CN110106484B - 一种钛合金表面抗热冲刷涂层的制备方法 - Google Patents
一种钛合金表面抗热冲刷涂层的制备方法 Download PDFInfo
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- 238000000576 coating method Methods 0.000 title claims abstract description 94
- 239000011248 coating agent Substances 0.000 title claims abstract description 90
- 229910001069 Ti alloy Inorganic materials 0.000 title claims abstract description 51
- 238000002360 preparation method Methods 0.000 title claims abstract description 8
- 230000003628 erosive effect Effects 0.000 title claims 7
- 238000000034 method Methods 0.000 claims abstract description 19
- 239000000463 material Substances 0.000 claims abstract description 16
- 239000002131 composite material Substances 0.000 claims abstract description 13
- 238000000151 deposition Methods 0.000 claims abstract description 11
- 238000004544 sputter deposition Methods 0.000 claims description 80
- 229910010038 TiAl Inorganic materials 0.000 claims description 21
- 239000000758 substrate Substances 0.000 claims description 21
- 238000005477 sputtering target Methods 0.000 claims description 20
- 229910003481 amorphous carbon Inorganic materials 0.000 claims description 15
- 229910010037 TiAlN Inorganic materials 0.000 claims description 14
- 239000010936 titanium Substances 0.000 claims description 14
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 12
- 229910021330 Ti3Al Inorganic materials 0.000 claims description 12
- 239000000203 mixture Substances 0.000 claims description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 10
- 229910052715 tantalum Inorganic materials 0.000 claims description 8
- 238000005498 polishing Methods 0.000 claims description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 6
- 238000004140 cleaning Methods 0.000 claims description 6
- 239000008367 deionised water Substances 0.000 claims description 6
- 229910021641 deionized water Inorganic materials 0.000 claims description 6
- 229910052735 hafnium Inorganic materials 0.000 claims description 5
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 4
- 230000008021 deposition Effects 0.000 claims description 3
- 239000013077 target material Substances 0.000 abstract description 20
