods for forming same
US20250091260A1 (en) 2022-01-31 2025-03-20 Kuraray Co., Ltd. Method for manufacturing resin sheet by using 3d printer, and polishing pad having polishing layer obtained thereby

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101142055A (zh) * 2005-02-22 2008-03-12 圣戈本磨料股份有限公司 涂敷或粘结研磨制品
CN100450716C (zh) * 2001-12-13 2009-01-14 3M创新有限公司 导电材料沉积和抛光用的磨具
CN102689270A (zh) * 2011-03-22 2012-09-26 中芯国际集成电路制造(上海)有限公司 固结磨料抛光垫及其制备方法
US20130283700A1 (en) * 2012-04-25 2013-10-31 Rajeev Bajaj Printed Chemical Mechanical Polishing Pad

Family Cites Families (65)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1364244A (en) * 1970-10-21 1974-08-21 Ici Ltd Pigmented polymer coating compositions
JPS61192480A (ja) * 1985-02-22 1986-08-27 Kanebo Ltd 軟質金属用合成砥石
US5387380A (en) 1989-12-08 1995-02-07 Massachusetts Institute Of Technology Three-dimensional printing techniques
US5197999A (en) * 1991-09-30 1993-03-30 National Semiconductor Corporation Polishing pad for planarization
MY114512A (en) 1992-08-19 2002-11-30 Rodel Inc Polymeric substrate with polymeric microelements
US5906863A (en) 1994-08-08 1999-05-25 Lombardi; John Methods for the preparation of reinforced three-dimensional bodies
DE19510086A1 (de) * 1995-03-20 1996-09-26 Hoechst Ag Siegelfähige Polyolefin-Mehrschichtfolie mit partikelförmigen Hohlkörpern, Verfahren zu ihrer Herstellung und ihre Verwendung
US5738574A (en) 1995-10-27 1998-04-14 Applied Materials, Inc. Continuous processing system for chemical mechanical polishing
US5976000A (en) * 1996-05-28 1999-11-02 Micron Technology, Inc. Polishing pad with incompressible, highly soluble particles for chemical-mechanical planarization of semiconductor wafers
US6244575B1 (en) * 1996-10-02 2001-06-12 Micron Technology, Inc. Method and apparatus for vaporizing liquid precursors and system for using same
US5792544A (en) * 1996-11-12 1998-08-11 Eastwind Lapidary, Inc. Flexible abrasive article and method for making the same
US5876490A (en) 1996-12-09 1999-03-02 International Business Machines Corporatin Polish process and slurry for planarization
US6062958A (en) * 1997-04-04 2000-05-16 Micron Technology, Inc. Variable abrasive polishing pad for mechanical and chemical-mechanical planarization
US5940674A (en) * 1997-04-09 1999-08-17 Massachusetts Institute Of Technology Three-dimensional product manufacture using masks
US5921855A (en) 1997-05-15 1999-07-13 Applied Materials, Inc. Polishing pad having a grooved pattern for use in a chemical mechanical polishing system
US6337280B1 (en) * 1998-05-11 2002-01-08 Kabushiki Kaisha Toshiba Polishing cloth and method of manufacturing semiconductor device using the same
US6976904B2 (en) * 1998-07-09 2005-12-20 Li Family Holdings, Ltd. Chemical mechanical polishing slurry
US6390890B1 (en) * 1999-02-06 2002-05-21 Charles J Molnar Finishing semiconductor wafers with a fixed abrasive finishing element
US6962524B2 (en) * 2000-02-17 2005-11-08 Applied Materials, Inc. Conductive polishing article for electrochemical mechanical polishing
US6991528B2 (en) * 2000-02-17 2006-01-31 Applied Materials, Inc. Conductive polishing article for electrochemical mechanical polishing
US20010046834A1 (en) 2000-02-28 2001-11-29 Anuradha Ramana Pad surface texture formed by solid phase droplets
EP1268165B1 (en) * 2000-03-24 2004-10-06 GENERIS GmbH Method and apparatus for manufacturing a structural part by a multi-layer deposition technique, and mold or core as manufactured by the method
US6860802B1 (en) 2000-05-27 2005-03-01 Rohm And Haas Electric Materials Cmp Holdings, Inc. Polishing pads for chemical mechanical planarization
JP2002028849A (ja) * 2000-07-17 2002-01-29 Jsr Corp 研磨パッド
US6736869B1 (en) 2000-08-28 2004-05-18 Micron Technology, Inc. Method for forming a planarizing pad for planarization of microelectronic substrates
GB0103754D0 (en) * 2001-02-15 2001-04-04 Vantico Ltd Three-dimensional structured printing
JP2002264025A (ja) * 2001-03-14 2002-09-18 Dainippon Printing Co Ltd 研磨フィルム
US6755728B2 (en) * 2001-03-29 2004-06-29 Noritake Co., Ltd. Abrasive film in which water-soluble inorganic compound is added to binder
JP2003071729A (ja) * 2001-08-29 2003-03-12 Dainippon Printing Co Ltd 研磨フィルム
US6659846B2 (en) * 2001-09-17 2003-12-09 Agere Systems, Inc. Pad for chemical mechanical polishing
DE10224981B4 (de) * 2002-06-05 2004-08-19 Generis Gmbh Verfahren zum schichtweisen Aufbau von Modellen
US7377840B2 (en) 2004-07-21 2008-05-27 Neopad Technologies Corporation Methods for producing in-situ grooves in chemical mechanical planarization (CMP) pads, and novel CMP pad designs
IL156094A0 (en) * 2003-05-25 2003-12-23 J G Systems Inc Fixed abrasive cmp pad with built-in additives
GB0323462D0 (en) 2003-10-07 2003-11-05 Fujifilm Electronic Imaging Providing a surface layer or structure on a substrate
KR100576465B1 (ko) 2003-12-01 2006-05-08 주식회사 하이닉스반도체 연마입자 함침 조성물을 이용한 연마 패드
TWI293266B (en) 2004-05-05 2008-02-11 Iv Technologies Co Ltd A single-layer polishing pad and a method of producing the same
CN100356516C (zh) * 2004-05-05 2007-12-19 智胜科技股份有限公司 单层研磨垫及其制造方法
US7153191B2 (en) 2004-08-20 2006-12-26 Micron Technology, Inc. Polishing liquids for activating and/or conditioning fixed abrasive polishing pads, and associated systems and methods
JP3769581B1 (ja) * 2005-05-18 2006-04-26 東洋ゴム工業株式会社 研磨パッドおよびその製造方法
US7875091B2 (en) * 2005-02-22 2011-01-25 Saint-Gobain Abrasives, Inc. Rapid tooling system and methods for manufacturing abrasive articles
US7829000B2 (en) 2005-02-25 2010-11-09 Hewlett-Packard Development Company, L.P. Core-shell solid freeform fabrication
US8304467B2 (en) 2005-05-17 2012-11-06 Toyo Tire & Rubber Co., Ltd. Polishing pad
JP4898172B2 (ja) * 2005-09-08 2012-03-14 日本ミクロコーティング株式会社 研磨パッド及びその製造方法並びに研磨方法
US20070128991A1 (en) 2005-12-07 2007-06-07 Yoon Il-Young Fixed abrasive polishing pad, method of preparing the same, and chemical mechanical polishing apparatus including the same
US20070235904A1 (en) 2006-04-06 2007-10-11 Saikin Alan H Method of forming a chemical mechanical polishing pad utilizing laser sintering
KR100842486B1 (ko) 2006-10-30 2008-07-01 동부일렉트로닉스 주식회사 Cmp 장비의 폴리싱패드와 이의 제조장치
US7438636B2 (en) * 2006-12-21 2008-10-21 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing pad
US7862320B2 (en) 2007-07-17 2011-01-04 Seiko Epson Corporation Three-dimensional object forming apparatus and method for forming three dimensional object
US7966743B2 (en) * 2007-07-31 2011-06-28 Eastman Kodak Company Micro-structured drying for inkjet printers
US8221196B2 (en) * 2007-08-15 2012-07-17 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing pad and methods of making and using same
JP5597140B2 (ja) * 2007-12-31 2014-10-01 スリーエム イノベイティブ プロパティズ カンパニー プラズマ処理された研磨物品及び同物品の作製方法
EP2305454B1 (en) * 2008-05-26 2017-03-22 Sony Corporation Shaping apparatus and shaping method
US8282866B2 (en) * 2008-06-30 2012-10-09 Seiko Epson Corporation Method and device for forming three-dimensional model, sheet material processing method, and sheet material processing device
US20100178853A1 (en) * 2009-01-12 2010-07-15 Novaplanar Technology, Inc. Polishing pads for chemical mechanical planarization and/or other polishing methods
SG181890A1 (en) * 2009-12-22 2012-07-30 3M Innovative Properties Co Polishing pad and method of making the same
CN107083233A (zh) * 2010-02-24 2017-08-22 巴斯夫欧洲公司 研磨制品,其制备方法及其应用方法
JP2012182314A (ja) * 2011-03-01 2012-09-20 Jsr Corp 組成物および化学機械研磨パッド、ならびに化学機械研磨方法
JP5945874B2 (ja) * 2011-10-18 2016-07-05 富士紡ホールディングス株式会社 研磨パッド及びその製造方法
US9017060B2 (en) * 2011-12-28 2015-04-28 Huang-Nan Huang Arc blade-shaped processing surface structure of pad conditioner and manufacturing mold structure thereof
US9314930B2 (en) 2012-12-14 2016-04-19 LuxVue Technology Corporation Micro pick up array with integrated pivot mount
US20150065013A1 (en) * 2013-08-30 2015-03-05 Dow Global Technologies Llc Chemical mechanical polishing pad
US9421666B2 (en) 2013-11-04 2016-08-23 Applied Materials, Inc. Printed chemical mechanical polishing pad having abrasives therein
US20150306731A1 (en) * 2014-04-25 2015-10-29 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing pad
US9259821B2 (en) * 2014-06-25 2016-02-16 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing layer formulation with conditioning tolerance
US9630293B2 (en) * 2015-06-26 2017-04-25 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Chemical mechanical polishing pad composite polishing layer formulation

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100450716C (zh) * 2001-12-13 2009-01-14 3M创新有限公司 导电材料沉积和抛光用的磨具
CN101142055A (zh) * 2005-02-22 2008-03-12 圣戈本磨料股份有限公司 涂敷或粘结研磨制品
CN102689270A (zh) * 2011-03-22 2012-09-26 中芯国际集成电路制造(上海)有限公司 固结磨料抛光垫及其制备方法
US20130283700A1 (en) * 2012-04-25 2013-10-31 Rajeev Bajaj Printed Chemical Mechanical Polishing Pad

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