- 230000003647 oxidation Effects 0.000 abstract description 6
- 238000007254 oxidation reaction Methods 0.000 abstract description 6
- 230000035939 shock Effects 0.000 abstract description 6
- 238000007740 vapor deposition Methods 0.000 abstract description 2
- 238000005406 washing Methods 0.000 abstract description 2
- 239000007789 gas Substances 0.000 description 63
- 239000010410 layer Substances 0.000 description 13
- 238000009991 scouring Methods 0.000 description 8
- 238000005240 physical vapour deposition Methods 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 229910021389 graphene Inorganic materials 0.000 description 4
- 239000011159 matrix material Substances 0.000 description 4
- 238000005299 abrasion Methods 0.000 description 3
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 229910003864 HfC Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 229910010041 TiAlC Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 229910001080 W alloy Inorganic materials 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000005524 ceramic coating Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000005121 nitriding Methods 0.000 description 1
- 239000011224 oxide ceramic Substances 0.000 description 1
- 229910052574 oxide ceramic Inorganic materials 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 229910003468 tantalcarbide Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
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Abstract
本发明是一种钛合金表面抗热冲刷涂层的制备方法,该方法采用气相沉积设备分多次沉积在钛合金表面涂覆不同成分,不同组织结构的涂层,有效增加基材使用过程中高温抗热震性能,抗氧化性能,解决了热匹配问题,防止钛合金界面处的应力集中。本发明的步骤是:1.在钛合金表面沉积界面结合层;2.在界面结合层表面沉积组元梯度涂层;3.在组元梯度涂层表面制备组织梯度涂层;3.在组织梯度涂层表面制备抗磨损复合涂层。本发明的优点是:采用PVD涂层技术,制备四种不同组织成分梯度的涂层,可以有效的防止热冲刷,其中涉及多钟材质的靶材,操作简单。
Description
技术领域
本发明涉及一种钛合金表面抗热冲刷涂层的制备方法或气相沉积方法,该涂层有效增加基材使用过程中高温抗热震性能,抗氧化性能,解决了不同材质热匹配问题,防止钛合金界面处的应力集中,属于材料的表面处理技术领域。
背景技术
武器装备用钛合金表面抗热冲刷涂层是影响武器装备长期稳定使用的关键,现有涂层主要为陶瓷、钨合金、钽等,但合金涂层硬度及抗高温冲刷性能较差,陶瓷涂层难以制备,无法满足武器的使用需求。
制退器2000年以前采用高温钢作为基材,70年代通过电镀的方法涂覆Cr,80年代在Cr涂层表面进行氮化处理,90年代通过PVD的方法制备Ta、W、Ta/Cr、Ta-W、Ta-Cr涂层,改善了界面结合力,当前尝试采用高温氧化物、氮化物、碳化物涂覆在钢材表面。采用钛合金为基材的制退器是近两年的热点,由于其高温下低的强度,易被高温冲蚀,目前尝试用W、NiCrAlY、氧化物陶瓷作为钛合金表面抗热冲刷涂层,但均无法满足武器的使用需求。
TiAlN及Ti3AlN具有优良的高温抗氧化性、高温力学强度和热稳定性,且与钛合金基体结合性好,是理想的钛合金基材表面的高温抗冲刷涂层。TiAlN具有比Ti3AlN更高的硬度,而Ti3AlN具有更好的韧性和更高的热稳定温度。此外,TiAlC/α-C、HfC/α-C和TaC/α-C作为自润滑涂层,具有良好的抗磨损能力。采用pvd方法制备的组元梯度和组织梯度TiAlN或Ti3AlN涂层能有效阻止钛合金基材表面的氧化,具有良好的高温抗热振性和抗冲刷能力,在表面TiAlN或Ti3AlN涂层再涂覆TiAlC/非晶C、HfC/非晶C或TaC/非晶C后还能提高其抗磨损能力。
发明内容
本发明的目的是:在钛合金表面制备TiAl(或Ti3Al)+组元梯度TiAlN(或Ti3AlN)+组织梯度TiAlN(或Ti3AlN)+抗磨损涂层。该涂层可以有效增加基材使用过程中高温抗热震性能,抗氧化性能,解决了热匹配问题,防止钛合金界面处的应力集中。保证该材料具有良好的抗热冲刷性能。
本发明的技术方案是:
提供一种钛合金表面抗热冲刷涂层的制备方法,该方法的操作步骤如下:
步骤1、在磁控溅射设备中,对钛合金基材进行沉积,采用TiAl或Ti3Al作为溅射靶材;在钛合金基材表面沉积出TiAl或Ti3Al的界面结合层,其中工作气体为Ar气;
步骤2、在界面结合层表面沉积出TiAlN或Ti3AlN组元梯度涂层,其中工作气体为Ar气和N2气的混合气体;
步骤3、在组元梯度涂层表面沉积出TiAlN或Ti3AlN的组织梯度涂层,其中工作气体为Ar气和N2气的混合气体,步骤3中Ar气和N2气的混合气体中N2气与Ar气的质量比高于步骤2中的N2气与Ar气的质量比;
步骤4、采用TiAl、Ti3Al、Ta或Hf作为溅射靶材;在组织梯度涂层表面沉积出碳化物和非晶碳复合材料涂层,其中工作气体为Ar气和CH4气的混合气体。
进一步的,步骤1中对钛合金基材进行沉积之前,对沉积区域的钛合金基材表面进行抛光处理。更优选地,在抛光处理后对抛光区域进行清洗,清洗采用丙酮、酒精和去离子水。
进一步的,步骤1中磁控溅射的背底真空高于10-4Pa后,基材加温至300~600℃,靶基距为30~150mm,溅射压强为0.4~2Pa,偏压-100V~-250V,溅射电流密度20~60mA/cm2,溅射时间0.5~3h,结合层厚度为5~10μm。
进一步的,步骤2中溅射压强为0.4~2Pa,靶基距为30~150mm,偏压为-150V~-250V,溅射电流密度20~60mA/cm2;混合气体中N2气与Ar气的质量比为5%~60%。
进一步的,步骤2的混合气体中N2气与Ar气的质量比从第一阶段逐级提高到第五阶段:第一阶段的质量比为3%~8%,第二阶段的质量比为5%~15%,第三阶段的质量比为10%~25%,第四阶段的质量比为20%~35%,第五阶段的质量比为30%~60%,溅射时间1.5~4h,致密组元梯度涂层的厚度为2~5μm。
进一步的,步骤3中混合气体的N2气与Ar气的质量比为30%~60%,溅射压强为0.4~2Pa,溅射电流密度20~60mA/cm2,靶基距为30~150mm,偏压-40V~-250V。
进一步的,步骤3中偏压从第一阶段逐级提高到第四阶段:第一阶段偏压为-200V~-250V,第二阶段偏压为-150V~-200V,第三阶段偏压为-100V~-150V,第四阶段偏压为-40V~-100V,溅射时间5~8h,组织梯度涂层的厚度为10~30μm。
进一步的,步骤4中靶基距为30~150mm,混合气体中CH4气与Ar气质量比为5%~20%,溅射压强为0.4~2Pa,溅射电流密度20~60mA/cm2,偏压0V~-200V,溅射时间0.5~1.5h,碳化物和非晶碳复合材料涂层厚度为1~3μm。
基体钛合金的表面形成TiAl或Ti3Al结合层,结合层为致密组织,防止基体钛合金发生氧化,导致涂层的剥落,同时,TiAl或Ti3Al能够调节基体钛合金及组元梯度涂层之间的热膨胀系数差及模量差,保持整个涂层结构具有低的热残余应力,提高涂层抗热震性能。
致密组元梯度涂层为致密结构,防止氧化的产生,通过调节N2气的流量实现N的组元梯度,是为了获得梯度的热膨胀系数、硬度、模量,防止界面处由于硬度、模量差距过大,造成应力集中。
组织梯度涂层的结构为从致密组织过渡到疏松柱状晶组织,提高本涂层与致密组元梯度涂层的结合力,同时疏松柱状晶组织具有规则孔隙率及优异的抗热震性能。
碳化物和非晶碳复合材料涂层主要成分为TaC和非晶碳、HfC合非晶碳、TiAlC和非晶碳或Ti3AlC和非晶碳(对应Ta、Hf、TiAl或Ti3Al靶材),该复合涂层具有低的摩擦系数及自润滑作用,防止涂层使用过程中,表面由于碰撞产生的冲击磨损。
本发明的优点是:第一,采用化学气相沉积的方法在SiC纤维C涂层表面上生长出石墨烯墙来增加表面积,在不引入有害元素的情况下,能增强界面结合强度。
第二,石墨烯墙的厚度能通过沉积条件高度可控,仅通过石墨烯墙的厚度便于对复合材料中界面结合强度的优化,便于制备出高性能的SiC纤维增强钛基复合材料。
第三,化学气相沉积与物理气相沉积相结合的方法,可控度高,石墨烯墙的厚度和钛合金涂层的厚度都具有高重复性和高可控性,工艺简单、洁净、高效,便于产业化。
具体实施方式
下面对本发明做进一步详细说明。
实施例1
该种在钛合金表面制备高温抗热冲刷涂层的操作步骤如下:
(1)将钛合金基材①表面抛光,采用丙酮、酒精、去离子水进行表面清洗,放入PVD设备中,开真空系统,背底真空高于10-4Pa后,基材加温至300℃,采用TiAl作为溅射靶材,靶基距30mm,通入Ar溅射气体,溅射压强调整为0.4Pa,偏压-250V,溅射电流密度30mA/cm2,溅射时间2h,实现在钛合金基材表面涂覆10μm致密TiAl结合层;
(2)通入Ar气和N2气的混合气体,溅射压强为0.4Pa,靶基距30mm,偏压-200V,溅射电流密度20mA/cm2,采用TiAl作为溅射靶材,梯度控制N2/Ar比例:第一阶段N2/Ar质量比为3%,第二阶段N2/Ar比例为8%,第三阶段N2/Ar比例为20%,第四阶段N2/Ar比例为30%,第五阶段N2/Ar比例为50%,溅射时间4h,实现在结合层②表面涂覆5μm致密组元梯度的TiAlN涂层;
(3)保持N2/Ar比例50%,溅射压强为0.4Pa,溅射电流密度50mA/cm2,靶基距30mm,采用TiAl作为溅射靶材,梯度控制偏压:第一阶段偏压-250V,第二阶段偏压-180V,第三阶段偏压-120V,第四阶段偏压-60V,溅射时间8h,实现在致密组元梯度涂层③表面涂覆30μm组织梯度的TiAlN涂层;
(4)关闭N2气,通入Ar气和CH4气的混合气体,采用TiAl作为溅射靶材,靶基距30mm,保持CH4/Ar比例为10%,溅射压强为0.4Pa,溅射电流密度20mA/cm2,偏压0V,溅射时间0.5h,实现在组织梯度涂层④表面涂覆1μmTiAlC/非晶碳复合材料涂层;
(5)试验结束后,关闭溅射电源及气体,冷却2小时后关闭循环水和总电源。
此涂层具有更高的硬度且工艺简单。
实施例2
该种在钛合金表面制备高温抗热冲刷涂层的操作步骤如下:
(1)将钛合金基材①表面抛光,采用丙酮、酒精、去离子水进行表面清洗,放入PVD设备中,开真空系统,背底真空高于10-4Pa后,基材加温至600℃,采用TiAl作为溅射靶材,靶基距60mm,通入Ar溅射气体,溅射压强调整为0.8Pa,偏压-200V,溅射电流密度40mA/cm2,溅射时间1h,实现在钛合金基材表面涂覆7μm TiAl结合层;
(2)通入Ar气和N2气的混合气体,溅射压强为0.8Pa,靶基距60mm,偏压-200V,溅射电流密度40mA/cm2,采用TiAl作为溅射靶材,梯度控制N2/Ar比例:第一阶段N2/Ar比例为5%,第二阶段N2/Ar比例为10%,第三阶段N2/Ar比例为15%,第四阶段N2/Ar比例为30%,第五阶段N2/Ar比例为60%,溅射时间1.5h,实现在结合层表面涂覆2μm致密组元梯度的TiAlN涂层;
(3)保持N2/Ar比例60%,溅射压强为0.8Pa,溅射电流密度40mA/cm2,靶基距60mm,采用TiAl作为溅射靶材,梯度控制偏压:第一阶段偏压-220V,第二阶段偏压-180V,第三阶段偏压-150V,第四阶段偏压-40V,溅射时间6h,实现在致密组元梯度涂层表面涂覆20μm组织梯度的TiAlN涂层;
(4)关闭N2气,通入Ar气和CH4气的混合气体,采用Ta或Hf作为溅射靶材,靶基距60mm,保持CH4/Ar比例为20%,溅射压强为0.8Pa,溅射电流密度30mA/cm2,偏压-50V,溅射时间1h,实现在组织梯度涂层④表面涂覆2μmTaC/非晶碳或HfC/非晶碳复合材料涂层;
(5)试验结束后,关闭溅射电源及气体,冷却2小时后关闭循环水和总电源。
此涂层具有良好的抗磨损性能。
实施例3
该种在钛合金表面制备高温抗热冲刷涂层的操作步骤如下:
(1)将钛合金基材表面抛光,采用丙酮、酒精、去离子水进行表面清洗,放入PVD设备中,开真空系统,背底真空高于10-4Pa后,基材加温至400℃,采用Ti3Al作为溅射靶材,靶基距150mm,通入Ar溅射气体,溅射压强调整为1.2Pa,偏压-150V,溅射电流密度20mA/cm2,溅射时间3h,实现在钛合金基材表面涂覆10μm Ti3Al结合层;
(2)通入Ar气和N2气的混合气体,溅射压强为1.2Pa,靶基距150mm,偏压-150V,溅射电流密度20mA/cm2,采用Ti3Al作为溅射靶材,梯度控制N2/Ar比例:第一阶段N2/Ar比例为8%,第二阶段N2/Ar比例为15%,第三阶段N2/Ar比例为25%,第四阶段N2/Ar比例为35%,第五阶段N2/Ar比例为40%,溅射时间4h,实现在结合层表面涂覆4μm致密组元梯度的Ti3AlN涂层;
(3)保持N2/Ar比例40%,溅射压强为1.2Pa,溅射电流密度60mA/cm2,靶基距150mm,采用Ti3Al作为溅射靶材,梯度控制偏压:第一阶段偏压-220V,第二阶段偏压-200V,第三阶段偏压-120V,第四阶段偏压-100V,溅射时间6h,实现在致密组元梯度涂层表面涂覆25μm组织梯度的Ti3AlN涂层;
(4)关闭N2气,通入Ar气和CH4气的混合气体,采用Ti3Al作为溅射靶材,靶基距150mm,保持CH4/Ar比例为5%,溅射压强为1.2Pa,溅射电流密度60mA/cm2,偏压-120V,溅射时间1.5h,实现在组织梯度涂层表面涂覆3μmTi3AlC/非晶碳复合材料涂层;
(5)试验结束后,关闭溅射电源及气体,冷却2小时后关闭循环水和总电源。
此涂层具有良好的柔韧性且工艺简单。
实施例4
该种在钛合金表面制备高温抗热冲刷涂层的操作步骤如下:
(1)将钛合金基材表面抛光,采用丙酮、酒精、去离子水进行表面清洗,放入PVD设备中,开真空系统,背底真空高于10-4Pa后,基材加温至600℃,采用Ti3Al作为溅射靶材,靶基距120mm,通入Ar溅射气体,溅射压强调整为2Pa,偏压-100V,溅射电流密度60mA/cm2,溅射时间0.5h,实现在钛合金基材表面涂覆5μm Ti3Al结合层;
(2)通入Ar气和N2气的混合气体,溅射压强为2Pa,靶基距120mm,偏压-200V,溅射电流密度60mA/cm2,采用Ti3Al作为溅射靶材,梯度控制N2/Ar比例:第一阶段N2/Ar比例为3%,第二阶段N2/Ar比例为5%,第三阶段N2/Ar比例为10%,第四阶段N2/Ar比例为20%,第五阶段N2/Ar比例为30%,溅射时间3h,实现在结合层表面涂覆3μm致密组元梯度的Ti3AlN涂层;
(3)保持N2/Ar比例30%,溅射压强为2Pa,溅射电流密度20mA/cm2,靶基距120mm,采用Ti3Al作为溅射靶材,梯度控制偏压:第一阶段偏压-200V,第二阶段偏压-150V,第三阶段偏压-100V,第四阶段偏压-40V,溅射时间5h,实现在致密组元梯度涂层表面涂覆10μm组织梯度的Ti3AlN涂层;
(4)关闭N2气,通入Ar气和CH4气的混合气体,采用Ta或Hf作为溅射靶材,靶基距120mm,保持CH4/Ar比例为18%,溅射压强为2Pa,溅射电流密度50mA/cm2,偏压-200V,溅射时间1h,实现在组织梯度涂层④表面涂覆2μmTaC/非晶碳或HfC/非晶碳复合材料涂层;
(5)试验结束后,关闭溅射电源及气体,冷却2小时后关闭循环水和总电源。
此涂层具有更高的抗热冲刷温度。
Claims (6)
1.一种钛合金表面抗热冲刷涂层的制备方法,该方法的操作步骤如下:
步骤1、在磁控溅射设备中,对钛合金基材进行沉积,采用TiAl或Ti3Al作为溅射靶材;在钛合金基材表面沉积出TiAl或Ti3Al的结合层,其中工作气体为Ar气;磁控溅射的背底真空高于10-4Pa后,基材加温至300~600℃,靶基距为30~150mm,溅射压强为0.4~2Pa,偏压-100V~-250V,溅射电流密度20~60mA/cm2,溅射时间0.5~3h,结合层厚度为5~10μm;
步骤2、在结合层表面沉积出TiAlN或Ti3AlN致密组元梯度涂层,其中工作气体为Ar气和N2气的混合气体;溅射压强为0.4~2Pa,靶基距为30~150mm,偏压为-150V~-250V,溅射电流密度20~60mA/cm2;混合气体中N2气与Ar气的质量比为5%~60%;
步骤3、在致密组元梯度涂层表面沉积出TiAlN或Ti3AlN的组织梯度涂层,其中工作气体为Ar气和N2气的混合气体,步骤3中Ar气和N2气的混合气体中N2气与Ar气的质量比高于步骤2中的N2气与Ar气的质量比;混合气体的N2气与Ar气的质量比为30%~60%,溅射压强为0.4~2Pa,溅射电流密度20~60mA/cm2,靶基距为30~150mm,偏压-40V~-250V;
步骤4、采用TiAl、Ti3Al、Ta或Hf作为溅射靶材;在组织梯度涂层表面沉积出碳化物和非晶碳复合材料涂层,其中工作气体为Ar气和CH4气的混合气体;靶基距为30~150mm,混合气体中CH4气与Ar气质量比为5%~20%,溅射压强为0.4~2Pa,溅射电流密度20~60mA/cm2,偏压0V~-200V,溅射时间0.5~1.5h,碳化物和非晶碳复合材料涂层厚度为1~3μm。
2.根据权利要求1所述的一种钛合金表面抗热冲刷涂层的制备方法,其特征在于:步骤1中对钛合金基材进行沉积之前,对沉积区域的钛合金基材表面进行抛光处理。
3.根据权利要求1所述的一种钛合金表面抗热冲刷涂层的制备方法,其特征在于:在抛光处理后对抛光区域进行清洗,清洗采用丙酮、酒精和去离子水。
4.根据权利要求1所述的一种钛合金表面抗热冲刷涂层的制备方法,其特征在于:步骤2的混合气体中N2气与Ar气的质量比从第一阶段逐级提高到第五阶段:第一阶段的质量比为3%~8%,第二阶段的质量比为5%~15%,第三阶段的质量比为10%~25%,第四阶段的质量比为20%~35%,第五阶段的质量比为30%~60%,溅射时间1.5~4h,致密组元梯度涂层的厚度为2~5μm。
5.根据权利要求1所述的一种钛合金表面抗热冲刷涂层的制备方法,其特征在于:步骤3中偏压从第一阶段逐级提高到第四阶段:第一阶段偏压为-200V~-250V,第二阶段偏压为-150V~-200V,第三阶段偏压为-100V~-150V,第四阶段偏压为-40V~-100V,溅射时间5~8h,组织梯度涂层的厚度为10~30μm。
6.根据权利要求1所述的一种钛合金表面抗热冲刷涂层的制备方法,其特征在于:步骤3中所述偏压从-250V逐渐升高-40V。
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